SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

    公开(公告)号:US20240332258A1

    公开(公告)日:2024-10-03

    申请号:US18494557

    申请日:2023-10-25

    申请人: SK hynix Inc.

    发明人: Da Il RIM

    摘要: A semiconductor device may include: a lower semiconductor structure including a lower semiconductor substrate including a first region and a second region, a lower circuit structure disposed in the first region over the lower semiconductor substrate, a lower bonding pad disposed over the lower circuit structure and connected thereto, and a dummy conductive pattern disposed in the second region over the lower semiconductor substrate; an upper semiconductor structure including an upper semiconductor substrate disposed over the lower semiconductor structure and including the first region and the second region, an upper circuit structure disposed in the first region under the upper semiconductor substrate, and an upper bonding pad disposed under the upper circuit structure and connected thereto while being bonded to the lower bonding pad; a through electrode; and a dummy through electrode passing through the upper semiconductor structure and connected to the dummy conductive pattern.