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公开(公告)号：US5537186A
公开(公告)日：1996-07-16
申请号：US282328
申请日：1994-07-29
CPC分类号： G03F7/70716 , B23Q1/601 , B23Q1/72 , B23Q17/2495
摘要： A movable stage apparatus suitable for a semiconductor exposure apparatus or the like has a stage, a first driving mechanism for moving the stage in a predetermined direction, and a second driving mechanism for moving the stage by a minute amount in the predetermined direction. One of the mover and stator of the second driving mechanism is substantially fixed to the stage and the other is substantially movable with the movement of the stage by the first driving mechanism.
摘要翻译： 适用于半导体曝光装置等的可移动平台装置具有台，用于沿预定方向移动台的第一驱动机构和用于沿预定方向微动地移动台的第二驱动机构。 第二驱动机构的动子和定子中的一个基本上固定在舞台上，另一个基本上可以随着舞台的移动而被第一驱动机构移动。
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公开(公告)号：US06570645B2
公开(公告)日：2003-05-27
申请号：US09359911
申请日：1999-07-26
IPC分类号： G03B2762
CPC分类号： H01L21/67242 , G03F7/70725 , H01L21/68
摘要： A stage system includes a stage being movable in a predetermined direction, a first unit for applying a force to the stage in the predetermined direction, a moving mechanism for moving one of the first unit and a structure including the first unit, a first measuring system for measuring at least one of the position and movement amount of the stage, and a second measuring system for measuring at least one of the position and movement amount of one of the first unit and the structure, wherein the stage is controlled on the basis of a measured value of the first measuring system, and wherein the moving system is controlled on the basis of a measured value of the second measuring system.
摘要翻译： 一种舞台系统包括：能够沿预定方向移动的舞台，用于沿预定方向向舞台施加力的第一单元;用于移动第一单元和包括第一单元的结构的移动机构;第一测量系统 用于测量平台的位置和移动量中的至少一个以及用于测量第一单元和结构中的一个的位置和移动量中的至少一个的第二测量系统，其中基于 第一测量系统的测量值，并且其中基于第二测量系统的测量值来控制移动系统。
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3.发明授权Stage apparatus and linear motor, and exposure apparatus and device production method using the stage apparatus 失效舞台装置和线性电动机以及使用舞台装置的曝光装置和装置制造方法
公开(公告)号：US6037680A
公开(公告)日：2000-03-14
申请号：US121112
申请日：1998-07-23
IPC分类号： B23Q5/28 , G03F7/20 , H01L21/027 , H01L21/68 , H02K41/03 , H02K41/035 , H02K41/00 , H02K41/02
CPC分类号： G03F7/70358 , G03F7/70725 , G03F7/70758 , H01L21/682 , H02K41/031 , H02K41/0356 , H01J2237/20221 , H01J2237/20278 , H01J2237/3175
摘要： A linear motor includes a single-phase coil, a plurality of polyphase coils each of which is shorter than the single-phase coil and wound to be parallel to the single-phase coil, a first permanent magnet movable relative to the single-phase coil and the plurality of polyphase coils in an axial direction of the single-phase coil, a first yoke consisting of a ferromagnetic substance and extending through the single-phase coil in the axial direction, a second yoke consisting of a ferromagnetic substance and having, outside the single-phase coil, a portion arranged to be parallel to the first yoke, to form a closed magnetic circuit together with the first yoke and the first permanent magnet such that the closed magnetic circuit circulates magnetic fluxes from the first permanent magnet across a winding of the single-phase coil, and a second permanent magnet for connecting the first and second yokes.
