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    Novel silver barrier materials for low-emissivity applications
    6.
    发明申请
    Novel silver barrier materials for low-emissivity applications 有权
    用于低发射率应用的新型银阻挡材料

    公开(公告)号：US20140177042A1

    公开(公告)日：2014-06-26

    申请号：US13725126

    申请日：2012-12-21

    Applicant: Guardian Industries Corp. ,  Intermolecular Inc.

    Inventor： Mohd Fadzli Anwar Hassan ,  Brent Boyce ,  Guowen Ding ,  Minh Huu Le ,  Zhi-Wen Wen Sun ,  Yu Wang ,  Yongli Xu

    IPC: G02B5/20

    CPC classification number: G02B5/208 ,  C03C17/36 ,  C03C17/3644 ,  C03C17/3649 ,  C03C17/3652 ,  C03C17/366 ,  C03C17/40 ,  G02B5/282

    Abstract: A method for making low emissivity panels, including control the composition of a barrier layer formed on a thin conductive silver layer. The barrier structure can include an alloy of a first element having high oxygen affinity with a second element having low oxygen affinity. The first element can include Ta, Nb, Zr, Hf, Mn, Y, Si, and Ti, and the second element can include Ru, Ni, Co, Mo, and W, which can have low oxygen affinity property. The alloy barrier layer can reduce optical absorption in the visible range, can provide color-neutral product, and can improve adhesion to the silver layer.

    Abstract translation: 一种制造低发射率面板的方法，包括控制形成在薄导电银层上的阻挡层的组成。 阻挡结构可以包括具有高氧亲和力的第一元素与具有低氧亲合力的第二元素的合金。 第一元素可以包括Ta，Nb，Zr，Hf，Mn，Y，Si和Ti，第二元素可以包括可以具有低氧亲和性的Ru，Ni，Co，Mo和W。 合金阻挡层可以减少可见光范围内的光吸收，可以提供颜色中性的产品，并可以提高对银层的粘附性。

    Low emissivity coating with optimal base layer material and layer stack
    7.
    发明申请
    Low emissivity coating with optimal base layer material and layer stack 审中-公开
    低发射率涂层，具有最佳的基层材料和层叠

    公开(公告)号：US20140170422A1

    公开(公告)日：2014-06-19

    申请号：US13715588

    申请日：2012-12-14

    Applicant: INTERMOLECULAR INC.

    Inventor： Yu Wang ,  Brent Boyce ,  Guowen Ding ,  Mohd Fadzli Anwar Hassan ,  Minh Huu Le ,  Haifan Liang ,  Zhi-Wen Wen Sun

    IPC: G02B1/10

    CPC classification number: G02B1/10 ,  C03C17/3644 ,  C03C17/366 ,  C03C2217/94 ,  G02B1/116 ,  G02B5/282

    Abstract: A method for making low emissivity panels, including forming a base layer to promote a seed layer for a conductive silver layer. The base layer can be an amorphous layer or a nanocrystalline layer, which can facilitate zinc oxide seed layer growth, together with smoother surface and improved thermal stability. The base layer can include doped tin oxide, for example, tin oxide doped with Al, Ga, In, Mg, Ca, Sr, Sb, Bi, Ti, V, Y, Zr, Nb, Hf, Ta, or any combination thereof. The doped tin oxide base layer can influence the growth of (002) crystallographic orientation in zinc oxide, which in turn serves as a seed layer template for silver (111).

    Abstract translation: 一种制造低发射率面板的方法，包括形成基底层以促进导电银层的种子层。 基层可以是非晶层或纳米晶层，其可以促进氧化锌种子层生长，以及更平滑的表面和改善的热稳定性。 基底层可以包括掺杂的氧化锡，例如掺杂有Al，Ga，In，Mg，Ca，Sr，Sb，Bi，Ti，V，Y，Zr，Nb，Hf，Ta或其任何组合的氧化锡 。 掺杂的氧化锡基层可以影响氧化锌中（002）晶体取向的生长，其又用作银（111）的种子层模板。

    pvd chamber and process for over-coating layer to improve emissivity for low emissivity coating
    9.
    发明申请
    pvd chamber and process for over-coating layer to improve emissivity for low emissivity coating 审中-公开
    pvd室和过涂层的过程，以提高低辐射率涂层的发射率

    公开(公告)号：US20140170338A1

    公开(公告)日：2014-06-19

    申请号：US13714797

    申请日：2012-12-14

    Applicant: INTERMOLECULAR INC.

    Inventor： Guowen Ding ,  Brent Boyce ,  Mohd Fadzli Anwar Hassan ,  Minh Huu Le ,  Zhi-Wen Wen Sun ,  Yu Wang

    IPC: C23C14/34

    CPC classification number: C23C14/3492 ,  C23C14/024 ,  C23C14/185

    Abstract: A method for making low emissivity panels, including control the ion characteristics, such as ion energy, ion density and ion to neutral ratio, in a sputter deposition process of a layer deposited on a thin conductive silver layer. The ion control can prevent or minimize degrading the quality of the conductive silver layer, which can lead to better transmittance in visible regime, block more heat transfer from the low emissivity panels, and potentially can reduce the requirements for other layers, so that the overall performance, such as durability, could be improved.

    Abstract translation: 在沉积在薄导电银层上的层的溅射沉积工艺中，制备低辐射率面板的方法，包括控制离子特性，例如离子能量，离子密度和离子与中性比。 离子控制可以防止或最小化降低导电银层的质量，这可以导致在可见状态下更好的透射率，阻止来自低辐射面板的更多的热传递，并且潜在地可以减少对其它层的要求，使得整体 可以提高性能，如耐久性。

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