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    TUNABLE TEMPERATURE CONTROLLED SUBSTRATE SUPPORT ASSEMBLY
    2.
    发明申请
    TUNABLE TEMPERATURE CONTROLLED SUBSTRATE SUPPORT ASSEMBLY 审中-公开
    可控温度控制基板支持总成

    公开(公告)号：US20160329231A1

    公开(公告)日：2016-11-10

    申请号：US15212946

    申请日：2016-07-18

    Applicant: Applied Materials, Inc.

    Inventor： Vijay D. PARKHE ,  Steven E. BABAYAN ,  Konstantin MAKHRATCHEV ,  Zhiqiang GUO ,  Phillip R. SOMMER ,  Dan A. MAROHL

    IPC: H01L21/683 ,  H05B1/02 ,  H01L21/67

    CPC classification number: H01L21/6833 ,  H01L21/67103 ,  H01L21/67248 ,  H01L21/6831 ,  H05B1/023 ,  H05B1/0233 ,  H05B3/02

    Abstract: Implementations described herein provide a substrate support assembly which enables both lateral and azimuthal tuning of the heat transfer between an electrostatic chuck and a heating assembly. The substrate support assembly comprises a body having a substrate support surface and a lower surface, one or more main resistive heaters disposed in the body, a plurality of spatially tunable heaters disposed in the body, and a spatially tunable heater controller coupled to the plurality of spatially tunable heaters, the spatially tunable heater controller configured to independently control an output one of the plurality of spatially tunable heaters relative to another of the plurality of spatially tunable heaters.

    Abstract translation: 本文所述的实施方案提供了一种基板支撑组件，其能够实现静电卡盘和加热组件之间的热传递的侧向和方位调节。 基板支撑组件包括具有基板支撑表面和下表面的主体，设置在主体中的一个或多个主电阻加热器，设置在主体中的多个可空调的加热器，以及耦合到多个 空间可调谐加热器，空间可调加热器控制器被配置为相对于多个空间可调谐加热器中的另一个来独立地控制多个空间可调加热器中的输出一个。

    TEMPERATURE CONTROLLED SUBSTRATE SUPPORT ASSEMBLY
    3.
    发明申请
    TEMPERATURE CONTROLLED SUBSTRATE SUPPORT ASSEMBLY 有权

    公开(公告)号：US20220013374A1

    公开(公告)日：2022-01-13

    申请号：US17483509

    申请日：2021-09-23

    Applicant: Applied Materials, Inc.

    Inventor： Vijay D. PARKHE ,  Konstantin MAKHRATCHEV ,  Masanori ONO ,  Zhiqiang GUO

    IPC: H01L21/67 ,  H01L21/683

    Abstract: Implementations described herein provide a substrate support assembly which enables both lateral and azimuthal tuning of the heat transfer between an electrostatic chuck and a heater assembly. The substrate support assembly comprises an upper surface and a lower surface; one or more main resistive heaters disposed in the substrate support; and a plurality of heaters in column with the main resistive heaters and disposed in the substrate support. A quantity of the heaters is an order of magnitude greater than a quantity of the main resistive heaters and the heaters are independently controllable relative to each other as well as the main resistive heater.

    PIXILATED TEMPERATURE CONTROLLED SUBSTRATE SUPPORT ASSEMBLY
    5.
    发明申请
    PIXILATED TEMPERATURE CONTROLLED SUBSTRATE SUPPORT ASSEMBLY 审中-公开
    受控温度控制的基板支撑组件

    公开(公告)号：US20150228513A1

    公开(公告)日：2015-08-13

    申请号：US14285606

    申请日：2014-05-22

    Applicant: Applied Materials, Inc.

    Inventor： Vijay D. PARKHE ,  Konstantin MAKHRATCHEV ,  Masanori ONO ,  Zhiqiang GUO

    IPC: H01L21/67 ,  H01L21/683

    CPC classification number: H01L21/67103 ,  H01L21/67248 ,  H01L21/6831

    Abstract: Implementations described herein provide a pixilated substrate support assembly which enables both lateral and azimuthal tuning of the heat transfer between an electrostatic chuck and a heating assembly. The pixilated substrate support assembly comprises an upper surface and a lower surface; one or more main resistive heaters disposed in the pixilated substrate support; and a plurality of pixel heaters in column with the main resistive heaters and disposed in the substrate support. A quantity of the pixel heaters is an order of magnitude greater than a quantity of the main resistive heaters and the pixel heaters are independently controllable relative to each other as well as the main resistive heater.

