公开(公告)号：US06217425B1

公开(公告)日：2001-04-17

申请号：US09327710

申请日：1999-06-08

申请人： Hiroshi Shindou ,  Tetsuo Abe ,  Akio Ogawa ,  Tsugihiro Hasebe

发明人： Hiroshi Shindou ,  Tetsuo Abe ,  Akio Ogawa ,  Tsugihiro Hasebe

IPC分类号： B24B722

CPC分类号： B24B37/048 ,  B24B37/00 ,  G11B5/1871 ,  G11B5/3103 ,  G11B5/3116 ,  G11B5/3169 ,  G11B5/3173 ,  Y10T29/49048 ,  Y10T29/4905

摘要： An apparatus for lapping a workpiece including a plurality of magnetic heads supported by a tool is disclosed. The lapping apparatus comprises a rotary lapping table, a lapping head attachment frame, an adjuster ring resiliently supported by the frame, a lapping head attached to the adjuster ring, a tilting assembly attached to the lapping head, and an up and down movable back plate pivotally attached to the lapping head. The apparatus further comprises first actuators or cylinders for correcting balance by applying forces on right and left sides of the pivotal point of the back plate, and second actuators or cylinders for correcting bow of the workpiece by applying operating forces on a plurality of predetermined locations of the tool so that the moving directions of movable parts of the second actuator means are substantially parallel with the directions of the operating forces.

摘要翻译： 公开了一种用于研磨包括由工具支撑的多个磁头的工件的装置。 研磨装置包括旋转研磨台，研磨头附接框架，由框架弹性支撑的调节环，附接到调节环的研磨头，附接到研磨头的倾斜组件，以及上下可动背板 枢转地附接到研磨头。 该装置还包括用于通过在后板的枢转点的右侧和左侧施加力来校正平衡的第一致动器或气缸，以及用于通过在多个预定位置上施加操作力来校正工件的弓形的第二致动器或气缸 使得第二致动器装置的可移动部件的移动方向基本上与操作力的方向平行的工具。

公开(公告)号：US06565414B2

公开(公告)日：2003-05-20

申请号：US09732722

申请日：2000-12-11

申请人： Tetsuo Abe ,  Akio Ogawa ,  Tsugihiro Hasebe ,  Hiroshi Shindou ,  Osamu Fukuroi

发明人： Tetsuo Abe ,  Akio Ogawa ,  Tsugihiro Hasebe ,  Hiroshi Shindou ,  Osamu Fukuroi

IPC分类号： B24B1100

CPC分类号： B24B37/30 ,  B24B37/048 ,  B24B49/10 ,  B24B49/16 ,  G11B5/102 ,  G11B5/1871 ,  G11B5/3116 ,  G11B5/3163 ,  G11B5/3903

摘要： In the polishing work for forming a crown shape on a ceramic bar bearing a plurality of conversion units for the magnetic heads, the present invention is to provide a well-controlled satisfactory shape by pressing the ceramic bar, provided with plural grooves perpendicular to the longitudinal direction and on a surface opposed to the polished plane, to a substantially concave polishing plane through an elastic member principally composed of rubber, then measuring the magneto resistivity of an element provided in the conversion unit of the magnetic head, and adjusting the pressure at the crown forming operation by a closed loop control based on the result of such measurement.

公开(公告)号：USRE41329E1

公开(公告)日：2010-05-11

申请号：US11493942

申请日：2006-07-27

申请人： Hiroshi Shindou ,  Masahiro Sasaki ,  Akio Ogawa ,  Tetsuo Abe ,  Masaki Kouzu ,  Masao Yamaguchi

发明人： Hiroshi Shindou ,  Masahiro Sasaki ,  Akio Ogawa ,  Tetsuo Abe ,  Masaki Kouzu ,  Masao Yamaguchi

