公开(公告)号：US08715901B2

公开(公告)日：2014-05-06

申请号：US11597332

申请日：2005-05-24

申请人： Hirokazu Sakakibara ,  Takayoshi Abe ,  Takashi Chiba ,  Toru Kimura

发明人： Hirokazu Sakakibara ,  Takayoshi Abe ,  Takashi Chiba ,  Toru Kimura

IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/028 ,  G03F7/40

CPC分类号： G03F7/40 ,  H01L21/0274

摘要： A resin composition which, in forming a fine pattern by a heat treatment of a resist pattern formed by using a photoresist, can be applied onto the resist pattern, can cause the resist pattern to smoothly shrink by heat treatment, and can be easily washed away by a treatment with an alkaline aqueous solution, and a method for efficiently forming a fine resist pattern using the resin composition are provided. The resin composition comprises a resin containing a hydroxyl group, a crosslinking component, and an alcohol solvent containing water in an amount of 10 wt % or less for the total solvent, wherein the alcohol in the alcohol solvent is a monovalent alcohol having 1 to 8 carbon atoms.

摘要翻译： 通过对通过使用光致抗蚀剂形成的抗蚀剂图案的热处理形成微细图案的树脂组合物可以施加到抗蚀剂图案上，可以使抗蚀剂图案通过热处理而平滑地收缩，并且可以容易地被冲走 通过用碱性水溶液处理，以及使用该树脂组合物有效形成精细抗蚀剂图案的方法。 树脂组合物包含含有羟基的树脂，交联组分和含有总量为10重量％以下的水的醇溶剂，其中醇溶剂中的醇为1〜8价的一元醇 碳原子。

公开(公告)号：US20070259287A1

公开(公告)日：2007-11-08

申请号：US11597332

申请日：2005-05-24

申请人： Hirokazu Sakakibara ,  Takayoshi Abe ,  Takashi Chiba ,  Toru Kimura

发明人： Hirokazu Sakakibara ,  Takayoshi Abe ,  Takashi Chiba ,  Toru Kimura

IPC分类号： G03C1/00

CPC分类号： G03F7/40 ,  H01L21/0274

摘要： A resin composition which, in forming a fine pattern by a heat treatment of a resist pattern formed by using a photoresist, can be applied onto the resist pattern, can cause the resist pattern to smoothly shrink by heat treatment, and can be easily washed away by a treatment with an alkaline aqueous solution, and a method for efficiently forming a fine resist pattern using the resin composition are provided. The resin composition comprises a resin containing a hydroxyl group, a crosslinking component, and an alcohol solvent containing water in an amount of 10 wt % or less for the total solvent, wherein the alcohol in the alcohol solvent is a monovalent alcohol having 1 to 8 carbon atoms.

摘要翻译： 通过对通过使用光致抗蚀剂形成的抗蚀剂图案的热处理形成微细图案的树脂组合物可以施加到抗蚀剂图案上，可以使抗蚀剂图案通过热处理而平滑地收缩，并且可以容易地被冲走 通过用碱性水溶液处理，以及使用该树脂组合物有效形成精细抗蚀剂图案的方法。 树脂组合物包含含有羟基的树脂，交联组分和含有总量为10重量％以下的水的醇溶剂，其中醇溶剂中的醇为1〜8价的一元醇 碳原子。

公开(公告)号：US20080038661A1

公开(公告)日：2008-02-14

申请号：US11664296

申请日：2005-09-28

申请人： Takashi Chiba ,  Toru Kimura ,  Tomohiro Utaka ,  Hiroki Nakagawa ,  Hirokazu Sakakibara ,  Hiroshi Dougauchi

发明人： Takashi Chiba ,  Toru Kimura ,  Tomohiro Utaka ,  Hiroki Nakagawa ,  Hirokazu Sakakibara ,  Hiroshi Dougauchi

IPC分类号： C08F12/30 ,  G03C1/73

CPC分类号： G03F7/11 ,  C08F220/18 ,  C08F220/26 ,  C08F220/38 ,  C08F228/00 ,  G03F7/2041

摘要： A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which comprises at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000, wherein at least one of R1 and R2 is a fluoroalkyl group having 1 to 4 carbon atoms and R3 in the formula (2) represents a fluoroalkyl group having 1 to 20 carbon atoms.

