公开(公告)号：US08661375B2

公开(公告)日：2014-02-25

申请号：US12970798

申请日：2010-12-16

Applicant: Yao-Ting Wang

Inventor： Yao-Ting Wang

IPC: G06F17/50

CPC classification number: G03F7/70466 ,  G03F7/701 ,  G03F7/70125 ,  G03F7/70283 ,  G03F7/70425 ,  G03F7/70566 ,  G03F7/70575

Abstract: Systems and methods for generating an image are provided. These systems and methods include generating multiple light beams from a light source by controlling at least one parameter of the light source to be different among each of the multiple light beams. The systems and methods further include forming multiple light patterns of circuit structures that are separated in frequency by directing each of the light beams at a mask of circuit features. The systems and methods, when used in lithography for example, further include directing each of the light patterns toward a silicon substrate. The silicon substrate includes a silicon wafer having a surface at least partially covered with at least one of a photoresist material and a reversible contrast enhancement material (R-CEM).

Abstract translation: 提供了用于生成图像的系统和方法。 这些系统和方法包括通过控制光源的至少一个参数在多个光束中的每一个之间不同来产生来自光源的多个光束。 这些系统和方法还包括通过将每个光束指向电路特征的掩模来形成通过频率分离的电路结构的多个光图案。 当例如在光刻中使用时，所述系统和方法还包括将每个光图案导向硅衬底。 硅衬底包括具有至少部分被光致抗蚀剂材料和可逆对比度增强材料（R-CEM）中的至少一种覆盖的表面的硅晶片。

公开(公告)号：US20130045615A1

公开(公告)日：2013-02-21

申请号：US13214199

申请日：2011-08-21

Applicant: YU-HUNG SU ,  Yao-Ting Wang

Inventor： YU-HUNG SU ,  Yao-Ting Wang

IPC: H01R13/62

CPC classification number: G06K7/0021 ,  G06K13/0831 ,  G06K13/085

Abstract: A card connector is disclosed. The card connector comprises an insulative base, a plurality of connecting terminals, a card ejecting mechanism and a shielding case. The shielding case covers the insulative base. A card insertion region is formed between the insulative base and the shielding case. A plurality of terminal slots is defined on a surface of the insulative base facing the card insertion region. The connecting terminals are received in the terminal slots. The tray comprises an inner tray and an outer tray. The outer tray is pivotally connected to the inner tray. The inner tray and the outer tray are connected together to form a receiving groove for receiving a SIM card. The tray is formed by pivotally connecting the inner tray to the outer tray, therefore, the card connector according to the present invention can be used more conveniently.

Abstract translation: 公开了一种卡连接器。 卡连接器包括绝缘基座，多个连接端子，卡弹出机构和屏蔽壳体。 屏蔽罩覆盖绝缘基座。 在绝缘基座和屏蔽壳体之间形成卡片插入区域。 在面向卡插入区域的绝缘基座的表面上限定多个端子槽。 连接端子被接收在端子槽中。 托盘包括内托盘和外托盘。 外托盘枢转地连接到内托盘。 内托盘和外托盘连接在一起以形成用于接收SIM卡的接收槽。 托盘通过将内托盘枢转地连接到外托盘而形成，因此，根据本发明的卡连接器可以更方便地使用。

公开(公告)号：US08216000B2

公开(公告)日：2012-07-10

申请号：US12871815

申请日：2010-08-30

Applicant: Yu-Hung Su ,  Yao-Ting Wang

Inventor： Yu-Hung Su ,  Yao-Ting Wang

IPC: H01R24/04

CPC classification number: H01R24/58 ,  H01R12/716 ,  H01R13/7033 ,  H01R2107/00

Abstract: An audio jack connector adapted for receiving a plug has a base having a socket. The base has a first terminal groove and a second terminal groove opened at one side of the socket. The second terminal groove is located between the socket and the first terminal groove and connects with the socket by means of a first connecting passage. A stationary switch terminal has a first fixing slice fastened in the second terminal groove, a first contacting end projected in the first connecting passage and an opening opened in first fixing slice. A resilient switch terminal has a second fixing slice fastened in the first terminal groove, a second contacting end projected into the socket through the first connecting passage and elastically received in the opening when the second contacting end is biased by the plug to be disconnected from the first contacting end.

