摘要:
A variable valve timing device that allows a valve timing of an engine valve to be varied by relatively rotating a vane rotor and a housing. The variable valve timing includes a lock mechanism that releases the locking in accordance with the application of a lock releasing oil pressure. A crank angle CCA at which the application of the lock releasing oil pressure is instructed can be varied in accordance with an engine speed NE so that the lock releasing oil pressure rises at a crank angle in which cam torque is suitable for lock releasing.
摘要:
A variable valve timing device that allows a valve timing of an engine valve to be varied by relatively rotating a vane rotor and a housing. The variable valve timing includes a lock mechanism that releases the locking in accordance with the application of a lock releasing oil pressure. A crank angle CCA at which the application of the lock releasing oil pressure is instructed can be varied in accordance with an engine speed NE so that the lock releasing oil pressure rises at a crank angle in which cam torque is suitable for lock releasing.
摘要:
A variable valve timing mechanism changes a relative rotation phase of a camshaft to a target phase based on hydraulic pressure supplied to an advance and a retard sides pressure chambers. A lock mechanism is placed in a locked state in which the relative rotation phase is locked at a maximum retard phase when the hydraulic pressure in the advance and the retard side pressure chambers is low, and that is placed in an unlocked state in which the locked state is released when the hydraulic pressure becomes high. Hydraulic pressure regulations in a first mode that changes the relative rotation phase to a side toward the maximum retard phase and in a second mode that changes the relative rotation phase to a side away from the maximum retard phase are executed in combination during a period from when an operating switch is turned off until a crankshaft stops rotating.
摘要:
A variable valve timing apparatus includes: a variable valve timing mechanism that changes a valve timing and locks the valve timing at a most retarded timing; an oil control valve that controls a mode in which hydraulic fluid is supplied to the variable valve timing mechanism; and a controller that varies a duty ratio of the oil control valve within a set range that includes an advance active band, a retard active band, a holding range, an advance release range and a retard release range. In the advance release range, a varying speed of the valve timing is higher than the holding range and a housing rotor is disengaged from a vane rotor. When an engine operating state is a release request state, the controller sets the duty ratio of the oil control valve within the advance release range.
摘要:
A variable valve timing apparatus includes: a variable valve timing mechanism that changes a valve timing and locks the valve timing at a most retarded timing; an oil control valve that controls a mode in which hydraulic fluid is supplied to the variable valve timing mechanism; and a controller that varies a duty ratio of the oil control valve within a set range that includes an advance active band, a retard active band, a holding range, an advance release range and a retard release range. In the advance release range, a varying speed of the valve timing is higher than the holding range and a housing rotor is disengaged from a vane rotor. When an engine operating state is a release request state, the controller sets the duty ratio of the oil control valve within the advance release range.
摘要:
A polycarbonate resin composition for light guides which has excellent light guiding properties and flame retardancy, a light guide and a surface light source body.The light guide is formed from a resin composition which comprises (A) 100 parts by weight of a polycarbonate resin (component A) and (B) 0.001 to 0.1 part by weight of a metal salt-based compound (component B).
摘要:
A system for cleaning an object and a method for cleaning an object by irradiating a multiphase fluid containing a gas and liquid droplets, wherein a desired impact force is obtained by controlling the degree of liquid-drop-impact cavitation, which is generated when the liquid droplets in the multiphase fluid hit the object.
摘要:
A cellular phone receives a position measurement result, which indicates a position of the cellular phone determined based on both GPS satellite information and CDMA base station information, from a location information server. Then, when a value indicated by uncertainty information of the position measurement result is greater than a first threshold value, the cellular phone receives another position measurement result, which indicates the position of the cellular phone determined based only on the CDMA base station information, from the location information server and displays it on a display device.
摘要:
A sound signal generator includes a sound signal output function for outputting a sound signal to a command-driven amplifier that drives a speaker by using the sound signal being converted according to a control command, a first counter control function for changing a content of a first counter in a storage medium in a predetermined manner, a control command sending function for sending a control command to the command-driven amplifier upon having change in the content of the first counter in the predetermined manner, and a second counter control function for changing a content of a second counter in the storage medium in the predetermined manner upon having the control command sent to the command-driven amplifier by the control command sending function.
摘要:
A method of polishing a semiconductor substrate surface having at least one ruthenium feature thereon and at least one dielectric material, wherein the substrate is contacted with an aqueous composition containing from about 0.0005 to about 1 moles/kilogram of periodic acid, from about 0.2% to about 6% % by weight of silica abrasive having an average particle size of about 50 nm or less, and an amine in an amount sufficient to adjust the pH of the composition to between about 2.5 and 7. The removal selectivity of the ruthenium to a. low-K dielectric is greater than 20:1. Advantageously, the substrate further has a tantalum-containing compound, and the polishing rate of the tantalum-containing compound is about the same as the polishing rate of the ruthenium, so that the polishing process is a one-step process.