-
公开(公告)号：US20060040839A1
公开(公告)日：2006-02-23
申请号：US11203377
申请日：2005-08-15
IPC分类号： C11D7/32
CPC分类号： G03F7/423 , C11D7/08 , C11D7/10 , C11D7/12 , C11D11/0047 , H01L21/02052 , H01L21/02068
摘要： Cleaning compositions composed of specific amounts of carbonic acid and/or carbonate, hydrogen peroxide, aluminum fluoride and water are highly effective for cleaning electronic devices of resist, resist residues, titanium dioxide, aluminum oxide and silicon dioxide. The compositions contain no hydroxylamine and are thus free of its hazards.
摘要翻译： 由特定量的碳酸和/或碳酸盐，过氧化氢，氟化铝和水组成的清洁组合物对于清洁抗蚀剂，抗蚀剂残留物，二氧化钛，氧化铝和二氧化硅的电子器件是非常有效的。 组合物不含羟胺，因此没有危害。
-
公开(公告)号：US07354890B2
公开(公告)日：2008-04-08
申请号：US11203377
申请日：2005-08-15
IPC分类号： C11D7/50
CPC分类号： G03F7/423 , C11D7/08 , C11D7/10 , C11D7/12 , C11D11/0047 , H01L21/02052 , H01L21/02068
摘要： Cleaning compositions composed of specific amounts of carbonic acid and/or carbonate, hydrogen peroxide, aluminum fluoride and water are highly effective for cleaning electronic devices of resist, resist residues, titanium dioxide, aluminum oxide and silicon dioxide. The compositions contain no hydroxylamine and are thus free of its hazards.
摘要翻译： 由特定量的碳酸和/或碳酸盐，过氧化氢，氟化铝和水组成的清洁组合物对于清洁抗蚀剂，抗蚀剂残留物，二氧化钛，氧化铝和二氧化硅的电子器件是非常有效的。 组合物不含羟胺，因此没有危害。
-
3.发明申请CLEANING COMPOSITION FOR SEMICONDUCTOR DEVICE-MANUFACTURING APPARATUS AND CLEANING METHOD 审中-公开用于半导体器件制造设备和清洁方法的清洁组合物公开(公告)号：US20070161529A1
公开(公告)日：2007-07-12
申请号：US11614760
申请日：2006-12-21
CPC分类号： C23F1/44 , C11D3/3947 , C11D7/08 , C11D7/10 , C11D11/0047 , C23C16/4407 , C23F1/18 , C23F1/26 , C23G1/103 , C23G1/106
摘要： A cleaning composition for a semiconductor device-manufacturing apparatus comprising, based on the weight of the composition, 0.1-10% by weight of at least one fluorine compound selected from sodium fluoride, potassium fluoride, lithium fluoride and ammonium fluoride; 1-50% by weight of at least one phosphoric ingredient selected from phosphoric acid and a phosphoric acid salt; 0.5-35% by weight of hydrogen peroxide; 0-5% by weight of hydrofluoric acid, and the remainder of water, wherein the ratio (H2O2/F) by weight of hydrogen peroxide to fluorine in the total of the fluorine compound and the hydrofluoric acid is at least 4. The cleaning composition is used for cleaning semiconductor device-manufacturing apparatus having deposited thereon at least one deposited metal ingredient selected from metallic titanium, titanium oxide, titanium nitride, metallic copper, copper oxide, metallic tantalum, tantalum oxide and tantalum nitride to remove these deposited metal ingredients.