Abstract translation: 适于接收插头的音频插孔连接器具有具有插座的底座。 基座具有在插座的一侧开口的第一端子槽和第二端子槽。 第二端子槽位于插座和第一端子槽之间，并通过第一连接通道与插座连接。 固定开关端子具有紧固在第二端子槽中的第一固定片，突出在第一连接通道中的第一接触端和在第一固定片中开口的开口。 弹性开关端子具有紧固在第一端子槽中的第二固定片，第二接触端通过第一连接通道突出到插座中，并且当第二接触端由插头偏置以被断开时弹性地容纳在开口中 第一接触端。

公开(公告)号：USD653622S1

公开(公告)日：2012-02-07

申请号：US29391493

申请日：2011-05-10

Applicant: Yao-Ting Wang ,  Yu-Hung Su

Designer： Yao-Ting Wang ,  Yu-Hung Su

公开(公告)号：USD647861S1

公开(公告)日：2011-11-01

申请号：US29387872

申请日：2011-03-18

Applicant: Yao-Ting Wang

Designer： Yao-Ting Wang

公开(公告)号：US07879538B2

公开(公告)日：2011-02-01

申请号：US10949678

申请日：2004-09-24

Applicant: Yao-Ting Wang

Inventor： Yao-Ting Wang

IPC: G03F7/20

CPC classification number: G03F7/70466 ,  G03F7/701 ,  G03F7/70125 ,  G03F7/70283 ,  G03F7/70425 ,  G03F7/70566 ,  G03F7/70575

Abstract: Systems and methods for generating an image are provided. These systems and methods include generating multiple light beams from a light source by controlling at least one parameter of the light source to be different among each of the multiple light beams. The systems and methods further include forming multiple light patterns of circuit structures that are separated in frequency by directing each of the light beams at a mask of circuit features. The systems and methods, when used in lithography for example, further include directing each of the light patterns toward a silicon substrate. The silicon substrate includes a silicon wafer having a surface at least partially covered with at least one of a photoresist material and a reversible contrast enhancement material (R-CEM).

Abstract translation: 提供了用于生成图像的系统和方法。 这些系统和方法包括通过控制光源的至少一个参数在多个光束中的每一个之间不同来产生来自光源的多个光束。 这些系统和方法还包括通过将每个光束指向电路特征的掩模来形成通过频率分离的电路结构的多个光图案。 当例如在光刻中使用时，所述系统和方法还包括将每个光图案导向硅衬底。 硅衬底包括具有至少部分被光致抗蚀剂材料和可逆对比度增强材料（R-CEM）中的至少一种覆盖的表面的硅晶片。

公开(公告)号：US07775826B1

公开(公告)日：2010-08-17

申请号：US12457503

申请日：2009-06-12

Applicant: Yao-Ting Wang

Inventor： Yao-Ting Wang

IPC: H01R3/00

CPC classification number: H01R13/6335 ,  H01R12/7094 ,  H01R13/2442

Abstract: A card connector includes an insulating housing defining a receiving room for receiving an electronic card, a cover coupled on the insulating housing, and a monitoring member having a base plate disposed in the insulating housing, a monitoring means extending along the insertion direction of the card, and a connecting arm perpendicularly connecting the monitoring means to the base plate. The connecting arm is inclined upward into the receiving room to make the monitoring means locate in the receiving room. One end of the monitoring means is higher than the other end thereof for electrically abutting against the cover, wherein the lower end of the monitoring means is adapted for being pressed downward by the card to make the connecting arm move downward and further make the upper end thereof disconnect from the cover so as to monitor whether the card is fully inserted in the card connector or not.

Abstract translation: 卡连接器包括限定用于接收电子卡的接收室的绝缘壳体，耦合在绝缘壳体上的盖子和具有设置在绝缘壳体中的基板的监视构件，沿着卡的插入方向延伸的监视装置 以及将监视装置垂直地连接到基板的连接臂。 连接臂向上倾斜到接收室中，使得监视装置位于接收室中。 监视装置的一端高于电气抵靠盖的另一端，其中监视装置的下端适于被卡向下按压，使连接臂向下移动，并进一步使上端 它与盖分离，以便监视卡是否完全插入卡连接器中。

公开(公告)号：US07523027B2

公开(公告)日：2009-04-21

申请号：US10878847

申请日：2004-06-28

Applicant: Fang-Cheng Chang ,  Yao-Ting Wang ,  Yagyensh C. Pati ,  Linard N. Karklin

Inventor： Fang-Cheng Chang ,  Yao-Ting Wang ,  Yagyensh C. Pati ,  Linard N. Karklin

