CHIP PACKAGE AND FABRICATION METHOD THEREOF
    3.
    发明申请
    CHIP PACKAGE AND FABRICATION METHOD THEREOF 审中-公开
    芯片包装及其制造方法

    公开(公告)号:US20140113412A1

    公开(公告)日:2014-04-24

    申请号:US14135506

    申请日:2013-12-19

    Applicant: XINTEC INC.

    Abstract: An embodiment of the present invention relates to a chip package and fabrication method thereof, which includes a chip protection layer or an additional etching stop layer to cover conducting pads to prevent dicing residue from damaging or scratching the conducting pads. According to another embodiment, a chip protection layer, an additional etching stop layer formed thereon, or a metal etching stop layer level with conducting pads or combinations thereof may be used when etching an intermetal dielectric layer at a structural etching region and a silicon substrate to form an opening for subsequent semiconductor manufacturing processes.

    Abstract translation: 本发明的实施例涉及一种芯片封装及其制造方法,其包括芯片保护层或附加的蚀刻停止层,以覆盖导电焊盘,以防止切割残留物损坏或划伤导电焊盘。 根据另一个实施例,当蚀刻结构蚀刻区域和硅衬底上的金属间电介质层时,可以使用芯片保护层,其上形成的附加蚀刻停止层或具有导电焊盘或其组合的金属蚀刻停止层, 形成随后的半导体制造工艺的开口。

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