-
公开(公告)号:US5125014A
公开(公告)日:1992-06-23
申请号:US578268
申请日:1990-09-06
IPC分类号: G21K5/02 , G03F7/20 , H01L21/027 , H01L21/30
CPC分类号: G03F7/702 , G03F7/2039
摘要: An exposure apparatus for exposing a substrate with X-rays is disclosed. The apparatus includes a radiation source for providing X-rays; and a convex mirror for reflecting the X-rays from the radiation source toward the substrate to expose a zone of the substrate with the X-rays; wherein the convex mirror and the substrate are so interrelated that a peak position of intensity distribution of the X-rays upon the zone deviates from the center of the zone.
-
公开(公告)号:US5159621A
公开(公告)日:1992-10-27
申请号:US739259
申请日:1991-08-01
申请人: Yutaka Watanabe , Shunichi Uzawa , Yasuaki Fukuda , Nobutoshi Mizusawa , Ryuichi Ebinuma , Mitsuaki Amemiya
发明人: Yutaka Watanabe , Shunichi Uzawa , Yasuaki Fukuda , Nobutoshi Mizusawa , Ryuichi Ebinuma , Mitsuaki Amemiya
CPC分类号: G21K5/04 , H01J2235/18
摘要: An X-ray transmitting window for use in X-ray lithography, for allowing transmission therethrough of X-rays from a vacuum ambience to a different ambience, includes an X-ray transmitting film, and a gasket material gas-tightly provided on at least one of opposite surfaces in a peripheral portion of the X-ray transmitting film. The gasket material has a Brinell hardness smaller than that of the X-ray transmitting film. The formed X-ray transmitting window is able to be sandwiched and fastened between a pair of flanges in a gas-tight manner.
-
公开(公告)号:US5285488A
公开(公告)日:1994-02-08
申请号:US974307
申请日:1992-11-10
CPC分类号: G03F7/702
摘要: An exposure apparatus includes an exposure beam source for projecting a beam flux for exposure, having a non-uniform intensity distribution, toward a range including an exposure zone, set with respect to a main body of the exposure apparatus; illuminance detectors disposed at least at two points inside the exposure beam flux but outside the exposure zone; and a detecting device for detecting a change in intensity of the exposure beam and a change in relative position of the exposure zone and the exposure beam flux, on the basis of detected illuminances at the two points.
摘要翻译: 曝光装置包括:曝光束源,用于将曝光用光束投射到具有相对于曝光装置的主体的曝光区域的范围内,具有不均匀的强度分布; 照度检测器至少设置在曝光光束内部的两个点处,但在曝光区域外; 以及检测装置,其基于两点处的检测到的照度,检测曝光光束的强度变化和曝光区域和曝光光束通量的相对位置的变化。
-
公开(公告)号:US5123036A
公开(公告)日:1992-06-16
申请号:US735691
申请日:1991-07-22
CPC分类号: G03F7/702 , G21K1/06 , G21K2201/064
摘要: An X-ray exposure apparatus for exposing a resist on a substrate to a pattern of an original includes a radiation source for providing X-rays; and an illumination system for irradiating the original and the substrate with the X-rays such that the resist of the substrate is exposed to the pattern of the original with the X-rays; wherein the illumination system has a convex mirror having a reflection surface of a shape like a cylindrical surface, for reflecting the X-rays from the radiation source to the original; and wherein the reflection surface of the mirror has such an aspherical surface shape that, with respect to a top of the reflection surface, a radiation source side and an original side are asymmetrical in shape, that, in the neighborood of the top, the radiation source side has a radius of curvature smaller than that of the original side, and that at a peripheral potion the reflection surface has a curvature of a radius larger than that at the top of the reflection surface.
-
5.