IPC: G06F17/50

CPC classification number: G06T7/0004 ,  G03F1/26 ,  G03F1/36 ,  G03F1/84 ,  G03F7/70441 ,  G03F7/705 ,  G06F17/5068 ,  G06T2207/30148

Abstract: A method and apparatus for inspecting a photolithography mask for defects is provided. The inspection method comprises providing a defect area image to an image simulator wherein the defect area image is an image of a portion of a photolithography mask, and providing a set of lithography parameters as a second input to the image simulator. The defect area image may be provided by an inspection tool which scans the photolithography mask for defects using a high resolution microscope and captures images of areas of the mask around identified potential defects. The image simulator generates a first simulated image in response to the defect area image and the set of lithography parameters. The first simulated image is a simulation of an image which would be printed on a wafer if the wafer were to be exposed to an illumination source directed through the portion of the mask. The method may also include providing a second simulated image which is a simulation of the wafer print of the portion of the design mask which corresponds to the portion represented by the defect area image. The method also provides for the comparison of the first and second simulated images in order to determine the printability of any identified potential defects on the photolithography mask. A method of determining the process window effect of any identified potential defects is also provided for.

Abstract translation: 提供了一种用于检查用于缺陷的光刻掩模的方法和装置。 检查方法包括向图像模拟器提供缺陷区域图像，其中缺陷区域图像是光刻掩模的一部分的图像，并且提供一组光刻参数作为图像模拟器的第二输入。 缺陷区域图像可以由检查工具提供，该检查工具使用高分辨率显微镜扫描光刻掩模以获得缺陷，并捕获围绕所识别的潜在缺陷的掩模区域的图像。 图像模拟器响应于缺陷区域图像和光刻参数集合而生成第一模拟图像。 第一模拟图像是如果将晶片暴露于通过该掩模的该部分的照明源而将被印刷在晶片上的图像的模拟。 该方法还可以包括提供第二模拟图像，其是对应于由缺陷区域图像表示的部分的设计掩模的部分的晶片印刷的模拟。 该方法还提供了第一和第二模拟图像的比较，以便确定光刻掩模上任何识别的潜在缺陷的可印刷性。 还提供了确定任何识别的潜在缺陷的过程窗口效应的方法。

公开(公告)号：US07107571B2

公开(公告)日：2006-09-12

申请号：US09906920

申请日：2001-07-16

Applicant: Fang-Cheng Chang ,  Yao-Ting Wang ,  Yagyensh C. Pati ,  Linard Karklin

Inventor： Fang-Cheng Chang ,  Yao-Ting Wang ,  Yagyensh C. Pati ,  Linard Karklin

IPC: G06F17/50

CPC classification number: G06F17/5068 ,  G03F1/26 ,  G03F1/36 ,  G03F1/84 ,  G03F7/70441 ,  G03F7/705 ,  G06T7/0004 ,  G06T2207/30148

Abstract: A system and method of analyzing defects on a mask used in lithography are provided. A defect area image is provided as a first input, a set of lithography parameters is provided as a second input, and a set of metrology data is provided as a third input. The defect area image comprises an image of a portion of the mask. A simulated image can be generated in response to the first input. The simulated image comprises a simulation of an image that would be printed on a wafer if the wafer were exposed to a radiation source directed at the portion of the mask. The characteristics of the radiation source comprise the set of lithography parameters and the characteristics of the mask comprise the set of metrology data.

公开(公告)号：US06721928B2

公开(公告)日：2004-04-13

申请号：US10323565

申请日：2002-12-17

Applicant: Christophe Pierrat ,  Chin-Hsen Lin ,  Fang-Cheng Chang ,  Yao-Ting Wang

Inventor： Christophe Pierrat ,  Chin-Hsen Lin ,  Fang-Cheng Chang ,  Yao-Ting Wang

IPC: G06F1750

CPC classification number: G06F17/5081

Abstract: The present invention uses an instance based (IB) representation to reduce the time required for verifying a transformed layout that was generated from a reference layout. Specifically, an IB based representation is generated from the reference layout. The IB based representation includes sets of instance cells that include a master instance cell and slave instance cells. Only a subset of each set of instance cell needs to be simulated to verify the transformed layout.

Abstract translation: 本发明使用基于实例的（IB）表示来减少验证从参考布局生成的经转换的布局所需的时间。 具体来说，从参考布局生成基于IB的表示。 基于IB的表示包括包括主实例单元和从实例单元的实例单元的集合。 需要模拟每组实例单元的一个子集，以验证转换后的布局。