公开(公告)号：US20190259574A1

公开(公告)日：2019-08-22

申请号：US16279628

申请日：2019-02-19

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Yo YAMAMOTO ,  Shota TORIKAWA ,  Hidekazu SUZUKI ,  Hiroyuki SUZUKI ,  Mamoru OKABE ,  Tatsuya ASAHATA

IPC: H01J37/30 ,  H01J37/08 ,  H01J37/14 ,  H01J37/147 ,  H01J37/09 ,  H01J37/28

Abstract: Disclosed are a charged particle beam apparatus wherein the charged particle beam apparatus can efficiently performs finish processing of a sample and acquisition of a high-precision SEM image of a processing surface of the sample in a short time, and a sample processing observation method using the same.The charged particle beam apparatus includes: a gallium ion beam column radiating a gallium ion beam toward a sample to form a cross-section of the sample; an electron beam column having a semi-in-lens type objective lens and radiating an electron beam toward the sample; a gas ion beam column radiating a gas ion beam toward the sample to perform finish processing of the cross-section of the sample, wherein the gas ion beam has a beam diameter larger than a maximum diameter of the cross-section of the sample.

公开(公告)号：US20150221473A1

公开(公告)日：2015-08-06

申请号：US14526172

申请日：2014-10-28

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Shota TORIKAWA ,  Tatsuya ASAHATA ,  Makoto SATO ,  Atsushi UEMOTO

IPC: H01J37/304 ,  H01J37/244 ,  H01J37/20 ,  H01J37/22

CPC classification number: H01J37/3045 ,  H01J2237/30438 ,  H01J2237/3045 ,  H01J2237/3174 ,  H01J2237/31749

Abstract: A charged particle beam apparatus including a column irradiating a sample with a charged particle beam, a detector detecting a secondary particle emitted from the sample, an image data generating section generating image data indicating two-dimensional distribution of an amount of the secondary particle detected by the detector, and a controller that respectively sets first and second position adjustment irradiation frames for first and second beam condition on a surface of the sample in the image data, form a first and second irradiation traces by respectively irradiating the first and second position adjustment irradiation frames with the charged particle beams of the first and second beam conditions, correct a position of the second processing irradiation frame, based on a position displacement amount between a predetermined position of the first irradiation trace and a predetermined position of the second irradiation trace.

Abstract translation: 一种带电粒子束装置，包括用带电粒子束照射样品的柱，检测从样品发射的二次粒子的检测器，图像数据生成部，生成表示由二次粒子的量的二维分布的二维分布的图像数据， 所述检测器和控制器分别在所述图像数据的样品的表面上分别设置用于第一和第二光束条件的第一和第二位置调整照射帧，通过分别照射所述第一和第二位置调整照射来形成第一和第二照射迹线 具有第一和第二光束条件的带电粒子束的帧，基于第一照射迹线的预定位置和第二照射迹线的预定位置之间的位置偏移量来校正第二处理照射帧的位置。

公开(公告)号：US20200035453A1

公开(公告)日：2020-01-30

申请号：US16496275

申请日：2018-03-27

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Shota TORIKAWA

IPC: H01J37/305 ,  H01J37/28 ,  H01J37/20 ,  H01J37/317

Abstract: This automatic processing device for fabricating a sample piece from a sample by irradiating the sample with a charged particle beam is provided with: a structural information acquiring unit which acquires structural information indicating the structure of the sample before processing; a processing termination position acquiring unit which acquires termination position specifying information specifying a processing termination position corresponding to the structure of the sample; an image acquiring unit which acquires a processed surface image in which a processed surface appearing at the position at which the sample has been irradiated by the charged particle beam is captured; and a determining unit which determines whether the position of the processing by the charged particle beam has reached the termination position, on the basis of a comparison between the structural information acquired by the structural information acquiring unit and the processed surface image acquired by the image acquiring unit.

