利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

19 条记录 (耗时 0.012 秒)

    Six headed carousel
    1.
    发明授权
    Six headed carousel 失效
    六头转盘

    公开(公告)号：US07241203B1

    公开(公告)日：2007-07-10

    申请号：US11608588

    申请日：2006-12-08

    申请人： Hung Chih Chen ,  Simon Yavelberg

    发明人： Hung Chih Chen ,  Simon Yavelberg

    IPC分类号： B24B7/00

    CPC分类号： B24B37/04 ,  B24B27/0023

    摘要： The present invention relates to an apparatus and method for polishing semiconductor substrates with improved throughput and reduced foot print. One embodiment of the present invention provides an apparatus for polishing a substrate. The apparatus comprises a base, four polishing stations disposed on the base, two load cups disposed on the base, a first wash station disposed on the base adjacent to the first of the four polishing station, and a carousel rotatable about a carousel axis and supported by the base, wherein the carousel comprises six substrate heads alignable to any of the four polishing stations, the two load cups and the first wash station.

    摘要翻译： 本发明涉及一种用于抛光半导体衬底的设备和方法，其具有改善的生产量和减少的脚印。 本发明的一个实施例提供了一种用于抛光衬底的装置。 该装置包括基座，设置在基座上的四个抛光台，设置在基座上的两个装载杯，设置在邻近四个抛光台中的第一个抛光台的基座上的第一洗涤台，以及可绕圆盘传送带轴线旋转的圆盘传送带， 其中转盘包括可与四个抛光台，两个装载杯和第一洗涤台中的任何一个对准的六个基板头。

    METHOD OF CALIBRATING OR COMPENSATING SENSOR FOR MEASURING PROPERTY OF A TARGET SURFACE
    3.
    发明申请
    METHOD OF CALIBRATING OR COMPENSATING SENSOR FOR MEASURING PROPERTY OF A TARGET SURFACE 审中-公开
    用于测量目标表面性能的校准或补偿传感器的方法

    公开(公告)号：US20090042481A1

    公开(公告)日：2009-02-12

    申请号：US11835624

    申请日：2007-08-08

    申请人： Rashid A. Mavliev ,  Gerald John Alonzo ,  Simon Yavelberg

    发明人： Rashid A. Mavliev ,  Gerald John Alonzo ,  Simon Yavelberg

    IPC分类号： B24B49/12 ,  G01B11/30

    CPC分类号： G01B11/306 ,  B24B49/12 ,  G01F23/292

    摘要： A method of calibrating or compensating a sensor for measuring property of target surface is provided. In one embodiment, a liquid reference surface is formed on a platen. A sensor is used to measure a feature property of the reference surface. The measured feature property of the reference surface may be used to calibrate the sensor. Further, the sensor is used to measure the feature property of a polishing pad. The measured feature property of the reference surface may be used to compensate the measured feature property of the polishing pad.

    摘要翻译： 提供了一种用于校准或补偿用于测量目标表面性质的传感器的方法。 在一个实施例中，液体参考表面形成在压板上。 传感器用于测量参考表面的特征属性。 参考表面的测量特征可用于校准传感器。 此外，传感器用于测量抛光垫的特征。 参考表面的测量特征可用于补偿所测量的抛光垫的特征。

    Recording Measurements by Sensors for a Carrier Head
    5.
    发明申请
    Recording Measurements by Sensors for a Carrier Head 有权
    通过传感器记录载波头的测量

    公开(公告)号：US20140138355A1

    公开(公告)日：2014-05-22

    申请号：US14081307

    申请日：2013-11-15

    申请人： Simon Yavelberg

    发明人： Simon Yavelberg

    IPC分类号： B24B37/005

    CPC分类号： B24B37/005 ,  B24B7/228 ,  B24B37/30

    摘要： A pressure control assembly for a carrier head of a polishing apparatus includes a pressure supply line configured to fluidically connect to a chamber of a carrier head, a sensor to responsive to pressure in the chamber and configured to generate a signal representative of the pressure, and a pneumatic control unit configured to receive the signal, to control a pressure applied to the pressure supply line, and to record the signal in a non-transitory storage media of a storage device removably attached to the pneumatic control unit.

    摘要翻译： 用于抛光装置的承载头的压力控制组件包括压力供应管线，其构造成流体连接到承载头的腔室，传感器响应于腔室中的压力并被配置为产生代表压力的信号，以及 气动控制单元，被配置为接收信号，以控制施加到压力供应管线的压力，并将信号记录在可移除地附接到气动控制单元的存储装置的非暂时性存储介质中。

    METHODS AND APPARATUS FOR LIQUID CHEMICAL DELIVERY
    8.
    发明申请
    METHODS AND APPARATUS FOR LIQUID CHEMICAL DELIVERY 审中-公开
    液体化学交付方法和装置

    公开(公告)号：US20090032075A1

    公开(公告)日：2009-02-05

    申请号：US12249921

    申请日：2008-10-11

    申请人： Richard Kok Hwee Lee ,  Alok Jain ,  Whee Yong Koh ,  James Chin Hock Tan ,  Hooman Bolandi ,  Simon Yavelberg

