Variable valve timing device
    1.
    发明授权
    Variable valve timing device 有权
    可变气门正时装置

    公开(公告)号:US09206712B2

    公开(公告)日:2015-12-08

    申请号:US13519370

    申请日:2011-04-07

    IPC分类号: F01L1/34 F01L1/344

    摘要: A variable valve timing device that allows a valve timing of an engine valve to be varied by relatively rotating a vane rotor and a housing. The variable valve timing includes a lock mechanism that releases the locking in accordance with the application of a lock releasing oil pressure. A crank angle CCA at which the application of the lock releasing oil pressure is instructed can be varied in accordance with an engine speed NE so that the lock releasing oil pressure rises at a crank angle in which cam torque is suitable for lock releasing.

    摘要翻译: 一种可变气门正时装置,其允许通过相对旋转叶片转子和壳体来改变发动机气门的气门正时。 可变气门正时包括根据释放油压的锁定的应用而释放锁定的锁定机构。 可以根据发动机转速NE改变施加锁定释放油压的曲柄角CCA,使得锁定释放油压在凸轮转矩适合于锁定释放的曲柄角度上升。

    VARIABLE VALVE TIMING DEVICE
    2.
    发明申请
    VARIABLE VALVE TIMING DEVICE 有权
    可变阀门定时装置

    公开(公告)号:US20140069359A1

    公开(公告)日:2014-03-13

    申请号:US13519370

    申请日:2011-04-07

    IPC分类号: F01L1/34

    摘要: A variable valve timing device that allows a valve timing of an engine valve to be varied by relatively rotating a vane rotor and a housing. The variable valve timing includes a lock mechanism that releases the locking in accordance with the application of a lock releasing oil pressure. A crank angle CCA at which the application of the lock releasing oil pressure is instructed can be varied in accordance with an engine speed NE so that the lock releasing oil pressure rises at a crank angle in which cam torque is suitable for lock releasing.

    摘要翻译: 一种可变气门正时装置,其允许通过相对旋转叶片转子和壳体来改变发动机气门的气门正时。 可变气门正时包括根据释放油压的锁定的应用而释放锁定的锁定机构。 可以根据发动机转速NE改变施加锁定释放油压的曲柄角CCA,使得锁定释放油压在凸轮转矩适合于锁定释放的曲柄角度上升。

    VALVE TIMING CONTROL APPARATUS FOR INTERNAL COMBUSTION ENGINE AND CONTROL METHOD THEREOF
    3.
    发明申请
    VALVE TIMING CONTROL APPARATUS FOR INTERNAL COMBUSTION ENGINE AND CONTROL METHOD THEREOF 审中-公开
    用于内燃机的阀定时控制装置及其控制方法

    公开(公告)号:US20130118430A1

    公开(公告)日:2013-05-16

    申请号:US13812230

    申请日:2011-07-29

    IPC分类号: F01L1/344

    摘要: A variable valve timing mechanism changes a relative rotation phase of a camshaft to a target phase based on hydraulic pressure supplied to an advance and a retard sides pressure chambers. A lock mechanism is placed in a locked state in which the relative rotation phase is locked at a maximum retard phase when the hydraulic pressure in the advance and the retard side pressure chambers is low, and that is placed in an unlocked state in which the locked state is released when the hydraulic pressure becomes high. Hydraulic pressure regulations in a first mode that changes the relative rotation phase to a side toward the maximum retard phase and in a second mode that changes the relative rotation phase to a side away from the maximum retard phase are executed in combination during a period from when an operating switch is turned off until a crankshaft stops rotating.

    摘要翻译: 可变气门正时机构基于供给前进侧和后侧侧压力室的液压而将凸轮轴的相对旋转相位改变为目标相位。 锁定机构处于锁定状态,其中当前进和延迟侧压力室中的液压低时,相对旋转相锁定在最大延迟阶段,并且处于锁定状态 当液压变高时,状态被释放。 在相对旋转相位相对于最大延迟阶段向第一模式改变相对旋转相位的第二模式中,将相对旋转相位改变为远离最大延迟相位的一侧的液压压力规定在从 操作开关关闭,直到曲轴停止转动。

    Variable valve timing apparatus for internal combustion engine
    4.
    发明授权
    Variable valve timing apparatus for internal combustion engine 有权
    内燃机可变气门正时装置

    公开(公告)号:US09027517B2

    公开(公告)日:2015-05-12

    申请号:US13695523

    申请日:2011-04-14

    IPC分类号: F01L9/02 F01L1/344

    CPC分类号: F01L1/3442

    摘要: A variable valve timing apparatus includes: a variable valve timing mechanism that changes a valve timing and locks the valve timing at a most retarded timing; an oil control valve that controls a mode in which hydraulic fluid is supplied to the variable valve timing mechanism; and a controller that varies a duty ratio of the oil control valve within a set range that includes an advance active band, a retard active band, a holding range, an advance release range and a retard release range. In the advance release range, a varying speed of the valve timing is higher than the holding range and a housing rotor is disengaged from a vane rotor. When an engine operating state is a release request state, the controller sets the duty ratio of the oil control valve within the advance release range.

