公开(公告)号：US20240145263A1

公开(公告)日：2024-05-02

申请号：US18099856

申请日：2023-01-20

Applicant: SEMES CO., LTD.

Inventor： Seung Hoon OH ,  Ki Bong KIM ,  Jong Doo LEE ,  Young Hun LEE ,  Mi So PARK ,  Jin Se PARK ,  Yong Sun KO

IPC: H01L21/67

CPC classification number: H01L21/67034

Abstract: According to an aspect of the present disclosure, there is provided a substrate treating apparatus comprising: a vessel part having a substrate treatment region formed therein and including a supply port through which a treating fluid is supplied to the substrate treatment region and an exhaust port through which the treating fluid is exhausted from the substrate treatment region; a fluid supply unit configured to supply the treating fluid to the substrate treatment region; an exhaust unit configured to exhaust the treating fluid from the vessel part. The exhaust unit comprises: a main line connected to the exhaust port; an extension line branched from at least one of first and second nodes of the main line and including at least one of a first orifice or a first check valve to control an exhaust speed; and an auxiliary line branched from a third node of the main line, where an orifice and a check valve are not formed. During a first process time, the treating fluid is discharged through the extension line, and the treating fluid is not discharged through the auxiliary line, and during a second process time, the treating fluid is discharged through the auxiliary line.

公开(公告)号：US20240142171A1

公开(公告)日：2024-05-02

申请号：US18099388

申请日：2023-01-20

Applicant: SEMES CO., LTD.

Inventor： Seung Hoon OH ,  Ji Hyeong LEE ,  Jin Se PARK ,  Yong Joon IM ,  Young Hun LEE ,  Yong Sun KO

IPC: F26B5/00 ,  F26B21/10 ,  F26B25/00 ,  F26B25/16 ,  G03F7/16

CPC classification number: F26B5/005 ,  F26B21/10 ,  F26B25/003 ,  F26B25/16 ,  G03F7/168

Abstract: A substrate treating apparatus of the present disclosure comprises: a chamber member having an accommodation space configured to accommodate a vessel part where a substrate treatment region constituting a supercritical treatment space are formed, and an opening configured to move the substrate inside or outside; a shutter configured to open or close the chamber member; and a first exhaust part configured to discharge an internal air from the accommodation space to the outside, wherein the temperature of the substrate treatment region is increased.

公开(公告)号：US20230147919A1

公开(公告)日：2023-05-11

申请号：US17980995

申请日：2022-11-04

Applicant: SEMES CO., LTD.

Inventor： Gui Su PARK ,  Jun Young CHOI ,  Young Jin JANG ,  Yong Sun KO ,  Kyu Hwan CHANG ,  Jun Hyun LIM

IPC: H01L21/677 ,  H01L21/687 ,  B08B3/08 ,  B08B13/00 ,  G03F7/20 ,  F26B5/00

CPC classification number: H01L21/67718 ,  H01L21/68707 ,  B08B3/08 ,  B08B13/00 ,  G03F7/2043 ,  F26B5/005 ,  B25J11/0095

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a first process treating unit configured to treat a substrate in a single-type method; a second process treating unit configured to treat a substrate in a batch-type method; and a posture changing unit provided between the first process treating unit and the second process treating unit and configured to change a posture of the substrate between a vertical posture and a horizontal posture, and wherein the substrate is loaded to and unloaded from the first process treating unit.

公开(公告)号：US20230110780A1

公开(公告)日：2023-04-13

申请号：US17960392

申请日：2022-10-05

Applicant: SEMES CO., LTD.

Inventor： Jun Young CHOI ,  Yong Sun KO ,  Jun Hyun LIM ,  Gui Su PARK ,  Young Jin JANG

IPC: H01L21/677 ,  H01L21/67 ,  H01L21/683

Abstract: The present invention provides an apparatus for treating a substrate, the apparatus including: a processing tank having an accommodation space in which a processing liquid is accommodated; a support member for supporting at least one substrate in the receiving space in a vertical posture; and a posture changing robot for changing a posture of the substrate in a state of being immersed in the liquid state from the vertical posture to a horizontal posture, in which wherein the posture changing robot includes: a hand configured to grip the substrate; and an arm for moving the hand.

公开(公告)号：US20230339790A1

公开(公告)日：2023-10-26

申请号：US17985038

申请日：2022-11-10

Applicant: SEMES CO., LTD.

Inventor： Myung A JEON ,  Young Seop CHOI ,  Bok Kyu LEE ,  Kyu Hwan CHANG ,  Yong Sun KO

IPC: C02F1/78

CPC classification number: C02F1/78 ,  C02F2301/08 ,  C02F2305/023 ,  C02F2103/346

Abstract: Provided are an ozone water decomposition apparatus and method that can decompose ozone water quickly and stably. The ozone water decomposition apparatus, comprising: a tank configured to accommodate ozone water and decompose the ozone water; a first supply unit configured to supply the ozone water to the tank; a second supply unit configured to supply an additive to the tank wherein the additive is supplied by a preset first or second supply amount; a circulation line configured to circulate the ozone water in the tank; and a concentration meter installed in the circulation line, wherein the ozone water decomposition apparatus comprises: after circulating the ozone water using the circulation line, measuring an ozone concentration of the ozone water using the concentration meter; subsequently supplying the additive of the first supply amount or the second supply amount based on the measured ozone concentration of the ozone water; and subsequently circulating the ozone water until the ozone concentration of the ozone water reaches a preset reference concentration.

公开(公告)号：US20230201884A1

公开(公告)日：2023-06-29

申请号：US18068917

申请日：2022-12-20

Applicant: SEMES CO, LTD.

Inventor： Yong Hyun CHOI ,  Young Hun LEE ,  Seung Hoon OH ,  Mi So PARK ,  Tae Jong CHOI ,  Yong Sun KO ,  Jin Woo JUNG

IPC: B08B3/02 ,  F26B5/00

CPC classification number: B08B3/022 ,  F26B5/005 ,  H01L21/02057

Abstract: The present invention provides a method for treating a substrate. The method for treating a substrate comprises: treating the substrate with liquid; and drying the liquid-treated substrate, and the liquid treatment step includes: a first liquid supply step of supplying a first liquid to an upper surface of the rotating substrate; and a second liquid supply step of supplying a second liquid to an upper surface of the rotating substrate, and in the second liquid supply step, a rotation speed of the substrate is adjusted such that the second liquid supplied on the substrate flows from a central region of the substrate to an edge region of the substrate.