IPC分类号： B24B9/00 ,  B24B7/00

CPC分类号： G11B5/3103 ,  B24B37/048 ,  B24B49/16 ,  G11B5/3116 ,  G11B5/3163 ,  G11B5/3169 ,  G11B5/3173 ,  G11B5/3967

摘要： To provide an apparatus that may impart a complicated bend deformation to an object to be machined such as a ceramic bar elongated in one direction or the like, and may reduce the non-uniformity in machining amount of the object to be machined upon the machining work of the object to be machined, specifically a correcting mechanism for deforming the object to be machined together with a jig holding the object to be machined is provided in a machining apparatus. The correcting mechanism includes a base, a plurality of levers provided at first ends with pins, a shaft fixed to the base for rotatably supporting the levers, and a plurality of correcting drive means coupled to second ends of said levers for pivoting the levers to the shaft to thereby pivoting the pins. The jig includes a plurality of load receiving portions arranged in a holding portion elongated on one direction for holding the object to be machined whereby portions corresponding to the load receiving portion in the holding portion are deformed together with the object to be machined in accordance with pivoting of each pin.

摘要翻译： 为了提供一种能够对诸如在一个方向等上延伸的陶瓷棒等被加工物体施加复杂的弯曲变形的装置，并且可以减少加工时加工对象物的加工量的不均匀性 具体地说，一种用于使待加工物体与夹具被加工物的夹具一起使其变形的校正机构设置在加工装置中。 校正机构包括基座，多个杆，其在第一端设置有销，固定到基座的轴可旋转地支撑杠杆;以及多个校正驱动装置，联接到所述杠杆的第二端，用于将杠杆转动到 从而枢转销。 夹具包括多个负载接收部，其布置在沿一个方向伸长的保持部分中，用于保持待加工物体，从而与保持部分中的负载接收部分相对应的部分与待加工物体一起根据枢转 的每个引脚。

公开(公告)号：US06767275B2

公开(公告)日：2004-07-27

申请号：US09789547

申请日：2001-02-22

申请人： Hiroshi Shindou ,  Masahiro Sasaki ,  Akio Ogawa ,  Tetsuo Abe ,  Masaki Kouzu ,  Masao Yamaguchi

发明人： Hiroshi Shindou ,  Masahiro Sasaki ,  Akio Ogawa ,  Tetsuo Abe ,  Masaki Kouzu ,  Masao Yamaguchi

IPC分类号： B24B900

CPC分类号： G11B5/3103 ,  B24B37/048 ,  B24B49/16 ,  G11B5/3116 ,  G11B5/3163 ,  G11B5/3169 ,  G11B5/3173 ,  G11B5/3967

摘要： To provide an apparatus that may impart a complicated bend deformation to an object to be machined such as a ceramic bar elongated in one direction or the like, and may reduce the non-uniformity in machining amount of the object to be machined upon the machining work of the object to be machined, specifically a correcting mechanism for deforming the object to be machined together with a jig holding the object to be machined is provided in a machining apparatus. The correcting mechanism includes a base, a plurality of levers provided at first ends with pins, a shaft fixed to the base for rotatably supporting the levers, and a plurality of correcting drive means coupled to second ends of said levers for pivoting the levers to the shaft to thereby pivoting the pins. The jig includes a plurality of load receiving portions arranged in a holding portion elongated on one direction for holding the object to be machined whereby portions corresponding to the load receiving portion in the holding portion are deformed together with the object to be machined in accordance with pivoting of each pin.

