公开(公告)号：US11926918B2

公开(公告)日：2024-03-12

申请号：US16468467

申请日：2017-12-19

Applicant: BASF SE

Inventor： Marcel Patrik Kienle ,  Dieter Mayer ,  Marco Arnold ,  Alexandra Haag ,  Charlotte Emnet ,  Alexander Fluegel

IPC: C25D3/32 ,  C25D3/02 ,  C25D3/38 ,  C25D7/12 ,  H01L21/288

CPC classification number: C25D3/32 ,  C25D3/02 ,  C25D3/38 ,  C25D7/123 ,  H01L21/2885

Abstract: The invention relates to a polyamine-based or polyhydric alcohol-based suppressing agent. The suppressing agent is modified by reaction with a compound that introduces a branching group into the suppressing agent before they are reacted with an alkylene oxide. The suppressing agent shows extraordinary superfilling properties, particularly when used to fill in features having extremely small aperture sizes and/or high aspect ratios.

公开(公告)号：US12134834B2

公开(公告)日：2024-11-05

申请号：US17995186

申请日：2021-03-24

Applicant: BASF SE

Inventor： Marco Arnold ,  Alexander Fluegel ,  Charlotte Emnet ,  Nadine Engelhardt

IPC: C25D3/38

Abstract: Described herein is a composition including copper ions, an acid, and at least one polyaminoamide including, a group of formula L1 [A-B-A′-Z]n[Y—Z]m  (L1) where B is a diacid fragment of formula L2 A, A′ are amine fragments independently selected from the group consisting of formula L3a and formula L3b Y is a co-monomer fragment; Z is a coupling fragment of formula L4 n is an integer of from 1 to 400; and m is 0 or an integer of from 1 to 400.

公开(公告)号：US12098473B2

公开(公告)日：2024-09-24

申请号：US17312737

申请日：2019-12-10

Applicant: BASF SE

Inventor： Sathana Kitayaporn ,  Charlotte Emnet ,  Dieter Mayer ,  Nadine Engelhardt ,  Marco Arnold ,  Lucas Benjamin Henderson ,  Alexander Fluegel

IPC: C25D3/18 ,  C25D3/12 ,  C25D5/18 ,  C25D7/12

CPC classification number: C25D3/18 ,  C25D3/12 ,  C25D5/18 ,  C25D7/123

Abstract: Described herein is a composition including metal ions consisting essentially of cobalt ions, and a specific monomeric and polymeric suppressing agent including a carboxylic, sulfonic, sulfinic, phosphonic, or phosphinic acid functional groups which show a suppressing effect that is required for void-free bottom-up filling of nanometer-sized recessed features.

公开(公告)号：US11840771B2

公开(公告)日：2023-12-12

申请号：US17566426

申请日：2021-12-30

Applicant: BASF SE

Inventor： Alexander Fluegel ,  Marco Arnold ,  Nadine Engelhardt ,  Marcel Patrik Kienle

IPC: C25D3/32 ,  C25D3/30

CPC classification number: C25D3/32 ,  C25D3/30

Abstract: Described herein is an aqueous composition including tin ions and at least one compound of formula I






wherein
X1 is selected from a linear or branched C1-C12 alkanediyl, which may optionally be interrupted by O or S or a C5 to C12 aromatic moiety,
R11 is a copolymer of ethylene oxide and a further C3 to C6 alkylene oxide, wherein the content of ethylene oxide is from 5 to 30% by weight,
R11 is selected from H, R11, R40,
R13, R14 are (a) independently selected from H, R11, R40, or (b) may together form a divalent group X13;
X13 is selected from a linear or branched C1-C12 alkanediyl, which may optionally be
interrupted by O, S or NR43;
R40 is H or a linear or branched C1-C20 alkyl,
R43 is selected from H, R11 and a linear or branched C1-C20 alkyl.

公开(公告)号：US20230203694A1

公开(公告)日：2023-06-29

申请号：US17564979

申请日：2021-12-29

Applicant: BASF SE

Inventor： Charlotte Emnet ,  Lucas Benjamin Henderson ,  Alexander Fluegel ,  Sathana Kitayaporn ,  Nadine Engelhardt

IPC: C25D3/38 ,  C25D7/12 ,  C25D5/00

CPC classification number: C25D3/38 ,  C25D7/123 ,  C25D5/605

Abstract: Described herein is a composition for depositing copper on a semiconductor substrate, the composition including

(a) copper ions;
(b) a grain refiner of formula G1








or salts thereof


(c) a complexing agent; and
(d) optionally a buffer or a base capable of adjusting the pH to a pH of from 7 to 13;
where the variables are as defined herein; and
where the pH of the composition is from 7 to 13.

