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公开(公告)号：US11862522B2
公开(公告)日：2024-01-02
申请号：US17179379
申请日：2021-02-18
Applicant: KLA-Tencor Corporation
Inventor： Barak Bringoltz , Evgeni Gurevich , Ido Adam , Yoel Feler , Dror Alumot , Yuval Lamhot , Noga Sella , Yaron De Leeuw , Tal Yaziv , Eltsafon Ashwal-Island , Lilach Saltoun , Tom Leviant
CPC classification number: H01L22/20 , G03F7/70633 , G03F9/7003 , H01L22/12
Abstract: Methods, metrology modules and target designs are provided, which improve the accuracy of metrology measurements. Methods provide flexible handling of multiple measurement recipes and setups and enable relating them to landscape features that indicate their relation to resonance regions and to flat regions. Clustering of recipes, self-consistency tests, common processing of aggregated measurements, noise reduction, cluster analysis, detailed analysis of the landscape and targets with skewed cells are employed separately or in combination to provide cumulative improvements of measurement accuracy.
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公开(公告)号：US10261014B2
公开(公告)日：2019-04-16
申请号：US14583447
申请日：2014-12-26
Applicant: KLA-Tencor Corporation
Inventor： Noam Sapiens , Joel Seligson , Vladimir Levinski , Daniel Kandel , Yoel Feler , Barak Bringoltz , Amnon Manassen , Eliav Benisty
Abstract: Metrology systems and methods are provided herein, which comprise an optical element that is positioned between an objective lens of the system and a target. The optical element is arranged to enhance evanescent modes of radiation reflected by the target. Various configurations are disclosed: the optical element may comprise a solid immersion lens, a combination of Moiré-elements and solid immersion optics, dielectric-metal-dielectric stacks of different designs, and resonating elements to amplify the evanescent modes of illuminating radiation. The metrology systems and methods are configurable to various metrology types, including imaging and scatterometry methods.
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公开(公告)号：US09784987B2
公开(公告)日：2017-10-10
申请号：US14799132
申请日：2015-07-14
Applicant: KLA-Tencor Corporation
Inventor： Andrew V. Hill , Amnon Manassen , Barak Bringoltz , Ohad Bachar , Mark Ghinovker , Zeev Bomzon , Daniel Kandel
CPC classification number: G02B27/58 , G01B11/00 , G01N21/47 , G01N21/55 , G01N2201/06113 , G01N2201/068 , G03F7/70625 , G03F7/70633
Abstract: The disclosure is directed to various apodization schemes for pupil imaging scatterometry. In some embodiments, the system includes an apodizer disposed within a pupil plane of the illumination path. In some embodiments, the system further includes an illumination scanner configured to scan a surface of the sample with at least a portion of apodized illumination. In some embodiments, the system includes an apodized pupil configured to provide a quadrupole illumination function. In some embodiments, the system further includes an apodized collection field stop. The various embodiments described herein may be combined to achieve certain advantages.
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公开(公告)号：US20150316783A1
公开(公告)日：2015-11-05
申请号：US14799132
申请日：2015-07-14
Applicant: KLA-Tencor Corporation
Inventor： Andrew V. Hill , Amnon Manassen , Barak Bringoltz , Ohad Bachar , Mark Ghinovker , Zeev Bomzon , Daniel Kandel
CPC classification number: G02B27/58 , G01B11/00 , G01N21/47 , G01N21/55 , G01N2201/06113 , G01N2201/068 , G03F7/70625 , G03F7/70633
Abstract: The disclosure is directed to various apodization schemes for pupil imaging scatterometry. In some embodiments, the system includes an apodizer disposed within a pupil plane of the illumination path. In some embodiments, the system further includes an illumination scanner configured to scan a surface of the sample with at least a portion of apodized illumination. In some embodiments, the system includes an apodized pupil configured to provide a quadrupole illumination function. In some embodiments, the system further includes an apodized collection field stop. The various embodiments described herein may be combined to achieve certain advantages.
Abstract translation: 本公开涉及用于瞳孔成像散射测量的各种变迹方案。 在一些实施例中，该系统包括设置在照明路径的光瞳平面内的变迹器。 在一些实施例中，系统还包括照明扫描器，其构造成用至少一部分变迹照明来扫描样品的表面。 在一些实施例中，系统包括配置成提供四极照明功能的变迹瞳孔。 在一些实施例中，系统还包括变迹集合区域停止。 可以组合这里描述的各种实施例以实现某些优点。
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公开(公告)号：US20150198524A1
公开(公告)日：2015-07-16
申请号：US14583447
申请日：2014-12-26
Applicant: KLA-Tencor Corporation
Inventor： Noam Sapiens , Joel Seligson , Vladimir Levinski , Daniel Kandel , Yoel Feler , Barak Bringoltz , Amnon Manassen , Eliav Benisty
IPC: G01N21/47
CPC classification number: G01N21/4788 , G01N2201/06113 , G02B27/56 , G02B27/58
Abstract: Metrology systems and methods are provided herein, which comprise an optical element that is positioned between an objective lens of the system and a target. The optical element is arranged to enhance evanescent modes of radiation reflected by the target. Various configurations are disclosed: the optical element may comprise a solid immersion lens, a combination of Moiré-elements and solid immersion optics, dielectric-metal-dielectric stacks of different designs, and resonating elements to amplify the evanescent modes of illuminating radiation. The metrology systems and methods are configurable to various metrology types, including imaging and scatterometry methods.
