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168 条记录 (耗时 0.041 秒)

    DISPERSIONS OF POLYURETHANES, THEIR PREPARATION AND USE
    91.
    发明申请
    DISPERSIONS OF POLYURETHANES, THEIR PREPARATION AND USE 审中-公开
    聚氨酯的分散体，其制备和使用

    公开(公告)号：US20110143055A1

    公开(公告)日：2011-06-16

    申请号：US13058200

    申请日：2009-07-30

    申请人： Holger Tuerk ,  Reinhold Schwalm ,  Cedric Du fresne von hohenesche ,  Martin Kaarup Bek

    发明人： Holger Tuerk ,  Reinhold Schwalm ,  Cedric Du fresne von hohenesche ,  Martin Kaarup Bek

    IPC分类号： C09D11/10 ,  B05D5/00 ,  C23C14/22

    CPC分类号： B41F31/00 ,  C08G18/6659 ,  C08G18/672 ,  C08G18/7837 ,  C09D11/101 ,  C09D17/001 ,  C09D175/16 ,  C08G18/0823

    摘要： The present invention provides the use of aqueous dispersions comprising a pigment (B) at least partially enveloped by polyurethane (A) and further comprising at least one polymerization inhibitor (C), said polyurethane (A) being obtainable by reaction of (a) 15% to 70% by weight of di- or polyisocyanate comprising on average from 1 to 10 allophanate groups and on average from 1 to 10 C—C double bonds per molecule, and optionally (b) 0% to 60% by weight of further di- or polyisocyanate, with (c) 5% to 50% by weight of compound having at least two isocyanate-reactive groups, weight % ages being based on total polyurethane (A), in printing inks.

    摘要翻译： 本发明提供了包含至少部分地被聚氨酯（A）包封的颜料（B）的水分散体的用途，并且还包含至少一种阻聚剂（C），所述聚氨酯（A）可通过（a）15 ％至70重量％的包含平均1至10个脲基甲酸酯基团的平均1至10个C-C双键的二 - 或多异氰酸酯，和任选（b）0至60重量％的另外的二 - 或多异氰酸酯，与（c）5重量％至50重量％的具有至少两个异氰酸酯反应性基团的化合物，基于总聚氨酯（A）的重量％年龄在印刷油墨中。

    Radiation-sensitive mixture containing acid-labile groups and production of relief patterns
    99.
    发明授权
    Radiation-sensitive mixture containing acid-labile groups and production of relief patterns 失效
    含有酸不稳定组的辐射敏感混合物和浮雕图案的生成

    公开(公告)号：US5318876A

    公开(公告)日：1994-06-07

    申请号：US862949

    申请日：1992-04-03

    申请人： Reinhold Schwalm ,  Horst Binder ,  Dirk Funhoff

    发明人： Reinhold Schwalm ,  Horst Binder ,  Dirk Funhoff

    IPC分类号： C08K5/42 ,  C08K5/51 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  G03G1/73 ,  G03G5/56

    CPC分类号： G03F7/0045 ,  Y10S430/115 ,  Y10S430/122

    摘要： A radiation-sensitive mixture which contains(a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and(b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains one or more groups cleavable by an acid and in addition a group which forms a strong acid under the action of radiation, and additionally(c) an alkyl- or arylsulfonate of a hydroxyaromatic, is suitable for the production of relief patterns.

    摘要翻译： 一种辐射敏感性混合物，其包含（a）不溶于水但可溶于碱性水溶液的聚合物粘合剂，和（b）通过酸的作用使其在碱性显影剂中的溶解度增加的有机化合物，并含有一种 或更多的基团，并且另外在辐射作用下形成强酸的基团，另外（c）羟基芳族化合物的烷基或芳基磺酸盐适用于产生浮雕图案。

    Process for developing a positive-working photoresist containing poly(p-hydroxystyrene) and sulfonium salt with an aqueous developer containing basic organic compounds
    100.
    发明授权
    Process for developing a positive-working photoresist containing poly(p-hydroxystyrene) and sulfonium salt with an aqueous developer containing basic organic compounds 失效
    用含有碱性有机化合物的含水显影剂开发含有聚（对羟基苯乙烯）和锍盐的正性光致抗蚀剂的方法

    公开(公告)号：US5252436A

    公开(公告)日：1993-10-12

    申请号：US976004

    申请日：1992-11-13

    申请人： Horst Binder ,  Reinhold Schwalm

    发明人： Horst Binder ,  Reinhold Schwalm

    IPC分类号： G03F7/32 ,  G03F7/30

    CPC分类号： G03F7/322

    摘要： An aqueous developer suitable in particular for developing photoresists which contain a phenolic resin and an onium salt contains from 0.5 to 5 % by weight of a tetraalkylammonium hydroxide and from 5 to 25% by weight of at least one amine of the general formula ##STR1## where R.sup.1, R.sup.2 and R.sup.3 are identical or different and each is hydrogen, alkyl, hydroxyalkyl or aminoalkyl, or two of R.sup.1 to R.sup.3 combine to form a N-containing ring, with at least one of R.sup.1 to R.sup.3 being hydroxyalkyl or aminoalkyl.

    摘要翻译： 特别适用于显影含有酚醛树脂和鎓盐的光致抗蚀剂的水性显影剂含有0.5-5重量％的四烷基氢氧化铵和5-25重量％的至少一种通式为“IMAGE”的胺， 其中R 1，R 2和R 3相同或不同并且各自为氢，烷基，羟基烷基或氨基烷基，或者R 1至R 3中的两个结合形成含N的环，其中至少一个R 1至R 3为羟烷基或氨基烷基。