摘要翻译： 用于形成表面涂层的树脂组合物可以形成在光致抗蚀剂膜上而不与光致抗蚀剂膜混合，可以保持在浸没光刻期间不溶于介质的稳定的膜涂层，在干燥曝光期间不损害图案轮廓（ 这不是浸没式光刻法），并且可以容易地溶解在碱性显影剂中。 树脂是包含至少一种选自由下式（1）表示的基团的重复单元，由下式（2）表示的基团的重复单元）的重复单元（I）的共聚物， 和具有羧基的重复单元和具有磺基的重复单元（II），所述共聚物的重均分子量通过凝胶渗透色谱法测定为2,000〜100,000，其中R 1〜 R 2是具有1〜4个碳原子的氟代烷基，式（2）中的R 3表示碳原子数1〜20的氟代烷基 。

公开(公告)号：US08580482B2

公开(公告)日：2013-11-12

申请号：US13338569

申请日：2011-12-28

申请人： Takashi Chiba ,  Toru Kimura ,  Tomohiro Utaka ,  Hiroki Nakagawa ,  Hirokazu Sakakibara ,  Hiroshi Dougauchi

发明人： Takashi Chiba ,  Toru Kimura ,  Tomohiro Utaka ,  Hiroki Nakagawa ,  Hirokazu Sakakibara ,  Hiroshi Dougauchi

IPC分类号： G03F7/11 ,  C08F18/20 ,  C08F18/22 ,  C08F26/02 ,  C08F28/02

CPC分类号： G03F7/11 ,  C08F220/18 ,  C08F220/26 ,  C08F220/38 ,  C08F228/00 ,  G03F7/2041

摘要： A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which includes at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000.

摘要翻译： 用于形成表面涂层的树脂组合物可以形成在光致抗蚀剂膜上而不与光致抗蚀剂膜混合，可以保持在浸没光刻期间不溶于介质的稳定的膜涂层，在干燥曝光期间不损害图案轮廓（ 这不是浸没式光刻法），并且可以容易地溶解在碱性显影剂中。 树脂是包含至少一种选自由下式（1）表示的基团的重复单元，由下式（2）表示的基团的重复单元）的重复单元（I）的共聚物， 和具有羧基的重复单元和具有磺基的重复单元（II），所述共聚物的重均分子量通过凝胶渗透色谱法测定为2,000〜100,000。

公开(公告)号：US20100266953A1

公开(公告)日：2010-10-21

申请号：US12832035

申请日：2010-07-07

申请人： Takashi Chiba ,  Toru Kimura ,  Tomohiro Utaka ,  Hiroki Nakagawa ,  Hirokazu Sakakibara ,  Hiroshi Dougauchi

发明人： Takashi Chiba ,  Toru Kimura ,  Tomohiro Utaka ,  Hiroki Nakagawa ,  Hirokazu Sakakibara ,  Hiroshi Dougauchi

IPC分类号： G03F7/004

CPC分类号： G03F7/11 ,  C08F220/18 ,  C08F220/26 ,  C08F220/38 ,  C08F228/00 ,  G03F7/2041

摘要： A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which has a recurring unit (I) having a carboxyl group, a recurring unit (II) having a sulfo group and a recurring unit obtained by copolymerizing fluoroalkyl(meth)acrylates having 1 to 20 carbon atoms in a fluoroalkyl group thereof other than a recurring unit having a side chain that includes an alcoholic hydroxyl group having a fluoroalkyl group at least in an α-position thereof, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000.

摘要翻译： 用于形成表面涂层的树脂组合物可以形成在光致抗蚀剂膜上而不与光致抗蚀剂膜混合，可以保持在浸没光刻期间不溶于介质的稳定的膜涂层，在干燥曝光期间不损害图案轮廓（ 这不是浸没式光刻法），并且可以容易地溶解在碱性显影剂中。 树脂是具有羧基的重复单元（I），具有磺基的重复单元（II）和通过在氟代烷基中共聚有碳原子数1〜20的氟代烷基（甲基）丙烯酸酯）而得到的重复单元的共聚物 除了具有侧链的重链单元以外，其具有至少在α-位具有氟烷基的醇羟基，所述共聚物的重均分子量通过凝胶渗透色谱法测定为2,000〜100,000。

公开(公告)号：US07781142B2

公开(公告)日：2010-08-24

申请号：US11664296

申请日：2005-09-28

申请人： Takashi Chiba ,  Toru Kimura ,  Tomohiro Utaka ,  Hiroki Nakagawa ,  Hirokazu Sakakibara ,  Hiroshi Dougauchi

