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公开(公告)号:US09812706B2
公开(公告)日:2017-11-07
申请号:US14140471
申请日:2013-12-25
Applicant: Industrial Technology Research Institute
Inventor: Jin-Bao Wu , Li-Duan Tsai , Jia-Jen Chang , Ming-Sheng Leu , Jenn-Yeu Hwang , Chun-Lung Li
IPC: H01M4/36 , H01M4/13 , H01M4/38 , H01M4/48 , H01M4/58 , H01M4/62 , H01M10/0525 , B82Y30/00 , H01M4/02
CPC classification number: H01M4/366 , B82Y30/00 , H01M4/13 , H01M4/38 , H01M4/382 , H01M4/483 , H01M4/581 , H01M4/624 , H01M4/625 , H01M10/0525 , H01M2004/021 , Y10S977/742 , Y10S977/948
Abstract: A protected active metal electrode and a device with the electrode are provided. The protected active metal electrode includes an active metal substrate and a protection layer on a surface of the active metal substrate. The protection layer at least includes a metal thin film covering the surface of the active metal substrate and an electrically-conductive thin film covering a surface of the metal thin film. A material of the metal thin film is Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, or W. A material of the electrically-conductive thin film is selected from nitride of a metal in the metal thin film, carbide of a metal in the metal thin film, a diamond-like carbon (DLC), and a combination thereof.
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2.
公开(公告)号:US20140186716A1
公开(公告)日:2014-07-03
申请号:US14140471
申请日:2013-12-25
Applicant: Industrial Technology Research Institute
Inventor: Jin-Bao Wu , Li-Duan Tsai , Jia-Jen Chang , Ming-Sheng Leu , Jenn-Yeu Hwang , Chun-Lung Li
IPC: H01M4/36
CPC classification number: H01M4/366 , B82Y30/00 , H01M4/13 , H01M4/38 , H01M4/382 , H01M4/483 , H01M4/581 , H01M4/624 , H01M4/625 , H01M10/0525 , H01M2004/021 , Y10S977/742 , Y10S977/948
Abstract: A protected active metal electrode and a device with the electrode are provided. The protected active metal electrode includes an active metal substrate and a protection layer on a surface of the active metal substrate. The protection layer at least includes a metal thin film covering the surface of the active metal substrate and an electrically-conductive thin film covering a surface of the metal thin film. A material of the metal thin film is Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, or W. A material of the electrically-conductive thin film is selected from nitride of a metal in the metal thin film, carbide of a metal in the metal thin film, a diamond-like carbon (DLC), and a combination thereof.
Abstract translation: 提供保护的有源金属电极和具有电极的器件。 受保护的有源金属电极在活性金属基板的表面上包括有源金属基板和保护层。 保护层至少包括覆盖有源金属基板的表面的金属薄膜和覆盖金属薄膜表面的导电薄膜。 金属薄膜的材料是Ti,V,Cr,Zr,Nb,Mo,Hf,Ta或W.导电薄膜的材料选自金属薄膜中的金属的氮化物,碳化物 金属薄膜中的金属,类金刚石碳(DLC)及其组合。
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公开(公告)号:US11328946B2
公开(公告)日:2022-05-10
申请号:US17327783
申请日:2021-05-24
Applicant: Industrial Technology Research Institute
Inventor: Ding-Shiang Wang , Jia-Jen Chang , Ming-Sheng Leu , Tai-Sheng Chen , Chin-Te Shih
Abstract: A manufacturing method of the ESD protection device includes the following steps. A surface treatment is performed on the substrate. A link layer is formed on the substrate after the surface treatment, wherein a material of the link layer includes a metal material. A progressive layer is formed on the link layer, wherein a material of the progressive layer includes a non-stoichiometric metal oxide material, and an oxygen concentration in the non-stoichiometric metal oxide material is increased gradually away from the substrate in a thickness direction of the progressive layer. A composite layer is formed on the progressive layer, wherein the composite layer includes a stoichiometric metal oxide material and a non-stoichiometric metal oxide material, and a ratio of the non-stoichiometric metal oxide material and the stoichiometric metal oxide material in the composite layer may make a sheet resistance value of the composite layer 1×107 to 1×108 Ω/sq.
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公开(公告)号:US20170176117A1
公开(公告)日:2017-06-22
申请号:US14981970
申请日:2015-12-29
Applicant: Industrial Technology Research Institute
Inventor: Jin-Bao Wu , Wei-Chien Tsai , Hao-Wen Cheng , Ming-Sheng Leu , Jia-Jen Chang , Hsien-Lin Hu
IPC: F28F21/02
CPC classification number: F28F21/02 , F28D2021/0029 , F28F2275/025 , H01L23/373 , H01L23/3737
Abstract: A heat dissipation module adapted to perform heat dissipation on a heat generating component is provided. The heat dissipation module includes a graphite sheet and an insulating and heat conducting layer. The graphite sheet includes a plurality of through holes, an attaching surface and a heat dissipating surface opposite to the attaching surface, wherein the attaching surface is configured to be attached to the heat generating component. Each of the through holes penetrates the graphite sheet, so the attaching surface and the heat dissipating surface are connected via the through holes. The insulating and heat conducting layer covers the graphite sheet. The insulating and heat conducting layer least covers the attaching surface, the heat dissipating surface and inner walls of the through holes.