摘要翻译： 线性电动机包括单相线圈，多个多相线圈，其每一个都短于单相线圈并缠绕成平行于单相线圈;第一永磁体，其可相对于单相线圈 所述单相线圈的轴向上的多个多相线圈，由铁磁性物质构成并沿轴向延伸通过单相线圈的第一磁轭，由铁磁性物质构成的第二磁轭，具有外部 所述单相线圈是与所述第一磁轭平行的部分，与所述第一磁轭和所述第一永磁体一起形成闭合磁路，使得所述闭合磁路使来自所述第一永久磁铁的磁通量绕过绕组 的单相线圈和用于连接第一和第二轭的第二永磁体。
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4.发明授权
公开(公告)号：US5822389A
公开(公告)日：1998-10-13
申请号：US464038
申请日：1995-06-05
申请人： Shunichi Uzawa , Takao Kariya , Makoto Higomura , Nobutoshi Mizusawa , Ryuichi Ebinuma , Kohji Uda , Kunitaka Ozawa , Mitsuaki Amemiya , Eiji Sakamoto , Naoto Abe , Kenji Saitoh
发明人： Shunichi Uzawa , Takao Kariya , Makoto Higomura , Nobutoshi Mizusawa , Ryuichi Ebinuma , Kohji Uda , Kunitaka Ozawa , Mitsuaki Amemiya , Eiji Sakamoto , Naoto Abe , Kenji Saitoh
IPC分类号： G21K1/06 , G03F7/20 , G03F9/00 , G21K5/02 , G21K5/04 , G21K5/10 , H01L21/027 , H01L21/30 , H05H13/04 , G21K5/00
CPC分类号： G03F7/70008 , G03F7/702 , G03F7/70691 , G03F7/70741 , G03F7/70841 , G03F7/70866 , G03F7/70975 , G03F9/70 , G21K1/06
摘要： A synchrotron exposure includes a synchrotron radiation source for generating a synchrotron radiation beam, and exposure unit having a mask stage for holding a mask and a wafer stage for holding a waver, a beam port for directing the radiation beam to the exposure unit, a mirror unit having a mirror for reflecting the radiation beam, a pre-alignment system for aligning the wafer relative to the wafer stage, a fine-alignment system for aligning the wafer held by the wafer stage relative to the mask held by the mask stage, a mask storage apparatus for storing the mask, a wafer storage apparatus for storing the wafer, a mask conveying apparatus for conveying the mask between the mask storage apparatus and the mask stage and a wafer conveying apparatus for conveying a wafer between the wafer storage apparatus and the wafer stage.
摘要翻译： 同步加速器曝光包括用于产生同步加速器辐射束的同步加速器辐射源，以及具有用于保持掩模的掩模台和用于保持摇摆的晶片台的曝光单元，用于将辐射束引导到曝光单元的光束端口 具有用于反射辐射束的反射镜的单元，用于使晶片相对于晶片台对准的预对准系统，用于使由晶片台保持的晶片相对于由掩模台保持的掩模对准的精细对准系统， 用于存储掩模的掩模存储装置，用于存储晶片的晶片存储装置，用于在掩模存储装置和掩模台之间传送掩模的掩模传送装置和用于在晶片存储装置和掩模载台之间传送晶片的晶片传送装置 晶圆台。
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公开(公告)号：US5796469A
公开(公告)日：1998-08-18
申请号：US891803
申请日：1997-07-14
申请人： Ryuichi Ebinuma
发明人： Ryuichi Ebinuma
CPC分类号： G03F7/70358 , G03F7/70716 , G03F7/70775 , G03F7/70833 , G03F7/70866 , G03F9/70
摘要： An exposure apparatus in which a portion of a pattern of a reticle is projected onto a wafer and in which the reticle and the wafer are scanned synchronously such that the pattern of the reticle is transferred to the wafer. The apparatus includes a reticle stage and a wafer stage for scanningly moving the reticle and the wafer, respectively, a measuring system for measuring a deviation of the reticle stage relative to the wafer stage in a predetermined direction other than the direction of scanning movement, and an adjusting device for adjusting the wafer stage on the basis of the measurement by the measuring system. In one aspect, the measuring system includes a laser interferometer. In another aspect, a frame member is provided for supporting the stages, and a flow passageway is provided in the frame member for flowing therethrough a temperature adjusting medium. In yet another aspect, the present invention is directed to an exposure method for the manufacture of microdevices.
摘要翻译： 将掩模版图形的一部分投影到晶片上并且将掩模版和晶片同步扫描的曝光装置，使得标线片的图案被转印到晶片上。 该装置包括：分划板台和用于分别扫描光罩和晶片的晶片台;测量系统，用于测量除了扫描方向以外的预定方向相对于晶片台的偏离;以及 调整装置，用于基于测量系统的测量来调整晶片台。 在一个方面，测量系统包括激光干涉仪。 在另一方面，提供了一种用于支撑台架的框架构件，并且在框架构件中设置有用于流过温度调节介质的流动通道。 在另一方面，本发明涉及一种用于制造微型器件的曝光方法。
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公开(公告)号：US5577552A
公开(公告)日：1996-11-26
申请号：US412101
申请日：1995-03-28
申请人： Ryuichi Ebinuma , Takao Kariya , Nobutoshi Mizusawa , Koji Uda , Eiji Sakamoto , Shunichi Uzawa
发明人： Ryuichi Ebinuma , Takao Kariya , Nobutoshi Mizusawa , Koji Uda , Eiji Sakamoto , Shunichi Uzawa
CPC分类号： H05K7/20281 , G03F7/707 , G03F7/70875 , G05D23/1919
摘要： A temperature controlling device suitably usable in a semiconductor microcircuit manufacturing exposure apparatus exposes a semiconductor wafer to a mask to print a pattern of the mask on the wafer. The device includes a constant-temperature liquid medium supplying system for controlling temperature of a liquid at high precision, a distributing system for distributing the supplied liquid medium into plural flow passages, to supply the liquid medium to plural subjects of control such as, for example, a mask stage, a wafer stage and the like. The device further includes a plurality of temperature controls each being provided in corresponding one of the flow passages, for correction of any variance in temperature of the distributed liquid medium, resulting from pressure loss energies in the respective flow passages. Thus, temperatures of plural subjects of control can be controlled efficiently and with a simple structure.
