Abstract:
Provided are methods of manufacturing an ultra-thin inorganic semiconductor film and methods of manufacturing three-dimensional (3D) semiconductor device using the ultra-thin inorganic semiconductor film. A method of manufacturing the ultra-thin inorganic semiconductor film includes preparing a Ge substrate, forming an amorphous graphene layer on the Ge substrate, forming an ultra-thin inorganic semiconductor film on the amorphous graphene layer, and transferring the ultra-thin inorganic semiconductor film to a target substrate. The ultra-thin inorganic semiconductor film is a Si thin film or a Ge thin film and may have a thickness of 50 μm or less.
Abstract:
A solar light concentration plate comprises a first hologram which receives solar light and diffracts incident light in a range of an incident angle, and first and second light guides respectively disposed on both sides of the first hologram, wherein at least one of the first and second light guides has an outer surface substantially inclined to an inner surface of the at least one of the first and second light guides.
Abstract:
A stretchable strain sensor includes a light-emitting element, an optical structure, and a photo-detective element. The stretchable strain sensor is located in a path of light emitted from the light-emitting element. The optical structure is configured to have optical properties that change in response to stretching of at least a portion of the stretchable strain sensor. The photo-detective element is configured to detect light transmitted through the optical structure or reflected through the optical structure.
Abstract:
According to example embodiments, a wire structure includes a first wire that includes a first wire core and a first carbon shell surrounding the first wire core, and a second wire that extends in a longitudinal direction from the first wire. The first wire core has a wire shape. The first carbon shell contains carbon.