公开(公告)号：US06713705B1

公开(公告)日：2004-03-30

申请号：US10148545

申请日：2002-06-04

申请人： Seiji Satou ,  Akihiro Goto

发明人： Seiji Satou ,  Akihiro Goto

IPC分类号： B23H702

CPC分类号： B23H7/02 ,  B23H7/10 ,  B23H7/101 ,  B23H7/102

摘要： A workpiece is machined by consecutively performing at least two of machining in a machining solution, machining in a mist and machining in a gas, such that at a point of time before the start of machining, except for the machining conducted in the machining solution, and a point of time after the operation of an automatic wire connecting device for conducting an automatic wire connection while the wire electrode is being held by a water column, the machining solution nozzles, can change from supplying the machining solution to supplying the pressurized gas. By the machining solution nozzles, liquid of the machining solution adhering to the workpiece and liquid adhering to the machining solution nozzle which is capable of dripping onto a face to be machined of the workpiece, are removed.

摘要翻译： 通过连续执行加工溶液中的加工中的至少两个，在雾中进行加工和气体加工中的至少两个加工，使得在加工开始之前的时间点，除了在加工溶液中进行的加工之外， 以及在线电极被水柱保持的情况下，用于进行自动线连接的自动线连接装置的操作后的时间点，加工液喷嘴可以从供给加压溶液到供给加压气体而变化。 通过加工溶液喷嘴，去除附着在工件上的加工液的液体和附着在能够滴加到被加工面上的加工液喷嘴的液体。

公开(公告)号：US06587182B1

公开(公告)日：2003-07-01

申请号：US09534750

申请日：2000-03-24

申请人： Akihiro Goto

发明人： Akihiro Goto

IPC分类号： G03B2772

CPC分类号： G03F7/70583

摘要： A compact illumination apparatus reduces nonuniformity in the Gaussian intensity distribution of a laser beam and reduces interference noise due to an optical integrator. The illumination apparatus illuminates a mask with a predetermined pattern. A light source supplies a light beam. The light beam is split into multiple beams by multiple reflections between a totally reflective surface and a partially reflective surface. The totally reflective and partially reflective surfaces being inclined with respect to each other. The multiple beams are split to form multiple light source images.

摘要翻译： 小型照明装置降低了激光束的高斯强度分布的不均匀性，并降低了由于光学积分器引起的干扰噪声。 照明装置用预定图案照亮面罩。 光源提供光束。 光束通过在全反射表面和部分反射表面之间的多次反射被分成多个光束。 全反射和部分反射的表面相对于彼此倾斜。 多个光束被分割以形成多个光源图像。

公开(公告)号：US06159766A

公开(公告)日：2000-12-12

申请号：US37963

申请日：1998-03-11

申请人： Hirokazu Taki ,  Akihiro Goto ,  Hirochika Kawaguchi ,  Yoshiharu Takahashi ,  Yasuhito Suzuki ,  Takao Takahashi ,  Takashi Arita ,  Satoshi Ookyuu

发明人： Hirokazu Taki ,  Akihiro Goto ,  Hirochika Kawaguchi ,  Yoshiharu Takahashi ,  Yasuhito Suzuki ,  Takao Takahashi ,  Takashi Arita ,  Satoshi Ookyuu

IPC分类号： H01L21/60 ,  G06F17/50 ,  H01L23/495 ,  H01L23/50 ,  H01L21/44 ,  H01L21/48 ,  H01L21/50

CPC分类号： H01L23/49541 ,  H01L2924/00014 ,  H01L2924/0002 ,  H01L2924/01004 ,  H01L2924/01006 ,  H01L2924/01033 ,  H01L2924/01082 ,  H01L2924/00

摘要： To determine leadframe tip positions, a circular arc portion where leadframe tips are to be arranged is determined so as to be opposed to each of the four corners of a die pad by performing a search. Then, straight line portions are set so as to extend from the circular arc portion and to be opposed to the die pad sidelines. The shape of each leadframe tip on the circular arc portion is defined as a region that is sectioned by two concentric circles and two radial rays extending from the center of the concentric circles. The division between the circular arc portion and straight line portions and the setting of the center of the circular arc portion are performed automatically. The leadframe tip width and interval are determined independently of each other.

