公开(公告)号：US20190189389A1

公开(公告)日：2019-06-20

申请号：US16202514

申请日：2018-11-28

Applicant: NuFlare Technology, Inc.

Inventor： Takuya UEMURA ,  Takashi NAKAMURA ,  Hideki MATSUI ,  Munehiro OGASAWARA ,  Rieko NISHIMURA ,  Tatsuya MUROFUSHI ,  Yoshiaki HATTORI

IPC: H01J37/21 ,  H01J37/147 ,  H01J37/10 ,  H01J37/317 ,  H01J37/20

CPC classification number: H01J37/21 ,  H01J37/10 ,  H01J37/1472 ,  H01J37/20 ,  H01J37/3174 ,  H01J2237/202 ,  H01J2237/31793

Abstract: In one embodiment, a charged particle beam writing apparatus includes a deflector deflecting a charged particle beam, a first correcting lens and a second correcting lens correcting a focus position of the charged particle beam, a focus correction amount calculator calculating a first correction amount for the focus position according to a change in a height position of a sample surface, and calculating a second correction amount for the focus position according to a change in shot size of the charged particle beam, a first DAC (digital to analog converter) amplifier applying a voltage for a ground potential based on the first correction amount to the first correcting lens, and a second DAC amplifier applying a voltage for a ground potential based on the second correction amount to the second correcting lens, an output of the second DAC amplifier being smaller than an output of the first DAC amplifier.

公开(公告)号：US20170011884A1

公开(公告)日：2017-01-12

申请号：US15188007

申请日：2016-06-21

Applicant: NuFlare Technology, Inc.

Inventor： Takashi NAKAMURA ,  Rieko Nishimura

IPC: H01J37/30 ,  H01J37/20 ,  H01J37/317

CPC classification number: H01J37/3005 ,  H01J37/20 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/30433 ,  H01J2237/30477

Abstract: According to one embodiment, a method of adjusting a charged particle beam drawing apparatus includes obtaining an offset amount in beam size to be set in the charged particle beam drawing apparatus. The method includes forming a linear evaluation pattern on a substrate by changing number of divisions of a beam with a predetermined size and performing drawing by using divided beams, obtaining a change amount in a line width of the evaluation pattern from a design dimension for each number of divisions, and calculating the offset amount by fitting a model function to the change amount for each number of divisions, the model function being obtained by modeling a pattern line width based on a distribution of energy given by charged particle beams.

Abstract translation: 根据一个实施例，一种调整带电粒子束描绘装置的方法包括：获得待设置在带电粒子束描绘装置中的束尺寸的偏移量。 该方法包括通过改变具有预定尺寸的光束的分割数来在衬底上形成线性评估图案，并通过使用划分的光束进行绘制，从每个数字的设计尺寸获得评估图案的线宽的变化量 并且通过将模型函数拟合到每个分割数的变化量来计算偏移量，所述模型函数通过基于由带电粒子束给出的能量分布对图案线宽进行建模而获得。