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公开(公告)号：US07160666B2
公开(公告)日：2007-01-09
申请号：US10378920
申请日：2003-03-05
申请人： Kazuyoshi Mizutani , Shinichi Kanna
发明人： Kazuyoshi Mizutani , Shinichi Kanna
CPC分类号： G03F7/0397 , G03F7/0046 , G03F7/0395 , Y10S430/108 , Y10S430/11 , Y10S430/111 , Y10S430/115 , Y10S430/122 , Y10S430/126
摘要： A photosensitive resin composition of the present invention comprises (A) a resin having a repeating unit represented by formula (IA) and a repeating unit containing an acid decomposable group and copolymerizable with formula (IA), which is decomposed under the action of an acid to increase the solubility in an alkali developer, (B1) a compound capable of generating an aliphatic or aromatic sulfonic acid substituted by at least one fluorine atom upon irradiation with actinic rays or radiation, (B2) a compound capable of generating an aliphatic or aromatic sulfonic acid containing no fluorine atom, or an aliphatic or aromatic carboxylic acid upon irradiation with actinic rays or radiation, and (C) a solvent.
摘要翻译： 本发明的感光性树脂组合物包含（A）具有式（IA）所示重复单元的树脂和含有酸分解基团并且可与式（IA）共聚的重复单元，其在酸的作用下分解 为了提高在碱性显影剂中的溶解性，（B1）能够在用光化射线或辐射照射时能够产生被至少一个氟原子取代的脂肪族或芳香族磺酸的化合物，（B2）能够产生脂肪族或芳香族的化合物 不含氟原子的磺酸，或光化射线或辐射照射时的脂肪族或芳香族羧酸，（C）溶剂。
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92.发明申请公开(公告)号：US20050042543A1
公开(公告)日：2005-02-24
申请号：US10921962
申请日：2004-08-20
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0392 , Y10S430/108
摘要： A positive photoresist composition containing: (A) a resin which contains at least one of a repeating unit represented by the formula (IA) defiend herein and a repeating unit represented by the formula (IB) defined herein, and is decomposed by an action of an acid and shows an increase in a solubility in an alkali developer; and (B) as compounds capable of generating an acid upon irradiation with one of an actinic ray and a radiation, at least two compounds selected from the compounds (B1), (B2), (B3) and (B4) as defiend herein.
摘要翻译： 一种正性光致抗蚀剂组合物，其含有：（A）含有本文所述的由式（IA）表示的重复单元和本文定义的式（IB）表示的重复单元中的至少一种的树脂，并且通过 酸显示出在碱性显影剂中的溶解度的增加; 和（B）作为能够在用光化学射线和辐射之一照射时产生酸的化合物，至少两种选自化合物（B1），（B2），（B3）和（B4）的化合物，如本文所述。
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公开(公告)号：US06852467B2
公开(公告)日：2005-02-08
申请号：US09961281
申请日：2001-09-25
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0046 , G03F7/0392 , G03F7/0395 , Y10S430/108
摘要： A positive resist composition comprising: (A) a fluorine group-containing resin having: a structure wherein at least one of the main chain and the side chain of the polymer skeleton has at least one fluorine atom; and having a group capable of decomposing under the action of an acid to increase the solubility in an alkali developer; (B) a compound capable of generating an acid upon irradiation with one of actinic ray and radiation, and (C) a surfactant containing at least one of a silicon atom and a fluorine atom.
摘要翻译： 一种正型抗蚀剂组合物，其包含：（A）含氟基树脂，其具有以下结构：其中所述聚合物骨架的主链和侧链中的至少一个具有至少一个氟原子; 并且具有能够在酸的作用下能够分解以增加在碱性显影剂中的溶解度的基团;（B）在用光化学射线和辐射之一照射时能够产生酸的化合物，和（C）含有 硅原子和氟原子中的至少一个。
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公开(公告)号：US06830871B2
公开(公告)日：2004-12-14
申请号：US10642182
申请日：2003-08-18
IPC分类号： G03F720
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/108 , Y10S430/12
摘要： A chemical amplification type resist composition comprising: (a) a resin comprising repeating units having a side chain containing the specific partial structure and which increases the solubility in an alkaline developing solution by the action of an acid, (b) a compound capable of generating an acid upon irradiation with actinic rays or a radiation, (c) a low-molecular compound having a molecular weight of 3,000 or lower, wherein the value determined with the specific calculation formula is from 0.1 to 0.5, and (d) a solvent.
摘要翻译： 一种化学放大型抗蚀剂组合物，其包含：（a）包含具有侧链的重复单元的树脂，所述侧链含有特定部分结构，并且通过酸的作用增加在碱性显影液中的溶解度，（b）能够产生 （3）分子量为3000以下的低分子化合物，其特征在于，计算式为0.1〜0.5，（d）为溶剂。
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公开(公告)号：US06811947B2
公开(公告)日：2004-11-02
申请号：US10372240
申请日：2003-02-25
IPC分类号： G03F7039
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , Y10S430/108 , Y10S430/115
摘要： A positive resist composition comprising (A) a resin, which is decomposed by the action of an acid to increase solubility in an alkali developing solution, having a repeating unit represented by formula (Y) defined in the specification, (B) a compound capable of generating an acid upon irradiation of an actinic ray or radiation, and (C) a solvent.
摘要翻译： 一种正型抗蚀剂组合物，其包含（A）通过酸的作用分解以提高在碱性显影液中的溶解度的树脂，其具有由说明书中定义的式（Y）表示的重复单元，（B）具有化合物 在光化射线或辐射照射时产生酸，和（C）溶剂。
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公开(公告)号：US06727036B2
公开(公告)日：2004-04-27
申请号：US09748198
申请日：2000-12-27
申请人： Shinichi Kanna , Kunihiko Kodama
发明人： Shinichi Kanna , Kunihiko Kodama
IPC分类号： G03C173
CPC分类号： G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/115
摘要： A positive-working radiation-sensitive composition containing a resin having an acid-decomposing group having a specific acetal structure, and being decomposed by the action of an acid to increase the solubility thereof in an alkali developer; a compound generating an acid by the irradiation of an active light or radiation and contributes to the decomposition reaction of the acid-decomposing group of the resin; a compound generating an acid by the irradiation of an active light or radiation but does not contribute to the decomposition reaction of the acid-decomposing group of the resin; a surface active agent, and a solvent.
摘要翻译： 一种正性辐射敏感性组合物，其含有具有特定缩醛结构的酸分解基团的树脂，并通过酸的作用而分解，以增加其在碱显影剂中的溶解度; 通过照射活性光或辐射而产生酸的化合物，并有助于树脂的酸分解基团的分解反应; 通过照射活性光或辐射而产生酸的化合物，但不影响树脂的酸分解基团的分解反应; 表面活性剂和溶剂。
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