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    MASK PLATE, EXPOSURE METHOD THEREOF AND LIQUID CRYSTAL DISPLAY PANEL INCLUDING THE SAME
    1.
    发明申请
    MASK PLATE, EXPOSURE METHOD THEREOF AND LIQUID CRYSTAL DISPLAY PANEL INCLUDING THE SAME 有权
    掩模板，其接触方法和液晶显示面板包括它们

    公开(公告)号：US20150177610A1

    公开(公告)日：2015-06-25

    申请号：US14241820

    申请日：2014-01-21

    Applicant: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.

    Inventor： Meng Li ,  Jinjie Wang

    IPC: G03F1/38 ,  G02F1/1335 ,  G02F1/1368

    CPC classification number: G03F1/38 ,  G02F1/133514 ,  G02F1/133516 ,  G02F1/13439 ,  G02F1/1368 ,  G03F1/00 ,  G03F7/0007

    Abstract: The present disclosure relates to a mask plate, an exposure method thereof, and a liquid crystal display panel including the mask plate. On the mask plate, a plurality of pattern regions is arranged in a gradient variation from the center of the mask plate to the edges thereof according to the deformation degree of the exposure mask. The method for exposing the mask plate comprises the following steps of, (a) providing an exposure mask in a horizontal state, and measuring the deformation degree of the exposure mask; (b) arranging, on the mask plate, a plurality of pattern regions, the dimensions of which change in a gradient manner from the center of the mask plate to the edges thereof according to the deformation degree of the exposure mask; and (c) completing the exposure of the mask plate. The mask plate according to the present disclosure can compensate the effect of deformation of the exposure mask on the exposure area of the mask plate.

    Abstract translation: 本发明涉及一种掩模板及其曝光方法以及包括掩模板的液晶显示面板。 在掩模板上，根据曝光掩模的变形程度，从掩模板的中心到其边缘的梯度变化中布置多个图案区域。 曝光掩模板的方法包括以下步骤：（a）以水平状态提供曝光掩模，并测量曝光掩模的变形程度; （b）根据曝光掩模的变形程度，在掩模板上布置多个图案区域，其尺寸从掩模板的中心到其边缘以梯度方式变化; 和（c）完成掩模板的曝光。 根据本公开的掩模板可以补偿曝光掩模的变形对掩模板的曝光区域的影响。

    LIQUID CRYSTAL DISPLAY PANEL, AND DRIVE STRUCTURE AND DRIVE METHOD THEREOF
    4.
    发明申请
    LIQUID CRYSTAL DISPLAY PANEL, AND DRIVE STRUCTURE AND DRIVE METHOD THEREOF 审中-公开
    液晶显示面板及其驱动结构及其驱动方法

    公开(公告)号：US20160247468A1

    公开(公告)日：2016-08-25

    申请号：US14417635

    申请日：2015-01-16

    Applicant: Shenzhen China Star Optoelectronics Technology Co., Ltd.

    Inventor： Meng Li ,  Jinjie Wang

    IPC: G09G3/36 ,  G09G3/00

    CPC classification number: G09G3/3614 ,  G09G3/003 ,  G09G3/3677 ,  G09G2310/0251 ,  G09G2310/08 ,  G09G2320/0204 ,  G09G2320/0247 ,  H04N13/359 ,  H04N13/398

    Abstract: Disclosed are a liquid crystal display panel, and a drive structure and a drive method thereof. The drive structure comprises a plurality of gate lines, a plurality of sets of charge and share gate lines, a plurality of switch units, a first drive signal line, a second drive signal line, a third drive signal line, a fourth drive signal line, and a low-voltage signal line. A plurality of switch units is used in conjunction with corresponding timing signals to achieve separate control of the functions of voltage charging and voltage sharing.

    Abstract translation: 公开了一种液晶显示面板及其驱动结构及其驱动方法。 驱动结构包括多条栅极线，多组充电和共享栅极线，多个开关单元，第一驱动信号线，第二驱动信号线，第三驱动信号线，第四驱动信号线 ，和低电压信号线。 多个开关单元与相应的定时信号结合使用，以实现电压充电和电压共享的功能的单独控制。

    Mask plate, exposure method thereof and liquid crystal display panel including the same
    5.
    发明授权
    Mask plate, exposure method thereof and liquid crystal display panel including the same 有权
    掩模板，曝光方法和包括其的液晶显示面板

    公开(公告)号：US09298082B2

    公开(公告)日：2016-03-29

    申请号：US14241820

    申请日：2014-01-21

    Applicant: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.

    Inventor： Meng Li ,  Jinjie Wang

    IPC: G03F1/38 ,  G02F1/1335 ,  G02F1/1368 ,  G03F7/00 ,  G02F1/1343

    CPC classification number: G03F1/38 ,  G02F1/133514 ,  G02F1/133516 ,  G02F1/13439 ,  G02F1/1368 ,  G03F1/00 ,  G03F7/0007

    Abstract: The present disclosure relates to a mask plate, an exposure method thereof, and a liquid crystal display panel including the mask plate. On the mask plate, a plurality of pattern regions is arranged in a gradient variation from the center of the mask plate to the edges thereof according to the deformation degree of the exposure mask. The method for exposing the mask plate comprises the following steps of, (a) providing an exposure mask in a horizontal state, and measuring the deformation degree of the exposure mask; (b) arranging, on the mask plate, a plurality of pattern regions, the dimensions of which change in a gradient manner from the center of the mask plate to the edges thereof according to the deformation degree of the exposure mask; and (c) completing the exposure of the mask plate. The mask plate according to the present disclosure can compensate the effect of deformation of the exposure mask on the exposure area of the mask plate.

    Abstract translation: 本发明涉及一种掩模板及其曝光方法以及包括掩模板的液晶显示面板。 在掩模板上，根据曝光掩模的变形程度，从掩模板的中心到其边缘的梯度变化中布置多个图案区域。 曝光掩模板的方法包括以下步骤：（a）以水平状态提供曝光掩模，并测量曝光掩模的变形程度; （b）根据曝光掩模的变形程度，在掩模板上布置多个图案区域，其尺寸从掩模板的中心到其边缘以梯度方式变化; 和（c）完成掩模板的曝光。 根据本公开的掩模板可以补偿曝光掩模的变形对掩模板的曝光区域的影响。

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