SUBSTRATE ASSEMBLY, METHOD OF MANUFACTURING SUBSTRATE ASSEMBLY AND METHOD OF MANUFACTURING CHIP PACKAGE
    1.
    发明申请
    SUBSTRATE ASSEMBLY, METHOD OF MANUFACTURING SUBSTRATE ASSEMBLY AND METHOD OF MANUFACTURING CHIP PACKAGE 有权
    基板组件,制造基板组件的方法和制造芯片封装的方法

    公开(公告)号:US20140301050A1

    公开(公告)日:2014-10-09

    申请号:US14209419

    申请日:2014-03-13

    Abstract: A substrate assembly including a photosensitive etching glass substrate; and a first substrate and a second substrate for interposing both main surfaces of the photosensitive etching glass substrate between them. One of the main surfaces of the photosensitive etching glass substrate is thermally bonded to the first substrate, and the other main surface of the photosensitive etching glass substrate is bonded to the second substrate. When a thermal expansion coefficient of the photosensitive etching glass substrate is defined as C0, and a thermal expansion coefficient of the first substrate is defined as C1, and a thermal expansion coefficient of the second substrate is defined as C2, C1/C2 satisfies a relation of 0.7 or more and 1.3 or less, and at least one of a relation of C0/C1 satisfying less than 0.7 or larger than 1.3, and a relation of C0/C2 satisfying less than 0.7 or larger than 1.3 is satisfied.

    Abstract translation: 一种基板组件,包括光敏蚀刻玻璃基板; 以及用于将感光蚀刻玻璃基板的两个主表面插入它们之间的第一基板和第二基板。 感光蚀刻用玻璃基板的主表面之一与第一基板热粘接,感光蚀刻用玻璃基板的另一主面与第二基板接合。 当感光蚀刻玻璃基板的热膨胀系数定义为C0,将第一基板的热膨胀系数定义为C1,将第二基板的热膨胀系数定义为C2时,C1 / C2满足关系 为0.7以上且1.3以下,并且满足小于0.7或大于1.3的C 0 / C的关系和满足小于0.7或大于1.3的C 0 / C 2的关系中的至少一个。

    Photosensitive Glass Molding and Method of Manufacturing the Same
    2.
    发明申请
    Photosensitive Glass Molding and Method of Manufacturing the Same 审中-公开
    感光玻璃成型及其制造方法

    公开(公告)号:US20160152505A1

    公开(公告)日:2016-06-02

    申请号:US14906916

    申请日:2014-08-04

    Inventor: Takashi FUSHIE

    Abstract: There is provided a method of manufacturing a photosensitive glass molding, including: softening a solid-state photosensitive glass material by heating; and molding the softened photosensitive glass material to obtain a photosensitive glass molding, wherein in the heating, a crystal precipitated on the photosensitive glass material is melted by heating.

    Abstract translation: 提供了一种制造感光玻璃模制品的方法,包括:通过加热软化固态感光玻璃材料; 并且对软化的感光性玻璃材料进行成型以获得感光性玻璃成型体,其中在加热时,通过加热使在感光性玻璃材料上析出的结晶熔融。

    ELECTRONIC AMPLIFYING SUBSTRATE AND METHOD OF MANUFACTURING ELECTRONIC AMPLIFYING SUBSTRATE
    3.
    发明申请
    ELECTRONIC AMPLIFYING SUBSTRATE AND METHOD OF MANUFACTURING ELECTRONIC AMPLIFYING SUBSTRATE 审中-公开
    电子放大基板及制造电子放大基板的方法

    公开(公告)号:US20150380224A1

    公开(公告)日:2015-12-31

    申请号:US14769003

    申请日:2014-02-24

    Inventor: Takashi FUSHIE

    Abstract: An electronic amplifying substrate, including: a glass base material having an insulating property; conductive layers formed on both main surfaces of the glass base material; and a plurality of through holes formed on a lamination body of the glass base material and the conductive layer, wherein an electric field is formed in the through hole by a potential difference between both conductive layers during application of a voltage to a surface of the conductive layer so that an electron avalanche amplification occurs in the through hole, and an insulation part is formed on at least one main surface of the glass base material, with one of the end portions of the insulation part formed to surround an opening part of the through hole of the glass base material, and the other end portion formed in contact with the end portions of the conductive layers.

    Abstract translation: 一种电子放大基板,包括:具有绝缘性的玻璃基材; 形成在玻璃基材的两个主表面上的导电层; 以及多个通孔,其形成在所述玻璃基材和所述导电层的层叠体上,其中,在对所述导电层的表面施加电压期间,通过所述两个导电层之间的电位差在所述通孔中形成电场 使得在通孔中发生电子雪崩放大,并且绝缘部分形成在玻璃基材的至少一个主表面上,绝缘部分的一个端部形成为围绕通孔的开口部分 玻璃基材的孔,另一端部形成为与导电层的端部接触。

    METHOD OF MANUFACTURING PHOTOSENSITIVE GLASS SUBSTRATE
    4.
    发明申请
    METHOD OF MANUFACTURING PHOTOSENSITIVE GLASS SUBSTRATE 审中-公开
    制造感光玻璃基材的方法

    公开(公告)号:US20160194240A1

    公开(公告)日:2016-07-07

    申请号:US14911456

    申请日:2014-08-13

    Inventor: Takashi FUSHIE

    Abstract: A method of manufacturing a photosensitive glass substrate, including: directly irradiating a plate-like base material composed of a photosensitive glass with an energy beam to form a latent image; crystallizing the latent image by a first heat treatment to obtain a crystallized portion; and dissolving and removing the crystallized portion and applying fine processing thereto, to obtain a photosensitive glass substrate, wherein in the irradiating, an irradiation position of the energy beam is corrected based on a dimensional variation of the photosensitive glass caused by a heat treatment including at least the first heat treatment.

    Abstract translation: 一种感光性玻璃基板的制造方法,其特征在于,包括:用能量束直接照射由感光性玻璃构成的板状基材,形成潜像; 通过第一次热处理使潜像结晶,得到结晶部分; 并溶解除去结晶部分并对其进行精细加工,以获得感光性玻璃基板,其中在照射中,基于由包括在...的热处理引起的感光玻璃的尺寸变化来校正能量束的照射位置 最少的热处理。

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