Abstract:
A substrate assembly including a photosensitive etching glass substrate; and a first substrate and a second substrate for interposing both main surfaces of the photosensitive etching glass substrate between them. One of the main surfaces of the photosensitive etching glass substrate is thermally bonded to the first substrate, and the other main surface of the photosensitive etching glass substrate is bonded to the second substrate. When a thermal expansion coefficient of the photosensitive etching glass substrate is defined as C0, and a thermal expansion coefficient of the first substrate is defined as C1, and a thermal expansion coefficient of the second substrate is defined as C2, C1/C2 satisfies a relation of 0.7 or more and 1.3 or less, and at least one of a relation of C0/C1 satisfying less than 0.7 or larger than 1.3, and a relation of C0/C2 satisfying less than 0.7 or larger than 1.3 is satisfied.
Abstract:
There is provided a method of manufacturing a photosensitive glass molding, including: softening a solid-state photosensitive glass material by heating; and molding the softened photosensitive glass material to obtain a photosensitive glass molding, wherein in the heating, a crystal precipitated on the photosensitive glass material is melted by heating.
Abstract:
An electronic amplifying substrate, including: a glass base material having an insulating property; conductive layers formed on both main surfaces of the glass base material; and a plurality of through holes formed on a lamination body of the glass base material and the conductive layer, wherein an electric field is formed in the through hole by a potential difference between both conductive layers during application of a voltage to a surface of the conductive layer so that an electron avalanche amplification occurs in the through hole, and an insulation part is formed on at least one main surface of the glass base material, with one of the end portions of the insulation part formed to surround an opening part of the through hole of the glass base material, and the other end portion formed in contact with the end portions of the conductive layers.
Abstract:
A method of manufacturing a photosensitive glass substrate, including: directly irradiating a plate-like base material composed of a photosensitive glass with an energy beam to form a latent image; crystallizing the latent image by a first heat treatment to obtain a crystallized portion; and dissolving and removing the crystallized portion and applying fine processing thereto, to obtain a photosensitive glass substrate, wherein in the irradiating, an irradiation position of the energy beam is corrected based on a dimensional variation of the photosensitive glass caused by a heat treatment including at least the first heat treatment.
Abstract:
There is provided a silicate ceramics formed by crystallizing a silicate glass containing at least silicon oxide and lithium oxide, wherein a crystallinity of the silicate ceramics is 95% or more, and the silicate ceramics has a lithium disilicate crystal phase and α-quartz crystal phase, and further, regarding the ratio of the lithium disilicate crystal phase and the α-quartz crystal phase in the silicate ceramics, the lithium disilicate crystal phase has a larger weight ratio, and the silicate glass is preferably a photosensitive glass.
Abstract:
There is provided that a substrate comprising a glass substrate 2 constituted by a glass including a silicon oxide. The glass substrate has a through-hole 3 communicating with a front surface and a rear surface of the glass substrate, and filled with a metal material. The substrate is realized by forming an anchor part by selectively etching a silicon oxide on a sidewall surrounding an inside of said through-hole 3 before filling the metal material and by filling the inside of said through-hole 3 with the metal material after forming the anchor part.