公开(公告)号：US20120133938A1

公开(公告)日：2012-05-31

申请号：US13306668

申请日：2011-11-29

申请人： David DECKERS ,  Franciscus Godefridus Casper BIJNEN ,  Sami MUSA

发明人： David DECKERS ,  Franciscus Godefridus Casper BIJNEN ,  Sami MUSA

IPC分类号： G01N21/84 ,  B29C59/02

CPC分类号： G03F7/70683 ,  G03F1/42 ,  G03F1/44 ,  G03F1/70 ,  G03F7/70625 ,  G03F7/70633 ,  G03F9/7076 ,  G03F9/7088

摘要： A pattern formed on a substrate includes first and second sub-patterns positioned adjacent one another and having respective first and second periodicities. The pattern is observed to obtain a combined signal which includes a beat component having a third periodicity at a frequency lower than that of the first and second periodicities. A measurement of performance of the lithographic process is determined by reference to a phase of the beat component. Depending how the sub-patterns are formed, the performance parameter might be critical dimension (CD) or overlay, for example. For CD measurement, one of the sub-patterns may comprise marks each having of a portion sub-divided by product-like features. The measurement can be made using an existing alignment sensor of a lithographic apparatus. Sensitivity and accuracy of the measurement can be adjusted by selection of the first and second periodicities, and hence the third periodicity.

摘要翻译： 形成在基板上的图案包括彼此相邻并且具有相应的第一和第二周期性的第一和第二子图案。 观察该图案以获得组合信号，该组合信号包括频率低于第一和第二周期的频率的第三周期的拍子分量。 通过参考拍子组件的相位来确定光刻工艺的性能的测量。 根据子模式的形成方式，例如，性能参数可能是关键维度（CD）或覆盖。 对于CD测量，子图案之一可以包括每个具有被产品类特征细分的部分的标记。 可以使用光刻设备的现有对准传感器进行测量。 通过选择第一和第二周期性，因此可以调整测量的灵敏度和精度，因此可以调整第三周期性。

公开(公告)号：US20120062863A1

公开(公告)日：2012-03-15

申请号：US13206592

申请日：2011-08-10

申请人： Franciscus Godefridus Casper BIJNEN ,  Sami MUSA ,  David DECKERS

发明人： Franciscus Godefridus Casper BIJNEN ,  Sami MUSA ,  David DECKERS

IPC分类号： G03B27/54 ,  G01J4/00 ,  G01B11/02 ,  G01B11/00

CPC分类号： G03F7/70141 ,  G01B9/02 ,  G01B11/272 ,  G01D5/344 ,  G03F9/7046 ,  G03F9/7088

摘要： An alignment measurement system measures an alignment target on an object. A measurement illuminates the target and is reflected. The reflected measurement beam is split and its parts are differently polarized. A detector receives the reflected measurement beam. A processing unit determines alignment on the basis of the measurement beam received by the detector. An alternative arrangement utilizes an optical dispersive fiber to guide a multi-wavelength measurement beam reflected from the object to a detector.

摘要翻译： 对准测量系统测量物体上的对准目标。 测量照亮目标并被反射。 反射的测量光束被分离，其部分被不同的极化。 检测器接收反射的测量光束。 处理单元基于由检测器接收的测量波束来确定对准。 一种替代方案是使用光学色散光纤将从物体反射的多波长测量光束引导到检测器。

公开(公告)号：US20090153861A1

公开(公告)日：2009-06-18

申请号：US12332953

申请日：2008-12-11

申请人： Sami MUSA ,  Richard Johannes Franciscus Van Haren ,  Sanjaysingh Lalbahadoersing ,  Xiuhong Wei

发明人： Sami MUSA ,  Richard Johannes Franciscus Van Haren ,  Sanjaysingh Lalbahadoersing ,  Xiuhong Wei

IPC分类号： G01B11/00

CPC分类号： G03F9/7076

摘要： The position of a product is measured using an alignment mark on the product. Radiation is transmitted towards the alignment mark and diffracted by a pattern in the alignment mark. Position information is determined from phase relations of the diffracted radiation. The alignment mark comprises a set of mutually parallel conductor tracks from which the diffracted radiation is collected, the pattern being defined by a pattern of variation of the pitch between successive tracks as a function of position along the surface of the product. Thus, for example the pattern comprises alternating first and second areas wherein the pitch has a first and second value, respectively. Because the tracks in the different parts of the pattern, such as the first and second areas, are parallel to each other improved measurements are possible.

摘要翻译： 使用产品上的对准标记测量产品的位置。 辐射被朝向对准标记传送并被对准标记中的图案衍射。 位置信息由衍射辐射的相位关系确定。 对准标记包括一组相互平行的导体轨道，衍射辐射从该轨迹收集起来，该图案是通过沿着产品表面的位置的函数的连续迹线之间的间距的变化模式来限定的。 因此，例如，图案包括交替的第一和第二区域，其中间距分别具有第一和第二值。 因为图案的不同部分中的轨迹（例如第一和第二区域）彼此平行，所以改进的测量是可能的。