中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

6 records (took 0.026 seconds)

    CHARGED PARTICLE BEAM APPARATUS
    2.
    发明申请
    CHARGED PARTICLE BEAM APPARATUS 有权
    充电颗粒光束装置

    公开(公告)号：US20160064187A1

    公开(公告)日：2016-03-03

    申请号：US14833563

    申请日：2015-08-24

    Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

    Inventor： Satoshi TOMIMATSU ,  Makoto SATO ,  Atsushi UEMOTO ,  Tatsuya ASAHATA ,  Yo YAMAMOTO

    IPC: H01J37/302 ,  H01J37/20

    CPC classification number: H01J37/3023 ,  H01J37/20 ,  H01J2237/208 ,  H01J2237/31745

    Abstract: ProblemTo automatically repeat an operation of extracting and transferring a sample piece, which is formed by processing a sample using an ion beam, to a sample piece holder.SolutionA charged particle beam includes: a computer that controls a needle actuating mechanism so as to approach a needle to a sample piece using a template formed from an absorbed current image obtained by irradiating the needle with a charged particle beam and a tip coordinate of the needle acquired from a secondary electron image obtained by irradiating the needle with the charged particle beam.

    Abstract translation: 问题为了自动重复将通过使用离子束处理样品而形成的样品的提取和转印操作重复到样品片保持器。 解决方案带电粒子束包括：计算机，其使用由通过用带电粒子束照射针而获得的吸收的当前图像形成的模板来控制针致动机构以使针接近样本片，并且将针 从通过用带电粒子束照射针获得的二次电子图像获取针。

    CHARGED PARTICLE BEAM APPARATUS
    3.
    发明申请
    CHARGED PARTICLE BEAM APPARATUS 有权
    充电颗粒光束装置

    公开(公告)号：US20150228451A1

    公开(公告)日：2015-08-13

    申请号：US14617273

    申请日：2015-02-09

    Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

    Inventor： Atsushi UEMOTO ,  Tatsuya ASAHATA ,  Hidekazu SUZUKI ,  Yo YAMAMOTO

    IPC: H01J37/20 ,  H01J37/26

    CPC classification number: H01J37/20 ,  H01J37/261 ,  H01J37/3023 ,  H01J2237/063 ,  H01J2237/08 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/208 ,  H01J2237/2448 ,  H01J2237/2482 ,  H01J2237/2602

    Abstract: A charged particle beam apparatus includes: a charged particle beam column configured to irradiate an irradiation target with a charged particle beam; a detector configured to detect secondary charged particles emitted from the irradiation target by the irradiation of the charged particle beam; a needle arranged in an irradiation area of the charged particle beam; a needle actuator configured to actuate the needle; and a controller configured to control the needle actuator to actuate the needle along a movement route that is configured by a preset target position and preset way points. The controller controls the needle actuator to set an actuating direction of the needle for each of the way points.

    Abstract translation: 带电粒子束装置包括：带电粒子束柱，被配置为用照射目标的带电粒子束; 检测器，被配置为通过照射带电粒子束来检测从照射目标物发射的二次带电粒子; 布置在带电粒子束的照射区域中的针; 针致动器，其构造成致动所述针; 以及控制器，被配置为控制针致动器沿着由预设目标位置和预设路线点构成的移动路线致动针。 控制器控制针致动器以为每个路点设置针的致动方向。

    COMPOSITE CHARGED PARTICLE BEAM APPARATUS
    6.
    发明申请
    COMPOSITE CHARGED PARTICLE BEAM APPARATUS 有权
    复合充电颗粒光束装置

    公开(公告)号：US20130248735A1

    公开(公告)日：2013-09-26

    申请号：US13840311

    申请日：2013-03-15

    Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

    Inventor： Xin MAN ,  Yo YAMAMOTO ,  Atsushi UEMOTO ,  Tatsuya ASAHATA

    IPC: H01J37/20

    CPC classification number: H01J37/20 ,  H01J37/023 ,  H01J37/3005 ,  H01J2237/0245

    Abstract: Provided is a composite charged particle beam apparatus, including: an electron beam column for irradiating a sample with an electron beam; an ion beam column for irradiating the sample with an ion beam to perform etching processing; a sample stage drive portion for moving a sample stage in an irradiation axis direction of the electron beam; and a column adjusting portion for moving the ion beam column relatively to a sample chamber such that the sample is irradiated with the ion beam at a position irradiated with the electron beam.

    Abstract translation: 提供一种复合带电粒子束装置，包括：用于用电子束照射样品的电子束柱; 离子束柱，用离子束照射样品进行蚀刻处理; 用于在电子束的照射轴方向移动样品台的样品台驱动部分; 以及用于相对于样品室移动离子束柱的柱调节部分，使得样品在被电子束照射的位置处被离子束照射。

Patent Agency Ranking