Golf Green Camera System
    92.
    发明申请

    公开(公告)号:US20200306586A1

    公开(公告)日:2020-10-01

    申请号:US16371843

    申请日:2019-04-01

    Applicant: David Cheung

    Inventor: David Cheung

    Abstract: In some embodiments, the present invention is directed to a golf green camera system comprising a pole having a first end and an opposite second end, a ferrule on the first end of the pole and configured to be inserted into a golf cup and a camera attached to the opposite second end of the pole. The golf cup is configured to be positioned within a corresponding opening in the golf green. The camera records play at the golf green. In some embodiments, the camera comprises a 360-degree camera.

    Monitoring server load balancing
    93.
    发明授权
    Monitoring server load balancing 有权
    监控服务器负载均衡

    公开(公告)号:US09270566B2

    公开(公告)日:2016-02-23

    申请号:US13584534

    申请日:2012-08-13

    Abstract: Embodiments described herein discuss an approach to implementing load-balancing across multiple monitoring servers. One such embodiment describes a network monitoring device. The network monitoring device includes an ingress port, for receiving mirrored network packets, and a number of egress ports. The egress ports are associated with a number of monitoring servers, and used to forward the mirrored network packets to the monitoring servers. A packet classifier, coupled to the ingress port, examines the mirrored network packets, and determines which of the monitoring servers should receive the packets.

    Abstract translation: 本文描述的实施例讨论了跨多个监控服务器实现负载平衡的方法。 一个这样的实施例描述了网络监视设备。 网络监控设备包括入口端口,用于接收镜像网络报文,以及多个出口端口。 出口端口与多个监控服务器相关联,用于将镜像网络数据包转发到监控服务器。 耦合到入口端口的数据包分类器检查镜像网络数据包,并确定哪些监视服务器应该接收数据包。

    High dose implantation strip (HDIS) in H2 base chemistry
    94.
    发明授权
    High dose implantation strip (HDIS) in H2 base chemistry 有权
    高剂量注入条(HDIS)在H2基础化学

    公开(公告)号:US08641862B2

    公开(公告)日:2014-02-04

    申请号:US13462660

    申请日:2012-05-02

    Abstract: Plasma is generated using elemental hydrogen, a weak oxidizing agent, and a fluorine containing gas. An inert gas is introduced to the plasma downstream of the plasma source and upstream of a showerhead that directs gas mixture into the reaction chamber where the mixture reacts with the high-dose implant resist. The process removes both the crust and bulk resist layers at a high strip rate, and leaves the work piece surface substantially residue free with low silicon loss.

    Abstract translation: 使用元素氢,弱氧化剂和含氟气体产生等离子体。 将惰性气体引入到等离子体源的下游等离子体源和喷淋头的上游,该喷头将气体混合物引导到反应室中,其中混合物与高剂量植入物抗蚀剂反应。 该方法以高剥离速率移除外壳和体抗蚀剂层,并且以低的硅损耗使工件表面基本上无残留物。

    PHOTORESIST STRIP PROCESSES FOR IMPROVED DEVICE INTEGRITY
    95.
    发明申请
    PHOTORESIST STRIP PROCESSES FOR IMPROVED DEVICE INTEGRITY 有权
    用于改进设备完整性的光栅条纹工艺

    公开(公告)号:US20130048014A1

    公开(公告)日:2013-02-28

    申请号:US13590083

    申请日:2012-08-20

    CPC classification number: H01L21/31138 G03F7/427 H01J37/32449 H01J37/32724

    Abstract: Provided herein are methods and apparatus of hydrogen-based photoresist strip operations that reduce dislocations in a silicon wafer or other substrate. According to various embodiments, the hydrogen-based photoresist strip methods can employ one or more of the following techniques: 1) minimization of hydrogen budget by using short processes with minimal overstrip duration, 2) providing dilute hydrogen, e.g., 2%-16% hydrogen concentration, 3) minimization of material loss by controlling process conditions and chemistry, 4) using a low temperature resist strip, 5) controlling implant conditions and concentrations, and 6) performing one or more post-strip venting processes. Apparatus suitable to perform the photoresist strip methods are also provided.

    Abstract translation: 本文提供了减少硅晶片或其它基板中位错的氢基光刻胶剥离操作的方法和装置。 根据各种实施方案,氢基光刻胶剥离方法可以采用以下一种或多种技术:1)通过使用具有最小过载持续时间的短过程来最小化氢预算,2)提供稀氢,例如2%-16% 氢气浓度,3)通过控制工艺条件和化学反应来最小化材料损失,4)使用低温抗蚀剂条,5)控制植入物条件和浓度,以及6)执行一个或多个后带通风过程。 还提供了适用于执行光致抗蚀剂剥离方法的设备。

    Fragrance Emitting Apparatus For Use With USB Port
    96.
    发明申请
    Fragrance Emitting Apparatus For Use With USB Port 审中-公开
    香水发射装置用于USB端口

    公开(公告)号:US20120298770A1

    公开(公告)日:2012-11-29

    申请号:US13304668

    申请日:2011-11-27

    Applicant: David Cheung

    Inventor: David Cheung

    CPC classification number: A61L9/03 A61L9/037 A61L9/14

    Abstract: A fragrance emitting apparatus for connection to a USB port. The fragrance emitting apparatus has a casing having an interior and a fragrance bottle removably disposed within the interior of the casing. The fragrance bottle contains a liquid that provides a desired fragrance. The fragrance bottle has a fragrance member that has a first portion within the fragrance bottle, a second portion extending from the fragrance bottle and is configured to absorb liquid in the fragrance bottle. A micro-pump device is positioned within the interior of the casing and has an oscillating member that contacts the second portion of the fragrance member. A control circuit controls generates an electrical wave signal to cause the oscillating member to vibrate so as to diffuse fragrance liquid that contacts the oscillating member so as to produce a fragrance. The fragrance exits a vent in the casing.

