公开(公告)号：US20210335596A1

公开(公告)日：2021-10-28

申请号：US17239091

申请日：2021-04-23

Applicant: SEMES CO., LTD.

Inventor： Yong Hoon HONG ,  Sul LEE ,  Myung A JEON ,  Moonsik CHOI ,  Young Su KIM

IPC: H01L21/02 ,  H01L21/263

Abstract: The inventive concept provides a substrate treating apparatus. In an embodiment, the substrate treating apparatus includes a housing having a treatment space for treating a substrate in an interior thereof, a support unit that supports the substrate in the treatment space, a nozzle that supplies a liquid to the substrate positioned on the support unit, a liquid supply unit that supplies the liquid to the nozzle, and a controller that controls the liquid unit, the liquid supply unit includes a tank having an interior space for storing the liquid, and a first circulation line that circulates the liquid stored in the interior space and in which a first heater is installed, and the controller controls the first heater such that the first heater heats the liquid to a first temperature, at which particles in the interior of the liquid are not eluted.

公开(公告)号：US20250041911A1

公开(公告)日：2025-02-06

申请号：US18791839

申请日：2024-08-01

Applicant: SEMES CO., LTD.

Inventor： Myung A JEON ,  Yong Hoon HONG ,  Ji Su HONG ,  Bok Kyu LEE ,  Young Seop CHOI

IPC: B08B3/10 ,  B08B3/02 ,  B08B13/00

Abstract: Disclosed is an ozone water supplying unit capable of maintaining a stable ozone concentration of ozone water supplied to a substrate, and a substrate treating apparatus including the same. The substrate treating apparatus includes: a chamber for liquid-treating a substrate loaded into a treating space with a liquid containing ozone water; and an ozone water supplying unit for supplying ozone water to the treating space, in which the ozone water supplying unit includes: an ozone water generator for generating ozone water; an ozone water supply line for supplying ozone water generated by the ozone water generator to the treating space; and a cooler provided in the ozone water supply line to cool the ozone water flowing through the ozone water supply line.

公开(公告)号：US20240210836A1

公开(公告)日：2024-06-27

申请号：US18501265

申请日：2023-11-03

Applicant: SEMES CO., LTD.

Inventor： Myung A JEON ,  Young Seop CHOI ,  Bok Kyu LEE ,  Joo Sung LEE ,  Je Myung CHA

IPC: G03F7/42

CPC classification number: G03F7/422 ,  H01L21/67051

Abstract: Provided is a substrate processing apparatus and method capable of improving photoresist removal efficiency by using two different types of chemical liquids. The substrate processing apparatus comprises a substrate support unit for supporting and rotating a substrate; and a spray unit for discharging a substrate processing liquid onto the substrate using a nozzle structure, wherein the nozzle structure comprises a first inlet pipe for providing a first chemical liquid; a second inlet pipe for providing a second chemical liquid;
a reaction space module where the first chemical liquid and the second chemical liquid are mixed; and a discharge pipe for discharging a mixture solution of the first chemical liquid and the second chemical liquid into the substrate processing liquid, wherein the first chemical liquid contains ozone gas, and the second chemical liquid contains an OH component.

公开(公告)号：US20240091819A1

公开(公告)日：2024-03-21

申请号：US18117592

申请日：2023-03-06

Applicant: SEMES CO., LTD.

Inventor： Ju Hwan LEE ,  Hyeon Jun LEE ,  So Young PARK ,  Myung A JEON

IPC: B08B3/02 ,  B08B13/00

CPC classification number: B08B3/022 ,  B08B13/00 ,  H01L21/67051

Abstract: Proposed are a substrate processing apparatus having improved substrate drying performance by separately providing a chemical liquid supply nozzle and a gas supply nozzle; and a substrate processing method.

公开(公告)号：US20250025923A1

公开(公告)日：2025-01-23

申请号：US18907549

申请日：2024-10-06

Applicant: SEMES CO., LTD.

Inventor： Ju Hwan LEE ,  Hyeon Jun LEE ,  So Young PARK ,  Myung A JEON

IPC: B08B3/02 ,  B08B13/00 ,  H01L21/67

Abstract: Proposed are a substrate processing apparatus having improved substrate drying performance by separately providing a chemical liquid supply nozzle and a gas supply nozzle; and a substrate processing method.

公开(公告)号：US20240145265A1

公开(公告)日：2024-05-02

申请号：US18141416

申请日：2023-04-29

Applicant: SEMES CO., LTD.

Inventor： Young Seop CHOI ,  Myung A JEON ,  Dong Uk LEE ,  Boo Seok YANG ,  Bok Kyu LEE

IPC: H01L21/67 ,  B08B3/10

CPC classification number: H01L21/67051 ,  B08B3/10 ,  B08B2203/005 ,  B08B2203/007

Abstract: Proposed are a process fluid treatment apparatus capable of decomposing ozone in a process fluid more effectively, and a wafer cleaning apparatus and semiconductor manufacturing equipment including the same. The process fluid treatment apparatus treats the process fluid used for cleaning a wafer in the semiconductor manufacturing equipment, and includes a housing having an inner space configured to contain the process fluid, a spray nozzle configured to spray the process fluid containing ozone into the inner space in the form of mist, and a nozzle heater configured to heat the process fluid passing through the spray nozzle.

公开(公告)号：US20230339790A1

公开(公告)日：2023-10-26

申请号：US17985038

申请日：2022-11-10

Applicant: SEMES CO., LTD.

Inventor： Myung A JEON ,  Young Seop CHOI ,  Bok Kyu LEE ,  Kyu Hwan CHANG ,  Yong Sun KO

IPC: C02F1/78

CPC classification number: C02F1/78 ,  C02F2301/08 ,  C02F2305/023 ,  C02F2103/346

Abstract: Provided are an ozone water decomposition apparatus and method that can decompose ozone water quickly and stably. The ozone water decomposition apparatus, comprising: a tank configured to accommodate ozone water and decompose the ozone water; a first supply unit configured to supply the ozone water to the tank; a second supply unit configured to supply an additive to the tank wherein the additive is supplied by a preset first or second supply amount; a circulation line configured to circulate the ozone water in the tank; and a concentration meter installed in the circulation line, wherein the ozone water decomposition apparatus comprises: after circulating the ozone water using the circulation line, measuring an ozone concentration of the ozone water using the concentration meter; subsequently supplying the additive of the first supply amount or the second supply amount based on the measured ozone concentration of the ozone water; and subsequently circulating the ozone water until the ozone concentration of the ozone water reaches a preset reference concentration.