METHODS AND APPARATUS FOR PRE-CHEMICAL MECHANICAL PLANARIZATION BUFFING MODULE
    1.
    发明申请
    METHODS AND APPARATUS FOR PRE-CHEMICAL MECHANICAL PLANARIZATION BUFFING MODULE 有权
    预制化机械平面布置模块的方法与装置

    公开(公告)号:US20130288578A1

    公开(公告)日:2013-10-31

    申请号:US13459177

    申请日:2012-04-28

    IPC分类号: B24B37/07 B24B1/00

    CPC分类号: B24B37/107 B24B41/068

    摘要: The present invention provides methods and apparatus for a pre-CMP semiconductor substrate buffing module. The invention includes a polishing pad assembly adapted to be rotated against a major surface of a substrate; a chuck adapted to hold the substrate and to rotate the substrate against the polishing pad assembly as the polishing pad assembly is rotated; and a lateral motion motor adapted to oscillate the polishing pad assembly laterally across the major surface of the substrate while the polishing pad assembly is rotated against the rotating substrate. Numerous additional features are disclosed.

    摘要翻译: 本发明提供了用于CMP前半导体衬底抛光模块的方法和装置。 本发明包括适于相对于基底的主表面旋转的抛光垫组件; 当所述抛光垫组件旋转时,卡盘适于保持所述基底并且将所述基底旋转抵靠所述抛光垫组件; 以及横向运动电动机,其适于在抛光垫组件相对于旋转衬底旋转的同时横向穿过衬底的主表面振荡抛光垫组件。 公开了许多附加特征。

    ANTI-SLIP SCRUBBER BRUSH AND ASSEMBLY METHODS
    2.
    发明申请
    ANTI-SLIP SCRUBBER BRUSH AND ASSEMBLY METHODS 审中-公开
    防滑玻璃刷和组装方法

    公开(公告)号:US20130283553A1

    公开(公告)日:2013-10-31

    申请号:US13456779

    申请日:2012-04-26

    申请人: Hui Chen Hung Chen

    发明人: Hui Chen Hung Chen

    IPC分类号: A46B15/00 A46D3/04 A47L13/10

    CPC分类号: A46B13/001 A46B3/005

    摘要: In one aspect, a scrubber brush assembly is provided. The scrubber brush assembly includes a scrubber brush including exterior molded surfaces and a mounting passage having interior molded surfaces, the interior molded surfaces having molded foam, raised rotation-restraining features, and a mandrel including recesses directly coupled to the molded foam, raised rotation-restraining features of the scrubber brush to prevent slippage. Scrubber brushes and methods of assembly are provided, as are numerous other aspects.

    摘要翻译: 在一个方面,提供了洗涤器刷组件。 洗涤器刷组件包括洗涤器刷,其包括外部模制表面和具有内部模制表面的安装通道,内部模制表面具有模制泡沫,升高的旋转抑制特征以及包括直接联接到模制泡沫的凹部的心轴, 洗涤刷的限制功能,防止滑动。 提供了洗涤刷和组装方法,以及许多其它方面。

    High stiffness, anti-slip scrubber brush assembly, high-stiffness mandrel, subassemblies, and assembly methods
    4.
    发明授权
    High stiffness, anti-slip scrubber brush assembly, high-stiffness mandrel, subassemblies, and assembly methods 有权
    高刚度,防滑洗刷器刷组件,高刚度心轴,子组件和装配方法

    公开(公告)号:US09119461B2

    公开(公告)日:2015-09-01

    申请号:US13456796

    申请日:2012-04-26

    摘要: In one aspect, a scrubber brush assembly is provided. The scrubber brush assembly includes a scrubber brush having a body of open-cell foam including an interior surface, a sleeve received in contact with the scrubber brush, the sleeve including peripherally-spaced, longitudinal walls and reinforcing segments interconnecting adjacent ones of the longitudinal walls and forming elongated pockets along the length, the sleeve having raised ribs extending along the length, and a mandrel having recesses formed on an outer surface, the mandrel being coupled to the sleeve by receiving the raised ribs within the recesses. Scrubber brush subassemblies, high stiffness mandrels, and methods of assembly are provided, as are numerous other aspects.

    摘要翻译: 在一个方面,提供了洗涤器刷组件。 洗涤器刷组件包括洗涤器刷,其具有包括内表面的开孔泡沫体,与洗涤器刷接触的套筒,套筒包括周向间隔开的纵向壁和将邻近的纵向壁相互连接的加强段 以及沿所述长度形成细长的袋,所述套筒具有沿所述长度延伸的凸肋,以及具有形成在外表面上的凹部的心轴,所述心轴通过容纳所述凹部内的所述凸肋而联接到所述套筒。 提供了洗涤刷组件,高刚度心轴和组装方法,以及许多其它方面。

    Methods and apparatus for pre-chemical mechanical planarization buffing module
    5.
    发明授权
    Methods and apparatus for pre-chemical mechanical planarization buffing module 有权
    预化学机械平面抛光模块的方法和装置