摘要翻译： 为了提供一种能够对诸如在一个方向等上延伸的陶瓷棒等被加工物体施加复杂的弯曲变形的装置，并且可以减少加工时加工对象物的加工量的不均匀性 具体地说，一种用于使待加工物体与夹具被加工物的夹具一起变形的校正机构设置在加工装置中。 校正机构包括基座，多个杆，其在第一端设置有销，固定到基座的轴可旋转地支撑杠杆;以及多个校正驱动装置，联接到所述杠杆的第二端，用于将杠杆转动到 从而枢转销。 夹具包括多个负载接收部，其布置在沿一个方向伸长的保持部分中，用于保持待加工物体，从而与保持部分中的负载接收部分相对应的部分与待加工物体一起根据枢转 的每个引脚。

公开(公告)号：US06623336B2

公开(公告)日：2003-09-23

申请号：US09788558

申请日：2001-02-21

申请人： Hiroshi Shindou ,  Masahiro Sasaki ,  Akio Ogawa ,  Tetsuo Abe ,  Masaki Kouzu ,  Masao Yamaguchi

发明人： Hiroshi Shindou ,  Masahiro Sasaki ,  Akio Ogawa ,  Tetsuo Abe ,  Masaki Kouzu ,  Masao Yamaguchi

IPC分类号： B24B900

CPC分类号： G11B5/3116 ,  B24B37/048 ,  B24B49/16 ,  G11B5/3103 ,  G11B5/3163 ,  G11B5/3173

摘要： When electric elements are formed on a ceramic bar or the like, the positional displacement of the respective elements occurs due to a division exposing process or the like. An object of the present invention is to provide a device and a method which unify the non-polished portion of the respective elements by conducting polishing while a complicated deformation or the like is given to the ceramic bar. To achieve this object, the ceramic bar or like is held by using a jig, and a plurality of loads are applied to portions of the jig where the ceramic bar or the like is held, to thereby deform the ceramic bar or the like and polish the element in that state. In this situation the load applied points are disposed so as to avoid the boundaries of the division exposure.

摘要翻译： 当电元件形成在陶瓷棒等上时，由于分割曝光处理等，各元件的位置偏移。 本发明的目的是提供一种通过进行抛光来统一未磨光部分的装置和方法，同时向陶瓷棒施加复杂的变形等。 为了实现该目的，通过使用夹具来保持陶瓷棒等，并且将多个负载施加到夹具的陶瓷棒等的夹持部分，从而使陶瓷棒等发生变形和抛光 该状态中的元素。 在这种情况下，负载施加点被设置为避免划分曝光的边界。

公开(公告)号：US08436351B2

公开(公告)日：2013-05-07

申请号：US12969304

申请日：2010-12-15

申请人： Tomofumi Yamamuro ,  Michihiro Sano ,  Naochika Horio ,  Hiroyuki Kato ,  Akio Ogawa ,  Hiroshi Kotani

发明人： Tomofumi Yamamuro ,  Michihiro Sano ,  Naochika Horio ,  Hiroyuki Kato ,  Akio Ogawa ,  Hiroshi Kotani

IPC分类号： H01L33/28

CPC分类号： H01L33/285

摘要： A ZnO-containing semiconductor layer contains Se added to ZnO and has an emission peak wavelength of ultraviolet light and an emission peak wavelength of visual light. By combining the ZnO-containing semiconductor layer with phosphor or a semiconductor which is excited by the emitted ultraviolet light and emits visual light, visual light at various wavelengths can be emitted.

摘要翻译： 含ZnO的半导体层含有添加到ZnO中的Se，并且具有紫外光的发射峰值波长和视觉光的发射峰值波长。 通过将含ZnO的半导体层与被发射的紫外线激发的荧光体或半导体结合并发射视觉光，可以发出各种波长的视觉光。

公开(公告)号：US07824608B2

公开(公告)日：2010-11-02

申请号：US11701846

申请日：2007-02-02

申请人： Hisashi Kuroshima ,  Akio Ogawa ,  Kojiro Kotani ,  Takayoshi Iwanami ,  Hideto Onishi

发明人： Hisashi Kuroshima ,  Akio Ogawa ,  Kojiro Kotani ,  Takayoshi Iwanami ,  Hideto Onishi

