公开(公告)号：US20190189389A1

公开(公告)日：2019-06-20

申请号：US16202514

申请日：2018-11-28

Applicant: NuFlare Technology, Inc.

Inventor： Takuya UEMURA ,  Takashi NAKAMURA ,  Hideki MATSUI ,  Munehiro OGASAWARA ,  Rieko NISHIMURA ,  Tatsuya MUROFUSHI ,  Yoshiaki HATTORI

IPC: H01J37/21 ,  H01J37/147 ,  H01J37/10 ,  H01J37/317 ,  H01J37/20

CPC classification number: H01J37/21 ,  H01J37/10 ,  H01J37/1472 ,  H01J37/20 ,  H01J37/3174 ,  H01J2237/202 ,  H01J2237/31793

Abstract: In one embodiment, a charged particle beam writing apparatus includes a deflector deflecting a charged particle beam, a first correcting lens and a second correcting lens correcting a focus position of the charged particle beam, a focus correction amount calculator calculating a first correction amount for the focus position according to a change in a height position of a sample surface, and calculating a second correction amount for the focus position according to a change in shot size of the charged particle beam, a first DAC (digital to analog converter) amplifier applying a voltage for a ground potential based on the first correction amount to the first correcting lens, and a second DAC amplifier applying a voltage for a ground potential based on the second correction amount to the second correcting lens, an output of the second DAC amplifier being smaller than an output of the first DAC amplifier.

公开(公告)号：US20180284620A1

公开(公告)日：2018-10-04

申请号：US15895285

申请日：2018-02-13

Applicant: NuFlare Technology, Inc.

Inventor： Munehiro OGASAWARA

IPC: G03F7/20 ,  H01J37/12 ,  H01L21/027 ,  G03F1/78

Abstract: An electron beam irradiation apparatus includes a first electrode being annular, arranged along the optical axis of the electron beam, at the downstream from the deflector, and in the magnetic field of the objective lens, to which a first potential being positive is variably applied, a second electrode being annular, arranged in the magnetic field of the objective lens and between the deflector and the first electrode, to which a second potential being positive and higher than the first potential is applied, and a third electrode being annular, arranged in the magnetic field of the objective lens and to be opposite to the second electrode with respect to the first electrode, to which a third potential lower than the first potential is applied.

公开(公告)号：US20170243716A1

公开(公告)日：2017-08-24

申请号：US15358324

申请日：2016-11-22

Applicant: NuFlare Technology, Inc.

Inventor： Munehiro OGASAWARA

IPC: H01J37/26 ,  H01J37/147 ,  H01J37/20 ,  H01J37/244 ,  H01J37/22

CPC classification number: H01J37/265 ,  H01J37/147 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J61/28 ,  H01J2237/0435 ,  H01J2237/20285 ,  H01J2237/20292 ,  H01J2237/221 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/2449 ,  H01J2237/24592 ,  H01J2237/2817

Abstract: An inspection apparatus according to an embodiment includes an irradiation part configured to irradiate an inspection target substrate with multiple beams including energy beams, a detector, on which a plurality of charged particle beams of charged particles released from the inspection target substrate are imaged, configured to detect each of the charged particle beams as an electrical signal, and a comparing unit configured to compare reference image data and image data that is reproduced based on the detected electrical signals and that represents patterns formed on the inspection target substrate to inspect the patterns. The detector includes a plurality of detecting elements corresponding one-to-one to the charged particle beams. The detecting elements each have a size greater than a size that covers a beam blur of each charged particle beam imaged on the detector.

公开(公告)号：US20150255249A1

公开(公告)日：2015-09-10

申请号：US14638786

申请日：2015-03-04

Applicant: NuFlare Technology, Inc.

Inventor： Munehiro OGASAWARA

IPC: H01J37/317 ,  H01J37/04 ,  H01J37/30

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/3007 ,  H01J2237/043 ,  H01J2237/0492 ,  H01J2237/12

Abstract: A multi charged particle beam writing apparatus includes an aperture member to form multiple beams, a blanking plate in which there are arranged a plurality of blankers to respectively perform blanking deflection for a corresponding beam in the multiple beams having passed through a plurality of openings of the aperture member, a blanking aperture member to block each beam having been deflected to be in OFF state by at least one of the plurality of blankers, a first grating lens, using the aperture member as gratings, to correct spherical aberration of the charged particle beam, and a correction lens configured to correct high order spherical aberration produced by the first grating lens.