    Abstract translation: 本文所述的实施方式提供了像素化衬底支撑组件，其能够对静电吸盘和加热组件之间的热传递进行横向和方位调节。 像素化衬底支撑组件包括上表面和下表面; 设置在像素化衬底支架中的一个或多个主电阻加热器; 以及具有主电阻加热器的列中的多个像素加热器，并且设置在基板支撑件中。 一些像素加热器的数量级大于主电阻加热器的数量级，并且像素加热器可以相对于彼此独立地被控制以及主电阻加热器。

    ELECTROSTATIC CHUCK HAVING REDUCED POWER LOSS
    8.
    发明申请
    ELECTROSTATIC CHUCK HAVING REDUCED POWER LOSS 有权

    公开(公告)号：US20160163577A1

    公开(公告)日：2016-06-09

    申请号：US15043179

    申请日：2016-02-12

    Applicant: Applied Materials, Inc.

    Inventor： Konstantin MAKHRATCHEV ,  Jennifer Y. SUN

    IPC: H01L21/683 ,  H01R43/16

    CPC classification number: H01L21/6833 ,  B23K10/00 ,  H01L21/67103 ,  H01R43/16 ,  Y10T29/49204

    Abstract: Embodiments of the invention generally relate to an electrostatic chuck having reduced power loss, and methods and apparatus for reducing power loss in an electrostatic chuck, as well as methods for testing and manufacture thereof. In one embodiment, an electrostatic chuck is provided. The electrostatic chuck includes a conductive base, and a ceramic body disposed on the conductive base, the ceramic body comprising an electrode and one or more heating elements embedded therein, wherein the ceramic body comprises a dissipation factor of about 0.11 to about 0.16 and a capacitance of about 750 picoFarads to about 950 picoFarads between the electrode and the one or more heating elements.

    CONTROL SYSTEMS EMPLOYING DEFLECTION SENSORS TO CONTROL CLAMPING FORCES APPLIED BY ELECTROSTATIC CHUCKS, AND RELATED METHODS
    10.
    发明申请
    CONTROL SYSTEMS EMPLOYING DEFLECTION SENSORS TO CONTROL CLAMPING FORCES APPLIED BY ELECTROSTATIC CHUCKS, AND RELATED METHODS 有权
    使用偏转传感器控制由静电切割机应用的夹紧力的控制系统及相关方法

    公开(公告)号：US20150138687A1

    公开(公告)日：2015-05-21

    申请号：US14158112

    申请日：2014-01-17

    Applicant: Applied Materials, Inc.

    Inventor： Wendell BOYD, JR. ,  Vijay D. PARKHE ,  Matthew BUSCHE ,  Konstantin MAKHRATCHEV ,  Masanori ONO ,  Sehn THACH

    IPC: H01L21/683

    CPC classification number: H01L21/6833 ,  H01L21/67288

    Abstract: A control system that includes deflection sensors which can control clamping forces applied by electrostatic chucks, and related methods are disclosed. By using a sensor to determine a deflection of a workpiece supported by an electrostatic chuck, a control system may use the deflection measured to control a clamping force applied to the workpiece by the electrostatic chuck. The control system applies a clamping voltage to the electrostatic chuck so that the clamping force reaches and maintains a target clamping force. In this manner, the clamping force may secure the workpiece to the electrostatic chuck to enable manufacturing operations to be performed while preventing workpiece damage resulting from unnecessary higher values of the clamping force.

    Abstract translation: 公开了一种包括能够控制由静电卡盘施加的夹持力的偏转传感器的控制系统及相关方法。 通过使用传感器来确定由静电卡盘支撑的工件的偏转，控制系统可以使用测量的偏转来控制由静电卡盘施加到工件的夹紧力。 控制系统对静电卡盘施加钳位电压，使得夹紧力达到并保持目标夹紧力。 以这种方式，夹紧力可以将工件固定到静电卡盘，以使得能够进行制造操作，同时防止由于不必要的较高的夹紧力而导致的工件损坏。

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