摘要翻译： 一种半导体装置制造装置用清洗组合物，其特征在于，以组合物的重量为基准，含有0.1-10重量％的选自氟化钠，氟化钾，氟化锂和氟化铵的至少一种氟化合物; 1-50重量％的选自磷酸和磷酸盐的至少一种磷成分; 0.5-35重量％的过氧化氢; 0-5重量％的氢氟酸，剩余的水，其中过氧化氢与氟的重量比（H 2 N 2 O 2 / F）为 氟化合物和氢氟酸的总和至少为4.清洁组合物用于清洁其上沉积有至少一种选自金属钛，氧化钛，氮化钛，金属铜，铜的沉积金属成分的半导体器件制造装置 氧化物，金属钽，氧化钽和氮化钽，以除去这些沉积的金属成分。
-
公开(公告)号：US20090008366A1
公开(公告)日：2009-01-08
申请号：US12208732
申请日：2008-09-11
IPC分类号： B44C1/22
CPC分类号： H01L21/31111 , H01L21/67086
摘要： This etching composition for etching hafnium compound, includes a fluoride compound and a chloride compound. This method for etching a substrate, includes etching a film which contains hafnium compound and is formed on a substrate by using an etching composition, wherein the etching composition contains a fluoride compound and a chloride compound.
摘要翻译： 用于蚀刻铪化合物的蚀刻组合物包括氟化物和氯化物。 用于蚀刻基板的方法包括使用蚀刻组合物蚀刻含有铪化合物的膜并在基板上形成，其中蚀刻组合物含有氟化物和氯化物。
-
公开(公告)号：US20050227473A1
公开(公告)日：2005-10-13
申请号：US11081678
申请日：2005-03-17
IPC分类号： C09K13/08 , G03F7/004 , H01L21/00 , H01L21/311 , H01L21/44
CPC分类号： H01L21/31111 , H01L21/67086
摘要： This etching composition for etching hafnium compound, includes a fluoride compound and a chloride compound. This method for etching a substrate, includes etching a film which contains hafnium compound and is formed on a substrate by using an etching composition, wherein the etching composition contains a fluoride compound and a chloride compound.
摘要翻译： 用于蚀刻铪化合物的蚀刻组合物包括氟化物和氯化物。 用于蚀刻基板的方法包括使用蚀刻组合物蚀刻含有铪化合物的膜并在基板上形成，其中蚀刻组合物含有氟化物和氯化物。
-
6.发明申请公开(公告)号：US20060033084A1
公开(公告)日：2006-02-16
申请号：US10914197
申请日：2004-08-10
申请人： Yasushi Hara , Masahiro Aoki , Hiroaki Hayashi
发明人： Yasushi Hara , Masahiro Aoki , Hiroaki Hayashi
IPC分类号： B01F1/00
CPC分类号： C23G1/106 , C23G1/24 , C23G1/26 , H01L21/31111
摘要： A composition for dissolving a titanium oxide, which comprises carbonic acid and/or a carbonate, hydrogen peroxide and water.
摘要翻译： 用于溶解包含碳酸和/或碳酸盐，过氧化氢和水的氧化钛的组合物。
-
公开(公告)号：US06797682B2
公开(公告)日：2004-09-28
申请号：US09996773
申请日：2001-11-30
申请人： Yasushi Hara , Masahiro Aoki , Hiroaki Hayashi
发明人： Yasushi Hara , Masahiro Aoki , Hiroaki Hayashi
IPC分类号： C11D1700
CPC分类号： C11D7/3227 , C11D1/62 , C11D3/3947 , C11D7/02 , C11D7/263 , C11D7/265 , C11D7/3209 , C11D11/0047 , G03F7/425 , H01L21/02052 , H01L21/02071
摘要： A resist stripper which comprises a peroxide and a quaternary ammonium salt.
摘要翻译： 一种抗蚀剂剥离剂，其包含过氧化物和季铵盐。
-
8.发明申请COMPOSITION FOR DISSOLVING TITANIUM OXIDE AND DISSOLUTION METHOD USING IT 审中-公开用于溶解氧化钛的组合物和使用它的溶解方法公开(公告)号：US20070125986A1
公开(公告)日：2007-06-07
申请号：US11673961
申请日：2007-02-12
申请人： Yasushi HARA , Masahiro Aoki , Hiroaki Hayashi
发明人： Yasushi HARA , Masahiro Aoki , Hiroaki Hayashi
IPC分类号： B01F1/00
CPC分类号： C23G1/106 , C23G1/24 , C23G1/26 , H01L21/31111
摘要： A composition for dissolving a titanium oxide, which comprises carbonic acid and/or a carbonate, hydrogen peroxide and water.
