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公开(公告)号：US20230392251A1
公开(公告)日：2023-12-07
申请号：US18120675
申请日：2023-03-13
Applicant: Raytheon Technologies Corporation
Inventor： Kaylan M. Wessels , Brian T. Hazel , Michael J. Maloney , David A. Litton , Elisa M. Zaleski
CPC classification number: C23C14/30 , C23C14/564 , C23C14/083
Abstract: In accordance with the present disclosure, there is provided a process for limiting a critical stabilizer content in coatings comprising placing a source coating material in a crucible of a vapor deposition apparatus having a coating chamber, the source coating material having compositional range of LnO1.5 comprising a single cation mol % of 30-50% relative to zirconia (ZrO2), where Ln=La, Pr, Nd, Sm, Eu, Gd, and Tb and combinations thereof; energizing the source coating material with an electron beam that delivers a power density to the material in the crucible forming a vapor cloud from the source coating material; and depositing the source coating material as a coating system onto a surface of a work piece.
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公开(公告)号：US11802339B2
公开(公告)日：2023-10-31
申请号：US17145869
申请日：2021-01-11
Applicant: Raytheon Technologies Corporation
Inventor： James W. Neal , David A. Litton , Brian T. Hazel , Michael J. Maloney , Eric M. Jorzik
IPC: C23C14/22 , C23C16/46 , C23C16/455 , C23C16/458 , C23C14/50 , C23C14/56 , C23C14/08 , C23C14/30 , C23C14/02 , C23C14/58
CPC classification number: C23C16/463 , C23C14/083 , C23C14/22 , C23C14/50 , C23C14/505 , C23C14/56 , C23C14/566 , C23C16/455 , C23C16/458 , C23C16/46 , C23C14/02 , C23C14/30 , C23C14/58
Abstract: A deposition apparatus comprises: an infeed chamber; a preheat chamber; a deposition chamber; and optionally at least one of a cooldown chamber and an outlet chamber. At least a first of the preheat chamber and the cooldown chamber contains a buffer system for buffering workpieces respectively passing to or from the deposition chamber.
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Patent Agency Ranking
公开(公告)号：US20220316048A1
公开(公告)日：2022-10-06
申请号：US17844199
申请日：2022-06-20
Applicant: Raytheon Technologies Corporation
Inventor： Brian T. Hazel , Michael J. Maloney , James W. Neal , David A. Litton
Abstract: A deposition apparatus (20) comprising: a chamber (22); a process gas source (62) coupled to the chamber; a vacuum pump (52) coupled to the chamber; at least two electron guns (26); one or more power supplies (30) coupled to the electron guns;
a plurality of crucibles (32,33,34) positioned or positionable in an operative position within a field of view of at least one said electron gun; and a part holder (170) having at least one operative position for holding parts spaced above the crucibles by a standoff height H. The standoff height H is adjustable in a range including at least 22 inches.-
公开(公告)号：US20210130959A1
公开(公告)日：2021-05-06
申请号：US17145869
申请日：2021-01-11
Applicant: Raytheon Technologies Corporation
Inventor： James W. Neal , David A. Litton , Brian T. Hazel , Michael J. Maloney , Eric M. Jorzik
IPC: C23C16/46 , C23C14/22 , C23C16/455 , C23C16/458 , C23C14/50 , C23C14/56
Abstract: A deposition apparatus comprises: an infeed chamber; a preheat chamber; a deposition chamber; and optionally at least one of a cooldown chamber and an outlet chamber. At least a first of the preheat chamber and the cooldown chamber contains a buffer system for buffering workpieces respectively passing to or from the deposition chamber.
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公开(公告)号：US20210324506A1
公开(公告)日：2021-10-21
申请号：US17359855
申请日：2021-06-28
Applicant: RAYTHEON TECHNOLOGIES CORPORATION
Inventor： Christopher W. Strock, III , Michael J. Maloney , David A. Litton , Benjamin Joseph Zimmerman , Brian T. Hazel
Abstract: A component for a gas turbine engine according to an exemplary embodiment of the present disclosure can include a substrate, a thermal barrier coating deposited on at least a portion of the substrate, and an outer layer deposited on at least a portion of the thermal barrier coating. The outer layer can include a material that is reactive with an environmental contaminant that comes into contact with the outer layer to alter a microstructure of the outer layer.
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公开(公告)号：US20210040854A1
公开(公告)日：2021-02-11
申请号：US17077459
申请日：2020-10-22
Applicant: Raytheon Technologies Corporation
Inventor： Brian T. Hazel , Kevin W. Schlichting , Michael J. Maloney
Abstract: Disclosed herein is a method comprising mixing a carrier liquid with particles and/or with a particle precursor to form a suspension or solution respectively; where the particles comprise a metal oxide; and where the particle precursor comprises a metal salt; injecting the suspension or solution through a plasma flame; and depositing the particles and/or the particle precursor onto a substrate to form an first abradable coating; where the first abradable coating comprises a plurality of cracks or voids that are substantially perpendicular to the substrate surface, where the substrate is a hub surface of a gas turbine engine or where the substrate is a cantilever stator.
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公开(公告)号：US11725269B2
公开(公告)日：2023-08-15
申请号：US17844199
申请日：2022-06-20
Applicant: Raytheon Technologies Corporation
Inventor： Brian T. Hazel , Michael J. Maloney , James W. Neal , David A. Litton
CPC classification number: C23C14/30 , C23C14/228 , C23C14/243 , C23C14/246 , C23C14/505
Abstract: A deposition apparatus (20) comprising: a chamber (22); a process gas source (62) coupled to the chamber; a vacuum pump (52) coupled to the chamber; at least two electron guns (26); one or more power supplies (30) coupled to the electron guns; a plurality of crucibles (32,33,34) positioned or positionable in an operative position within a field of view of at least one said electron gun; and a part holder (170) having at least one operative position for holding parts spaced above the crucibles by a standoff height H. The standoff height H is adjustable in a range including at least 22 inches.
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