摘要翻译： 为了确定引线框尖端位置，通过执行搜索来确定引线框架顶端将被布置的圆弧部分，以便与芯片焊盘的四个角中的每一个相对。 然后，直线部分被设置成从圆弧部分延伸并与芯片焊盘侧面相对。 圆弧部分上的每个引线框尖的形状被定义为由两个同心圆分割的区域和从同心圆的中心延伸的两个径向射线。 自动进行圆弧部与直线部之间的分割以及圆弧部的中心的设定。 引线框尖端宽度和间隔彼此独立地确定。

公开(公告)号：US5919381A

公开(公告)日：1999-07-06

申请号：US881933

申请日：1997-06-25

申请人： Akihiro Goto ,  Mitsuyoshi Wada ,  Yoshio Ozaki

发明人： Akihiro Goto ,  Mitsuyoshi Wada ,  Yoshio Ozaki

IPC分类号： B23H1/02 ,  B23H7/16 ,  B23H11/00

CPC分类号： B23H11/00 ,  B23H1/02 ,  B23H1/022 ,  B23H1/024 ,  B23H7/16

摘要： An electrical discharge machine for applying a pulsed voltage to a machining gap between an electrode and a workpiece disposed opposite thereto. An insulating dielectric fluid, such as oil or water mixed with a compound additive, is disposed in the gap. A positive polarity voltage and an opposite polarity voltage are applied via switches and respective impedances to the machining gap in order to generate a discharge for machining the workpiece. A pulse having a first polarity is applied to machine the workpiece and a pulse having a second polarity is applied when the first polarity pulse is not applied. A misfire pulse detector detects an undesired drop in the machining voltage by determining whether the first polarity voltage is in a range between two voltages, the first of which has a magnitude greater than the magnitude of the machining gap during discharge and the second of which has a magnitude greater than the magnitude of the first voltage.

摘要翻译： 一种放电机，用于对电极和与其相对设置的工件之间的加工间隙施加脉冲电压。 绝缘介质流体，例如与复合添加剂混合的油或水，设置在间隙中。 通过开关和相应的阻抗将正极性电压和相反极性电压施加到加工间隙，以便产生用于加工工件的放电。 施加具有第一极性的脉冲来加工工件，并且当不施加第一极性脉冲时施加具有第二极性的脉冲。 失火脉冲检测器通过确定第一极性电压是否在两个电压之间的范围内来检测加工电压的不希望的下降，第一极性电压具有大于放电期间加工间隙的幅度的幅度，第二极性电压具有 大于第一电压的大小的幅度。

公开(公告)号：US5902119A

公开(公告)日：1999-05-11

申请号：US885352

申请日：1997-06-30

申请人： Hirokazu Taki ,  Akihiro Goto ,  Yoshiharu Takahashi ,  Yasuhito Suzuki ,  Takao Takahashi ,  Takashi Arita ,  Satoshi Ookyuu

发明人： Hirokazu Taki ,  Akihiro Goto ,  Yoshiharu Takahashi ,  Yasuhito Suzuki ,  Takao Takahashi ,  Takashi Arita ,  Satoshi Ookyuu

IPC分类号： H01L23/50 ,  G06F17/50 ,  H01L23/495 ,  H01L21/44

CPC分类号： H01L23/49541 ,  H01L2924/0002

摘要： A designing method calculates leadframe tip arrangement. The method comprises the steps of setting a leadframe tip arrangement region opposed to a die pad sideline of a leadframe, setting a leadframe tip arrangement line in the leadframe arrangement region, and arranging a predetermined number of leadframe tips on the leadframe tip arrangement line at proper intervals. The method allows for the independent calculation of various parameters.

摘要翻译： 一种设计方法计算引线框尖端布置。 该方法包括以下步骤：设置与引线框架的芯片焊盘副线相对的引线框尖端布置区域，将引线框架布置线设置在引线框架布置区域中，并且在引线框架顶端布置线上以适当的方式布置预定数量的引线框架末端 间隔 该方法允许独立计算各种参数。

公开(公告)号：US5504596A

公开(公告)日：1996-04-02

申请号：US169055

申请日：1993-12-20

申请人： Akihiro Goto ,  Takashi Gemma ,  Yutaka Ichihara ,  Nobutaka Magome ,  Naomasa Shiraishi ,  Hiroshi Shirasu ,  Toshio Matsuura