发明人： Takashi Chiba ,  Toru Kimura ,  Tomohiro Utaka ,  Hiroki Nakagawa ,  Hirokazu Sakakibara ,  Hiroshi Dougauchi

IPC分类号： G03F7/11 ,  C08F18/20 ,  C08F18/22

CPC分类号： G03F7/11 ,  C08F220/18 ,  C08F220/26 ,  C08F220/38 ,  C08F228/00 ,  G03F7/2041

摘要： A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which comprises at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000, wherein at least one of R1 and R2 is a fluoroalkyl group having 1 to 4 carbon atoms and R3 in the formula (2) represents a fluoroalkyl group having 1 to 20 carbon atoms.

摘要翻译： 用于形成表面涂层的树脂组合物可以形成在光致抗蚀剂膜上而不与光致抗蚀剂膜混合，可以保持在浸没光刻期间不溶于介质的稳定的膜涂层，在干燥曝光期间不损害图案轮廓（ 这不是浸没式光刻法），并且可以容易地溶解在碱性显影剂中。 树脂是包含至少一种选自由下式（1）表示的基团的重复单元，由下式（2）表示的基团的重复单元）的重复单元（I）的共聚物， 和具有羧基的重复单元和具有磺基的重复单元（II），所述共聚物的重均分子量通过凝胶渗透色谱法测定为2,000〜100,000，其中R1和R2中的至少一个为 具有1至4个碳原子的氟代烷基和式（2）中的R 3表示具有1至20个碳原子的氟烷基。

公开(公告)号：US08697331B2

公开(公告)日：2014-04-15

申请号：US12949795

申请日：2010-11-19

申请人： Hirokazu Sakakibara ,  Takehiko Naruoka ,  Makoto Shimizu ,  Yukio Nishimura ,  Nobuji Matsumura ,  Yuusuke Asano

发明人： Hirokazu Sakakibara ,  Takehiko Naruoka ,  Makoto Shimizu ,  Yukio Nishimura ,  Nobuji Matsumura ,  Yuusuke Asano

IPC分类号： G03F7/004 ,  G03F7/039

CPC分类号： C07C69/96 ,  C08F220/18 ,  C08F220/22 ,  C08F220/24 ,  C08F220/26 ,  C09D133/18 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

摘要： A compound is shown by a following formula (1), wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R2 represents a methylene group, an ethylene group, a 1-methylethylene group, a 2-methylethylene group, a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, or a derivative thereof, each of R3 represents at least one of a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, a derivative thereof, and a linear or branched alkyl group having 1 to 4 carbon atoms, provided that two of R3 may bond to form a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof together with the carbon atom that is bonded thereto, and X represents a linear or branched fluoroalkylene group having 1 to 20 carbon atoms.

摘要翻译： 化合物由下式（1）表示，其中R1表示氢原子，甲基或三氟甲基，R2表示亚甲基，亚乙基，1-甲基亚乙基，2-甲基亚乙基， 碳原子数4〜20的二价脂环式烃基或其衍生物，各R3表示碳原子数为4〜20的一价脂环族烃基，其衍生物和具有1个碳原子的直链或支链烷基中的至少一种 至4个碳原子，条件是R3中的两个可以键合形成具有4至20个碳原子的二价脂环族烃基或其衍生物和与其键合的碳原子，并且X表示具有1个碳原子的直链或支链氟亚烷基 至20个碳原子。

公开(公告)号：US20100255420A1

公开(公告)日：2010-10-07

申请号：US12740111

申请日：2008-10-21

申请人： Hirokazu Sakakibara ,  Makoto Shimizu ,  Takehiko Naruoka ,  Yoshifumi Ooizumi ,  Kentarou Harada ,  Takuma Ebata

发明人： Hirokazu Sakakibara ,  Makoto Shimizu ,  Takehiko Naruoka ,  Yoshifumi Ooizumi ,  Kentarou Harada ,  Takuma Ebata

IPC分类号： G03C1/00 ,  C08F118/02

CPC分类号： G03F7/0397 ,  C08F220/18 ,  C08L2312/06 ,  C09D133/14 ,  C09D133/16 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/2041 ,  C08F220/24 ,  C08F220/38

摘要： A radiation-sensitive resin composition includes a polymer, an acid-labile group-containing resin, a radiation-sensitive acid generator, and a solvent, the polymer including repeating units shown by following general formulas (1) and (2). wherein R1 and R2 represent a hydrogen atom, a methyl group, or a trifluoromethyl group, R3 represents a linear or branched alkyl group having 1 to 6 carbon atoms or an alicyclic hydrocarbon group having 4 to 20 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom, or a derivative thereof, and Z represents a group that includes a group that generates an acid upon exposure to light. The radiation-sensitive resin composition produces an excellent pattern shape, reduces the amount of elution into an immersion liquid upon contact during liquid immersion lithography, ensures that a high receding contact angle is formed by a resist film and an immersion liquid, and rarely causes development defects.

