公开(公告)号：US07817844B2

公开(公告)日：2010-10-19

申请号：US11058616

申请日：2005-02-16

Applicant: Tadashi Kitamura ,  Kazufumi Kubota ,  Shinichi Nakazawa ,  Neeti Vohra ,  Masahiro Yamamoto

Inventor： Tadashi Kitamura ,  Kazufumi Kubota ,  Shinichi Nakazawa ,  Neeti Vohra ,  Masahiro Yamamoto

IPC: G06K9/00 ,  G06K9/48 ,  G06K9/62

CPC classification number: G06K9/00 ,  G06K2209/19 ,  G06T7/0004 ,  G06T2207/30148

Abstract: A pattern inspection apparatus is used for inspecting a pattern, such as semiconductor integrated circuit (LSI), liquid crystal panel, and a photomask by using an image of the pattern to-be-inspected and design data for fabricating the pattern to-be-inspected. The pattern inspection apparatus includes a reference pattern generation device for generating a reference pattern represented by one or more lines from design data, an image generation device for generating the image of the pattern to-be-inspected, a detecting device for detecting an edge of the image of the pattern to-be-inspected, and an inspection device for inspecting the pattern to-be-inspected by comparing the edge of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.

Abstract translation: 图案检查装置用于通过使用要检查的图案的图像和用于制造待图案的图案的设计数据来检查诸如半导体集成电路（LSI），液晶面板和光掩模的图案， 检查。 图案检查装置包括：参考图案生成装置，用于从设计数据生成由一条或多条线表示的参考图案;图像生成装置，用于生成被检查图案的图像;检测装置， 要检查的图案的图像;以及检查装置，用于通过将待检查图案的图像的边缘与参考图案的一条或多条线进行比较来检查待检查的图案。

公开(公告)号：US20050143513A1

公开(公告)日：2005-06-30

申请号：US10502715

申请日：2003-01-31

Applicant: Tadashi Kitamura

Inventor： Tadashi Kitamura

IPC: G02F1/1339 ,  G02F1/1341 ,  A63B39/00 ,  B32B31/00 ,  C08K3/34 ,  C08K9/00

CPC classification number: G02F1/1339 ,  G02F1/1341 ,  G02F2001/13415 ,  G02F2202/023

Abstract: A method for producing a liquid crystal display cell comprising processes of applying a sealing agent on a sealing portion of at least one liquid crystal display cell substrate, dropping liquid crystal on the substrate, and bonding substrates to each other under vacuum, wherein the sealing agent comprising a material to be cured and a curing agent is applied to the sealing portion without mixing the material to be cured and the curing agent, and then the substrates are bonded to each other under vacuum at room temperature to cure the sealing agent, is disclosed. A sealing agent for a liquid crystal display cell wherein the above material to be cured comprise a radically polymerizable resin and an organic peroxide, and the above curing agent comprises a radically polymerizable resin and a decomposition accelerator, is also disclosed.

Abstract translation: 一种制造液晶显示单元的方法，包括在至少一个液晶显示单元基板的密封部分上施加密封剂，在基板上滴下液晶以及在真空下彼此接合基板的方法，其中密封剂 包括待固化的材料，并且将固化剂施加到密封部分上而不混合待固化的材料和固化剂，然后在室温下在真空下将基底彼此粘合以固化密封剂 。 一种用于液晶显示器的密封剂，其中上述待固化的材料包括自由基聚合树脂和有机过氧化物，并且上述固化剂包括可自由基聚合的树脂和分解促进剂。