    Abstract translation: 一种用于连接到USB端口的香味发射装置。 香味发射装置具有一个具有可拆卸地设置在壳体内部的内部和一个香味瓶的外壳。 香水瓶含有提供所需香料的液体。 香味瓶具有香料构件,其具有在香料瓶内的第一部分,第二部分从香料瓶延伸并且构造成吸收香料瓶中的液体。 微型泵装置定位在壳体的内部,并且具有与香料构件的第二部分接触的摆动构件。 控制电路控制产生电波信号,使振荡部件发生振动,从而扩散与振荡部件接触的香味液体,从而产生香味。 香水在外壳中离开一个通风口。

    HIGH DOSE IMPLANTATION STRIP (HDIS) IN H2 BASE CHEMISTRY
    97.
    发明申请
    HIGH DOSE IMPLANTATION STRIP (HDIS) IN H2 BASE CHEMISTRY 有权
    H2碱基化学中的高剂量植入条纹(HDIS)

    公开(公告)号:US20120211473A1

    公开(公告)日:2012-08-23

    申请号:US13462660

    申请日:2012-05-02

    Abstract: Plasma is generated using elemental hydrogen, a weak oxidizing agent, and a fluorine containing gas. An inert gas is introduced to the plasma downstream of the plasma source and upstream of a showerhead that directs gas mixture into the reaction chamber where the mixture reacts with the high-dose implant resist. The process removes both the crust and bulk resist layers at a high strip rate, and leaves the work piece surface substantially residue free with low silicon loss.

    Abstract translation: 使用元素氢,弱氧化剂和含氟气体产生等离子体。 将惰性气体引入到等离子体源的下游等离子体源和喷淋头的上游,该喷头将气体混合物引导到反应室中,其中混合物与高剂量植入物抗蚀剂反应。 该方法以高剥离速率移除外壳和体抗蚀剂层,并且以低的硅损耗使工件表面基本上无残留物。

    High dose implantation strip (HDIS) in H2 base chemistry
    98.
    发明授权
    High dose implantation strip (HDIS) in H2 base chemistry 有权
    高剂量注入条(HDIS)在H2基础化学

    公开(公告)号:US08193096B2

    公开(公告)日:2012-06-05

    申请号:US12251305

    申请日:2008-10-14

    Abstract: Plasma is generated using elemental hydrogen, a weak oxidizing agent, and a fluorine containing gas. An inert gas is introduced to the plasma downstream of the plasma source and upstream of a showerhead that directs gas mixture into the reaction chamber where the mixture reacts with the high-dose implant resist. The process removes both the crust and bulk resist layers at a high strip rate, and leaves the work piece surface substantially residue free with low silicon loss.

    Abstract translation: 使用元素氢,弱氧化剂和含氟气体产生等离子体。 将惰性气体引入到等离子体源的下游等离子体源和喷淋头的上游,该喷头将气体混合物引导到反应室中,其中混合物与高剂量植入物抗蚀剂反应。 该方法以高剥离速率移除外壳和体抗蚀剂层,并且以低的硅损耗使工件表面基本上无残留物。

    Fragrance emitting apparatus for use with USB port
    99.
    发明授权
    Fragrance emitting apparatus for use with USB port 有权
    用于USB端口的香水发光设备

    公开(公告)号:US08032014B2

    公开(公告)日:2011-10-04

    申请号:US12295647

    申请日:2007-05-10

    Applicant: David Cheung

    Inventor: David Cheung

    CPC classification number: A61L9/03 H01R13/66

    Abstract: A fragrance emitting apparatus (20) for connection to a USB port. In one embodiment, the fragrance emitting apparatus (20) comprises a casing (22) having an interior and a fragrance vent (36A, 36B) in communication with the interior, a heating element (42) located within the casing (22) that generates heat when electrical power is applied thereto, a USB connector (28) connected to the casing (22) and electrically connected to the heating element (42) so as to provide electrical power to the heating element (42) when the USB connector (28) is connected to a USB port, and a stationary fragrance member (50) located within the casing (22) to provide a fragrance, scent or aroma when heat is applied to the fragrance member (50). The fragrance member (50) is proximate to the heating element (42) so that heat generated by the heating element (42) causes the fragrance member (50) to emit a fragrance, scent or aroma which exits the interior of the casing (22) through the vent (36A, 36B). Other embodiments of the apparatus of the present invention are disclosed herein.

    Abstract translation: 一种用于连接到USB端口的香味发射设备(20)。 在一个实施例中,香味发射设备(20)包括具有内部的壳体(22)和与内部连通的香味通风口(36A,36B),位于壳体(22)内的加热元件(42),其产生 当连接到其上的热量时,连接到壳体(22)并电连接到加热元件(42)的USB连接器(28),以便当USB连接器(28) )连接到USB端口,以及位于壳体(22)内的静止香料构件(50),以在向香料构件(50)施加热量时提供香味,气味或香气。 芳香构件(50)靠近加热元件(42),使得由加热元件(42)产生的热量使香料构件(50)发出离开外壳(22)内部的香味,气味或香气 )通过排气口(36A,36B)。 本文公开了本发明的装置的其它实施例。

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