公开(公告)号：US20240162056A1

公开(公告)日：2024-05-16

申请号：US18367564

申请日：2023-09-13

Applicant: SEMES CO., LTD.

Inventor： Sun Wook JUNG ,  Ha Neul YOO ,  Woo Ram LEE ,  Young Jun SON

IPC: H01L21/67 ,  B08B3/02

CPC classification number: H01L21/67051 ,  B08B3/022

Abstract: An apparatus for processing a substrate includes a first bowl and a processing space therein; a first support portion disposed in the processing space and configured to support the substrate in a first support position; a second bowl disposed to move in a first direction in the processing space; a second support portion configured to move upwardly and downwardly with respect to the first support portion to support the substrate between the second support position disposed above the first support position and the third support position, and to move in the first direction; and a cleaning unit including a first cleaning portion disposed below the substrate toward a rear surface of the substrate in the first support position and a second cleaning portion disposed below the substrate and opposing a rear surface of the substrate between the second support position and the third support position.

公开(公告)号：US20230131569A1

公开(公告)日：2023-04-27

申请号：US17967281

申请日：2022-10-17

Applicant: SEMES CO., LTD.

Inventor： Young Jun SON ,  Byoung Doo CHOI ,  Young Un YUN ,  Woo Ram LEE ,  Sung Chul JUNG ,  Woo Sin JUNG ,  Ki Sang EUM

IPC: F04B43/08 ,  B01D35/02

Abstract: An exemplary embodiment of the present invention provided a pump for supplying a liquid. The pump includes: a flexible tube body including a pump chamber; a first flange provided at one end of the tube body; and a second flange provided at the other end of the tube body; and a driving unit for transmitting rotational force to the tube body to twist the tube body, in which the tube body has a bent portion bent at a predetermined angle.

公开(公告)号：US20240186155A1

公开(公告)日：2024-06-06

申请号：US18523893

申请日：2023-11-30

Applicant: SEMES CO., LTD.

Inventor： Ki Sang EUM ,  Dong Woon PARK ,  Young Jun SON ,  Woo Ram LEE ,  Jin Ho CHOI

IPC: H01L21/67 ,  H01L21/687

CPC classification number: H01L21/67051 ,  H01L21/6719 ,  H01L21/67196 ,  H01L21/67253 ,  H01L21/68785

Abstract: Proposed is a substrate processing apparatus for cleaning the bottom surface of a substrate. The apparatus includes a processing container configured to form a processing space for a substrate, a substrate support unit provided inside the processing space and configured to support the substrate, a first nozzle unit configured to have a first nozzle member provided on a side of the substrate support unit inside the processing space and supplying a processing fluid toward a center area of a bottom surface of the substrate, and a second nozzle member provided to be fixedly coupled to the substrate support unit and supplying a processing fluid toward an edge area of the bottom surface of the substrate, wherein the first nozzle member is provided to rotate between a center position and an end position of the bottom surface of the substrate.

公开(公告)号：US20230060309A1

公开(公告)日：2023-03-02

申请号：US17896518

申请日：2022-08-26

Applicant: SEMES CO., LTD.

Inventor： Young Jun SON ,  Byoung Doo CHOI ,  Woo Sin JUNG ,  Sung Chul JUNG ,  Woo Ram LEE ,  Ki Sang EUM ,  Young Un YUN

IPC: F04B43/08 ,  G03F7/16

Abstract: Provided is a pump for supplying a liquid, the pump including: a flexible tube body including a pump chamber; first flange provided at one end of the tube body and including an inlet communicating with the pump chamber; a second flange provided at the other end of the tube body and including an outlet communicating with the pump chamber; and driving unit for transmitting rotational force to the tube body to twist the tube body.

公开(公告)号：US20230072779A1

公开(公告)日：2023-03-09

申请号：US17900761

申请日：2022-08-31

Applicant: SEMES CO., LTD.

Inventor： Young Jun SON ,  Byoung Doo CHOI ,  Sung Chul JUNG ,  Woo Sin JUNG ,  Young Un YUN ,  Woo Ram LEE ,  Ki Sang EUM

IPC: F04B45/06

Abstract: Provided is a pump for supplying a liquid. The pump includes: a tube including a pump chamber communicating with a chemical liquid inlet and a chemical liquid outlet, and configured to discharge a chemical liquid through a change in volume due to contraction and expansion; and a driving unit contracting or expanding the tube in a longitudinal direction, in which the tube includes: a flexible tube body including a pump chamber which has an increased internal volume when is contracted in a longitudinal direction and has a decreased internal volume when is expanded in the longitudinal direction, and which has a jar shape of which a radius is increased from the chemical liquid inlet to a center of the pump chamber, and the radius is decreased from the pump chamber to the chemical liquid outlet; a first flange provided at one end of the tube body and including the chemical liquid inlet; and a second flange provided at the other end of the tube body and including the chemical liquid outlet.

公开(公告)号：US20220403517A1

公开(公告)日：2022-12-22

申请号：US17837241

申请日：2022-06-10

Applicant: SEMES CO., LTD.

Inventor： Ki Sang EUM ,  Woo Ram LEE ,  Jong Wha KANG ,  Dong Woon PARK

IPC: C23C16/455 ,  C23C16/458 ,  C23C16/44 ,  C23C16/46

Abstract: Provided is an apparatus for treating a substrate. The apparatus for treating the substrate includes a chamber having an inner space, a support unit configured to support the substrate in the inner space, a gas supply tube configured to supply a gas onto the substrate supported on the support unit, a gas exhaust tube configured to exhaust the gas from the inner space, and a gas block connected to the gas supply tube and the gas exhaust tube and provided above the chamber.