公开(公告)号：US10242290B2

公开(公告)日：2019-03-26

申请号：US14152562

申请日：2014-01-10

Applicant: KLA-Tencor Corporation

Inventor： Inna Tarshish-Shapir ,  Yoel Feler ,  Anat Marchelli ,  Berta Dinu ,  Vladimir Levinski ,  Boris Efraty ,  Nuriel Amir ,  Mark Ghinovker ,  Amnon Manassen ,  Sigalit Robinzon

IPC: G01R31/28 ,  G06K9/52 ,  G06T7/00 ,  H01L21/66 ,  G01N21/47

Abstract: Methods and systems are provided, which identify specified metrology target abnormalities using selected metrics and classify the identified target abnormalities geometrically to link them to corresponding sources of error. Identification may be carried out by deriving target signals such as kernels from specified regions of interest (ROIs) from corresponding targets on a wafer, calculating the metrics from the target signals using respective functions and analyzing the metrics to characterize the targets.

公开(公告)号：US20150316490A1

公开(公告)日：2015-11-05

申请号：US14797754

申请日：2015-07-13

Applicant: KLA-Tencor Corporation

Inventor： Eran Amit ,  Zeev Bomzon ,  Barak Bringoltz ,  Boris Efraty

IPC: G01N21/88 ,  G01N21/47

CPC classification number: G01N21/8851 ,  G01N21/47 ,  G03F7/70633

Abstract: Metrology methods and respective software and module are provided, which identify and remove measurement inaccuracy which results from process variation leading to target asymmetries. The methods comprise identifying an inaccuracy contribution of process variation source(s) to a measured scatterometry signal (e.g., overlay) by measuring the signal across a range of measurement parameter(s) (e.g., wavelength, angle) and targets, and extracting a measurement variability over the range which is indicative of the inaccuracy contribution. The method may further assume certain functional dependencies of the resulting inaccuracy on the target asymmetry, estimate relative donations of different process variation sources and apply external calibration to further enhance the measurement accuracy.

Abstract translation: 提供了计量方法和各自的软件和模块，其识别和消除由过程变化导致的目标不对称性的测量不准确度。 所述方法包括通过测量跨越测量参数（例如波长，角度）和目标的范围的信号来识别过程变化源对测量的散射测量信号（例如，覆盖）的不准确贡献，并且提取 在范围内的测量变异性表示不准确的贡献。 该方法可以进一步假设所得到的不准确性对目标不对称性的某些功能依赖性，估计不同过程变化源的相对捐赠并应用外部校准以进一步提高测量精度。

公开(公告)号：US09874527B2

公开(公告)日：2018-01-23

申请号：US14797754

申请日：2015-07-13

Applicant: KLA-Tencor Corporation

Inventor： Eran Amit ,  Zeev Bomzon ,  Barak Bringoltz ,  Boris Efraty

IPC: G01B11/00 ,  G01N21/88 ,  G01N21/47 ,  G03F7/20

CPC classification number: G01N21/8851 ,  G01N21/47 ,  G03F7/70633

Abstract: Metrology methods and respective software and module are provided, which identify and remove measurement inaccuracy which results from process variation leading to target asymmetries. The methods comprise identifying an inaccuracy contribution of process variation source(s) to a measured scatterometry signal (e.g., overlay) by measuring the signal across a range of measurement parameter(s) (e.g., wavelength, angle) and targets, and extracting a measurement variability over the range which is indicative of the inaccuracy contribution. The method may further assume certain functional dependencies of the resulting inaccuracy on the target asymmetry, estimate relative donations of different process variation sources and apply external calibration to further enhance the measurement accuracy.

公开(公告)号：US20160231102A1

公开(公告)日：2016-08-11

申请号：US15131728

申请日：2016-04-18

Applicant: KLA-Tencor Corporation

Inventor： Boris Efraty ,  Yuri Paskover

IPC: G01B11/00

CPC classification number: G01B11/00 ,  G03F7/70633

Abstract: Methods are provided, which estimate a quality of a metrology target by calculating a noise metric of its ROI kernels, derived from application of a Fourier filter on the measured kernel with respect to a periodicity of the target's periodic structure(s); and using the calculated noise metric to indicate the target quality. An additional Fourier filter may be applied perpendicularly on the measured kernel with respect to a periodicity of a perpendicular segmentation of the periodic structure(s), and the (2D) noise metric may be derived by application of both Fourier filters. The estimated noise may be analyzed statistically to provide various types of information on the target.

Abstract translation: 提供了一种方法，其通过计算其ROI核心的噪声度量来估计度量目标的质量，所述噪声度量是相对于所述目标周期性结构的周期性而在测量的内核上应用傅里叶滤波器得到的; 并使用计算出的噪声度量来指示目标质量。 可以相对于周期性结构的垂直分割的周期性将附加的傅立叶滤波器垂直地施加在测量的内核上，并且可以通过应用两个傅里叶滤波器来导出（2D）噪声度量。 可以对估计的噪声进行统计分析，以提供目标上的各种类型的信息。

公开(公告)号：US10408602B2

公开(公告)日：2019-09-10

申请号：US15131728

申请日：2016-04-18

Applicant: KLA-Tencor Corporation

Inventor： Boris Efraty ,  Yuri Paskover

IPC: G01B11/00 ,  G03F7/20

Abstract: Methods are provided, which estimate a quality of a metrology target by calculating a noise metric of its ROI kernels, derived from application of a Fourier filter on the measured kernel with respect to a periodicity of the target's periodic structure(s); and using the calculated noise metric to indicate the target quality. An additional Fourier filter may be applied perpendicularly on the measured kernel with respect to a periodicity of a perpendicular segmentation of the periodic structure(s), and the (2D) noise metric may be derived by application of both Fourier filters. The estimated noise may be analyzed statistically to provide various types of information on the target.

