Hair design system and its applications
    1.
    发明授权
    Hair design system and its applications 失效
    头发设计系统及其应用

    公开(公告)号:US06994552B2

    公开(公告)日:2006-02-07

    申请号:US10312190

    申请日:2001-07-02

    IPC分类号: G09B19/10

    摘要: As shown in FIG. 1, a hairstyle design system comprises an image-processing device 1, an input/output device 2, a graphic system 3, a display device 4, a head-development drawing information-storage device 5, and a hairstyle-design information-storage device 6. In other words, the beautician or the customer designs a desired hairstyle while looking at the display device 4. Information on the designed hairstyle is stored in the head-development drawing information-storage device 5 as numerals and/or symbols assigned to each of a plurality of divided sections. When processing hair, the beautician displays a head-development drawing on the display device 4, and by referring to the drawing the beautician cuts or applies permanent wave to the hair in order to design a hairstyle precisely as desired by the customer and reproduce a predetermined hairstyle accurately.

    摘要翻译: 如图所示。 如图1所示,发型设计系统包括图像处理装置1,输入/输出装置2,图形系统3,显示装置4,头部显影图形信息存储装置5和发型设计信息存储装置 装置6。 换句话说,美容师或客户在看待显示装置4时设计出期望的发型。 关于设计的发型的信息被存储在头部显影图形信息存储装置5中,作为分配给多个分割部分中的每一个的数字和/或符号。 在处理头发时,美容师在显示装置4上显示头部显影图,并且通过参照图示,美容师将头发剪切或施加永久波,以便根据顾客的需要精确设计发型,并再现预定的 发型准确。

    Hair styling method
    2.
    发明申请
    Hair styling method 审中-公开
    发型方法

    公开(公告)号:US20050227206A1

    公开(公告)日:2005-10-13

    申请号:US11148473

    申请日:2005-06-09

    摘要: A hair-styling form includes strips attached thereto, each strip having a length of hair. The form is divided into multiple regions, and the strips are pasted on each region. The strip is made of a plain paper, cardboard, or plastic sheet and indicates information of at least one of hair length, permanent wave, or hair color requested by a customer.

    摘要翻译: 头发造型形式包括连接到其上的条带,每个条带具有一定长度的头发。 形式分为多个区域,每个区域都贴上条带。 该条由普通纸,纸板或塑料片制成,并指示客户要求的头发长度,永久波或头发颜色中的至少一种的信息。

    Hair repair, styling, and straightening process
    5.
    发明授权
    Hair repair, styling, and straightening process 有权
    头发修复,造型和矫直过程

    公开(公告)号:US6125856A

    公开(公告)日:2000-10-03

    申请号:US296689

    申请日:1999-04-21

    申请人: Yuko Yamashita

    发明人: Yuko Yamashita

    摘要: An improved hair repair, styling, and straightening process wherein the optimal reaction point of the hair with the straightening solution is more accurately controlled and monitored. The hair straightening solution has a unique jell-like consistency to more completely and easily be rinsed from the hair. A unique pre-oxidizing set is applied to the hair by application of heat and compression while the hair remains in an elastic condition. The pre-oxidizing set provides the ability to make fine styling adjustments to the hair. A substantial improvement in straightening, styling, and repairing damaged hair is achieved.

    摘要翻译: 改进的头发修整,造型和矫直过程,其中更精确地控制和监测头发与矫直溶液的最佳反应点。 头发矫直溶液具有独特的凝胶状稠度,可以更完全地更容易地从头发上清洗。 当头发保持在弹性状态时,通过施加热和压缩将独特的预氧化组合施加到头发上。 预氧化组合可以对头发进行精细的造型调整。 实现矫直,造型和修复受损头发的实质性改善。

    Photoresist composition
    7.
    发明授权
    Photoresist composition 有权
    光刻胶组成

    公开(公告)号:US08524440B2

    公开(公告)日:2013-09-03

    申请号:US12983729

    申请日:2011-01-03

    IPC分类号: G03F7/26

    摘要: The present invention provides a photoresist composition comprisinga resin which comprises a structural unit represented by the formula (I): wherein Q1 and Q2 independently represent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group etc., X1 represents —O—CO— etc., and A+ represents an organic counter ion, and a compound represented by the formula (D′): wherein R51, R52, R53 and R54 independently represent a C1-C20 alkyl group etc., and A11 represents a C1-C36 saturated cyclic hydrocarbon group which may have one or more substituents and which may contain one or more heteroatoms.

    摘要翻译: 本发明提供了包含树脂的光致抗蚀剂组合物,其包含式(I)表示的结构单元:其中Q1和Q2独立地表示氟原子等,U表示C1-C20二价烃基等,X 1表示 - O-CO-等,A +表示有机抗衡离子,由式(D')表示的化合物:其中R51,R52,R53和R54独立地表示C1-C20烷基等,A11表示 可以具有一个或多个取代基且可以含有一个或多个杂原子的C 1 -C 36饱和环烃基。