    发明人： Richard Kok Hwee Lee ,  Alok Jain ,  Whee Yong Koh ,  James Chin Hock Tan ,  Hooman Bolandi ,  Simon Yavelberg

    IPC分类号： B08B13/00 ,  G05D11/02

    CPC分类号： B01F3/0861 ,  B01F2003/0896 ,  Y10T137/0318 ,  Y10T137/87571 ,  Y10T137/87652 ,  Y10T137/877

    摘要： In a first aspect, an apparatus for chemical delivery to a scrubber is provided. The apparatus comprises: a liquid delivery module comprising: a first input adapted to receive a first input flow of a dilutant; a second input adapted to receive a second input flow of a chemistry; one or more flow couplers coupled to the first input and the second input, and adapted to combine the first input flow and the second input flow into a combined flow; a mixing element coupled to the one or more flow couplers, and adapted to mix the combined flow such that a homogeneity of the combined flow is increased; a flow splitter coupled to the mixing element and adapted to generate at least a first output flow and a second output flow from the combined flow; a first output coupled to the flow splitter and adapted to direct the first output flow toward a first scrubber dispensing element; and a second output coupled to the flow splitter and adapted to direct the second output flow toward a second scrubber dispensing element. Numerous other aspects are provided.

    摘要翻译： 在第一方面，提供了一种用于化学物质输送到洗涤器的装置。 该装置包括：液体输送模块，包括：适于接收稀释剂的第一输入流的第一输入; 适于接收化学品的第二输入流的第二输入; 耦合到所述第一输入端和所述第二输入端的一个或多个流耦合器，并且适于将所述第一输入流与所述第二输入流组合成组合流; 耦合到所述一个或多个流动耦合器的混合元件，并且适于混合所述组合流，使得所述组合流的均匀性增加; 耦合到所述混合元件并适于从所述组合流产生至少第一输出流和第二输出流的流量分配器; 耦合到所述分流器并适于将所述第一输出流引向第一洗涤器分配元件的第一输出; 以及耦合到所述分流器并适于将所述第二输出流引向第二洗涤器分配元件的第二输出。 提供了许多其他方面。

    Pad characterization tool
    9.
    发明授权
    Pad characterization tool 失效
    垫表征工具

    公开(公告)号：US07407433B2

    公开(公告)日：2008-08-05

    申请号：US11556114

    申请日：2006-11-02

    申请人： Rashid A. Mavliev ,  Simon Yavelberg ,  Gerald J. Alonzo

    发明人： Rashid A. Mavliev ,  Simon Yavelberg ,  Gerald J. Alonzo

    IPC分类号： B24B49/00

    CPC分类号： B24B49/00 ,  B24B37/34

    摘要： Tools and methods for in-situ characterizing of a surface of a polishing pad are described. A characterization tool is integrated with polishing tool so that the polishing pad can be monitored in-situ. The characterization tool and the polishing pad can be rotated or moved so that any portion of the polishing pad can be tested.

    摘要翻译： 描述了用于原位表征抛光垫表面的工具和方法。 表征工具与抛光工具集成在一起，从而可以原位监测抛光垫。 表征工具和抛光垫可以旋转或移动，以便可以对抛光垫的任何部分进行测试。

    MULTIPLE SUBSTRATE VAPOR DRYING SYSTEMS AND METHODS
    10.
    发明申请
    MULTIPLE SUBSTRATE VAPOR DRYING SYSTEMS AND METHODS 审中-公开
    多基底蒸汽干燥系统及方法

    公开(公告)号：US20080155852A1

    公开(公告)日：2008-07-03

    申请号：US11967533

    申请日：2007-12-31

    申请人： DONALD J.K. OLGADO ,  Simon Yavelberg ,  Edwin Velaquez ,  Hui Chen ,  Sheshraj L. Tulshibagwale ,  Ho Seon Shin

    发明人： DONALD J.K. OLGADO ,  Simon Yavelberg ,  Edwin Velaquez ,  Hui Chen ,  Sheshraj L. Tulshibagwale ,  Ho Seon Shin

    IPC分类号： F26B25/08 ,  F26B3/04

    CPC分类号： H01L21/67034 ,  H01L21/67028

    摘要： Embodiments of the present invention generally relate to an apparatus and methods for rinsing and drying substrates that include multiple rinsing and drying modules. Methods for arranging drying modules to enable high-throughput rinsing and drying of multiple substrates are also provided. In one embodiment a system for drying semiconductor substrates is provided. The system comprises a housing, a first drying module positioned within the housing, and a second drying module positioned adjacent the first drying module within the housing, wherein the first and second drying modules are oriented approximately vertically within the housing.

    摘要翻译： 本发明的实施方案一般涉及用于冲洗和干燥包括多个漂洗和干燥模块的基材的设备和方法。 还提供了用于布置干燥模块以实现多个基板的高通量冲洗和干燥的方法。 在一个实施例中，提供了一种用于干燥半导体衬底的系统。 所述系统包括壳体，位于所述壳体内的第一干燥模块和邻近所述壳体内的所述第一干燥模块定位的第二干燥模块，其中所述第一和第二干燥模块在所述壳体内大致垂直定向。