公开(公告)号：US10366483B2

公开(公告)日：2019-07-30

申请号：US14958535

申请日：2015-12-03

Applicant: KLA-TENCOR CORPORATION

Inventor： Boris Efraty ,  Nassim Bishara ,  Arkady Simkin ,  Yaron Ish-Shalom

IPC: G06K9/52 ,  G06T3/20 ,  G06T7/60 ,  G06T7/00 ,  H01L21/68 ,  G01B11/00 ,  G01N21/88 ,  G01N21/95

Abstract: Notch detection methods and modules are provided for efficiently estimating a position of a wafer notch. Capturing an image of specified region(s) of the wafer, a principle angle is identified in a transformation, converted into polar coordinates, of the captured image. Then the wafer axes are recovered from the identified principle angle as the dominant orientations of geometric primitives in the captured region. The captured region may be selected to include the center of the wafer and/or certain patterns that enhance the identification and recovering of the axes. Multiple images and/or regions may be used to optimize image quality and detection efficiency.

公开(公告)号：US20160313658A1

公开(公告)日：2016-10-27

申请号：US15198902

申请日：2016-06-30

Applicant: KLA-TENCOR CORPORATION

Inventor： Tal Marciano ,  Barak Bringoltz ,  Evgeni Gurevich ,  Ido Adam ,  Ze'ev Lindenfeld ,  Zeng Zhao ,  Yoel Feler ,  Daniel Kandel ,  Nadav Carmel ,  Amnon Manassen ,  Nuriel Amir ,  Oded Kaminsky ,  Tal Yaziv ,  Ofer Zaharan ,  Moshe Cooper ,  Roee Sulimarski ,  Tom Leviant ,  Noga Sella ,  Boris Efraty ,  Lilach Saltoun ,  Amir Handelman ,  Eltsafon Ashwal ,  Ohad Bachar

IPC: G03F9/00

Abstract: Methods are provided for deriving a partially continuous dependency of metrology metric(s) on recipe parameter(s), analyzing the derived dependency, determining a metrology recipe according to the analysis, and conducting metrology measurement(s) according to the determined recipe. The dependency may be analyzed in form of a landscape such as a sensitivity landscape in which regions of low sensitivity and/or points or contours of low or zero inaccuracy are detected, analytically, numerically or experimentally, and used to configure parameters of measurement, hardware and targets to achieve high measurement accuracy. Process variation is analyzed in terms of its effects on the sensitivity landscape, and these effects are used to characterize the process variation further, to optimize the measurements and make the metrology both more robust to inaccuracy sources and more flexible with respect to different targets on the wafer and available measurement conditions.

Abstract translation: 提供了用于导出计量度量对配方参数的部分连续依赖性的方法，分析衍生依赖性，根据分析确定计量配方，并根据确定的配方进行计量测量。 依赖性可以以景观的形式进行分析，例如灵敏度景观，其中检测到低分辨率或零误差的低灵敏度和/或点或等值线的区域，分析，数字或实验，并用于配置测量参数，硬件 并达到高测量精度。 根据其对灵敏度景观的影响分析过程变化，并且这些效应用于进一步表征过程变化，优化测量结果，使计量学对于不准确性来源更加鲁棒，并且对于不同的目标更灵活 晶圆和可用的测量条件。

公开(公告)号：US20140136137A1

公开(公告)日：2014-05-15

申请号：US14152562

申请日：2014-01-10

Applicant: KLA-Tencor Corporation

Inventor： Inna Tarshish-Shapir ,  Yoel Feler ,  Anat Marchelli ,  Berta Dinu ,  Vladimir Levinski ,  Boris Efraty ,  Nuriel Amir ,  Mark Ghinovker ,  Amnon Manassen ,  Sigalit Robinzon

IPC: G01R31/28

CPC classification number: G06K9/522 ,  G01B2210/56 ,  G01N21/4788 ,  G06T7/0004 ,  G06T2207/30148 ,  H01L22/12 ,  H01L22/30

Abstract: Methods and systems are provided, which identify specified metrology target abnormalities using selected metrics and classify the identified target abnormalities geometrically to link them to corresponding sources of error. Identification may be carried out by deriving target signals such as kernels from specified regions of interest (ROIs) from corresponding targets on a wafer, calculating the metrics from the target signals using respective functions and analyzing the metrics to characterize the targets.

Abstract translation: 提供了方法和系统，其使用选定的度量来识别指定的计量目标异常，并在几何上对所识别的目标异常进行分类，以将它们链接到相应的误差源。 可以通过从晶片上的相应目标导出来自指定感兴趣区域（ROI）的目标信号（例如来自目标信号的内核）来执行识别，使用各自的功能从目标信号计算度量，并分析用于表征目标的度量。