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公开(公告)号：US20100035519A1
公开(公告)日：2010-02-11
申请号：US12579245
申请日：2009-10-14
IPC分类号： B24B49/12
CPC分类号： H01L22/26 , B24B37/013 , B24B37/205 , B24B49/08 , B24B49/12 , B24D7/14 , H01L21/30625 , H01L21/31053 , H01L21/31055 , H01L21/3212 , H01L21/67075 , H01L21/67092 , H01L21/67253
摘要： A polishing system includes a platen having a top surface to receive a polishing pad, a recess in the top surface, and a cavity inside the platen spaced from the recess, a carrier head to hold a surface of a substrate against the polishing pad on the platen, a monitoring module located in the cavity, the monitoring module including a light source and a detector, an optical head removably mounted in the recess in the top surface platen, and an optical fiber having a proximate end coupled to the monitoring module and a distal end held by the optical head holding the distal end of the optical fiber in a position to direct light through a window in the polishing pad to the surface of the substrate and receive reflected light from the surface of the substrate.
摘要翻译： 抛光系统包括具有顶表面以接收抛光垫的台板，顶表面中的凹部以及与凹部间隔开的压板内的空腔，用于将基板的表面保持在抛光垫上的载体头 压板，位于空腔中的监测模块，监测模块包括光源和检测器，可拆卸地安装在顶表面压板中的凹部中的光学头，以及具有耦合到监测模块的近端的光纤和 远端由保持光纤的远端的光学头保持在将光引导至抛光垫中的窗口的位置，并接收来自基板表面的反射光。
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公开(公告)号：US07651385B2
公开(公告)日：2010-01-26
申请号：US11894785
申请日：2007-08-20
CPC分类号： H01L22/26 , B24B37/013 , B24B37/205 , B24B49/08 , B24B49/12 , B24D7/14 , H01L21/30625 , H01L21/31053 , H01L21/31055 , H01L21/3212 , H01L21/67075 , H01L21/67092 , H01L21/67253
摘要： A polishing system includes a platen, a carrier head to hold a surface of a substrate against a polishing pad on the platen, a monitoring module including a light source and a detector, an optical fiber having a proximate end coupled to the monitoring module and a distal end, and an optical head removably mounted in the platen. The optical head holds the distal end of the optical fiber to direct light through a window in the polishing pad to the surface of the substrate and receive reflected light from the surface of the substrate, and the optical head is configured to adjust a distance from the distal end of the fiber to the window.
摘要翻译： 抛光系统包括压板，用于将基板的表面保持在压板上的抛光垫上的载体头，包括光源和检测器的监测模块，具有耦合到监测模块的近端的光纤和 远端，以及可拆卸地安装在压板中的光学头。 光学头保持光纤的远端以将光引导到抛光垫中的窗口到达基板的表面，并接收来自基板表面的反射光，并且光学头被配置成调整距离 纤维的末端到窗户。
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公开(公告)号：US07614936B2
公开(公告)日：2009-11-10
申请号：US11747786
申请日：2007-05-11
CPC分类号： H01L22/26 , B24B37/013 , B24B37/205 , B24B49/08 , B24B49/12 , B24D7/14 , H01L21/30625 , H01L21/31053 , H01L21/31055 , H01L21/3212 , H01L21/67075 , H01L21/67092 , H01L21/67253
摘要： Methods and apparatus for providing a flushing system for flushing a top surface of an optical head. The flushing system includes a source of gas configured to provide a flow of gas, a delivery nozzle, a delivery line that connects the source of gas to the delivery nozzle, a vacuum source configured to provide a vacuum, a vacuum nozzle, and a vacuum line that connects the vacuum source to the vacuum nozzle. The source of gas and the delivery nozzle are configured to direct a flow of gas across the top surface of the optical head. The vacuum nozzle and vacuum sources are configured so that the flow if gas is laminar.
摘要翻译： 用于提供用于冲洗光学头的顶表面的冲洗系统的方法和装置。 冲洗系统包括构造成提供气体流的气体源，输送喷嘴，将气体源连接到输送喷嘴的输送管线，被配置为提供真空，真空喷嘴和真空的真空源 将真空源连接到真空喷嘴。 气体源和输送喷嘴构造成引导气流穿过光学头的顶表面。 真空喷嘴和真空源被配置为使得气体是层流的流动。
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公开(公告)号：US07210980B2
公开(公告)日：2007-05-01
申请号：US11213623
申请日：2005-08-26
IPC分类号： B24B7/22
CPC分类号： B24B37/205 , B24D18/00
摘要： A polishing pad, polishing system, method of making a polishing pad and method of using a polishing pad. The polishing pad includes a polishing layer having a polishing surface, a backing layer with an aperture and a first portion that is permeable to liquid, and a sealant that penetrates a second portion of the backing layer adjacent to and surrounding the aperture such that the second portion is substantially impermeable to liquid. The aperture is positioned below a substantially fluid-impermeable element.