公开(公告)号：US20120117520A1

公开(公告)日：2012-05-10

申请号：US13290801

申请日：2011-11-07

Applicant: Tadashi Kitamura ,  Akio Ishikawa

Inventor： Tadashi Kitamura ,  Akio Ishikawa

IPC: G06F17/50

CPC classification number: G03F7/705 ,  G03F7/70516 ,  G03F7/70625

Abstract: A system and method for precise control of fine-line photolithography is disclosed. The system includes a wafer inspector that detects and measures edges and contours of patterns as produced on a wafer and a lithography simulator. The method calibrates the lithography simulator using multiple measurements and/or edges of patterns on the wafer. The calibrated lithography simulator is used to simulate processing to permit optimization of processing conditions by iterative adjustment and re-simulation. In embodiments, the process conditions optimized include one or more of dose, placement of edges on masks, and placement, shape, and locations of SRAF/OPC structures on the masks. In embodiments, the method includes using the calibrated lithography simulator to match results of production process equipment to those achieved with standard equipment. In embodiments, process data from multiple process simulations is stored in a single image file. The method concludes with fabrication of wafers using the optimized conditions and masks.

Abstract translation: 公开了一种用于精细控制细线光刻的系统和方法。 该系统包括晶片检查器，其检测并测量在晶片和光刻模拟器上产生的图案的边缘和轮廓。 该方法使用晶片上的图案的多个测量和/或边缘校准光刻模拟器。 校准光刻模拟器用于模拟处理，以通过迭代调整和重新模拟来优化处理条件。 在实施例中，优化的工艺条件包括剂量，掩模上边缘的放置以及掩模上的SRAF / OPC结构的放置，形状和位置中的一个或多个。 在实施例中，该方法包括使用经校准的光刻模拟器来将生产工艺设备的结果与用标准设备实现的结果相匹配。 在实施例中，来自多个过程模拟的过程数据被存储在单个图像文件中。 该方法的结论是使用优化的条件和掩模制造晶片。

公开(公告)号：US08150140B2

公开(公告)日：2012-04-03

申请号：US12725141

申请日：2010-03-16

Applicant: Tadashi Kitamura ,  Akio Ishikawa

Inventor： Tadashi Kitamura ,  Akio Ishikawa

IPC: G06K9/00

CPC classification number: G06T7/001 ,  G06T2207/10004 ,  G06T2207/30148

Abstract: A system and method is described for evaluating a wafer fabrication process for forming patterns on a wafer based upon data. Multiple inspection regions are defined on the wafer for analysis. For each inspection region, images of patterns within the inspection region are captured, edges are detected, and lines are registered to lines of a reference pattern automatically generated from the design data. Line widths are determined from the edges. Measured line widths are analyzed to provide statistics and feedback information regarding the fabrication process. In particular embodiments defects are identified as where measured line widths lie outside boundaries determined from the statistics. In particular embodiments, lines of different drawn width and/or orientation are grouped and analyzed separately. Measured line widths may also be grouped for analysis according to geometry such as shape or proximity to other shapes in the inspection region to provide feedback for optical proximity correction rules.

Abstract translation: 描述了一种基于数据来评估在晶片上形成图案的晶片制造工艺的系统和方法。 在晶片上定义多个检查区域用于分析。 对于每个检查区域，捕获检查区域内的图案的图像，检测边缘，并且将线注册到从设计数据自动生成的参考图案的线上。 线宽从边缘确定。 分析测量线宽以提供关于制造过程的统计和反馈信息。 在特定实施例中，将缺陷识别为测量的线宽在从统计确定的边界之外的位置。 在特定实施例中，将不同拉伸宽度和/或取向的线分开并分开分析。 测量的线宽也可以根据诸如形状或检查区域中其他形状的接近度的几何形状进行分组，以提供用于光学邻近校正规则的反馈。

公开(公告)号：US20110235895A1

公开(公告)日：2011-09-29

申请号：US13152227

申请日：2011-06-02

Applicant: Tadashi Kitamura ,  Toshiaki Hasebe ,  Masotoshi Tsuneoka

Inventor： Tadashi Kitamura ,  Toshiaki Hasebe ,  Masotoshi Tsuneoka

IPC: G06K9/00

CPC classification number: G06T7/001 ,  G06K9/00 ,  G06K2209/19 ,  G06T2207/30148