公开(公告)号:US5822389A
公开(公告)日:1998-10-13
申请号:US464038
申请日:1995-06-05
申请人: Shunichi Uzawa , Takao Kariya , Makoto Higomura , Nobutoshi Mizusawa , Ryuichi Ebinuma , Kohji Uda , Kunitaka Ozawa , Mitsuaki Amemiya , Eiji Sakamoto , Naoto Abe , Kenji Saitoh
发明人: Shunichi Uzawa , Takao Kariya , Makoto Higomura , Nobutoshi Mizusawa , Ryuichi Ebinuma , Kohji Uda , Kunitaka Ozawa , Mitsuaki Amemiya , Eiji Sakamoto , Naoto Abe , Kenji Saitoh
IPC分类号: G21K1/06 , G03F7/20 , G03F9/00 , G21K5/02 , G21K5/04 , G21K5/10 , H01L21/027 , H01L21/30 , H05H13/04 , G21K5/00
CPC分类号: G03F7/70008 , G03F7/702 , G03F7/70691 , G03F7/70741 , G03F7/70841 , G03F7/70866 , G03F7/70975 , G03F9/70 , G21K1/06
摘要: A synchrotron exposure includes a synchrotron radiation source for generating a synchrotron radiation beam, and exposure unit having a mask stage for holding a mask and a wafer stage for holding a waver, a beam port for directing the radiation beam to the exposure unit, a mirror unit having a mirror for reflecting the radiation beam, a pre-alignment system for aligning the wafer relative to the wafer stage, a fine-alignment system for aligning the wafer held by the wafer stage relative to the mask held by the mask stage, a mask storage apparatus for storing the mask, a wafer storage apparatus for storing the wafer, a mask conveying apparatus for conveying the mask between the mask storage apparatus and the mask stage and a wafer conveying apparatus for conveying a wafer between the wafer storage apparatus and the wafer stage.
摘要翻译: 同步加速器曝光包括用于产生同步加速器辐射束的同步加速器辐射源,以及具有用于保持掩模的掩模台和用于保持摇摆的晶片台的曝光单元,用于将辐射束引导到曝光单元的光束端口 具有用于反射辐射束的反射镜的单元,用于使晶片相对于晶片台对准的预对准系统,用于使由晶片台保持的晶片相对于由掩模台保持的掩模对准的精细对准系统, 用于存储掩模的掩模存储装置,用于存储晶片的晶片存储装置,用于在掩模存储装置和掩模台之间传送掩模的掩模传送装置和用于在晶片存储装置和掩模载台之间传送晶片的晶片传送装置 晶圆台。
-
公开(公告)号:US5577552A
公开(公告)日:1996-11-26
申请号:US412101
申请日:1995-03-28
申请人: Ryuichi Ebinuma , Takao Kariya , Nobutoshi Mizusawa , Koji Uda , Eiji Sakamoto , Shunichi Uzawa
发明人: Ryuichi Ebinuma , Takao Kariya , Nobutoshi Mizusawa , Koji Uda , Eiji Sakamoto , Shunichi Uzawa
CPC分类号: H05K7/20281 , G03F7/707 , G03F7/70875 , G05D23/1919
摘要: A temperature controlling device suitably usable in a semiconductor microcircuit manufacturing exposure apparatus exposes a semiconductor wafer to a mask to print a pattern of the mask on the wafer. The device includes a constant-temperature liquid medium supplying system for controlling temperature of a liquid at high precision, a distributing system for distributing the supplied liquid medium into plural flow passages, to supply the liquid medium to plural subjects of control such as, for example, a mask stage, a wafer stage and the like. The device further includes a plurality of temperature controls each being provided in corresponding one of the flow passages, for correction of any variance in temperature of the distributed liquid medium, resulting from pressure loss energies in the respective flow passages. Thus, temperatures of plural subjects of control can be controlled efficiently and with a simple structure.