摘要翻译： 可适用于半导体微电路制造曝光装置的温度控制装置将半导体晶片暴露于掩模，以将掩模的图案印刷在晶片上。 该装置包括用于高精度地控制液体的温度的恒温液体介质供给系统，用于将供应的液体介质分配到多个流动通道中的分配系统，以将液体介质供应到多个控制对象，例如 ，掩模台，晶片台等。 该装置还包括多个温度控制装置，每个温度控制装置设置在对应的一个流动通道中，用于校正由相应流动通道中的压力损失能量产生的分配液体介质的温度变化。 因此，能够以简单的结构有效地控制多个控制对象的温度。
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公开(公告)号：US5161176A
公开(公告)日：1992-11-03
申请号：US802705
申请日：1991-12-06
申请人： Ryuichi Ebinuma , Kunitaka Ozawa , Takao Kariya , Shunichi Uzawa , Noriyuki Nose
发明人： Ryuichi Ebinuma , Kunitaka Ozawa , Takao Kariya , Shunichi Uzawa , Noriyuki Nose
IPC分类号： G03F9/00 , G03F7/20 , H01L21/027 , H01L21/30
CPC分类号： G03F7/70066
摘要： An exposure apparatus includes a light source for exposing a wafer through a mask; a light blocking device being movable and effective to block light from the light source to limit an exposure zone; a positional deviation detecting system for detecting positional deviation between the mask and the wafer; and a drive control system for moving the light blocking device to execute position control therefor, on the basis of a detection signal from the positional deviation detecting system.
摘要翻译： 曝光装置包括用于通过掩模曝光晶片的光源; 遮光装置可移动并且有效地阻挡来自光源的光以限制曝光区域; 用于检测掩模和晶片之间的位置偏差的位置偏差检测系统; 以及驱动控制系统，用于基于来自位置偏差检测系统的检测信号移动遮光装置以执行其位置控制。
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公开(公告)号：US5157700A
公开(公告)日：1992-10-20
申请号：US401615
申请日：1989-08-31
申请人： Hiroshi Kurosawa , Mitsuaki Amemiya , Shigeru Terashima , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Kunitaka Ozawa , Makiko Mori , Ryuichi Ebinuma , Shinichi Hara , Nobutoshi Mizusawa , Eigo Kawakami
发明人： Hiroshi Kurosawa , Mitsuaki Amemiya , Shigeru Terashima , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Kunitaka Ozawa , Makiko Mori , Ryuichi Ebinuma , Shinichi Hara , Nobutoshi Mizusawa , Eigo Kawakami
IPC分类号： G03F7/20
CPC分类号： G03F7/70691 , G03F7/70058 , G03F7/70091 , G03F7/702
摘要： An exposure apparatus usable with synchrotron radiation source wherein the synchrotron radiation is generated by electron injection into a ring. The exposure apparatus is to transfer a semiconductor element pattern of a mask onto a semiconductor wafer by the synchrotron radiation. The apparatus includes a shutter for controlling the exposure of the wafer. The shutter controls the exposure with the illuminance distribution on the wafer surface taken into account. The illuminance distribution is determined in response to the electron injection, and thereafter, the illuminance distribution is corrected in a predetermined manner. By this, the illuminance distribution data for controlling the shutter always correspond to the actual illuminance distribution. The entire shot areas of the semiconductor wafer are exposed with high precision.
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公开(公告)号：US5150151A
公开(公告)日：1992-09-22
申请号：US489194
申请日：1990-03-06
IPC分类号： G03F7/20
摘要： A reflecting device includes a reflection surface for reflecting light inputted thereto from a predetermined direction; and a driving mechanism for moving the reflection surface without causing a change in a direction of reflection and a position of reflection of the inputted light.
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公开(公告)号：US5125014A
公开(公告)日：1992-06-23
申请号：US578268
申请日：1990-09-06
IPC分类号： G21K5/02 , G03F7/20 , H01L21/027 , H01L21/30
CPC分类号： G03F7/702 , G03F7/2039
摘要： An exposure apparatus for exposing a substrate with X-rays is disclosed. The apparatus includes a radiation source for providing X-rays; and a convex mirror for reflecting the X-rays from the radiation source toward the substrate to expose a zone of the substrate with the X-rays; wherein the convex mirror and the substrate are so interrelated that a peak position of intensity distribution of the X-rays upon the zone deviates from the center of the zone.
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