Abstract translation: 多带电粒子束写入装置包括形成多个光束的孔径构件，其中布置有多个遮挡件，以分别对通过多个光束的多个光束的多个光束中的相应光束执行消隐偏转 孔径构件，用于阻挡已经被多个遮挡件中的至少一个偏转到处于关闭状态的每个光束的消隐孔径构件，使用孔径构件作为光栅的第一光栅透镜，以校正带电粒子束的球面像差 以及配置为校正由第一光栅透镜产生的高阶球面像差的校正透镜。

公开(公告)号：US20150064934A1

公开(公告)日：2015-03-05

申请号：US14528652

申请日：2014-10-30

Applicant: NuFlare Technology, Inc.

Inventor： Ryoichi YOSHIKAWA ,  Munehiro OGASAWARA

IPC: H01L21/263 ,  H01L21/308

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/31764 ,  H01J2237/31766 ,  H01L21/263 ,  H01L21/2633 ,  H01L21/3085

Abstract: In accordance with one aspect of this invention, a multi charged particle beam writing apparatus includes an aperture member, in which a plurality of openings are formed, configured to form multi-beams by making portions of the charged particle beam pass through the plurality of openings; a plurality of blankers configured to perform blanking-deflect regarding beams corresponding to the multi-beams; a writing processing control unit configured to control writing processing with a plurality of beams having passed through different openings among the plurality of openings being irradiated on the target object at a predetermined control grid interval; and a dose controlling unit configured to variably control a dose of a beam associated with deviation according to a deviation amount when an interval between the plurality of beams irradiated is deviated from the control grid interval.

Abstract translation: 根据本发明的一个方面，一种多带电粒子束写入装置，包括：孔部件，其中形成有多个开口，构成为通过使带电粒子束的部分通过多个开口而形成多光束; ; 多个阻挡器，被配置为对与所述多光束对应的光束执行消隐偏转; 写入处理控制单元，被配置为以预定的控制网格间隔以多个已经穿过所述多个开口中的不同开口的光束来对所述目标物体照射的所述写入处理进行控制; 以及剂量控制单元，被配置为当所述多个照射的光束之间的间隔偏离所述控制网格间隔时，根据偏差量可变地控制与偏差相关联的光束的剂量。

公开(公告)号：US20230335368A1

公开(公告)日：2023-10-19

申请号：US18170142

申请日：2023-02-16

Applicant: NuFlare Technology, Inc.

Inventor： Munehiro OGASAWARA ,  Atsushi ANDO ,  Kazuhiko INOUE

IPC: H01J37/141 ,  H01J37/147 ,  H01J37/065

CPC classification number: H01J37/141 ,  H01J37/1475 ,  H01J37/065

Abstract: An electromagnetic lens includes a coil, and a pole piece configured to include an upper wall, a lower wall, an outer peripheral wall and an inner peripheral wall which are formed using a conductive magnetic material, to surround the coil by the upper wall, the lower wall, the outer peripheral wall and the inner peripheral wall, one of opposite facing surfaces of an upper part and a lower part of the inner peripheral wall and opposite facing surfaces of the upper wall and the inner peripheral wall being insulated electrically, the outer peripheral wall including a laminated structure where a magnetic material and an insulator are alternately laminated in a direction of a central axis of a trajectory of a passing electron beam, and to be covered at least the laminated structure of the outer peripheral wall with an insulator.

公开(公告)号：US20200013585A1

公开(公告)日：2020-01-09

申请号：US16502706

申请日：2019-07-03

Applicant: NuFlare Technology, Inc. ,  NuFlare Technology America, Inc.

Inventor： Kazuhiko INOUE ,  Munehiro OGASAWARA ,  Steven GOLLADAY

IPC: H01J37/317 ,  H01J37/30 ,  H01J37/145 ,  H01J37/304

Abstract: A multiple-electron-beam irradiation apparatus includes a first electrostatic lens, configured using the substrate used as a bias electrode by being applied with a negative potential, a control electrode to which a control potential is applied and a ground electrode to which a ground potential is applied, configured to provide dynamic focusing of the multiple electron beams onto the substrate, in accordance with change of the height position of the surface of the substrate, by generating an electrostatic field, wherein the control electrode is disposed on an upstream side of a maximum magnetic field of the lens magnetic field of the first electromagnetic lens with respect to a direction of a trajectory central axis of the multiple electron beams, and a ground electrode is disposed on an upstream side of the control electrode with respect to the direction of the trajectory central axis.

