公开(公告)号：US20140278227A1

公开(公告)日：2014-09-18

申请号：US13831446

申请日：2013-03-14

Applicant: Applied Materials Israel Ltd.

Inventor： Moshe Amzaleg ,  Nir Ben-David

IPC: G01B21/02 ,  G01R31/265

CPC classification number: G01B21/02

Abstract: A computerized method for estimating a size of a nanometric part of an inspected article, the method including: (a) acquiring inspection results generated by processing an inspection image which was generated by collecting signals arriving from a portion of the article which includes the part by an inspection system; (b) fitting to the inspection results an approximation function from a group of functions which is related to a response pattern of the inspection system; and (c) determining an estimated size of the part, based on at least one parameter of the approximation function.

Abstract translation: 一种用于估计被检物品的纳米部分的尺寸的计算机化方法，所述方法包括：（a）获取通过处理检查图像产生的检查结果，所述检查图像是通过收集从包括该部分的物品的一部分到达的信号而产生的信号， 检查系统; （b）从检查系统的响应模式相关的一组功能拟合检验结果; 以及（c）基于所述近似函数的至少一个参数来确定所述部分的估计大小。

公开(公告)号：US20130075605A1

公开(公告)日：2013-03-28

申请号：US13623804

申请日：2012-09-20

Applicant: APPLIED MATERIALS ISRAEL, LTD.

Inventor： Igor Krivts (Krayvitz) ,  Israel Avneri ,  Yoram Uziel ,  Nir Ben-David ,  Ido Holcman ,  Itzak Yair ,  Yosi Basson

IPC: F16B17/00 ,  G01N23/18

CPC classification number: H01J37/20 ,  F16B17/00 ,  G01N23/18 ,  G03F1/22 ,  G03F1/40 ,  H01J2237/0044 ,  H01J2237/20 ,  H01J2237/2008 ,  H01L21/6831 ,  Y10T279/23 ,  Y10T403/70

Abstract: A coupling module may include an upper portion that defines an aperture, mask contact elements, chuck contact elements and an intermediate element that is connected between the mask contact elements and the upper portion. A shape and a size of the aperture may correspond to a shape and size of a pattern transfer area of an extreme ultra violet (EUVL) mask. The coupling module may be shaped and sized so that once the mask contact elements contact the upper portion of the EUVL mask, the chuck contact elements contact a chuck that supports the mask. The coupling module may further provide at least one conductive path between the upper portion of the EUVL mask and the chuck when the EUVL mask is positioned on the chuck.

Abstract translation: 耦合模块可以包括限定孔的上部，掩模接触元件，卡盘接触元件和连接在掩模接触元件和上部之间的中间元件。 孔径的形状和尺寸可以对应于极紫外（EUVL）掩模的图案转移区域的形状和尺寸。 耦合模块的形状和尺寸可以使得一旦掩模接触元件接触EUVL掩模的上部，卡盘接触元件就接触支撑掩模的卡盘。 当EUVL掩模位于卡盘上时，耦合模块还可以在EUVL掩模的上部和卡盘之间提供至少一个导电路径。