    摘要翻译: 可变气门正时装置包括:可变气门正时机构,其改变气门正时并在最延迟的时机锁定气门正时; 油控阀,其控制向可变气门正时机构供给液压流体的模式; 以及控制器,其将油控制阀的占空比改变在包括提前有功带,延迟有效带,保持范围,提前释放范围和延迟释放范围的设定范围内。 在提前释放范围内,气门正时的变化速度高于保持范围,并且壳体转子与叶片转子脱离。 当发动机工作状态为释放请求状态时,控制器将油控制阀的占空比设定在提前释放范围内。

    VARIABLE VALVE TIMING APPARATUS FOR INTERNAL COMBUSTION ENGINE
    5.
    发明申请
    VARIABLE VALVE TIMING APPARATUS FOR INTERNAL COMBUSTION ENGINE 有权
    用于内燃机的可变阀定时装置

    公开(公告)号:US20130042829A1

    公开(公告)日:2013-02-21

    申请号:US13695523

    申请日:2011-04-14

    IPC分类号: F01L1/344

    CPC分类号: F01L1/3442

    摘要: A variable valve timing apparatus includes: a variable valve timing mechanism that changes a valve timing and locks the valve timing at a most retarded timing; an oil control valve that controls a mode in which hydraulic fluid is supplied to the variable valve timing mechanism; and a controller that varies a duty ratio of the oil control valve within a set range that includes an advance active band, a retard active band, a holding range, an advance release range and a retard release range. In the advance release range, a varying speed of the valve timing is higher than the holding range and a housing rotor is disengaged from a vane rotor. When an engine operating state is a release request state, the controller sets the duty ratio of the oil control valve within the advance release range.

    摘要翻译: 可变气门正时装置包括:可变气门正时机构,其改变气门正时并在最延迟的时机锁定气门正时; 油控阀,其控制向可变气门正时机构供给液压流体的模式; 以及控制器,其将油控制阀的占空比改变在包括提前有功带,延迟有效带,保持范围,提前释放范围和延迟释放范围的设定范围内。 在提前释放范围内,气门正时的变化速度高于保持范围,并且壳体转子与叶片转子脱离。 当发动机工作状态为释放请求状态时,控制器将油控制阀的占空比设定在提前释放范围内。

    Sound signal output device and program for controlling sound output
    9.
    发明授权
    Sound signal output device and program for controlling sound output 有权
    声音信号输出装置和程序,用于控制声音输出

    公开(公告)号:US08155351B2

    公开(公告)日:2012-04-10

    申请号:US11332363

    申请日:2006-01-17

    申请人: Atsushi Hayashida

    发明人: Atsushi Hayashida

    IPC分类号: H03F99/00

    CPC分类号: H04R5/04

    摘要: A sound signal generator includes a sound signal output function for outputting a sound signal to a command-driven amplifier that drives a speaker by using the sound signal being converted according to a control command, a first counter control function for changing a content of a first counter in a storage medium in a predetermined manner, a control command sending function for sending a control command to the command-driven amplifier upon having change in the content of the first counter in the predetermined manner, and a second counter control function for changing a content of a second counter in the storage medium in the predetermined manner upon having the control command sent to the command-driven amplifier by the control command sending function.

    摘要翻译: 声音信号发生器包括声音信号输出功能,用于通过使用根据控制命令转换的声音信号将声音信号输出到驱动扬声器的命令驱动放大器;第一计数器控制功能,用于改变第一 计数器以预定的方式存储在存储介质中;控制命令发送功能,用于在以预定方式改变第一计数器的内容时​​向控制驱动放大器发送控制命令;以及第二计数器控制功能,用于改变 通过控制命令发送功能将控制命令发送到命令驱动放大器,以预定方式在存储介质中的第二计数器的内容。

    Periodic acid compositions for polishing ruthenium/low K substrates
    10.
    发明授权
    Periodic acid compositions for polishing ruthenium/low K substrates 有权
    用于抛光钌/低K衬底的周期酸组合物

    公开(公告)号:US07968465B2

    公开(公告)日:2011-06-28

    申请号:US10568077

    申请日:2004-08-12

    IPC分类号: H01L21/302 H01L21/461

    摘要: A method of polishing a semiconductor substrate surface having at least one ruthenium feature thereon and at least one dielectric material, wherein the substrate is contacted with an aqueous composition containing from about 0.0005 to about 1 moles/kilogram of periodic acid, from about 0.2% to about 6% % by weight of silica abrasive having an average particle size of about 50 nm or less, and an amine in an amount sufficient to adjust the pH of the composition to between about 2.5 and 7. The removal selectivity of the ruthenium to a. low-K dielectric is greater than 20:1. Advantageously, the substrate further has a tantalum-containing compound, and the polishing rate of the tantalum-containing compound is about the same as the polishing rate of the ruthenium, so that the polishing process is a one-step process.

    摘要翻译: 一种抛光其上具有至少一个钌特征的半导体衬底表面和至少一种电介质材料的方法,其中所述衬底与含有约0.0005至约1摩尔/千克高碘酸的水性组合物接触,约0.2%至 约6重量%的平均粒度为约50nm或更小的二氧化硅磨料,以及足以将组合物的pH调节至约2.5至7的量的胺。钌对于 。 低K电介质大于20:1。 有利的是,基板还含有含钽化合物,并且含钽化合物的抛光速率与钌的抛光速率大致相同,因此抛光过程是一步法。