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公开(公告)号：US06622735B2
公开(公告)日：2003-09-23
申请号：US09885711
申请日：2001-06-20
申请人： Yoshihiro Hirata , Yuko Yamashita
发明人： Yoshihiro Hirata , Yuko Yamashita
IPC分类号： A45D100
摘要： An improved hair iron prevents damage to and frizziness of hair. A hair heating surface and a pressing surface of an iron for hair treatment are covered with iron press covers made from a woven or nonwoven cloth of a heat-resistant synthetic fiber.
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公开(公告)号：US5820810A
公开(公告)日：1998-10-13
申请号：US918512
申请日：1997-08-22
申请人： Yoshihiro Hirata
发明人： Yoshihiro Hirata
CPC分类号： B28B1/263 , B28B7/342 , H01L41/333
摘要： A method of forming a fine ceramics structure having columns with a fine pattern of width and a high aspect ratio includes steps of charging a plastic mold with a ceramics slurry, solidifying the ceramics slurry, and thereafter removing the plastic mold. The plastic mold is removed by heating the plastic mold in a vacuum, employing laser ablation, employing plasma etching, or employing a solvent of low viscosity dissolving plastic mold. Especially, the plastic mold is made of acrylic, the ceramics structure is made of lead zirconate titanate, and the mold is removed by laser ablation. The resulting fine pattern ceramics structure may have columns with an aspect ratio of at least 10, and particularly a height of 100 .mu.m and a diameter of 10 .mu.m.
摘要翻译： 形成具有宽度和高纵横比精细图案的柱的精细陶瓷结构的方法包括以下步骤：向陶瓷浆料填充塑料模具，固化陶瓷浆料，然后除去塑料模具。 通过使用激光烧蚀，采用等离子体蚀刻或采用低粘度溶解塑料模具的溶剂，在真空中加热塑料模具来除去塑料模具。 特别是塑料模具由丙烯酸制成，陶瓷结构由锆钛酸铅制成，模具通过激光烧蚀除去。 所得精细图案陶瓷结构可以具有长宽比为至少10，特别是高度为100μm，直径为10μm的柱。
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公开(公告)号：US4487161A
公开(公告)日：1984-12-11
申请号：US201115
申请日：1980-10-28
IPC分类号： H01L21/205 , C23C16/507 , H01L21/31 , C23C13/08
CPC分类号： C23C16/507
摘要： A semiconductor device manufacturing unit in which plasma gas is maintained sealed in a quartz tube by a magnet disposed outside the quartz tube to make the density of plasma gas high and uniform thereby improving the quality of CVD films deposited with the gas and reducing the processing time for semiconductor wafers. A wafer holder is movably mounted in the quartz tube. A support bar is provided for moving the wafer holder with the support bar serving additionally as a ground electrode. An RF electrode and magnet are disposed outside the quartz tube. A heater may be disposed outside the RF electrode and magnet.
摘要翻译： 一种半导体器件制造单元，其中通过设置在石英管外部的磁体将等离子体气体保持密封在石英管中，使得等离子体气体的密度高且均匀，从而提高了沉积在气体上的CVD膜的质量并缩短了处理时间 用于半导体晶片。 晶片保持器可移动地安装在石英管中。 提供支撑杆用于移动具有另外用作接地电极的支撑杆的晶片保持器。 RF电极和磁体设置在石英管的外部。 加热器可以设置在RF电极和磁体之外。
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公开(公告)号：US4465529A
公开(公告)日：1984-08-14
申请号：US385137
申请日：1982-06-04
IPC分类号： C30B31/18 , H01L21/223 , H01L21/225 , H01L21/263 , H01L21/268
CPC分类号： H01L21/2254 , C30B31/185 , H01L21/223 , H01L21/2636 , H01L21/268
摘要： A method for producing an impurity containing semiconductor substrate includes depositing an impurity on selected portions of the substrate by placing a charge on the substrate and converting a gaseous impurity containing atmosphere into a plasma. The impurity may then be diffused into the substrate to a controlled and shallow depth by employing a laser or the like to selectively irradiate the impurity.
摘要翻译： 一种用于制造含杂质的半导体衬底的方法包括通过在衬底上放置电荷并将含气态杂质的气氛转化成等离子体来在衬底的选定部分上沉积杂质。 然后可以通过使用激光等来选择性地照射杂质，将杂质扩散到衬底中至受控和浅的深度。
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公开(公告)号：US4454166A
公开(公告)日：1984-06-12
申请号：US455251
申请日：1983-01-03
申请人： Haruhiko Abe , Hiroshi Harada , Shigeji Kinoshita , Yoshihiro Hirata , Masahiko Denda , Yoichi Akasaka
发明人： Haruhiko Abe , Hiroshi Harada , Shigeji Kinoshita , Yoshihiro Hirata , Masahiko Denda , Yoichi Akasaka
IPC分类号： H01L21/265 , H01L21/314 , H01L21/318 , H01L21/768 , H01L21/283
CPC分类号： H01L21/76889 , H01L21/3144
摘要： A nitride film is formed on a main surface of a semiconductor substrate by plasma CVD process and an oxygen-containing layer is formed on the nitride film and an aluminum-containing film is further formed on the oxygen-containing layer.
摘要翻译： 通过等离子体CVD法在半导体基板的主表面上形成氮化物膜，在氮化膜上形成含氧层，在含氧层上形成含铝膜。
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