公开(公告)号：US20160093467A1

公开(公告)日：2016-03-31

申请号：US14859726

申请日：2015-09-21

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Shota TORIKAWA ,  Tatsuya ASAHATA ,  Atsushi UEMOTO ,  Makoto SATO

IPC: H01J37/244 ,  H01J37/28

CPC classification number: H01J37/3045 ,  H01J2237/317

Abstract: A charged particle beam apparatus includes a stage for fixing a sample, a driving mechanism for driving the stage, a focused ion beam column, an electron beam column, a detector that detects a secondary charged particle emitted from the sample irradiated with a charged particle beam, a gas supplying device that supplies gas for forming a deposition film on a surface of the sample, and a control device that generates image data indicating the position distribution of the secondary charged particle detected by the detector. The control device irradiates the sample with the electron beam prior to irradiating the sample with a focused ion beam, recognizes an alignment mark provided in the sample in the image data by the electron beam, and performs positioning of an irradiation region of the sample using the alignment mark.

Abstract translation: 带电粒子束装置包括用于固定样品的台，用于驱动台的驱动机构，聚焦离子束柱，电子束柱，检测从照射了带电粒子束的样品发射的二次带电粒子的检测器 在样品的表面上供给用于形成沉积膜的气体的气体供给装置，以及生成表示由检测器检测出的二次带电粒子的位置分布的图像数据的控制装置。 控制装置在用聚焦离子束照射样品之前用电子束照射样品，通过电子束识别图像数据中的样品中提供的对准标记，并使用该样品的照射区域进行定位 对齐标记。

公开(公告)号：US20140284307A1

公开(公告)日：2014-09-25

申请号：US14221548

申请日：2014-03-21

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Tatsuya ASAHATA ,  Shota TORIKAWA

IPC: H01J37/305 ,  H01J37/30

CPC classification number: H01J37/3056 ,  H01J37/3005 ,  H01J2237/30466 ,  H01J2237/31749

Abstract: A focused ion beam system includes a focused ion beam irradiation mechanism which irradiates a sample, on which a protective film is formed, with a focused ion beam from above the sample, a processing control unit which performs a removal process on both sides of a region to be a thin piece portion of the sample by the focused ion beam and sequentially forms observation surfaces parallel to an irradiation direction of the focused ion beam so as to achieve the thin piece portion, and an observation surface image generation unit which generates an observation surface image. The processing control unit terminates the removal process when a height of the protective film in the irradiation direction of the focused ion beam becomes a predetermined threshold value or less in the observation surface image.

Abstract translation: 聚焦离子束系统包括：聚焦离子束照射机构，其从形成有来自样品上方的聚焦离子束照射形成有保护膜的样品;处理控制单元，其对区域的两侧进行去除处理 通过聚焦离子束成为样品的薄片部分，并顺序地形成与聚焦离子束的照射方向平行的观察面，以实现薄片部分;以及观察表面图像生成单元，其生成观察表面 图片。 当聚焦离子束的照射方向上的保护膜的高度在观察表面图像中变为预定阈值以下时，处理控制单元终止去除处理。

公开(公告)号：US20140061159A1

公开(公告)日：2014-03-06

申请号：US14012019

申请日：2013-08-28

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Tatsuya ASAHATA ,  Hidekazu SUZUKI ,  Shota TORIKAWA

IPC: H01J37/30 ,  H01J37/02

CPC classification number: H01J37/3005 ,  H01J37/02 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/20207 ,  H01J2237/28 ,  H01J2237/3174 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: A composite charged particle beam apparatus includes: a FIB column irradiating a thin sample with FIB; a GIB column irradiating the thin sample with GIB; a sample stage on which the thin sample is placed; a first tilt unit for tilting the thin sample about a first tilt axis of the sample stage, the first tilt axis being orthogonal to an FIB irradiation axis and being located inside a first plane formed by the FIB irradiation axis and a GIB irradiation axis; and a second tilt unit for tilting the thin sample about an axis which is orthogonal to the FIB irradiation axis and the first tilt axis.

Abstract translation: 复合带电粒子束装置包括：用FIB照射薄样品的FIB柱; GIB柱用GIB照射薄样品; 放置薄样品的样品台; 第一倾斜单元，用于围绕样品台的第一倾斜轴倾斜薄样品，第一倾斜轴正交于FIB照射轴并位于由FIB照射轴和GIB照射轴形成的第一平面内; 以及第二倾斜单元，用于使薄样品围绕与FIB照射轴和第一倾斜轴正交的轴倾斜。