发明人： Akihiro Goto ,  Takashi Gemma ,  Yutaka Ichihara ,  Nobutaka Magome ,  Naomasa Shiraishi ,  Hiroshi Shirasu ,  Toshio Matsuura

IPC分类号： G03F7/20 ,  G03H1/00 ,  G03H1/26

CPC分类号： G03F7/70558 ,  G03F7/70625 ,  G03H1/00

摘要： An exposure apparatus is used for reproducing a mask pattern of a semiconductor device or the like onto a photosensitive substrate using a holography. The holography is utilized also in a process for alignment between a mask pattern hologram and an exposure region of the substrate. The pattern hologram is recorded to a recording medium by interference between an object wave from the pattern and a reference wave, and a second hologram is formed to the medium by diffraction light from an alignment mark formed on the mask. Prior to reconstruction of the pattern image, reconstruction light from the second hologram, illuminated with a reconstruction wave, is irradiated onto the substrate arranged in place of the mask. A reproduction image of the alignment mark on the substrate surface illuminated with the reconstruction light is measured, and relative displacement between the medium and the substrate is detected from a result of the measurement. The relative positional relationship between the medium and the substrate is corrected in accordance with the displacement information, and, thereafter, the surface is exposed with a reconstruction image of the pattern hologram.

摘要翻译： 使用曝光装置将半导体装置等的掩模图案再现到使用全息术的感光基板上。 全息术也用于掩模图案全息图和衬底的曝光区域之间的对准的过程。 图案全息图通过来自图案的对象波与参考波之间的干涉而被记录到记录介质上，并且通过衍射光从形成在掩模上的对准标记的衍射光形成第二全息图。 在图案图像重建之前，用重建波照射的来自第二全息图的重建光被照射到布置在掩模上的衬底上。 测量用重建光照射的基板表面上的对准标记的再现图像，并且从测量结果检测介质和基板之间的相对位移。 根据位移信息来校正介质和基板之间的相对位置关系，然后用图案全息图的重构图像曝光表面。

公开(公告)号：US08933361B2

公开(公告)日：2015-01-13

申请号：US13056609

申请日：2008-07-29

申请人： Satoshi Suzuki ,  Akihiro Goto ,  Kazushi Nakamura

发明人： Satoshi Suzuki ,  Akihiro Goto ,  Kazushi Nakamura

IPC分类号： B23H1/04 ,  B23H9/14 ,  B23H7/26 ,  B23H7/28

CPC分类号： B23H9/14 ,  B23H7/265 ,  B23H7/28 ,  B23H2200/20 ,  B23H2400/10

摘要： A microhole electric discharge machining apparatus that forms a conical inverse-tapered hole on a workpiece by a thin wire electrode, includes, an electrode holder that holds an upper part of the thin wire electrode and feeds a lower part of the thin wire electrode downward to stretch the lower part to the workpiece by rotating the thin wire electrode; a first guide member that is arranged near the workpiece upper surface and is provided with a first guide hole through which the thin wire electrode is penetrated on a hole-machining axis; a second guide member that is arranged between the first guide member and the electrode holder and is provided with a second guide hole through which the thin wire electrode is penetrated at a position eccentric from the hole-machining axis; and a swivel driving unit that circularly swivels the second guide member around the hole-machining axis.

摘要翻译： 一种微细孔放电加工装置，其通过细线电极在工件上形成锥形倒锥形孔，包括：电极保持器，其保持细线电极的上部并将细线电极的下部向下供给到 通过旋转细线电极将下部拉伸到工件; 第一引导构件，其布置在工件上表面附近并且设置有第一引导孔，细线电极穿过该第一引导孔穿过孔加工轴线; 第二引导构件，布置在第一引导构件和电极保持器之间，并且设置有第二引导孔，细线电极穿过第二引导孔偏心于孔加工轴线的位置; 以及旋转驱动单元，其围绕所述孔加工轴线旋转所述第二引导构件。

公开(公告)号：US08640571B2

公开(公告)日：2014-02-04

申请号：US12847388

申请日：2010-07-30

申请人： Tatsuo Shimizu ,  Takio Nakamura ,  Akihiro Goto ,  Yuki Noguchi

发明人： Tatsuo Shimizu ,  Takio Nakamura ,  Akihiro Goto ,  Yuki Noguchi

IPC分类号： B23Q16/10 ,  B23Q1/54

CPC分类号： B23Q1/5431 ,  B23Q16/102 ,  B23Q39/024 ,  B23Q2039/004 ,  B23Q2220/002 ,  Y10T29/5152 ,  Y10T29/5154 ,  Y10T29/5155 ,  Y10T29/5158 ,  Y10T29/5165 ,  Y10T74/14 ,  Y10T74/1494 ,  Y10T82/2506 ,  Y10T82/2508 ,  Y10T408/37