IPC分类号： A61L2/18

CPC分类号： A61B1/123 ,  A61B1/015 ,  A61B1/125 ,  A61B90/70 ,  A61B2090/701 ,  A61L2/18 ,  A61L2/24 ,  A61L2202/17 ,  A61L2202/24

摘要： An apparatus washes/disinfects, at a time, a plurality of endoscopes having a plurality of channels with different diameters, and dewaters the channels at a time. For the dewatering, the apparatus includes plural ports for receiving air supply, and a plurality of tubes for connecting between each of the plurality of ports and each of the plurality of channels in each of the plurality of endoscopes. The apparatus also includes an on-off valve for intermittently supply air to the ports, and a control unit for opening/closing the valve a plurality of times at a predetermined ratio. Water droplets remaining in a large-diameter channel are mainly moved by wind pressure of continuously flowing air while the valve is open, and discharged. Water droplets in a smaller-diameter channel are mainly moved by hammer effect of high-pressure air caused while the valve is closed, and discharged. The valve opening/closing is repeated for complete dewatering.

摘要翻译： 一次装置一次洗涤/消毒多个具有不同直径的通道的内窥镜，并一次对通道进行脱水。 为了脱水，该装置包括用于接收空气供应的多个端口和用于在多个端口中的每一个和多个内窥镜中的每一个中的多个通道中的每一个连接的多个管。 该装置还包括用于向端口间歇地供给空气的开关阀和用于以预定比率多次打开/关闭阀的控制单元。 留在大直径通道中的水滴主要是通过持续流动的空气的风压在阀门打开时移动并排出。 较小直径通道中的水滴主要是通过在阀门关闭时引起的高压空气的锤击作用而移动，并排出。 阀门打开/关闭重复进行完全脱水。

公开(公告)号：US20090284857A1

公开(公告)日：2009-11-19

申请号：US12467335

申请日：2009-05-18

申请人： Akio Ogawa ,  Tsutomu Chikamatsu ,  Kazuyuki Kobayashi ,  Haruhiko Yamaguchi ,  Kazunori Matsuiwa ,  Masaki Ohashi ,  Kazuyoshi Nakajima ,  Kiyotaka Shindo

发明人： Akio Ogawa ,  Tsutomu Chikamatsu ,  Kazuyuki Kobayashi ,  Haruhiko Yamaguchi ,  Kazunori Matsuiwa ,  Masaki Ohashi ,  Kazuyoshi Nakajima ,  Kiyotaka Shindo

IPC分类号： G11B27/36

CPC分类号： G11B5/455

摘要： The characteristics of thin-film magnetic heads are evaluated by measuring, in a step and repeat method and apparatus, the magnetic field generated by the respective heads in a bar including multiple heads.

摘要翻译： 通过在步骤和重复方法和装置中测量由包括多个头的棒中的各个头产生的磁场来评估薄膜磁头的特性。

公开(公告)号：US20070134842A1

公开(公告)日：2007-06-14

申请号：US11589998

申请日：2006-10-31

申请人： Hiroshi Kotani ,  Michihiro Sano ,  Hiroyuki Kato ,  Akio Ogawa

发明人： Hiroshi Kotani ,  Michihiro Sano ,  Hiroyuki Kato ,  Akio Ogawa

IPC分类号： H01L21/16 ,  H01L21/00

CPC分类号： H01L21/02576 ,  H01L21/0237 ,  H01L21/02403 ,  H01L21/02433 ,  H01L21/02472 ,  H01L21/02554 ,  H01L21/02565 ,  H01L21/02579 ,  H01L21/02631 ,  H01L33/0083