摘要翻译： 辐射敏感性树脂组合物包括聚合物，含酸不稳定基团的树脂，辐射敏感性酸产生剂和溶剂，所述聚合物包括由以下通式（1）和（2）表示的重复单元。 其中R 1和R 2表示氢原子，甲基或三氟甲基，R 3表示碳原子数1〜6的直链或支链烷基或碳原子数4〜20的脂环式烃基，其中至少一个氢原子 被氟原子或其衍生物取代，Z表示包含在曝光时产生酸的基团的基团。 放射线敏感性树脂组合物产生优异的图案形状，在液浸光刻期间减少接触时浸入液中的洗脱量，确保通过抗蚀剂膜和浸渍液形成高后退接触角，并且很少引起显影 缺陷

公开(公告)号：US08968980B2

公开(公告)日：2015-03-03

申请号：US13288963

申请日：2011-11-04

申请人： Ken Maruyama ,  Kota Nishino ,  Kazuki Kasahara ,  Hirokazu Sakakibara

发明人： Ken Maruyama ,  Kota Nishino ,  Kazuki Kasahara ,  Hirokazu Sakakibara

IPC分类号： G03F7/004 ,  G03F7/039 ,  C07C65/10

CPC分类号： C07C65/10 ,  C08F8/12 ,  C08F12/22 ,  C08F212/14 ,  C09D125/18 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  Y10S430/122 ,  Y10S430/126 ,  C08F2220/1891 ,  C08F220/18

摘要： A radiation-sensitive resin composition includes an acid-dissociable group-containing resin, and a compound shown by the following general formula (1). wherein Z− represents a monovalent anion shown by a general formula (2), M+ represents a monovalent onium cation, R1 represents a linear or branched alkyl group having 1 to 12 carbon atoms substituted or unsubstantiated with a fluorine atom, or a linear or branched alkoxy group having 1 to 12 carbon atoms, and n is 1 or 2.

摘要翻译： 辐射敏感性树脂组合物包含含酸解离基团的树脂和由以下通式（1）表示的化合物。 其中Z-表示由通式（2）表示的一价阴离子，M +表示一价鎓阳离子，R1表示碳原子数1〜12的被氟原子取代或未取代的直链或支链烷基，或直链或支链 具有1至12个碳原子的烷氧基，n为1或2。

公开(公告)号：US20120100480A1

公开(公告)日：2012-04-26

申请号：US13216209

申请日：2011-08-23

申请人： Nobuji MATSUMURA ,  Yuusuke Asano ,  Hirokazu Sakakibara ,  Yukio Nishimura ,  Takehiko Naruoka

发明人： Nobuji MATSUMURA ,  Yuusuke Asano ,  Hirokazu Sakakibara ,  Yukio Nishimura ,  Takehiko Naruoka

IPC分类号： G03F7/004 ,  C08F222/20 ,  C07C69/96

CPC分类号： C07C69/96 ,  C07C68/06 ,  C07C2601/14 ,  C08F220/30 ,  G03F7/0046 ,  G03F7/0392

摘要： A compound has a following general formula (1). R0 represents an (n+1)-valent linear or branched aliphatic hydrocarbon group having 1 to 10 carbon atoms, or the like. R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group. R2 represents a single bond or the like. R3 represent a linear or branched alkyl group having 1 to 4 carbon atoms or the like. X represents a linear or branched fluoroalkylene group having 1 to 10 carbon atoms, and n is an integer from 1 to 5.

摘要翻译： 化合物具有以下通式（1）。 R 0表示具有1〜10个碳原子的（n + 1）价的直链或支链脂肪族烃基等。 R1表示氢原子，甲基或三氟甲基。 R2表示单键等。 R 3表示具有1〜4个碳原子的直链或支链烷基等。 X表示碳原子数1〜10的直链状或支链状的氟代亚烷基，n表示1〜5的整数。