公开(公告)号：US20170207061A1

公开(公告)日：2017-07-20

申请号：US15365545

申请日：2016-11-30

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Wen LI ,  Kazuki IKEDA ,  Takuma NISHIMOTO ,  Hiroyuki TAKAHASHI ,  Hajime KAWANO

IPC: H01J37/22 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2448

Abstract: In an image forming method of charged particle beam apparatus for scanning a sample by irradiating the sample with a converged charged particle beam and detecting secondary charged particles generated from the sample by a detection unit, receiving and processing an output signal from the detection unit, and receiving the processed signal and forming an image of the sample, receiving and processing the output signal are performed by analogically processing the output signal and by performing pulse-count processing on the output signal, and pulse-count processing is performed by removing a ringing pulse in the output signal and counting pulses in the signal from which the ringing pulse has been removed.

公开(公告)号：US20190341225A1

公开(公告)日：2019-11-07

申请号：US16473957

申请日：2016-12-27

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Takuma NISHIMOTO ,  Wen LI ,  Hiroyuki TAKAHASHI ,  Wataru MORI ,  Hajime KAWANO

IPC: H01J37/22

Abstract: Provided is a charged particle beam device to enable determination of a noise source of a charged particle beam device that can cause a noise frequency component superimposed on a measurement image. The charged particle beam device includes a unit that extracts information regarding a noise source. The unit that extracts information regarding a noise source includes: a control signal monitoring unit that observes a control signal of a control unit which controls an electron optical system of the charged particle beam device and outputs the observed signal; a first frequency conversion processing unit that executes frequency conversion processing on the signal output from the control signal monitoring unit; a second frequency conversion processing unit that executes frequency conversion processing on an image signal output from a detector of the electron optical system; and a frequency analysis and comparison processing unit that receives an output signal of the first frequency conversion processing unit and an image signal of the second frequency conversion processing unit, and associates a peak frequency of a superimposed noise of the image signal with a noise source of the control unit which generates a noise having a peak frequency corresponding to the peak frequency of the superimposed noise within the image signal.

公开(公告)号：US20200043695A1

公开(公告)日：2020-02-06

申请号：US16491819

申请日：2017-03-06

Applicant: Hitachi High-Technologies Corporation

Inventor： Kazuki IKEDA ,  Wen LI ,  Takuma NISHIMOTO ,  Hiroyuki TAKAHASHI ,  Wataru MORI ,  Makoto SUZUKI ,  Hajime KAWANO

IPC: H01J37/147 ,  H01J37/22 ,  H01J37/28

Abstract: A charged particle beam device includes a deflection unit that deflects a charged particle beam released from a charged particle source to irradiate a sample, a reflection plate that reflects secondary electrons generated from the sample, and a control unit that controls the deflection unit based on an image generated by detecting the secondary electrons reflected from the reflection plate. The deflection unit includes an electromagnetic deflection unit that electromagnetically scans with the charged particle beam by a magnetic field and an electrostatic deflection unit that electrostatically scans with the charged particle beam by an electric field. The control unit controls the electromagnetic deflection unit and the electrostatic deflection unit, superimposes an electromagnetic deflection vector generated by the electromagnetic scanning and an electrostatic deflection vector generated by the electrostatic scanning, and controls at least a trajectory of the charged particle beam.

公开(公告)号：US20180366296A1

公开(公告)日：2018-12-20

申请号：US16060197

申请日：2015-12-08

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Takuma NISHIMOTO ,  Wen LI ,  Hiroyuki TAKAHASHI ,  Hajime KAWANO

IPC: H01J37/24 ,  H01J37/244 ,  H01J37/06

CPC classification number: H01J37/241 ,  H01J37/06 ,  H01J37/244 ,  H01J2237/026 ,  H01J2237/0473 ,  H01J2237/2448 ,  H01J2237/24535 ,  H01J2237/281

Abstract: Even in a case where a disturbance is applied from an adjacently disposed power supply circuit or the like, in order to realize a reduction in ripple, a high-voltage power supply device is configured to include a drive circuit, a transformer that boosts an output voltage of the drive circuit, a boost circuit that further boosts a voltage boosted by the transformer, a shield that covers the transformer and the boost circuit, a filter circuit that filters, smoothes, and outputs a high voltage output from the boost circuit, and an impedance loop circuit configured by connection of a plurality of impedance elements into a loop shape. A grounding point of the boost circuit, a grounding point of the shield, and a grounding point of the filter circuit are configured to be grounded via the impedance loop circuit, and this is applied to a high-voltage power supply unit that applies a high voltage to an electron gun of a charged particle beam apparatus.