Abstract: A pattern inspection apparatus is used for inspecting a fine pattern, such as a semiconductor integrated circuit (LSI), a liquid crystal panel, and a photomask (reticle) for the semiconductor or the liquid crystal panel, which are fabricated based on data for fabricating the fine pattern such as design data. The pattern inspection apparatus includes a reference pattern generation device configured to generate a reference pattern represented by one or more lines, comprising one of a line segment and a curve, from the data, an image generation device configured to generate the image of the pattern to-be-inspected, a detecting device configured to detect an edge of the image of the pattern to-be-inspected, and an inspection device configured to inspect the pattern to-be-inspected by comparing the edge of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.

Abstract translation: 图案检查装置用于检查用于半导体或液晶面板的半导体集成电路（LSI），液晶面板和光掩模（掩模版）等精细图案，其基于用于制造的数据 精细图案如设计数据。 图案检查装置包括：参考图案生成装置，被配置为从数据生成包括线段和曲线中的一个或多个线的代表的参考图案，被配置为生成图案的图像的图像生成装置 被检查的检测装置，被配置为检测所述待检查图案的边缘的检测装置;以及检查装置，被配置为通过将所述图案的图像的边缘与所述图案的边缘进行比较来检查所述图案， 用参考图案的一行或多行进行检查。

公开(公告)号：US20110021116A1

公开(公告)日：2011-01-27

申请号：US12508762

申请日：2009-07-24

Applicant: James W. Brown ,  Tadashi Kitamura ,  Gautam N. Kudva ,  Siva Venkatachalam

Inventor： James W. Brown ,  Tadashi Kitamura ,  Gautam N. Kudva ,  Siva Venkatachalam

IPC: B24B9/10 ,  B24B1/00

CPC classification number: B24B9/10 ,  B24B41/068

Abstract: A method for beveling a thin glass plate by simultaneously grinding an edge of the glass using multiple abrasive cup wheels, wherein the edge of the glass plate is extended from the fixturing device. The extension of the glass plate allows the glass plate to bend in response to forces applied by the abrasive cup wheels, thereby reducing the sensitivity of the grinding process to variations in position of the abrasive wheels. The axes of rotation of the abrasive wheels are separated by a distance selected to prevent deflection in the glass plate caused by a first abrasive wheel to influence the deflection in the glass plate caused by a second (adjacent) abrasive wheel.

Abstract translation: 一种用于通过使用多个研磨杯轮同时研磨玻璃的边缘来倾斜薄玻璃板的方法，其中玻璃板的边缘从固定装置延伸。 玻璃板的延伸允许玻璃板响应于研磨杯轮所施加的力而弯曲，从而降低研磨过程对砂轮位置变化的敏感性。 磨轮的旋转轴线被分开一定距离，以防止由第一砂轮引起的玻璃板偏转，以影响由第二（相邻）砂轮引起的玻璃板中的偏转。

公开(公告)号：US20100158345A1

公开(公告)日：2010-06-24

申请号：US12637331

申请日：2009-12-14

Applicant: Tadashi Kitamura ,  Akio Ishikawa

Inventor： Tadashi Kitamura ,  Akio Ishikawa

IPC: G06K9/00

CPC classification number: G06T7/0006 ,  G06T7/13 ,  G06T2207/30148

Abstract: Apparatus and method evaluate a wafer fabrication process for forming patterns on a wafer based upon design data. Within a recipe database, two or more inspection regions are defined on the wafer for analysis. Patterns within each of the inspection regions are automatically selected based upon tendency for measurement variation resulting from variation in the fabrication process. For each inspection region, at least one image of patterns within the inspection region is captured, a reference pattern, represented by one or both of (a) one or more line segments and (b) one or more curves, is automatically generated from the design data. An inspection unit detects edges within each of the images and registers the image with the reference pattern. One or more measurements are determined from the edges for each of the selected patterns and are processed within a statistical analyzer to form statistical information associated with the fabrication process.

