公开(公告)号：US20200299236A1

公开(公告)日：2020-09-24

申请号：US16899633

申请日：2020-06-12

申请人： Rohm and Haas Electronic Materials Korea Ltd

发明人： Seok-Bong Park ,  Gyung-Sik Choi ,  Yeonok Kim

IPC分类号： C07D209/82 ,  C07D251/12 ,  C07D317/10 ,  C07D405/12 ,  G03F7/105 ,  G03F7/029 ,  G03F7/031 ,  G03F7/038 ,  G03F7/00 ,  C07D251/24

摘要： Disclosed herein is a colored photosensitive resin composition including a copolymer, an epoxy resin compound or a compound derived therefrom, a polymerizable compound, a photoinitiator, and a colorant, wherein the photoinitiator includes an oxime compound and a triazine compound. The composition, when formed into a cured film, may facilitate the fabrication of necessary height difference and satisfy the requirements of sensitivity and an exposure margin for light shielding spacers, and, thus, is useful as a material for manufacturing a light shielding spacer such as a black column spacer used in various electronic parts including the panels of an LCD and an OLED display.

公开(公告)号：US10859907B2

公开(公告)日：2020-12-08

申请号：US15774426

申请日：2016-09-28

申请人： Rohm and Haas Electronic Materials Korea Ltd.

发明人： Yeonok Kim ,  Seok-Bong Park ,  Gyung-Sik Choi ,  Su Min Lee

IPC分类号： G03F1/50 ,  G02F1/1339

摘要： The present invention relates to a method for preparing a column spacer, and is characterized in using a mask including first, second, and third patterns having different light transmittance. In addition, according to the method for preparing a column spacer of the present invention, a taper angle between a matrix part and a spacer part may increase during manufacturing a column spacer in which the matrix part and the spacer part are continuously connected, and critical dimension of the spacer part may decrease. Therefore, a column spacer with fine patterns may be simply and efficiently manufactured.

公开(公告)号：US20180305313A1

公开(公告)日：2018-10-25

申请号：US15769875

申请日：2016-09-23

申请人： Rohm and Haas Electronic Materials Korea Ltd.

发明人： Seok-Bong Park ,  Gyung-Sik Choi ,  Yeonok Kim

IPC分类号： C07D209/82 ,  C07D251/12 ,  C07D317/10 ,  C07D405/12 ,  G03F7/00 ,  G03F7/029 ,  G03F7/031 ,  G03F7/038 ,  G03F7/105

CPC分类号： C07D209/82 ,  C07D251/12 ,  C07D317/10 ,  C07D405/12 ,  G03F7/0007 ,  G03F7/029 ,  G03F7/031 ,  G03F7/0388 ,  G03F7/105

摘要： Disclosed herein is a colored photosensitive resin composition including a copolymer, an epoxy resin compound or a compound derived therefrom, a polymerizable compound, a photoinitiator, and a colorant, wherein the photoinitiator includes an oxime compound and a triazine compound. The composition, when formed into a cured film, may facilitate the fabrication of necessary height difference and satisfy the requirements of sensitivity and an exposure margin for light shielding spacers, and, thus, is useful as a material for manufacturing a light shielding spacer such as a black column spacer used in various electronic parts including the panels of an LCD and an OLED display.

公开(公告)号：US10656520B2

公开(公告)日：2020-05-19

申请号：US15775441

申请日：2016-09-30

申请人： Rohm and Haas Electronic Materials Korea Ltd.

发明人： Hyung-Tak Jeon ,  Seok-Bong Park ,  Gyung-Sik Choi

IPC分类号： G03F7/027 ,  G03F7/033 ,  H01B3/44 ,  G02F1/137 ,  C08L63/00 ,  C08L33/04 ,  C08F265/06 ,  C08F222/10 ,  C09D151/00 ,  C08F265/10 ,  C09D133/06 ,  C08F220/32 ,  C08F222/40 ,  C08F220/06 ,  C08F212/08 ,  G02F1/1339

摘要： Disclosed herein are a photosensitive resin composition and a cured film prepared therefrom. By comprising a copolymer (A) and a photopolymerizable compound (B) in specific amounts, a photosensitive resin composition may form a cured film having pattern developability with high resolution and good elasticity recovery rate. The composition may be effectively used for the formation of a cured film, particularly a spacer of a display device such as a liquid crystal display and an organic electroluminescence device.

公开(公告)号：US20180373144A1

公开(公告)日：2018-12-27

申请号：US15775441

申请日：2016-09-30

申请人： Rohm and Haas Electronic Materials Korea Ltd.

发明人： Hyung-Tak Jeon ,  Seok-Bong Park ,  Gyung-Sik Choi

IPC分类号： G03F7/027 ,  G02F1/137 ,  C08L63/00 ,  C08L33/04 ,  C08F222/10 ,  C08F265/06

摘要： Disclosed herein are a photosensitive resin composition and a cured film prepared therefrom. By comprising a copolymer (A) and a photopolymerizable compound (B) in specific amounts, a photosensitive resin composition may form a cured film having pattern developability with high resolution and good elasticity recovery rate. The composition may be effectively used for the formation of a cured film, particularly a spacer of a display device such as a liquid crystal display and an organic electroluminescence device.

公开(公告)号：US20180321535A1

公开(公告)日：2018-11-08

申请号：US15774426

申请日：2016-09-28

申请人： Rohm and Haas Electronic Materials Korea Ltd.

发明人： Yeonok Kim ,  Seok-Bong Park ,  Gyung-Sik Choi ,  Su Min Lee

IPC分类号： G02F1/1339 ,  G02F1/13 ,  B05D1/32

CPC分类号： G02F1/13394 ,  B05D1/32 ,  G02F1/1303 ,  G02F2001/13398

摘要： The present invention relates to a method for preparing a column spacer, and is characterized in using a mask including first, second, and third patterns having different light transmittance. In addition, according to the method for preparing a column spacer of the present invention, a taper angle between a matrix part and a spacer part may increase during manufacturing a column spacer in which the matrix part and the spacer part are continuously connected, and critical dimension of the spacer part may decrease. Therefore, a column spacer with fine patterns may be simply and efficiently manufactured.