Abstract:
In some embodiments, the present invention is directed to a golf green camera system comprising a pole having a first end and an opposite second end, a ferrule on the first end of the pole and configured to be inserted into a golf cup and a camera attached to the opposite second end of the pole. The golf cup is configured to be positioned within a corresponding opening in the golf green. The camera records play at the golf green. In some embodiments, the camera comprises a 360-degree camera.
Abstract:
Embodiments described herein discuss an approach to implementing load-balancing across multiple monitoring servers. One such embodiment describes a network monitoring device. The network monitoring device includes an ingress port, for receiving mirrored network packets, and a number of egress ports. The egress ports are associated with a number of monitoring servers, and used to forward the mirrored network packets to the monitoring servers. A packet classifier, coupled to the ingress port, examines the mirrored network packets, and determines which of the monitoring servers should receive the packets.
Abstract:
Plasma is generated using elemental hydrogen, a weak oxidizing agent, and a fluorine containing gas. An inert gas is introduced to the plasma downstream of the plasma source and upstream of a showerhead that directs gas mixture into the reaction chamber where the mixture reacts with the high-dose implant resist. The process removes both the crust and bulk resist layers at a high strip rate, and leaves the work piece surface substantially residue free with low silicon loss.
Abstract:
Provided herein are methods and apparatus of hydrogen-based photoresist strip operations that reduce dislocations in a silicon wafer or other substrate. According to various embodiments, the hydrogen-based photoresist strip methods can employ one or more of the following techniques: 1) minimization of hydrogen budget by using short processes with minimal overstrip duration, 2) providing dilute hydrogen, e.g., 2%-16% hydrogen concentration, 3) minimization of material loss by controlling process conditions and chemistry, 4) using a low temperature resist strip, 5) controlling implant conditions and concentrations, and 6) performing one or more post-strip venting processes. Apparatus suitable to perform the photoresist strip methods are also provided.
Abstract:
A fragrance emitting apparatus for connection to a USB port. The fragrance emitting apparatus has a casing having an interior and a fragrance bottle removably disposed within the interior of the casing. The fragrance bottle contains a liquid that provides a desired fragrance. The fragrance bottle has a fragrance member that has a first portion within the fragrance bottle, a second portion extending from the fragrance bottle and is configured to absorb liquid in the fragrance bottle. A micro-pump device is positioned within the interior of the casing and has an oscillating member that contacts the second portion of the fragrance member. A control circuit controls generates an electrical wave signal to cause the oscillating member to vibrate so as to diffuse fragrance liquid that contacts the oscillating member so as to produce a fragrance. The fragrance exits a vent in the casing.
Abstract:
Plasma is generated using elemental hydrogen, a weak oxidizing agent, and a fluorine containing gas. An inert gas is introduced to the plasma downstream of the plasma source and upstream of a showerhead that directs gas mixture into the reaction chamber where the mixture reacts with the high-dose implant resist. The process removes both the crust and bulk resist layers at a high strip rate, and leaves the work piece surface substantially residue free with low silicon loss.
Abstract:
Plasma is generated using elemental hydrogen, a weak oxidizing agent, and a fluorine containing gas. An inert gas is introduced to the plasma downstream of the plasma source and upstream of a showerhead that directs gas mixture into the reaction chamber where the mixture reacts with the high-dose implant resist. The process removes both the crust and bulk resist layers at a high strip rate, and leaves the work piece surface substantially residue free with low silicon loss.
Abstract:
A fragrance emitting apparatus (20) for connection to a USB port. In one embodiment, the fragrance emitting apparatus (20) comprises a casing (22) having an interior and a fragrance vent (36A, 36B) in communication with the interior, a heating element (42) located within the casing (22) that generates heat when electrical power is applied thereto, a USB connector (28) connected to the casing (22) and electrically connected to the heating element (42) so as to provide electrical power to the heating element (42) when the USB connector (28) is connected to a USB port, and a stationary fragrance member (50) located within the casing (22) to provide a fragrance, scent or aroma when heat is applied to the fragrance member (50). The fragrance member (50) is proximate to the heating element (42) so that heat generated by the heating element (42) causes the fragrance member (50) to emit a fragrance, scent or aroma which exits the interior of the casing (22) through the vent (36A, 36B). Other embodiments of the apparatus of the present invention are disclosed herein.
Abstract:
The invention is generally directed to a drug-release composition that contains drug-linker-drug compound that is combined with another therapeutic agent that can be an antirestenotic agent. The therapeutic agent can be partially bound to the drug-linker-drug compound, miscible with the drug-linker-drug compound, combined with the drug-linker-drug compound at various ratios, and tuned to control the release of drugs to a tissue in need thereof.