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公开(公告)号：US06622334B1
公开(公告)日：2003-09-23
申请号：US09537206
申请日：2000-03-29
IPC分类号： B01B1102
CPC分类号： H01L21/02052 , B08B1/04 , B24B9/065 , H01L21/67046
摘要： An improvement is disclosed in a brush cleaning apparatus for cleaning a major surface of a wafer and including wafer guide wheels for transporting the wafer. The improvement includes a polish pad material disposed on a circumference of the guide wheels. The polish pad material is a material used in chemical-mechanical polishing of the wafer. The polish pad material contacts an edge portion of the wafer during cleaning thereof, thereby removing contaminants from the edge portion of the wafer, so that edge cleaning is performed in situ in addition to the brush cleaning of the major surface of the wafer.
摘要翻译： 在用于清洁晶片的主表面并且包括用于输送晶片的晶片导向轮的刷清洁装置中公开了一种改进。 该改进包括设置在导轮的圆周上的抛光垫材料。 抛光垫材料是用于晶片化学机械抛光的材料。 抛光垫材料在其清洁期间接触晶片的边缘部分，从而从晶片的边缘部分去除污染物，使得边缘清洁除了对晶片的主表面的刷清洁之外进行。
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2.发明授权公开(公告)号：US06227948B1
公开(公告)日：2001-05-08
申请号：US09532170
申请日：2000-03-21
IPC分类号： B24B100
CPC分类号： B24B53/017 , B24D9/08
摘要： A method of reconditioning a polishing pad using a chemical-mechanical polishing apparatus is disclosed, wherein the polishing pad contacts a workpiece in the presence of a slurry to perform chemical-mechanical polishing on the workpiece. The method comprises contacting the polishing pad with a reconditioning pad. The reconditioning pad is made of a polishing pad material similar to that of the polishing pad.
摘要翻译： 公开了一种使用化学机械抛光装置来修复抛光垫的方法，其中抛光垫在浆料存在下接触工件以在工件上进行化学机械抛光。 该方法包括使抛光垫与修复垫接触。 再生垫由与抛光垫类似的抛光垫材料制成。
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公开(公告)号：US06217422B1
公开(公告)日：2001-04-17
申请号：US09233886
申请日：1999-01-20
IPC分类号： B24B100
CPC分类号： B24B53/017 , B24B37/04
摘要： A method and apparatus for cleaning polishing debris from the surface of a polishing pad by wetting the surface with a liquid and irradiating the wetted surface with a beam of light. The light beam has sufficient intensity at the polishing surface of the pad to vaporize at least a portion of the liquid such that the vaporized liquid causes at least a portion of the debris to be expelled from the polishing surface of the pad.
摘要翻译： 一种用于通过用液体润湿表面并用光束照射润湿表面来从抛光垫的表面清洁抛光碎屑的方法和装置。 光束在衬垫的抛光表面具有足够的强度以使至少一部分液体蒸发，使得蒸发的液体使至少一部分碎屑从衬垫的抛光表面排出。
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公开(公告)号：US06837777B2
公开(公告)日：2005-01-04
申请号：US10610098
申请日：2003-06-30
CPC分类号： H01L21/02052 , B08B1/04 , B24B9/065 , H01L21/67046
摘要： An improvement is disclosed in a brush cleaning apparatus for cleaning a major surface of a wafer and including wafer guide wheels for transporting the wafer. The improvement includes a polish pad material disposed on a circumference of the guide wheels. The polish pad material is a material used in chemical-mechanical polishing of the wafer. The polish pad material contacts an edge portion of the wafer during cleaning thereof, thereby removing contaminants from the edge portion of the wafer, so that edge cleaning is performed in situ in addition to the brush cleaning of the major surface of the wafer.
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5.发明授权Apparatus and method for front side chemical mechanical planarization (CMP) of semiconductor workpieces 有权半导体工件的前侧化学机械平面化（CMP）的装置和方法公开(公告)号：US06620029B2
公开(公告)日：2003-09-16
申请号：US10059775
申请日：2002-01-30
IPC分类号： B24B100
摘要： An apparatus for performing semiconductor planarizing operations is disclosed. In an exemplary embodiment, the apparatus includes a carrier assembly for maintaining a workpiece therein in a face up orientation. A roller assembly includes a first cylindrical roller and a cylindrical second roller, the first and second rollers being linked to one another through a pair of arms. Each of the first and second rollers may be independently positioned with respect to a horizontal plane, the horizontal plane being substantially parallel to a top surface of the workpiece.
摘要翻译： 公开了一种用于执行半导体平面化操作的装置。 在示例性实施例中，该装置包括用于以面朝上的方向将工件保持在其中的托架组件。 辊组件包括第一圆柱形辊和圆柱形第二辊，第一和第二辊通过一对臂相互连接。 第一和第二辊中的每一个可以相对于水平面独立地定位，水平面基本上平行于工件的顶表面。
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6.发明授权Real-time method for profiling and conditioning chemical-mechanical polishing pads 失效化学机械抛光垫成型和调理的实时方法公开(公告)号：US06343974B1
公开(公告)日：2002-02-05
申请号：US09603684
申请日：2000-06-26
IPC分类号： B24B4900
CPC分类号： B24B53/017 , B24B49/10 , B24B53/12
摘要： A conditioning tool including a rotary conditioning pad; a lower shaft attached to the conditioning pad; an upper shaft having an upper end and a lower end, the lower end attached to the lower shaft via a flexible coupling; and a motor attached to the upper end of the upper shaft and adapted to rotate the shaft. The tool further includes a mechanism for measuring an angle of the conditioning pad relative to a reference plane. The conditioning tool may further include a conditioning arm, various control mechanisms, and a controller for receiving feedback from the angle measuring mechanism and the various control mechanisms and for controlling the various control mechanisms in response to the feedback. A chemical-mechanical polishing apparatus and a conditioning method for providing a uniform polishing surface of a chemical-mechanical polishing pad are also disclosed.