摘要翻译: 可适用于半导体微电路制造曝光装置的温度控制装置将半导体晶片暴露于掩模,以将掩模的图案印刷在晶片上。 该装置包括用于高精度地控制液体的温度的恒温液体介质供给系统,用于将供应的液体介质分配到多个流动通道中的分配系统,以将液体介质供应到多个控制对象,例如 ,掩模台,晶片台等。 该装置还包括多个温度控制装置,每个温度控制装置设置在对应的一个流动通道中,用于校正由相应流动通道中的压力损失能量产生的分配液体介质的温度变化。 因此,能够以简单的结构有效地控制多个控制对象的温度。
-
公开(公告)号:US5161176A
公开(公告)日:1992-11-03
申请号:US802705
申请日:1991-12-06
申请人: Ryuichi Ebinuma , Kunitaka Ozawa , Takao Kariya , Shunichi Uzawa , Noriyuki Nose
发明人: Ryuichi Ebinuma , Kunitaka Ozawa , Takao Kariya , Shunichi Uzawa , Noriyuki Nose
IPC分类号: G03F9/00 , G03F7/20 , H01L21/027 , H01L21/30
CPC分类号: G03F7/70066
摘要: An exposure apparatus includes a light source for exposing a wafer through a mask; a light blocking device being movable and effective to block light from the light source to limit an exposure zone; a positional deviation detecting system for detecting positional deviation between the mask and the wafer; and a drive control system for moving the light blocking device to execute position control therefor, on the basis of a detection signal from the positional deviation detecting system.
摘要翻译: 曝光装置包括用于通过掩模曝光晶片的光源; 遮光装置可移动并且有效地阻挡来自光源的光以限制曝光区域; 用于检测掩模和晶片之间的位置偏差的位置偏差检测系统; 以及驱动控制系统,用于基于来自位置偏差检测系统的检测信号移动遮光装置以执行其位置控制。
-
公开(公告)号:US5157700A
公开(公告)日:1992-10-20
申请号:US401615
申请日:1989-08-31
申请人: Hiroshi Kurosawa , Mitsuaki Amemiya , Shigeru Terashima , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Kunitaka Ozawa , Makiko Mori , Ryuichi Ebinuma , Shinichi Hara , Nobutoshi Mizusawa , Eigo Kawakami
发明人: Hiroshi Kurosawa , Mitsuaki Amemiya , Shigeru Terashima , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Kunitaka Ozawa , Makiko Mori , Ryuichi Ebinuma , Shinichi Hara , Nobutoshi Mizusawa , Eigo Kawakami
IPC分类号: G03F7/20
CPC分类号: G03F7/70691 , G03F7/70058 , G03F7/70091 , G03F7/702
摘要: An exposure apparatus usable with synchrotron radiation source wherein the synchrotron radiation is generated by electron injection into a ring. The exposure apparatus is to transfer a semiconductor element pattern of a mask onto a semiconductor wafer by the synchrotron radiation. The apparatus includes a shutter for controlling the exposure of the wafer. The shutter controls the exposure with the illuminance distribution on the wafer surface taken into account. The illuminance distribution is determined in response to the electron injection, and thereafter, the illuminance distribution is corrected in a predetermined manner. By this, the illuminance distribution data for controlling the shutter always correspond to the actual illuminance distribution. The entire shot areas of the semiconductor wafer are exposed with high precision.
-
9.