摘要： A manufacture method for zinc oxide (ZnO) based semiconductor crystal includes providing a substrate having a Zn polarity plane; and reacting at least zinc (Zn) and oxygen (O) on the Zn polarity plane of said substrate to grow ZnO based semiconductor crystal on the Zn polarity plane of said substrate in a Zn rich condition. (a) An n-type ZnO buffer layer is formed on a Zn polarity plane of a substrate. (b) An n-type ZnO layer is formed on the surface of the n-type ZnO buffer layer. (c) An n-type ZnMgO layer is formed on the surface of the n-type ZnO layer. (d) A ZnO/ZnMgO quantum well layer is formed on the surface of the n-type ZnMgO layer, by alternately laminating a ZnO layer and a ZnMgO layer. @(e) A p-type ZnMgO layer is formed on the surface of the ZnO/ZnMgO quantum well layer. (f) A p-type ZnO layer is formed on the surface of the p-type ZnMgO layer. @(g) An electrode is formed on the n-type ZnO layer and p-type ZnO layer. The n-type ZnO layer is formed under a Zn rich condition at the step (b).

摘要翻译： 一种氧化锌（ZnO）系半导体晶体的制造方法，其特征在于，提供具有Zn极性面的基板， 并且在所述衬底的Zn极性平面上使至少锌（Zn）和氧（O）反应，以在富锌条件下在所述衬底的Zn极性平面上生长ZnO基半导体晶体。 （a）在基板的Zn极性平面上形成n型ZnO缓冲层。 （b）在n型ZnO缓冲层的表面上形成n型ZnO层。 （c）在n型ZnO层的表面上形成n型ZnMgO层。 （d）通过交替层叠ZnO层和ZnMgO层，在n型ZnMgO层的表面上形成ZnO / ZnMgO量子阱层。 @（e）p型ZnMgO层 形成在ZnO / ZnMgO量子阱层的表面上。 （f）在p型ZnMgO层的表面上形成p型ZnO层。 @（g）在n型ZnO层和p型ZnO层上形成电极。 在步骤（b），在富锌条件下形成n型ZnO层。

公开(公告)号：US20070034144A1

公开(公告)日：2007-02-15

申请号：US11463369

申请日：2006-08-09

申请人： Akio Ogawa ,  Michihiro Sano ,  Hiroyuki Kato ,  Hiroshi Kotani

发明人： Akio Ogawa ,  Michihiro Sano ,  Hiroyuki Kato ,  Hiroshi Kotani

IPC分类号： C30B23/00 ,  C30B25/00 ,  C30B28/12 ,  C30B28/14

CPC分类号： C30B29/16 ,  C30B23/005 ,  C30B23/02

摘要： A growth apparatus and a method for making a nitrogen (N)-doped oxide crystal grow can be configured to set a nitrogen concentration to a desired concentration and to make the concentration of nitrogen uniform in a depth direction. A nitrogen source gun configured to supply ammonia (NH3) gas into an ultrahigh vacuum chamber can be arranged on a side of an ultrahigh vacuum chamber that is approximately opposite to a side that includes an exhaust port. A stage can be located between the nitrogen source gun and the exhaust port so as to form a flow path for ammonia that allows ammonia introduced into the ultrahigh vacuum chamber to be quickly exhausted after reaching a ZnO substrate placed on the stage. As a result, accumulation of ammonia in the ultrahigh vacuum chamber can be minimized, so that the nitrogen concentration in a crystal growth layer on the ZnO substrate can be set at a desired concentration and can be made uniform in the depth direction.

摘要翻译： 可以将生长装置和氮（N）掺杂氧化物晶体生长的方法构成为将氮浓度设定为所需浓度，并使氮浓度在深度方向上均匀。 配置成将氮（NH 3）气体供应到超高真空室中的氮源枪可以布置在与包括排气口的一侧大致相反的超高真空室的一侧。 阶段可以位于氮源枪和排气口之间，以便形成氨的流动通道，允许在达到放置在载物台上的ZnO衬底之后，引入超高真空室的氨被快速排出。 结果，可以使超高真空室中的氨的积累最小化，使得ZnO基板上的晶体生长层中的氮浓度可以设定为期望的浓度并且可以在深度方向上均匀。