    公开(公告)号:US08968055B2

    公开(公告)日:2015-03-03

    申请号:US13459177

    申请日:2012-04-28

    IPC分类号: B24B1/00

    CPC分类号: B24B37/107 B24B41/068

    摘要: The present invention provides methods and apparatus for a pre-CMP semiconductor substrate buffing module. The invention includes a polishing pad assembly adapted to be rotated against a major surface of a substrate; a chuck adapted to hold the substrate and to rotate the substrate against the polishing pad assembly as the polishing pad assembly is rotated; and a lateral motion motor adapted to oscillate the polishing pad assembly laterally across the major surface of the substrate while the polishing pad assembly is rotated against the rotating substrate. Numerous additional features are disclosed.

    摘要翻译: 本发明提供了用于CMP前半导体衬底抛光模块的方法和装置。 本发明包括适于相对于基底的主表面旋转的抛光垫组件; 当所述抛光垫组件旋转时,卡盘适于保持所述基底并且将所述基底旋转抵靠所述抛光垫组件; 以及横向运动电动机,其适于在抛光垫组件相对于旋转衬底旋转的同时横向穿过衬底的主表面振荡抛光垫组件。 公开了许多附加特征。

    HIGH STIFFNESS, ANTI-SLIP SCRUBBER BRUSH ASSEMBLY, HIGH-STIFFNESS MANDREL, SUBASSEMBLIES, AND ASSEMBLY METHODS
    6.
    发明申请
    HIGH STIFFNESS, ANTI-SLIP SCRUBBER BRUSH ASSEMBLY, HIGH-STIFFNESS MANDREL, SUBASSEMBLIES, AND ASSEMBLY METHODS 有权
    高刚度,防滑玻璃刷组件,高强度人造板,底座和组装方法

    公开(公告)号:US20130283556A1

    公开(公告)日:2013-10-31

    申请号:US13456796

    申请日:2012-04-26

    IPC分类号: A46B15/00 A46D3/04 A46B9/08

    摘要: In one aspect, a scrubber brush assembly is provided. The scrubber brush assembly includes a scrubber brush having a body of open-cell foam including an interior surface, a sleeve received in contact with the scrubber brush, the sleeve including peripherally-spaced, longitudinal walls and reinforcing segments interconnecting adjacent ones of the longitudinal walls and forming elongated pockets along the length, the sleeve having raised ribs extending along the length, and a mandrel having recesses formed on an outer surface, the mandrel being coupled to the sleeve by receiving the raised ribs within the recesses. Scrubber brush subassemblies, high stiffness mandrels, and methods of assembly are provided, as are numerous other aspects.

    摘要翻译: 在一个方面,提供了洗涤器刷组件。 洗涤器刷组件包括洗涤器刷,其具有包括内表面的开孔泡沫体,与洗涤器刷接触的套筒,套筒包括周向间隔开的纵向壁和将邻近的纵向壁相互连接的加强段 以及沿所述长度形成细长的袋,所述套筒具有沿所述长度延伸的凸肋,以及具有形成在外表面上的凹部的心轴,所述心轴通过容纳所述凹部内的所述凸肋而联接到所述套筒。 提供了洗涤刷组件,高刚度心轴和组装方法,以及许多其它方面。

    Faucet
    7.
    外观设计
    Faucet 有权

    公开(公告)号:USD854663S1

    公开(公告)日:2019-07-23

    申请号:US29643385

    申请日:2018-04-08

    申请人: Hui Chen

    设计人: Hui Chen

    Faucet handle
    8.
    外观设计

    公开(公告)号:USD851219S1

    公开(公告)日:2019-06-11

    申请号:US29647922

    申请日:2018-05-16

    申请人: Hui Chen

    设计人: Hui Chen

    CENTRALIZED CLIENT APPLICATION MANAGEMENT
    10.
    发明申请
    CENTRALIZED CLIENT APPLICATION MANAGEMENT 审中-公开
    集中客户应用管理

    公开(公告)号:US20160147526A1

    公开(公告)日:2016-05-26

    申请号:US14950012

    申请日:2015-11-24

    IPC分类号: G06F9/445 H04L29/08

    摘要: Systems and methods for centralized client application management are provided. In an example embodiment, device data is received from a user device. The user device is identified according to an identification rule. A client state is received from the user device. A match between the client state and a specified state is determined. Based on the client state matching the specified state, an instruction to be performed on the user device is generated. The instruction is caused to be performed on the user device. The instruction causes a change to the client state stored on the user device.

    摘要翻译: 提供了集中式客户端应用程序管理的系统和方法。 在示例实施例中,从用户设备接收设备数据。 根据识别规则识别用户设备。 从用户设备接收到客户端状态。 确定客户端状态和指定状态之间的匹配。 基于与指定状态匹配的客户端状态,生成在用户装置上执行的指令。 导致在用户设备上执行指令。 该指令改变存储在用户设备上的客户端状态。