公开(公告)号:US5524131A
公开(公告)日:1996-06-04
申请号:US441641
申请日:1995-05-15
申请人: Shunichi Uzawa , Takao Kariya , Makoto Higomura , Nobutoshi Mizusawa , Ryuichi Ebinuma , Kohji Uda , Kunitaka Ozawa , Mitsuaki Amemiya , Eiji Sakamoto , Naoto Abe , Kenji Saitoh
发明人: Shunichi Uzawa , Takao Kariya , Makoto Higomura , Nobutoshi Mizusawa , Ryuichi Ebinuma , Kohji Uda , Kunitaka Ozawa , Mitsuaki Amemiya , Eiji Sakamoto , Naoto Abe , Kenji Saitoh
IPC分类号: G21K1/06 , G03F7/20 , G03F9/00 , G21K5/02 , G21K5/04 , G21K5/10 , H01L21/027 , H01L21/30 , H05H13/04 , G21K5/00
CPC分类号: G03F7/70008 , G03F7/702 , G03F7/70691 , G03F7/70741 , G03F7/70841 , G03F7/70866 , G03F7/70975 , G03F9/70 , G21K1/06
摘要: A semiconductor device manufacturing SOR X-ray exposure apparatus wherein, after a mask and a semiconductor wafer are aligned, and SOR X-ray is used to transfer a semiconductor device pattern on the mask onto a resist on the semiconductor wafer. The apparatus includes a mirror unit and an exposure unit for exposing the wafer through the mask to the X-ray from the mirror unit. The mirror unit includes an X-ray mirror for diverging the X-ray in a desired direction, a first chamber for providing a desired vacuum ambience around the X-ray mirror and a first supporting device for supplying the X-ray mirror. The exposure unit includes a shutter for controlling the exposure, a mask stage for holding the mask, a wafer stage for holding the wafer, a second chamber for providing a desired He ambience around the mask stage and the wafer stage, a frame structure for mounting the mask stage and the wafer stage and a second supporting device for supporting the frame structure. By this, a more highly integrated semiconductor device can be produced.
摘要翻译: 一种制造SOR X射线曝光装置的半导体器件,其中在掩模和半导体晶片对准之后,使用SOR X射线将掩模上的半导体器件图案转印到半导体晶片上的抗蚀剂上。 该装置包括反射镜单元和曝光单元,用于将晶片通过掩模曝光到来自反射镜单元的X射线。 镜单元包括用于沿所需方向分散X射线的X射线镜,用于在X射线反射镜周围提供期望的真空环境的第一腔室和用于供给X射线镜的第一支撑装置。 曝光单元包括用于控制曝光的快门,用于保持掩模的掩模台,用于保持晶片的晶片台,用于在掩模台和晶片台周围提供期望的He环境的第二室,用于安装的框架结构 掩模台和晶片台以及用于支撑框架结构的第二支撑装置。 由此,可以制造更高度集成的半导体器件。
-
公开(公告)号:US5277539A
公开(公告)日:1994-01-11
申请号:US58791
申请日:1993-05-10
IPC分类号: G03F7/20 , H01L21/677 , H01L21/68 , B65G47/24
CPC分类号: G03F7/70691 , H01L21/67766 , H01L21/67778 , H01L21/68
摘要: A substrate conveying apparatus usable with a semiconductor manufacturing apparatus wherein a pattern of a mask is transferred onto a semiconductor wafer by exposing the semiconductor wafer to synchrotron orbital radiation or other exposure energy through a mask. The conveying apparatus transfers the semiconductor wafer to and from a wafer chuck while the surface thereof extends vertically, and/or transfers the wafer to and from a wafer cassette which contains a plurality of wafers horizontally. The apparatus includes a conveying hand having a gimbal mechanism for supporting the semiconductor wafer to assure the semiconductor wafer transfer to and from the wafer chuck while the wafer is vertical. When the semiconductor wafer is transferred to and from a wafer cassette, the apparatus is provided with a correcting mechanism for correcting the attitude of the conveying hand to prevent the semiconductor wafer from contacting the wafer cassette.
摘要翻译: 一种可用于半导体制造装置的基板输送装置,其中通过将半导体晶片暴露于同步加速器轨道辐射或通过掩模的其他曝光能量将掩模的图案转印到半导体晶片上。 输送装置将晶片卡盘的表面向垂直方向延伸和/或从晶片卡盘传送半导体晶片,和/或将晶片从包含多个晶片的晶片盒水平地传送到晶片盒。 该装置包括具有用于支撑半导体晶片的万向架机构的传送手,以确保半导体晶片在晶片垂直时传送到晶片卡盘。 当将半导体晶片转移到晶片盒或从晶片盒转移时,该装置设置有校正机构,用于校正传送手的姿态以防止半导体晶片接触晶片盒。
-
-
-
-
-
-
-
-
-