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1.发明授权Photosensitive resin composition, process for producing patterned hardened film with use thereof and electronic part 有权感光树脂组合物，用于制造图案化硬化膜的方法和电子部件公开(公告)号：US08298747B2
公开(公告)日：2012-10-30
申请号：US12531055
申请日：2008-03-06
CPC分类号： H01L21/02118 , C08G69/26 , C08G69/28 , C08G73/22 , C08L77/06 , C08L79/04 , G03F7/0233 , H01L21/02282 , H01L21/312
摘要： To provide a photosensitive resin composition in which a hardened film obtained from the photosensitive resin composition has properties comparable to those of a film hardened at a high temperature, a method for manufacturing a patterned hardened film using the photosensitive resin composition, and an electronic part. The photosensitive resin composition includes (a) a polybenzoxazole precursor having a repeating unit represented by a general formula (I): wherein U and V represent a divalent organic group, and at least one of U and V is a group containing an aliphatic chain structure having 1 to 30 carbon atoms; (b) a photosensitizer; (c) a solvent; and (d) a crosslinking agent capable of causing crosslinking or polymerization by heating.
摘要翻译： 为了提供一种感光树脂组合物，其中由感光性树脂组合物获得的硬化膜具有与在高温下硬化的膜相当的性能，使用该感光性树脂组合物制造图案化硬化膜的方法和电子部件。 感光性树脂组合物包含（a）具有由通式（I）表示的重复单元的聚苯并恶唑前体：其中U和V表示二价有机基团，U和V中的至少一个是含有脂族链结构的基团 具有1至30个碳原子; （b）光敏剂; （c）溶剂; 和（d）能够通过加热引起交联或聚合的交联剂。
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2.发明申请PHOTOSENSITIVE RESIN COMPOSITION, PROCESS FOR PRODUCING PATTERNED HARDENED FILM WITH USE THEREOF AND ELECTRONIC PART 有权光敏树脂组合物，其使用方法和电子部件生产图案硬化膜的工艺公开(公告)号：US20100092879A1
公开(公告)日：2010-04-15
申请号：US12531055
申请日：2008-03-06
CPC分类号： H01L21/02118 , C08G69/26 , C08G69/28 , C08G73/22 , C08L77/06 , C08L79/04 , G03F7/0233 , H01L21/02282 , H01L21/312
摘要： To provide a photosensitive resin composition in which a hardened film obtained from the photosensitive resin composition has properties comparable to those of a film hardened at a high temperature, a method for manufacturing a patterned hardened film using the photosensitive resin composition, and an electronic part. The photosensitive resin composition includes (a) a polybenzoxazole precursor having a repeating unit represented by a general formula (I): wherein U and V represent a divalent organic group, and at least one of U and V is a group containing an aliphatic chain structure having 1 to 30 carbon atoms; (b) a photosensitizer; (c) a solvent; and (d) a crosslinking agent capable of causing crosslinking or polymerization by heating.
摘要翻译： 为了提供一种感光树脂组合物，其中由感光性树脂组合物获得的硬化膜具有与在高温下硬化的膜相当的性能，使用该感光性树脂组合物制造图案化硬化膜的方法和电子部件。 感光性树脂组合物包含（a）具有由通式（I）表示的重复单元的聚苯并恶唑前体：其中U和V表示二价有机基团，U和V中的至少一个是含有脂族链结构的基团 具有1至30个碳原子; （b）光敏剂; （c）溶剂; 和（d）能够通过加热引起交联或聚合的交联剂。
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3.发明授权Photosensitive resin composition and circuit formation substrate using the same 有权感光树脂组合物和使用其的电路形成基材公开(公告)号：US08304160B2
公开(公告)日：2012-11-06
申请号：US12759475
申请日：2010-04-13
申请人： Tomonori Minegishi , Rika Nogita , Dai Kawasaki , Keiko Suzuki , Taku Konno
发明人： Tomonori Minegishi , Rika Nogita , Dai Kawasaki , Keiko Suzuki , Taku Konno
CPC分类号： G03F7/0387 , G03F7/0388 , G03F7/11 , H05K1/05 , H05K3/287
摘要： A photosensitive resin composition for an interlayer insulating film or a protective film of a substrate for circuit formation, which includes a polymer (a) having a structural unit shown by the formula (A) and a compound (b) which generates a radical when irradiated with active rays and has a structure shown by the following formula (B).
摘要翻译： 一种用于层间绝缘膜或电路形成用基板的保护膜的感光性树脂组合物，其包含具有式（A）所示的结构单元的聚合物（a）和在照射时产生自由基的化合物（b） 具有活性射线并具有下式（B）所示的结构。
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4.发明授权Photosensitive resin composition and circuit formation substrate using the same 有权感光树脂组合物和使用其的电路形成基材公开(公告)号：US08614051B2
公开(公告)日：2013-12-24
申请号：US13535552
申请日：2012-06-28
申请人： Tomonori Minegishi , Rika Nogita , Dai Kawasaki , Keiko Suzuki , Taku Konno
发明人： Tomonori Minegishi , Rika Nogita , Dai Kawasaki , Keiko Suzuki , Taku Konno
CPC分类号： G03F7/0387 , G03F7/0388 , G03F7/11 , H05K1/05 , H05K3/287
摘要： A photosensitive resin composition for an interlayer insulating film or a protective film of a substrate for circuit formation, which includes a polymer (a) having a structural unit shown by the formula (A) and a compound (b) which generates a radical when irradiated with active rays and has a structure shown by the following formula (B).
摘要翻译： 一种用于层间绝缘膜或电路形成用基板的保护膜的感光性树脂组合物，其包含具有式（A）所示的结构单元的聚合物（a）和在照射时产生自由基的化合物（b） 具有活性射线并具有下式（B）所示的结构。
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