SENSOR
    1.
    发明公开
    SENSOR 审中-公开

    公开(公告)号:US20240361195A1

    公开(公告)日:2024-10-31

    申请号:US18642297

    申请日:2024-04-22

    申请人: ROHM CO., LTD.

    发明人: Masahiro SAKURAGI

    IPC分类号: G01L9/00

    摘要: A sensor includes a substrate. A cavity is formed in the substrate. The substrate includes a membrane spaced from and facing a bottom surface of the cavity. A plurality of protruding portions are formed on one of the bottom surface of the cavity and an inner surface of the membrane.

    MEMS SENSOR
    2.
    发明公开
    MEMS SENSOR 审中-公开

    公开(公告)号:US20240183734A1

    公开(公告)日:2024-06-06

    申请号:US18525746

    申请日:2023-11-30

    申请人: ROHM CO., LTD.

    发明人: Masahiro SAKURAGI

    摘要: The present disclosure provides a MEMS sensor. The MEMS sensor includes: a substrate, on which a first sensor region for an acceleration sensor is formed; a first cavity, formed in the first sensor region of the substrate; a first weight portion, including a first membrane formed on the first cavity; a beam portion, supporting the first weight portion; and a piezoresistor, formed in the beam portion. A first opposing surface of the first weight portion facing the first cavity and a second opposing surface of the beam portion facing the first cavity are formed on same plane.

    MEMS SENSOR
    3.
    发明申请

    公开(公告)号:US20210039946A1

    公开(公告)日:2021-02-11

    申请号:US16984999

    申请日:2020-08-04

    申请人: ROHM CO., LTD.

    发明人: Masahiro SAKURAGI

    IPC分类号: B81B3/00 G01L9/00

    摘要: A MEMS sensor includes a silicon substrate that has a first surface and a second surface on a side opposite to the first surface and that has a cavity in the first surface, a silicon diaphragm that has a first surface and a second surface on aside opposite to the first surface and in which the second surface is joined directly to the first surface of the silicon substrate, and a piezoresistance formed at the first surface of the silicon diaphragm, and, in the MEMS sensor, a plane orientation of the first surface of the silicon substrate and a plane orientation of the first surface of the silicon diaphragm differ from each other.

    SENSOR
    5.
    发明公开
    SENSOR 审中-公开

    公开(公告)号:US20240361196A1

    公开(公告)日:2024-10-31

    申请号:US18635919

    申请日:2024-04-15

    申请人: ROHM CO., LTD.

    发明人: Masahiro SAKURAGI

    IPC分类号: G01L9/00

    CPC分类号: G01L9/0051

    摘要: A sensor includes a substrate. A cavity is formed in the substrate. The substrate includes a membrane spaced from and facing a bottom surface of the cavity. A first depressed portion is formed in a central portion of the cavity as seen in a plan view.

    MEMS SENSOR AND MANUFACTURING METHOD THEREOF

    公开(公告)号:US20240183732A1

    公开(公告)日:2024-06-06

    申请号:US18525773

    申请日:2023-11-30

    申请人: ROHM CO., LTD.

    发明人: Masahiro SAKURAGI

    IPC分类号: G01L9/00

    CPC分类号: G01L9/0072

    摘要: The present disclosure provides a MEMS sensor. The MEMS sensor includes: a semiconductor substrate having a first surface and a second surface opposite to the first surface, and including a cavity; a membrane on the first surface to seal the cavity; a first region of a first conductivity type formed at a bottom of the cavity; and a second region of a second conductivity type formed on the membrane, facing the first region and separated from the first region by the cavity.

    ELECTRONIC PART
    7.
    发明申请
    ELECTRONIC PART 审中-公开

    公开(公告)号:US20170284881A1

    公开(公告)日:2017-10-05

    申请号:US15428244

    申请日:2017-02-09

    申请人: ROHM CO., LTD.

    发明人: Masahiro SAKURAGI

    IPC分类号: G01L9/00 H05K1/18 H05K1/11

    摘要: An electronic part (air pressure detecting device) 1 includes a sensor element (air pressure sensor element) 2 that includes an ambient air contacting surface S including an ambient air contacting region Sa to be exposed to ambient air, and a supporting substrate 4, arranged to support the sensor element 2. The sensor element 2 is bonded to one surface 4a of the supporting substrate 4 in a state where its ambient air contacting surface S faces the one surface 4a of the supporting substrate 4 and a gap, through which the ambient air flows, is formed between the ambient air contacting surface S and the one surface 4a of the supporting substrate 4.