摘要翻译： 一种调节工具，包括旋转调节垫; 连接到调节垫的下轴; 具有上端和下端的上轴，所述下端通过柔性连接件附接到所述下轴; 以及安装在上轴的上端并适于旋转轴的马达。 该工具还包括用于测量调节垫相对于参考平面的角度的机构。 调节工具还可以包括调节臂，各种控制机构和用于从角度测量机构和各种控制机构接收反馈的控制器，并且用于响应于反馈来控制各种控制机构。 还公开了一种化学机械抛光装置和用于提供化学机械抛光垫的均匀抛光表面的调节方法。
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7.发明授权公开(公告)号：US07591624B2
公开(公告)日：2009-09-22
申请号：US11306708
申请日：2006-01-09
IPC分类号： H01L21/677
CPC分类号： H01L21/67769 , H01L21/67276 , H01L21/67359 , H01L21/67379 , H01L21/68707 , Y10S414/14
摘要： A combination of a FOUP (front opening unified pod) system and a reticle system utilized for the transport of wafers and a reticle system, the latter of which are used for transporting reticles from a first fabrication site to a further site at another location, and which provides for a unified system enabling the automated and trackable delivery of the reticles between these sites. Provided is a modified FOUP base structure, which is adapted to retain a reticle and to be able to employ existing equipment in a fabrication site which only necessitates a minimal modification of the equipment in order to render the latter universally adaptable to the combination of the systems.
摘要翻译： FOUP（前开口统一舱）系统和用于运输晶片的掩模版系统和掩模版系统的组合，后者用于将掩模版从第一制造位置传送到另一位置的另一位置，以及 其提供统一的系统，使得能够在这些站点之间自动和可跟踪地传送标线。 提供了一种改进的FOUP基础结构，其适于保持掩模版并且能够在制造场地中使用现有设备，其仅需要对设备进行最小的修改，以使后者普遍适用于系统的组合 。
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公开(公告)号：US20090025598A1
公开(公告)日：2009-01-29
申请号：US11828657
申请日：2007-07-26
IPC分类号： B61B3/00
CPC分类号： B61B3/02 , B66F11/04 , H01L21/67733
摘要： A overhead transport service vehicle system includes a carriage frame structured and arranged to carry a user. A hoisting mechanism utilizes at least one lifting device for lifting and lowering the carriage frame and at least one moving device for causing movement of the hoisting mechanism along one of a track or rail. A control controls at least one of the at least one lifting device and the at least one moving device.
摘要翻译： 架空运输服务车辆系统包括构造和布置为承载用户的托架框架。 提升机构使用至少一个提升装置来提升和降低托架框架和至少一个运动装置，用于使提升机构沿轨道或轨道中的一个移动。 控制器控制至少一个提升装置和至少一个移动装置中的至少一个。
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公开(公告)号：US07287740B2
公开(公告)日：2007-10-30
申请号：US11163835
申请日：2005-11-01
申请人： Ray A. Reyes , David L. Schmoke , Uldis A. Ziemins
发明人： Ray A. Reyes , David L. Schmoke , Uldis A. Ziemins
IPC分类号： B66D1/26
CPC分类号： B66C13/06
摘要： A cable attachment assembly, a hoist and a transportation system using the cable attachment assembly. The cable attachment assembly including: a plate pivotable about a first axis; first and second pivot assemblies pivotable about respective second and third axes, the first, second and third axes parallel to each other; a first cable retainer in the first pivot assembly, the first cable retainer adapted to rotateably retain an end of a first cable in the first cable pivot assembly, the first cable rotatable about a fourth axis; a second cable retainer in the second pivot assembly, the second cable retainer adapted to rotateably retain an end of a second cable in the second pivot assembly, the second cable rotatable about a fifth axis; wherein the fourth and fifth axes parallel to each other and the fourth and fifth axes are perpendicular to the first, second and third axis.
摘要翻译： 电缆连接组件，起重机和使用电缆连接组件的运输系统。 所述电缆连接组件包括：可围绕第一轴线枢转的板; 第一枢转组件和第二枢轴组件可围绕相应的第二和第三轴线枢转，第一，第二和第三轴线彼此平行; 所述第一电缆保持器在所述第一枢转组件中，所述第一电缆保持器适于将第一电缆的端部可旋转地保持在所述第一电缆枢轴组件中，所述第一电缆可围绕第四轴线旋转; 在第二枢转组件中的第二电缆保持器，第二电缆保持器适于将第二电缆的端部可旋转地保持在第二枢转组件中，第二电缆可围绕第五轴线旋转; 其中第四和第五轴彼此平行，第四和第五轴垂直于第一轴，第二轴和第三轴。
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公开(公告)号：US07854202B2
公开(公告)日：2010-12-21
申请号：US11828657
申请日：2007-07-26
IPC分类号： B61B3/00
CPC分类号： B61B3/02 , B66F11/04 , H01L21/67733
摘要： A overhead transport service vehicle system includes a carriage frame structured and arranged to carry a user. A hoisting mechanism utilizes at least one lifting device for lifting and lowering the carriage frame and at least one moving device for causing movement of the hoisting mechanism along one of a track or rail. A control controls at least one of the at least one lifting device and the at least one moving device.
摘要翻译： 架空运输服务车辆系统包括构造和布置为承载用户的托架框架。 提升机构使用至少一个提升装置来提升和降低托架框架和至少一个运动装置，用于使提升机构沿轨道或轨道中的一个移动。 控制器控制至少一个提升装置和至少一个移动装置中的至少一个。
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