摘要翻译： 一种用于溶解包含碳酸和/或碳酸盐，过氧化氢和水的氧化钛的组合物。
-
9.发明授权Optical device, modulator module, and method for manufacturing the optical device 有权光学器件，调制器模块以及用于制造光学器件的方法公开(公告)号：US09110315B2
公开(公告)日：2015-08-18
申请号：US13488511
申请日：2012-06-05
CPC分类号： G02F1/025 , G02B2006/12097 , G02B2006/12135 , G02B2006/12142 , G02F1/2257 , G02F2201/063 , G02F2201/50 , H01S5/0265 , H01S5/12 , H01S5/227
摘要： An optical device includes a ridge-like optical waveguide portion, a mesa protector portion that is arranged in parallel to the optical waveguide portion, a resin portion that covers upper parts of the mesa protector portion and is disposed at both sides of the mesa protector portion, an electrode that is disposed on the optical waveguide portion, an electrode pad that is disposed on the resin portion located at an opposite side to the optical waveguide portion with respect to the mesa protector portion, and a connection portion that is disposed on the resin portion and electrically connects the electrode to the electrode pad.
摘要翻译： 光学装置包括脊状光波导部分，平行于光波导部分的台面保护部分，覆盖台面保护部分的上部并设置在台面保护部分两侧的树脂部分 设置在所述光波导路部分上的电极，设置在与所述台面保护器部分相对的所述光波导部分相对侧的所述树脂部分上的电极焊盘和设置在所述树脂上的连接部分 并将电极电连接到电极焊盘。
-
10.发明授权Apparatus for manufacturing dye-sensitized solar cell, and method of manufacturing dye-sensitized solar cell 有权染料敏化太阳能电池的制造装置及染料敏化太阳能电池的制造方法公开(公告)号：US08969123B2
公开(公告)日：2015-03-03
申请号：US13580782
申请日：2011-02-24
申请人： Hiroaki Hayashi , Ryuichi Shiratsuchi , Suehiro Ohkubo , Shuzi Hayase , Taiichi Mure , Yasuhiro Shishida
发明人： Hiroaki Hayashi , Ryuichi Shiratsuchi , Suehiro Ohkubo , Shuzi Hayase , Taiichi Mure , Yasuhiro Shishida
CPC分类号： H01G9/2068 , H01G9/2031 , H01G9/2059 , Y02E10/542 , Y02P70/521
摘要： In an apparatus for manufacturing a dye-sensitized solar cell, a photosensitization dye solution makes contact with an electrode material layer that functions as a working electrode of a dye-sensitized solar cell so that the photosensitizing dye is adsorbed on the layer. Such an apparatus for manufacturing a dye-sensitized solar cell has a substrate housing section to house a substrate with the electrode material layer formed on its surface, and a circulation mechanism to circulate the photosensitization dye solution in such a way that the solution passes a surface of the substrate housed in the substrate housing section. In such an apparatus, a cross-sectional area of a flow path for the photosensitization dye solution in a portion facing the substrate in the substrate housing section is set smaller than a cross-sectional area of a flow path for the photosensitization dye solution in other portions.
摘要翻译： 在染料敏化太阳能电池的制造装置中，光敏染料溶液与作为染料敏化太阳能电池的工作电极的电极材料层接触，使得光敏染料被吸附在该层上。 用于制造染料敏化太阳能电池的这种装置具有：基板容纳部，用于容纳其表面上形成有电极材料层的基板;以及循环机构，使光敏染料溶液循环使得溶液通过表面 的衬底容纳在衬底容纳部分中。 在这样的装置中，在基板容纳部中面向基板的部分中的光敏染料溶液的流路的截面积被设定为小于其他光敏染料溶液的流路的截面面积 部分。
-
-
-
-
-
-
-
-
-
搜索结果
106 条记录 (耗时 0.023 秒)
