利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

13 条记录 (耗时 0.036 秒)

    Discovery of an advertising service in e-speak
    9.
    发明授权
    Discovery of an advertising service in e-speak 有权
    在电子谈话中发现广告服务

    公开(公告)号：US07284264B1

    公开(公告)日：2007-10-16

    申请号：US09732621

    申请日：2000-12-08

    申请人： Wooyoung Kim ,  Sekhar R. Sarukkai

    发明人： Wooyoung Kim ,  Sekhar R. Sarukkai

    IPC分类号： H04L29/00 ,  G06F21/00

    CPC分类号： H04L63/083 ,  G06F21/10 ,  G06F21/33 ,  H04L67/16 ,  H04L67/20

    摘要： A method and system for locating resources outside a client's normal domain provides for the client to send a query to a core serving the client. The core then sends the query to remote core over a communication network. The remote core runs the query in an advertising service serving the remote core, then returns a message identifying a matching resource to the core serving the client. The core serving the client locates the remote core by searching for appropriate advertising services in a well-known portal. In some embodiments, the client's core authenticates itself to the remote core before the query is run. Accordingly, unauthorized clients are prevented from accessing resources registered with the advertising service serving the remote core.

    摘要翻译： 用于定位客户端正常域之外的资源的方法和系统提供客户端向服务客户端的核心发送查询。 然后核心通过通信网络将查询发送到远程核心。 远程核心在服务于远程核心的广告服务中运行查询，然后将标识匹配资源的消息返回给服务于客户端的核心。 服务于客户的核心通过在知名门户中搜索适当的广告服务来定位远程核心。 在一些实施例中，客户端的核心在查询运行之前将其自身认证到远程核心。 因此，防止未经授权的客户端访问为服务于远程核心的广告服务注册的资源。

    Plasma deposition of a thin film
    10.
    发明授权
    Plasma deposition of a thin film 失效
    等离子体沉积薄膜

    公开(公告)号：US08414985B2

    公开(公告)日：2013-04-09

    申请号：US12822406

    申请日：2010-06-24

    申请人： Seyoun Moon ,  Wooyoung Kim ,  Sehwon Ahn ,  Dongjoo You

    发明人： Seyoun Moon ,  Wooyoung Kim ,  Sehwon Ahn ,  Dongjoo You

    IPC分类号： H05H1/24

    CPC分类号： H01J37/32146 ,  C23C16/24 ,  C23C16/505 ,  C23C16/515 ,  C23C16/517 ,  H01J37/32091 ,  H01J37/32165

    摘要： A plasma deposition apparatus and a method of manufacturing a thin film using the same are disclosed. The method of manufacturing a thin film includes introducing a process gas in a reaction chamber of a plasma deposition device, the reaction chamber including a first electrode and a second electrode. The method further includes applying, by a first power supply unit, a first pulsed RF signal to one of the first and second electrodes, and applying, by a second power supply unit, a second pulsed RF signal to one of the first and second electrodes. The first pulsed RF signal and the second pulsed RF signal are applied based on a predetermined deposition variable.

    摘要翻译： 公开了一种等离子体沉积设备及其制造方法。 制造薄膜的方法包括在等离子体沉积装置的反应室中引入工艺气体，反应室包括第一电极和第二电极。 该方法还包括由第一电源单元将第一脉冲RF信号施加到第一和第二电极之一，并且由第二电源单元将第二脉冲RF信号施加到第一和第二电极之一 。 基于预定的沉积变量施加第一脉冲RF信号和第二脉冲RF信号。