公开(公告)号：US11459665B2

公开(公告)日：2022-10-04

申请号：US16954333

申请日：2018-12-10

Applicant: BASF SE

Inventor： Alexander Fluegel ,  Marco Arnold ,  Marcel Patrik Kienle ,  Nadine Engelhardt

IPC: C25D3/60 ,  C25D3/32 ,  C25D5/02 ,  C25D7/12

Abstract: Described herein is an aqueous composition including tin ions and at least one compound of formula I where X1, X2 are independently selected from a linear or branched C1-C12 alkanediyl, R11 is a monovalent group of formula —(O—CH2—CHR41)m—OR42, R12, R13, R14 are independently selected from H, R11, and R40; R15 is selected from H, R11, R40 and —X4—N(R21)2, X4 is a divalent group selected from (a) a linear or branched C1 to C12 alkanediyl, and (b) formula —(O—CH2—CHR41)o—, R21 is selected from R11 and R40, R40 is a linear or branched C1-C20 alkyl, R41 is selected from H and a linear or branched C1 to C5 alkyl, R42 is selected from H and a linear or branched C1-C20 alkyl, n is an integer of from 1 to 6, m is an integer of from 2 to 250, and o is an integer of from 1 to 250.

公开(公告)号：US11242606B2

公开(公告)日：2022-02-08

申请号：US17048770

申请日：2019-04-11

Applicant: BASF SE

Inventor： Alexander Fluegel ,  Marco Arnold ,  Nadine Engelhardt ,  Marcel Patrik Kienle

IPC: C25D3/32

Abstract: The present invention provides an aqueous composition comprising tin ions and at least one compound of formula I wherein X1 is selected from a linear or branched C1-C12 alkanediyl, which may optionally be interrupted by O or S or a C5 to C12 aromatic moiety, R11 is a copolymer of ethylene oxide and a further C3 to C6 alkylene oxide, wherein the content of ethylene oxide is from 5 to 30% by weight, R12 is selected from H, R11, R40, R13, R14, are (a) independently selected from H, R11, R40, or (b) may together form a divalent group X13; X13 is selected from a linear or branched C1-C12 alkanediyl, which may optionally be interrupted by O, S or NR43; R40 is H or a linear or branched C1-C20 alkyl, R43 is selected from H, R11 and a linear or branched C1-C20 alkyl.

公开(公告)号：US20220018035A1

公开(公告)日：2022-01-20

申请号：US17312737

申请日：2019-12-10

Applicant: BASF SE

Inventor： Sathana Katayaporn ,  Charlotte Emnet ,  Dieter Mayer ,  Nadine Engelhardt ,  Marco Arnold ,  Lucas Benjamin Henderson ,  Alexander Fluegel

IPC: C25D3/12 ,  C25D7/12 ,  C25D5/18

Abstract: Described herein is a composition including metal ions consisting essentially of cobalt ions, and a specific monomeric and polymeric suppressing agent including a carboxylic, sulfonic, sulfinic, phosphonic, or phosphinic acid functional groups which show a suppressing effect that is required for void-free bottom-up filling of nanometer-sized recessed features.

公开(公告)号：US20230203695A1

公开(公告)日：2023-06-29

申请号：US17565059

申请日：2021-12-29

Applicant: BASF SE

Inventor： Charlotte Emnet ,  Lucas Benjamin Henderson ,  Alexander Fluegel ,  Sathana Kitayaporn ,  Nadine Engelhardt

IPC: C25D3/38 ,  C25D7/12 ,  C25D5/02 ,  H01L21/768

CPC classification number: C25D3/38 ,  C25D7/123 ,  C25D5/02 ,  H01L21/76873 ,  H01L21/76879 ,  H01L23/53228

Abstract: Described herein is a composition for depositing copper on a semiconductor substrate, the composition including
(a) copper ions;

(b) an additive of formula S1





(c) a complexing agent; and

(d) optionally a buffer or base capable of adjusting the pH to a pH of from 7 to 13;

where the variables are as defined herein; and

where the pH of the composition is from 7 to 13 and where the composition is free of any cyanide.

公开(公告)号：US11535946B2

公开(公告)日：2022-12-27

申请号：US16618222

申请日：2018-05-28

Applicant: BASF SE

Inventor： Alexander Fluegel ,  Jean-Pierre Berkan Lindner ,  Marco Arnold

IPC: C25D3/60 ,  C25D3/32 ,  C25D5/02

Abstract: The present invention relates to the use of an aqueous composition comprising tin ions optionally further alloy metal ions selected from silver, copper, indium, and bismuth ions and at least one additive comprising a linear or branched polyimidazolium compound comprising the structural unit of formula (L1) for depositing tin or tin alloy containing layers and a process for depositing tin alloy layer onto a substrate.