Structures, design structures and methods of fabricating global shutter pixel sensor cells
    1.
    发明授权
    Structures, design structures and methods of fabricating global shutter pixel sensor cells 有权
    制造全局快门像素传感器单元的结构,设计结构和方法

    公开(公告)号:US08138531B2

    公开(公告)日:2012-03-20

    申请号:US12561581

    申请日:2009-09-17

    IPC分类号: H01L31/113

    摘要: Pixel sensor cells, method of fabricating pixel sensor cells and design structure for pixel sensor cells. The pixel sensor cells including: a photodiode body in a first region of a semiconductor layer; a floating diffusion node in a second region of the semiconductor layer, a third region of the semiconductor layer between and abutting the first and second regions; and dielectric isolation in the semiconductor layer, the dielectric isolation surrounding the first, second and third regions, the dielectric isolation abutting the first, second and third regions and the photodiode body, the dielectric isolation not abutting the floating diffusion node, portions of the second region intervening between the dielectric isolation and the floating diffusion node.

    摘要翻译: 像素传感器单元,制造像素传感器单元的方法和像素传感器单元的设计结构。 所述像素传感器单元包括:在半导体层的第一区域中的光电二极管主体; 半导体层的第二区域中的浮动扩散节点,位于第一和第二区域之间并邻接第一和第二区域的半导体层的第三区域; 以及在所述半导体层中的绝缘隔离,围绕所述第一,第二和第三区域的介电隔离,所述介质隔离邻接所述第一,第二和第三区域以及所述光电二极管主体,所述介电隔离件不邻接所述浮动扩散节点,所述第二 介于介电隔离和浮动扩散节点之间的区域。

    STRUCTURES, DESIGN STRUCTURES AND METHODS OF FABRICATING GLOBAL SHUTTER PIXEL SENSOR CELLS
    2.
    发明申请
    STRUCTURES, DESIGN STRUCTURES AND METHODS OF FABRICATING GLOBAL SHUTTER PIXEL SENSOR CELLS 有权
    制作全球快门像素传感器细胞的结构,设计结构和方法

    公开(公告)号:US20110062542A1

    公开(公告)日:2011-03-17

    申请号:US12561581

    申请日:2009-09-17

    IPC分类号: H01L31/12 H01L31/18 G06F17/50

    摘要: Pixel sensor cells, method of fabricating pixel sensor cells and design structure for pixel sensor cells. The pixel sensor cells including: a photodiode body in a first region of a semiconductor layer; a floating diffusion node in a second region of the semiconductor layer, a third region of the semiconductor layer between and abutting the first and second regions; and dielectric isolation in the semiconductor layer, the dielectric isolation surrounding the first, second and third regions, the dielectric isolation abutting the first, second and third regions and the photodiode body, the dielectric isolation not abutting the floating diffusion node, portions of the second region intervening between the dielectric isolation and the floating diffusion node.

    摘要翻译: 像素传感器单元,制造像素传感器单元的方法和像素传感器单元的设计结构。 所述像素传感器单元包括:在半导体层的第一区域中的光电二极管主体; 半导体层的第二区域中的浮动扩散节点,位于第一和第二区域之间并邻接第一和第二区域的半导体层的第三区域; 以及在所述半导体层中的绝缘隔离,围绕所述第一,第二和第三区域的介电隔离,所述介质隔离邻接所述第一,第二和第三区域以及所述光电二极管主体,所述介电隔离件不邻接所述浮动扩散节点,所述第二 介于介电隔离和浮动扩散节点之间的区域。

    CMOS sensors having charge pushing regions
    3.
    发明授权
    CMOS sensors having charge pushing regions 失效
    CMOS传感器具有电荷推送区域

    公开(公告)号:US07492048B2

    公开(公告)日:2009-02-17

    申请号:US11275497

    申请日:2006-01-10

    IPC分类号: H01L31/062

    摘要: Structures and method for forming the same. The semiconductor structure comprises a photo diode that includes a first semiconductor region and a second semiconductor region. The first and second semiconductor regions are doped with a first and second doping polarities, respectively, and the first and second doping polarities are opposite. The semiconductor structure also comprises a transfer gate that comprises (i) a first extension region, (ii) a second extension region, and (iii) a floating diffusion region. The first and second extension regions are in direct physical contact with the photo diode and the floating diffusion region, respectively. The semiconductor structure further comprises a charge pushing region. The charge pushing region overlaps the first semiconductor region and does not overlap the floating diffusion region. The charge pushing region comprises a transparent and electrically conducting material.

    摘要翻译: 结构及其形成方法。 该半导体结构包括包含第一半导体区域和第二半导体区域的光电二极管。 第一和第二半导体区域分别掺杂有第一和第二掺杂极性,并且第一和第二掺杂极性相反。 半导体结构还包括传输门,其包括(i)第一延伸区,(ii)第二延伸区和(iii)浮动扩散区。 第一和第二延伸区分别与光电二极管和浮动扩散区直接物理接触。 半导体结构还包括电荷推送区域。 电荷推送区域与第一半导体区域重叠,并且不与浮动扩散区域重叠。 电荷推送区域包括透明且导电的材料。

    Funneled light pipe for pixel sensors
    5.
    发明授权
    Funneled light pipe for pixel sensors 有权
    用于像素传感器的漏斗式光管

    公开(公告)号:US07524694B2

    公开(公告)日:2009-04-28

    申请号:US11275171

    申请日:2005-12-16

    IPC分类号: G02B27/10

    摘要: A photo sensing structure and methods for forming the same. The structure includes (a) a semiconductor substrate and (b) a photo collection region on the semiconductor substrate. The structure also includes a funneled light pipe on top of the photo collection region. The funneled light pipe includes (i) a bottom cylindrical portion on top of the photo collection region of the photo collection region, and (ii) a funneled portion which has a tapered shape and is on top and in direct physical contact with the bottom cylindrical portion. The structure further includes a color filter region on top of the funneled light pipe.

    摘要翻译: 感光结构及其形成方法。 该结构包括(a)半导体衬底和(b)半导体衬底上的光收集区域。 该结构还包括在照片收集区域顶部的漏斗光管。 漏斗式光管包括(i)照片收集区域的照片收集区域顶部的底部圆柱形部分,和(ii)具有锥形形状并且在顶部并与底部圆柱体直接物理接触的漏斗部分 一部分。 该结构还包括在漏斗的光管的顶部上的滤色器区域。