公开(公告)号：US11869780B2

公开(公告)日：2024-01-09

申请号：US16126106

申请日：2018-09-10

Applicant: Tokyo Electron Limited

Inventor： Takahiro Kawazu ,  Takafumi Tsuchiya ,  Hideaki Sato ,  Hidemasa Aratake ,  Osamu Kuroda ,  Takashi Nagai ,  Jiro Harada

IPC: H01L21/06 ,  H01L21/677 ,  H01L21/67

CPC classification number: H01L21/67086 ,  H01L21/6719 ,  H01L21/67253 ,  H01L21/67057 ,  H01L21/67173 ,  H01L21/67754

Abstract: A substrate liquid processing apparatus includes a processing liquid storage unit configured to store a processing liquid therein; a processing liquid drain unit configured to drain the processing liquid from the processing liquid storage unit; and a control unit. The control unit performs a first control in a constant concentration mode in which a concentration of the processing liquid in the processing liquid storage unit is regulated to a predetermined set concentration and a second control in a concentration changing mode in which the concentration of the processing liquid is changed. In the second control, a set concentration after concentration change is compared with a set concentration before the concentration change, and when the set concentration after the concentration change is lower, the control unit controls the processing liquid drain unit to start draining of the processing liquid.

公开(公告)号：US10071544B2

公开(公告)日：2018-09-11

申请号：US13693151

申请日：2012-12-04

Applicant: Tokyo Electron Limited ,  INTEL CORPORATION

Inventor： Osamu Hirakawa ,  Masaru Honda ,  Akira Fukutomi ,  Takeshi Tamura ,  Jiro Harada ,  Kazutaka Noda ,  Xavier Francois Brun

IPC: B32B38/10 ,  H01L21/67 ,  B32B43/00

CPC classification number: B32B38/10 ,  B32B43/006 ,  B32B2457/14 ,  H01L21/67051 ,  H01L21/67092 ,  H01L21/67288 ,  Y10T156/11 ,  Y10T156/1189 ,  Y10T156/19 ,  Y10T156/1972

Abstract: A separation apparatus for separating a superposed substrate in which a processing target substrate and a supporting substrate are joined together with an adhesive, into the processing target substrate and the supporting substrate, includes: a first holding unit which holds the processing target substrate; a second holding unit which holds the supporting substrate; a moving mechanism which relatively moves the first holding unit or the second holding unit in a horizontal direction; a load measurement unit which measures a load acting on the processing target substrate and the supporting substrate when the processing target substrate and the supporting substrate are separated; and a control unit which controls the moving mechanism based on the load measured by the load measurement unit.

公开(公告)号：US20190080938A1

公开(公告)日：2019-03-14

申请号：US16126106

申请日：2018-09-10

Applicant: Tokyo Electron Limited

Inventor： Takahiro Kawazu ,  Takafumi Tsuchiya ,  Hideaki Sato ,  Hidemasa Aratake ,  Osamu Kuroda ,  Takashi Nagai ,  Jiro Harada

IPC: H01L21/67 ,  G05B19/418

Abstract: A substrate liquid processing apparatus A1 includes a processing liquid storage unit 38 configured to store a processing liquid therein; a processing liquid drain unit 41 configured to drain the processing liquid from the processing liquid storage unit 38; and a control unit 7. The control unit 7 performs a first control in a constant concentration mode in which a concentration of the processing liquid in the processing liquid storage unit 38 is regulated to a predetermined set concentration and a second control in a concentration changing mode in which the concentration of the processing liquid is changed. In the second control, a set concentration after concentration change is compared with a set concentration before the concentration change, and when the set concentration after the concentration change is lower, the control unit controls the processing liquid drain unit 41 to start draining of the processing liquid.