Abstract translation: 基于设计数据，装置和方法评估在晶片上形成图案的晶片制造工艺。 在配方数据库中，在晶片上定义两个或更多个检查区域用于分析。 基于制造过程的变化导致的测量变化的趋势，自动地选择每个检查区域内的图案。 对于每个检查区域，捕获检查区域内的图案的至少一个图像，由（a）一个或多个线段和（b）一个或多个曲线中的一个或两个表示的参考图案从 设计数据。 检查单元检测每个图像内的边缘，并用参考图案注册图像。 从针对每个所选择的图案的边缘确定一个或多个测量值，并在统计分析器内处理以形成与制造过程相关联的统计信息。

公开(公告)号：US07566377B2

公开(公告)日：2009-07-28

申请号：US10528196

申请日：2003-09-19

Applicant: Takahisa Miyawaki ,  Yasushi Mizuta ,  Fumito Takeuchi ,  Kenji Itou ,  Tadashi Kitamura ,  Hiroyuki Asakura ,  Kenichi Yashiro ,  Kei Nagata

Inventor： Takahisa Miyawaki ,  Yasushi Mizuta ,  Fumito Takeuchi ,  Kenji Itou ,  Tadashi Kitamura ,  Hiroyuki Asakura ,  Kenichi Yashiro ,  Kei Nagata

IPC: B32B38/04 ,  C08L63/00

CPC classification number: C08G59/18 ,  C08F283/10 ,  G02F1/1339

Abstract: A liquid crystal sealing agent composition that is a one-component light and heat-curable resin composition containing: (1) a solid epoxy resin having a ring and ball method softening temperature of 40° C. or above; (2) an acrylate monomer and/or a methacrylate monomer, or an oligomer thereof; (3) a thermoplastic polymer having a ring and ball method softening temperature of 50 to 120° C., the thermoplastic polymer being obtained by copolymerizing an acrylate monomer and/or a methacrylate monomer with a monomer copolymerizable therewith; (4) a light-activated radical polymerization initiator; and (5) a latent epoxy curing agent. The light and heat curable liquid crystal sealing agent composition is employable in one drop fill, is excellent in properties of a cured product particularly after first-stage light curing, achieves stable cell gap after cell gap formation, permits prevention of contamination of the liquid crystal in second-stage heat curing, is excellent in curing properties in shaded area, and shows superior bonding reliability.

Abstract translation: 一种液晶密封剂组合物，其是单组分的光热可固化树脂组合物，其包含：（1）环球法软化温度为40℃以上的固体环氧树脂; （2）丙烯酸酯单体和/或甲基丙烯酸酯单体或其低聚物; （3）具有环球法软化温度为50〜120℃的热塑性聚合物，所述热塑性聚合物通过使丙烯酸酯单体和/或甲基丙烯酸酯单体与可共聚合的单体共聚而得到; （4）光活化自由基聚合引发剂; 和（5）潜在环氧固化剂。 光热固化型液晶密封剂组合物可以在一个滴液填充中使用，特别是在第一阶段光固化之后，固化产物的性能优异，在电池间隙形成之后实现稳定的电池间隙，可以防止液晶的污染 在第二阶段热固化中，阴影区域的固化性优异，粘接可靠性优异。

公开(公告)号：US06913798B2

公开(公告)日：2005-07-05

申请号：US10069048

申请日：2001-06-21

Applicant: Tadashi Kitamura ,  Hiroshi Kondo ,  Sunao Maeda

Inventor： Tadashi Kitamura ,  Hiroshi Kondo ,  Sunao Maeda

IPC: C08G59/66 ,  C08K5/16 ,  C08K5/37 ,  C08K5/54 ,  C08L63/00 ,  G02F1/1333 ,  G02F1/1339 ,  B32B31/12 ,  C08G59/40 ,  G02F1/3339

CPC classification number: G02F1/1339 ,  C08G59/66 ,  C08K5/16 ,  C08K5/37 ,  C08K5/54 ,  C08L63/00 ,  G02F1/133305 ,  Y10T428/1073 ,  C08L2666/08