公开(公告)号：US20180130632A1

公开(公告)日：2018-05-10

申请号：US15797588

申请日：2017-10-30

Applicant: NuFlare Technology, Inc.

Inventor： Munehiro OGASAWARA ,  Hirofumi MORITA

IPC: H01J37/09 ,  H01J37/317 ,  H01J37/20 ,  H01J37/244

CPC classification number: H01J37/09 ,  H01J37/20 ,  H01J37/244 ,  H01J37/3174

Abstract: A multi-beam optical system adjustment method includes forming multi-beams by making a region including the whole of a plurality of openings in a shaping aperture array substrate irradiated by a charged particle beam, and making portions of the charged particle beam individually pass through a corresponding one of the plurality of openings, measuring a distortion of the multi-beams while variably changing the crossover height position of the multi-beams, measuring the crossover height position of the multi-beams where the distortion of the multi-beams is smaller than the others, and adjusting the height position of a limiting aperture substrate which limits passage of a beam deviated from the trajectory in the multi-beams to the crossover height position.

公开(公告)号：US20160042908A1

公开(公告)日：2016-02-11

申请号：US14885726

申请日：2015-10-16

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi MATSUMOTO ,  Tomohiro IIJIMA ,  Munehiro OGASAWARA ,  Hideo INOUE ,  Ryoichi YOSHIKAWA

IPC: H01J37/04

CPC classification number: H01J37/045 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0432 ,  H01J2237/0435 ,  H01J2237/31771 ,  H01J2237/31774

Abstract: A multi charged particle beam writing method includes performing ON/OFF switching of a beam by an individual blanking system for the beam concerned, for each beam in multi-beams of charged particle beam, with respect to each time irradiation of irradiation of a plurality of times, by using a plurality of individual blanking systems that respectively perform beam ON/OFF control of a corresponding beam in the multi-beams, and performing blanking control, in addition to the performing ON/OFF switching of the beam for the each beam by the individual blanking system, with respect to the each time irradiation of the irradiation of the plurality of times, so that the beam is in an ON state during an irradiation time corresponding to irradiation concerned, by using a common blanking system that collectively performs beam ON/OFF control for a whole of the multi-beams.

Abstract translation: 多带电粒子束写入方法包括：对于多束带电粒子束中的每个束，针对相关束的单个消隐系统，对于多个照射束的每次照射，执行光束的ON / OFF切换 次，通过使用多个单独的消隐系统，分别执行多光束中相应光束的光束ON / OFF控制，以及执行消隐控制，除了通过对每个光束的光束进行ON / OFF切换 单个消隐系统相对于每次照射多次照射，使得在对应于照射的照射时间期间光束处于ON状态，通过使用共同执行光束ON的公共消隐系统 / OFF控制整个多光束。

公开(公告)号：US20130082187A1

公开(公告)日：2013-04-04

申请号：US13633468

申请日：2012-10-02

Applicant: NuFlare Technology, Inc.

Inventor： Munehiro OGASAWARA

IPC: G21K5/04

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3007 ,  H01J2237/0213 ,  H01J2237/0435 ,  H01J2237/045

Abstract: A multi charged particle beam writing apparatus according to one aspect of the present invention includes a first aperture member to form multiple beams, a blanker array provided with a plurality of blankers which respectively perform blanking deflection of a corresponding beam in the multiple beams, a first electromagnetic lens and a second electromagnetic lens arranged between the first aperture member and the blanker array, a second aperture member arranged between the first electromagnetic lens and the second electromagnetic lens and at a position of a convergence point of the multiple beams and configured to restrict passage of charged particles deviated from the convergence point, and a third aperture member to block each beam which was deflected to be in a beam off state by the plurality of blankers.

Abstract translation: 根据本发明的一个方面的多带电粒子束写入装置包括形成多个光束的第一孔径构件，设置有分别对多个光束中的对应光束进行消隐偏转的多个消隐器的消隐器阵列，第一 电磁透镜和布置在所述第一孔径构件和所述遮蔽器阵列之间的第二电磁透镜，布置在所述第一电磁透镜和所述第二电磁透镜之间并且在所述多个光束的会聚点的位置处的第二孔径构件， 的带电粒子偏离会聚点，以及第三孔径构件，用于阻挡被多个阻挡器偏转成束束状态的每个束。