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    SCATTERING MEASUREMENT SYSTEM AND METHOD
    1.
    发明申请
    SCATTERING MEASUREMENT SYSTEM AND METHOD 审中-公开
    散射测量系统和方法

    公开(公告)号：US20170045355A1

    公开(公告)日：2017-02-16

    申请号：US14974892

    申请日：2015-12-18

    Applicant: Industrial Technology Research Institute

    Inventor： Yi-Chen HSIEH ,  Chia-Liang YEH ,  Chia-Hung CHO ,  Yi-Chang CHEN ,  Yi-Sha KU ,  Chun-Wei LO

    IPC: G01B11/24

    CPC classification number: G01B11/24 ,  G01B2210/56 ,  H01L22/12

    Abstract: A scattering measurement system is provided, including: a light source generator for generating a detection light beam with multi-wavelengths, wherein the detection light beam is incident on an object so as to generate a plurality of multi-order diffraction light beams with three-dimensional feature information; a spatial filter for filtering out zero-order light beams from the plurality of multi-order diffraction light beams; and a detector having a photosensitive array for receiving the plurality of multi-order diffraction light beams filtered out by the spatial filter and converting the filtered plurality of multi-order diffraction light beams into multi-order diffraction signals with the three-dimensional feature information. As such, the three-dimensional structure of the object can be obtained by comparing the multi-order diffraction signals with a database.

    Abstract translation: 提供了一种散射测量系统，包括：用于产生具有多波长的检测光束的光源发生器，其中检测光束入射到物体上，以便产生多个三阶衍射光束， 三维特征信息; 用于滤除来自所述多个多级衍射光束的零级光束的空间滤波器; 以及检测器，其具有用于接收由空间滤波器滤除的多个多级衍射光束的光敏阵列，并将经滤波的多个多阶衍射光束转换成具有三维特征信息的多阶衍射信号。 因此，可以通过将多阶衍射信号与数据库进行比较来获得对象的三维结构。

    OPTICAL MEASUREMENT SYSTEM
    2.
    发明申请
    OPTICAL MEASUREMENT SYSTEM 有权

    公开(公告)号：US20210149337A1

    公开(公告)日：2021-05-20

    申请号：US17028012

    申请日：2020-09-22

    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

    Inventor： Hsiang-Chun WEI ,  Chung-Lun KUO ,  Chia-Hung CHO ,  Chun-Wei LO ,  Chih-Hsiang LIU

    IPC: G03H1/04 ,  G06T15/08 ,  G01B9/02 ,  G03H1/00

    Abstract: An optical measurement system comprises a polarization beam splitter for dividing an incident beam into a reference beam and a measurement beam, a first beam splitter for reflecting the measurement beam to form a first reflected measurement beam, a spatial light modulator for modulating the first reflected measurement beam to form a modulated measurement beam, a condenser lens for focusing the modulated measurement beam to an object to form a penetrating measurement beam, an objective lens for converting the penetrating measurement beam into a parallel measurement beam, a mirror for reflecting the parallel measurement beam to form an object beam, a second beam splitter for reflecting the reference beam to a path coincident with that of the object beam, and a camera for receiving an interference signal generated by the reference beam and the object beam to generate an image of the object.

    MEASUREMENT SYSTEM
    4.
    发明申请
    MEASUREMENT SYSTEM 有权

    公开(公告)号：US20170146339A1

    公开(公告)日：2017-05-25

    申请号：US14983053

    申请日：2015-12-29

    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

    Inventor： Hsiang-Chun WEI ,  Yi-Sha KU ,  Chia-Hung CHO ,  Chieh-Yu WU ,  Chun-Wei LO ,  Chih-Hsiang LIU

    IPC: G01B11/22 ,  G01B11/06

    CPC classification number: G01B11/22 ,  G01B11/0616 ,  G01B11/2441 ,  G01B2210/56 ,  H01L22/12

    Abstract: A measurement system is configured to measure a surface structure of a sample. The surface of the sample has a thin film and a via, the depth of the via is larger than the thickness of the thin film. The measurement system includes a light source, a first light splitter, a first aperture stop, a lens assembly, a second aperture stop, a spectrum analyzer and an analysis module. The first light splitter disposed in the light emitting direction of the light source. The first aperture stop disposed between the light source and the first light splitter. The lens assembly is disposed between the first light splitter and the sample. The second aperture stop is disposed between the lens assembly and the first light splitter. The spectrum analyzer is disposed to at a side of the first light splitter opposite to the sample.

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