Abstract: A sealant composition for a plastic liquid crystal display cell is composed of a two-component epoxy resin composition of a base resin liquid and a curing agent liquid, wherein the base resin is a liquid epoxy resin having from 1.7 to 6 in weight average of epoxy groups in one molecule and an ionic conductivity of 2 mS/m or less; and the curing agent has an ionic conductivity of 0.6 mS/m or less. The sealant composition facilitates the fabrication of plastic liquid crystal displays having enhanced durability and sealant properties, particularly in high temperature and high humidity environments.

Abstract translation: 用于塑料液晶显示单元的密封剂组合物由基础树脂液体和固化剂液体的双组分环氧树脂组合物组成，其中基础树脂是具有1.7至6重量平均环氧树脂的液体环氧树脂 一个分子中的基团和离子电导率为2mS / m或更小; 固化剂的离子电导率为0.6mS / m以下。 密封剂组合物有助于制造具有增强的耐久性和密封剂性质的塑料液晶显示器，特别是在高温和高湿度环境中。

公开(公告)号：US06868175B1

公开(公告)日：2005-03-15

申请号：US09648372

申请日：2000-08-25

Applicant: Masahiro Yamamoto ,  Tadashi Kitamura

Inventor： Masahiro Yamamoto ,  Tadashi Kitamura

IPC: G01N21/956 ,  G01N23/225 ,  G03F1/84 ,  G06K9/00 ,  G06K9/48 ,  G06T1/00 ,  G06T7/00 ,  H01L21/027

CPC classification number: G06K9/00 ,  G06K9/6206 ,  G06K2209/19 ,  G06T7/001 ,  G06T7/12 ,  G06T2207/30121 ,  G06T2207/30148

Abstract: First, a pattern inspection apparatus detects the first edge from an image of a pattern to-be-inspected. Next, the pattern inspection apparatus conducts matching of the image of the pattern to-be-inspected and the first reference pattern by comparing the first edge and an edge of the first reference pattern. Since, as a result of the matching, a shift quantity S1 can be obtained, and then the first reference pattern is shifted by this shift quantity S1. Subsequently the pattern to-be-inspected is inspected by comparing the first edge and the edge of the first reference pattern so shifted. In this first inspection, pattern deformation quantities are obtained and defects are detected. A shift quantity S2 can be obtained as one of the pattern deformation quantities. Next, in order to detect the second edge from the pattern image to-be-inspected, the corresponding second reference pattern is shifted by a shift quantity S1+S2. Using the second reference pattern so shifted, a profile is obtained on the pattern image to-be-inspected and the second edge is detected. Then, by comparing the second edge and the edge of the second reference pattern so shifted, the pattern to-be-inspected is inspected. Also in this second inspection, the pattern deformation quantities are obtained and defects are detected. A shift quantity S3 can be obtained as one of the pattern deformation quantities.

Abstract translation: 首先，图案检查装置从要检查的图案的图像检测第一边缘。 接下来，图案检查装置通过比较第一参考图案的第一边缘和边缘来进行被检查图案的图像与第一参考图案的匹配。 由于作为匹配的结果，可以获得移位量S1，然后第一基准图案偏移该移位量S1。 随后，通过比较如此偏移的第一参考图案的第一边缘和边缘来检查待检查的图案。 在该第一检查中，获得图案变形量并检测缺陷。 作为图案变形量之一，可以获得偏移量S2。 接下来，为了从要检查的图案图像检测第二边缘，相应的第二参考图案偏移了移位量S1 + S2。 使用这样偏移的第二参考图案，在待检查的图案图像上获得轮廓并检测第二边缘。 然后，通过比较如此移动的第二参考图案的第二边缘和边缘，检查待检查的图案。 此外，在该第二检查中，获得图案变形量并检测缺陷。 可以获得作为图案变形量之一的偏移量S3。