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公开(公告)号:US20170175242A1
公开(公告)日:2017-06-22
申请号:US14981972
申请日:2015-12-29
Applicant: Industrial Technology Research Institute
Inventor: Tai-Sheng Chen , Ming-Sheng Leu , Wu-Han Liu , Jia-Jen Chang
CPC classification number: C22F1/183 , C22F1/057 , C23C4/06 , C23C4/08 , C23C4/134 , C23C4/18 , C23C14/14 , C23C14/3414 , C23C14/35 , C23C14/5806 , C23F17/00
Abstract: A hydrophobic alloy film and a manufacturing method thereof are provided. The hydrophobic alloy film includes Al, Cu, O, and at least one selected from the group consisting of Fe, Co, Ni, and Cr, or Ti, Zr, O, and at least one selected from the group consisting of Fe, Co, Ni, and Cr. The content of each of Al and Ti is in the range of 40 at. % to 70 at. %. The content of each of Cu and Zr is in the range of 10 at. % to 40 at. %. The total content of at least one selected from the group consisting of Fe, Co, Ni, and Cr is in the range of 10 at. % to 30 at. %. The content of O is in the range of 10 at. % to 30 at. %. The hydrophobic alloy film has a quasicrystal structure and nanoparticles.
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公开(公告)号:US20210282253A1
公开(公告)日:2021-09-09
申请号:US17327783
申请日:2021-05-24
Applicant: Industrial Technology Research Institute
Inventor: Ding-Shiang Wang , Jia-Jen Chang , Ming-Sheng Leu , Tai-Sheng Chen , Chin-Te Shih
Abstract: A manufacturing method of the ESD protection device includes the following steps. A surface treatment is performed on the substrate. A link layer is formed on the substrate after the surface treatment, wherein a material of the link layer includes a metal material. A progressive layer is formed on the link layer, wherein a material of the progressive layer includes a non-stoichiometric metal oxide material, and an oxygen concentration in the non-stoichiometric metal oxide material is increased gradually away from the substrate in a thickness direction of the progressive layer. A composite layer is formed on the progressive layer, wherein the composite layer includes a stoichiometric metal oxide material and a non-stoichiometric metal oxide material, and a ratio of the non-stoichiometric metal oxide material and the stoichiometric metal oxide material in the composite layer may make a sheet resistance value of the composite layer 1×107 to 1×108 Ω/sq.
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7.
公开(公告)号:US11044798B2
公开(公告)日:2021-06-22
申请号:US16152425
申请日:2018-10-05
Applicant: Industrial Technology Research Institute
Inventor: Ding-Shiang Wang , Jia-Jen Chang , Ming-Sheng Leu , Tai-Sheng Chen , Chin-Te Shih
Abstract: An ESD protection composite structure includes a link layer, a progressive layer, and a composite layer. The link layer is used for disposing the ESD protection composite structure on a substrate, wherein a material of the link layer includes a metal material. The progressive layer is disposed on the link layer, wherein the material of the progressive layer includes a non-stoichiometric metal oxide material, and an oxygen concentration in the non-stoichiometric metal oxide material is increased gradually away from the substrate in a thickness direction of the progressive layer. The composite layer is disposed on the progressive layer, wherein the composite layer includes a stoichiometric metal oxide material and a non-stoichiometric metal oxide material, and a ratio of the non-stoichiometric metal oxide material and the stoichiometric metal oxide material in the composite layer may make a sheet resistance value of the composite layer 1×107 Ω/sq to 1×108 Ω/sq.
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公开(公告)号:US10428413B2
公开(公告)日:2019-10-01
申请号:US14981972
申请日:2015-12-29
Applicant: Industrial Technology Research Institute
Inventor: Tai-Sheng Chen , Ming-Sheng Leu , Wu-Han Liu , Jia-Jen Chang
IPC: C22F1/18 , C23F17/00 , C23C4/18 , C22F1/057 , C23C14/58 , C23C4/134 , C23C4/08 , C23C4/06 , C23C14/14 , C23C14/35
Abstract: A hydrophobic alloy film and a manufacturing method thereof are provided. The hydrophobic alloy film includes Al, Cu, O, and at least one selected from the group consisting of Fe, Co, Ni, and Cr, or Ti, Zr, O, and at least one selected from the group consisting of Fe, Co, Ni, and Cr. The content of each of Al and Ti is in the range of 40 at. % to 70 at. %. The content of each of Cu and Zr is in the range of 10 at. % to 40 at. %. The total content of at least one selected from the group consisting of Fe, Co, Ni, and Cr is in the range of 10 at. % to 30 at. %. The content of O is in the range of 10 at. % to 30 at. %. The hydrophobic alloy film has a quasicrystal structure and nanoparticles.
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