摘要翻译： 抛光垫，抛光系统，制造抛光垫的方法和抛光垫的使用方法。 抛光垫包括具有抛光表面的抛光层，具有孔的背衬层和可渗透液体的第一部分，以及密封剂，该密封剂穿透邻近并包围孔的背衬层的第二部分，使得第二 部分对液体基本上是不可渗透的。 孔被定位在基本上不透液体的元件之下。
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公开(公告)号：US08834229B2
公开(公告)日：2014-09-16
申请号：US13090926
申请日：2011-04-20
申请人： Jeffrey Drue David , Harry Q. Lee
发明人： Jeffrey Drue David , Harry Q. Lee
CPC分类号： B24B49/12 , B24B37/013 , B24B37/205 , G01N21/25
摘要： A method of controlling polishing includes polishing a substrate and receiving an identification of a selected spectral feature, a wavelength range having a width, and a characteristic of the selected spectral feature to monitor during polishing. A sequence of spectra of light from the substrate is measured while the substrate is being polished. A sequence of values of the characteristic of the selected spectral feature is generated from the sequence of spectra. For at least some spectra from the sequence of spectra, a modified wavelength range is generated based on a position of the spectral feature within a previous wavelength range used for a previous spectrum in the sequence of spectra, the modified wavelength range is searched for the selected spectral feature, and a value of a characteristic of the selected spectral feature is determined.
摘要翻译： 控制抛光的方法包括抛光衬底并接收所选择的光谱特征的识别，具有宽度的波长范围以及所选择的光谱特征的特征以在抛光期间进行监视。 在衬底被抛光的同时测量来自衬底的光的光谱序列。 从光谱序列中产生所选光谱特征的特征值的序列。 对于来自光谱序列的至少一些光谱，基于在光谱序列中用于先前光谱的先前波长范围内的光谱特征的位置来生成修改的波长范围，将修改的波长范围搜索所选择的 光谱特征和所选光谱特征的特征值被确定。
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公开(公告)号：US08467896B2
公开(公告)日：2013-06-18
申请号：US13480434
申请日：2012-05-24
摘要： A substrate having a plurality of zones is polished and spectra are measured. For each zone, a first linear function fits a sequence of index values associated with reference spectra that best match the measured spectra. A projected time at which a reference zone will reach the target index value is determined based on the first linear function, and for at least one adjustable zone, a polishing parameter adjustment is calculated such that the adjustable zone has closer to the target index at the projected time than without such adjustment. The adjustment is calculated based on a feedback error calculated for a previous substrate. The feedback error for a subsequent substrate is calculated based on a second linear function that fits a sequence of index values associated with reference spectra that best match spectra measured after the polishing parameter is adjusted.
摘要翻译： 研磨具有多个区域的基板并测量光谱。 对于每个区域，第一个线性函数拟合与参考光谱相关联的索引值序列，该参考光谱与测量的光谱最匹配。 基于第一线性函数确定参考区域将达到目标指标值的预计时间，并且对于至少一个可调整区域，计算抛光参数调整，使得可调节区域更接近目标索引处的目标索引 预计时间比没有这样的调整。 基于对先前基板计算的反馈误差来计算调整。 基于适合与调整抛光参数之后测量的最佳匹配光谱的参考光谱相关联的索引值序列的第二线性函数来计算后续衬底的反馈误差。
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公开(公告)号：US20110275281A1
公开(公告)日：2011-11-10
申请号：US13090926
申请日：2011-04-20
申请人： Jeffrey Drue David , Harry Q. Lee
发明人： Jeffrey Drue David , Harry Q. Lee
IPC分类号： B24B49/12
CPC分类号： B24B49/12 , B24B37/013 , B24B37/205 , G01N21/25
摘要： A method of controlling polishing includes polishing a substrate and receiving an identification of a selected spectral feature, a wavelength range having a width, and a characteristic of the selected spectral feature to monitor during polishing. A sequence of spectra of light from the substrate is measured while the substrate is being polished. A sequence of values of the characteristic of the selected spectral feature is generated from the sequence of spectra. For at least some spectra from the sequence of spectra, a modified wavelength range is generated based on a position of the spectral feature within a previous wavelength range used for a previous spectrum in the sequence of spectra, the modified wavelength range is searched for the selected spectral feature, and a value of a characteristic of the selected spectral feature is determined.