Abstract translation: 本文提供的计量系统和方法包括位于系统的物镜和目标之间的光学元件。 光学元件布置成增强目标反射的辐射消散模式。 公开了各种配置：光学元件可以包括固体浸没透镜，莫尔元件和固体浸没光学元件的组合，不同设计的介电金属 - 电介质叠层以及用于放大照明辐射的渐逝模式的谐振元件。 计量系统和方法可配置为各种计量类型，包括成像和散射方法。
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Patent Agency Ranking
6.发明申请公开(公告)号：US20180106723A1
公开(公告)日：2018-04-19
申请号：US15841219
申请日：2017-12-13
Applicant: KLA-Tencor Corporation
Inventor： Amnon Manassen , Andrew Hill , Daniel Kandel , Ilan Sela , Ohad Bachar , Barak Bringoltz
IPC: G01N21/55 , G01B11/00 , G01N21/956 , G01N21/95
CPC classification number: G01N21/55 , G01B11/00 , G01N21/9501 , G01N21/956 , G01N2201/06113 , G01N2201/104
Abstract: Angle-resolved reflectometers and reflectometry methods are provided, which comprise a coherent light source, an optical system arranged to scan a test pattern using a spot of coherent light from the light source to yield realizations of the light distribution in the collected pupil, wherein the spot covers a part of the test pattern and the scanning is carried out optically or mechanically according to a scanning pattern, and a processing unit arranged to generate a composite image of the collected pupil distribution by combining the pupil images. Metrology systems and methods are provided, which reduce diffraction errors by estimating, quantitatively, a functional dependency of measurement parameters on aperture sizes and deriving, from identified diffraction components of the functional dependency which relate to the aperture sizes, correction terms for the measurement parameters with respect to the measurement conditions.
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公开(公告)号：US20180023950A1
公开(公告)日：2018-01-25
申请号：US15329618
申请日：2016-11-01
Applicant: KLA-Tencor Corporation
Inventor： Tal Marciano , Michael E. Adel , Mark Ghinovker , Barak Bringoltz , Dana Klein , Tal Itzkovich , Vidya Ramanathan , Janay Camp
IPC: G01B11/27
CPC classification number: G01B11/272 , G03F7/70616 , G03F7/70633 , H01L22/12 , H01L22/20
Abstract: Method, metrology modules and RCA tool are provided, which use the behavior of resonance region(s) in measurement landscapes to evaluate and characterize process variation with respect to symmetric and asymmetric factors, and provide root cause analysis of the process variation with respect to process steps. Simulations of modeled stacks with different layer thicknesses and process variation factors may be used to enhance the analysis and provide improved target designs, improved algorithms and correctables for metrology measurements. Specific targets that exhibit sensitive resonance regions may be utilize to enhance the evaluation of process variation.
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公开(公告)号：US09874527B2
公开(公告)日：2018-01-23
申请号：US14797754
申请日：2015-07-13
Applicant: KLA-Tencor Corporation
Inventor： Eran Amit , Zeev Bomzon , Barak Bringoltz , Boris Efraty
CPC classification number: G01N21/8851 , G01N21/47 , G03F7/70633
Abstract: Metrology methods and respective software and module are provided, which identify and remove measurement inaccuracy which results from process variation leading to target asymmetries. The methods comprise identifying an inaccuracy contribution of process variation source(s) to a measured scatterometry signal (e.g., overlay) by measuring the signal across a range of measurement parameter(s) (e.g., wavelength, angle) and targets, and extracting a measurement variability over the range which is indicative of the inaccuracy contribution. The method may further assume certain functional dependencies of the resulting inaccuracy on the target asymmetry, estimate relative donations of different process variation sources and apply external calibration to further enhance the measurement accuracy.
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公开(公告)号：US09869543B2
公开(公告)日：2018-01-16
申请号：US14184295
申请日：2014-02-19
Applicant: KLA-Tencor Corporation
Inventor： Barak Bringoltz , Mark Ghinovker , Daniel Kandel , Vladimir Levinski , Zeev Bomzon
CPC classification number: G01B11/14 , G01B11/2441 , G03F7/70633
Abstract: Methods and systems for minimizing of algorithmic inaccuracy in scatterometry overlay (SCOL) metrology are provided. SCOL targets are designed to limit the number of oscillation frequencies in a functional dependency of a resulting SCOL signal on the offset and to reduce the effect of higher mode oscillation frequencies. The targets are segmented in a way that prevents constructive interference of high modes with significant amplitudes, and thus avoids the inaccuracy introduced by such terms into the SCOL signal. Computational methods remove residual errors in a semi-empirical iterative process of compensating for the residual errors algorithmically or through changes in target design.
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公开(公告)号：US09726984B2
公开(公告)日：2017-08-08
申请号：US14483733
申请日：2014-09-11
Applicant: KLA-Tencor Corporation
Inventor： Barak Bringoltz , Nadav Carmel
CPC classification number: G03F7/70633 , G03F7/70258
Abstract: Methods and algorithms are provided, as well as new metrics for misalignment of apertures with respect to the optical axis of a metrology system. The methods comprise aligning aperture(s) to an optical axis of a scatterometry metrology tool using correction term(s) derived by minimizing an overlay variation measure calculated with respect to overlay measurements of a periodic structure. These methods result in highly sensitive misalignment metrics, which may be used in calibration stages or on the fly to align the system's apertures, and enable reducing target size due to the resulting enhanced alignment accuracy.
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