摘要翻译： 控制抛光的方法包括抛光衬底并接收所选择的光谱特征的识别，具有宽度的波长范围以及所选择的光谱特征的特征以在抛光期间进行监视。 在衬底被抛光的同时测量来自衬底的光的光谱序列。 从光谱序列中产生所选光谱特征的特征值的序列。 对于来自光谱序列的至少一些光谱，基于在光谱序列中用于先前光谱的先前波长范围内的光谱特征的位置来生成修改的波长范围，将修改的波长范围搜索所选择的 光谱特征和所选光谱特征的特征值被确定。
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98.发明授权Automatic initiation of reference spectra library generation for optical monitoring 有权用于光学监测的自动启动参考光谱库生成公开(公告)号：US08666665B2
公开(公告)日：2014-03-04
申请号：US13088144
申请日：2011-04-15
申请人： Jeffrey Drue David , Harry Q. Lee , Jun Qian , Jimin Zhang
发明人： Jeffrey Drue David , Harry Q. Lee , Jun Qian , Jimin Zhang
CPC分类号： G01J3/46 , B24B37/013 , B24B37/042 , B24B49/12
摘要： A method of generating reference spectra includes polishing a first substrate in a polishing apparatus, measuring a sequence of spectra from the first substrate during polishing with an in-situ optical monitoring system, for each spectrum in the sequence of spectra, determining a best matching reference spectrum from a first plurality of first reference spectra to generate a sequence of reference spectra, calculating a value of a metric of fit of the sequence of spectra to the sequence of reference spectra, comparing the value of the metric of fit to a threshold value and determining whether to generate a second library based on the comparison, and if the second library is determined to be generated, storing the sequence of spectra as a second plurality of reference spectra.
摘要翻译： 产生参考光谱的方法包括抛光抛光装置中的第一衬底，在光谱序列中的每个光谱下，用原位光学监测系统在抛光期间测量来自第一衬底的光谱序列，确定最佳匹配参考 频谱从第一多个第一参考光谱生成参考光谱序列，计算光谱序列的拟合度量与参考光谱序列的值，将拟合度量的值与阈值进行比较，以及 基于所述比较确定是否生成第二库，以及如果确定要生成所述第二库，则将所述光谱序列存储为第二多个参考光谱。
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公开(公告)号：US08190285B2
公开(公告)日：2012-05-29
申请号：US12781644
申请日：2010-05-17
摘要： A substrate having a plurality of zones is polished and spectra are measured. For each zone, a first linear function fits a sequence of index values associated with reference spectra that best match the measured spectra. A projected time at which a reference zone will reach the target index value is determined based on the first linear function, and for at least one adjustable zone, a polishing parameter adjustment is calculated such that the adjustable zone has closer to the target index at the projected time than without such adjustment. The adjustment is calculated based on a feedback error calculated for a previous substrate. The feedback error for a subsequent substrate is calculated based on a second linear function that fits a sequence of index values associated with reference spectra that best match spectra measured after the polishing parameter is adjusted.
摘要翻译： 研磨具有多个区域的基板并测量光谱。 对于每个区域，第一个线性函数拟合与参考光谱相关联的索引值序列，该参考光谱与测量的光谱最匹配。 基于第一线性函数确定参考区域将达到目标指标值的预计时间，并且对于至少一个可调整区域，计算抛光参数调整，使得可调节区域更接近目标索引处的目标索引 预计时间比没有这样的调整。 基于对先前基板计算的反馈误差来计算调整。 基于适合与调整抛光参数之后测量的最佳匹配光谱的参考光谱相关联的索引值序列的第二线性函数来计算后续衬底的反馈误差。
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100.发明申请Automatic Initiation Of Reference Spectra Library Generation For Optical Monitoring 有权自动启动参考光谱库生成用于光学监测公开(公告)号：US20110301847A1
公开(公告)日：2011-12-08
申请号：US13088144
申请日：2011-04-15
申请人： Jeffrey Drue David , Harry Q. Lee , Jun Qian , Jimin Zhang
发明人： Jeffrey Drue David , Harry Q. Lee , Jun Qian , Jimin Zhang
IPC分类号： G06F19/00
CPC分类号： G01J3/46 , B24B37/013 , B24B37/042 , B24B49/12
摘要： A method of generating reference spectra includes polishing a first substrate in a polishing apparatus, measuring a sequence of spectra from the first substrate during polishing with an in-situ optical monitoring system, for each spectrum in the sequence of spectra, determining a best matching reference spectrum from a first plurality of first reference spectra to generate a sequence of reference spectra, calculating a value of a metric of fit of the sequence of spectra to the sequence of reference spectra, comparing the value of the metric of fit to a threshold value and determining whether to generate a second library based on the comparison, and if the second library is determined to be generated, storing the sequence of spectra as a second plurality of reference spectra.
摘要翻译： 产生参考光谱的方法包括抛光抛光装置中的第一衬底，在光谱序列中的每个光谱下，用原位光学监测系统在抛光期间测量来自第一衬底的光谱序列，确定最佳匹配参考 频谱从第一多个第一参考光谱生成参考光谱序列，计算光谱序列的拟合度量与参考光谱序列的值，将拟合度量的值与阈值进行比较，以及 基于所述比较确定是否生成第二库，以及如果确定要生成所述第二库，则将所述光谱序列存储为第二多个参考光谱。
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