摘要： An automatic rotating turret device for work machinery is provided, in which a lift turret is not used. The turret device is provided with an axial-direction slide body, which is advanced or retracted in the direction of the axis of rotation of the turret by the drive device advancing or retracting the drive body in a direction orthogonal to the direction of rotation axis; and a clutch device that is engaged or disengaged by the axial-direction slide body being advanced or retracted, the turret being of a non-lift-type, and there being provided to the drive body a tapering action part for generating an expanding action caused by the movement of the drive body and pressingly sliding the axial-direction slide body against the turret stage.

摘要翻译： 提供了一种用于工作机械的自动旋转转塔装置，其中不使用提升转塔。 转台装置设置有轴向滑动体，该轴向滑动体通过驱动装置沿着与旋转轴线方向正交的方向使驱动体前进或缩回而在转台的旋转轴线的方向上前进或后退; 并且由所述轴向滑动体前进或后退而接合或分离的离合器装置，所述转台是非提升型的，并且在所述驱动体上设置有用于产生膨胀动作的锥形动作部件 通过驱动体的运动并将轴向滑动体按压地滑动到转台上。

公开(公告)号：US20130209705A1

公开(公告)日：2013-08-15

申请号：US13140604

申请日：2010-09-16

申请人： Akihiro Goto ,  Nobuyuki Sumi ,  Yusuke Yasunaga ,  Hiroyuki Teramoto

发明人： Akihiro Goto ,  Nobuyuki Sumi ,  Yusuke Yasunaga ,  Hiroyuki Teramoto

IPC分类号： H01B13/00

CPC分类号： H01B13/00 ,  C23C26/00 ,  C23C26/02

摘要： There is an electrical discharge surface treatment method of forming a surface layer on a work piece surface by making pulsed electrical discharge repeatedly occur between a work piece (2) and an electrode (1) for electrical discharge surface treatment, for which a compact formed by powder obtained by mixing 20 wt % or more of silicon with powder of a hard material or a solid body of silicon is used, so that the electrode material is moved to the work piece (2), including: a processing time decision step of observing an electrical discharge treatment surface formed on the work piece surface by the electrical discharge and deciding the electrical discharge surface treatment end time in a process where surface roughness formed by the electrical discharge on the electrical discharge treatment surface acquired from the observation result is increased and is then decreased. Electrical discharge surface treatment between the electrode and the work piece is executed for only the processing time set in the processing time decision step.

摘要翻译： 存在通过在工件（2）和用于放电表面处理的电极（1）之间重复发生脉冲放电而在工件表面上形成表面层的放电表面处理方法，由此形成由 使用通过将20重量％以上的硅与硬质材料或硅固体粉末混合而获得的粉末，使得电极材料移动到工件（2），包括：处理时间决定步骤，观察 通过放电在工件表面上形成的放电处理表面，并且在从观察结果获得的放电处理表面上的放电形成的表面粗糙度增加的过程中决定放电表面处理结束时间，并且是 然后减少。 仅在处理时间决定步骤中设定的处理时间执行电极与工件之间的放电表面处理。

公开(公告)号：US08377339B2

公开(公告)日：2013-02-19

申请号：US12194970

申请日：2008-08-20

申请人： Akihiro Goto ,  Masao Akiyoshi ,  Hiroyuki Ochiai ,  Mitsutoshi Watanabe

发明人： Akihiro Goto ,  Masao Akiyoshi ,  Hiroyuki Ochiai ,  Mitsutoshi Watanabe

IPC分类号： H01B1/02 ,  H01B1/22

CPC分类号： C23C26/00 ,  Y10T428/31678

摘要： An apparatus and a method to form a thick coat by an in-liquid pulsed electric discharge treatment, the electrode contains 40 volume % or more metallic material that is not carbonized or is hard to be carbonized.

摘要翻译： 通过液体脉冲放电处理形成厚涂层的装置和方法，所述电极含有40体积％以上的未碳化或难以碳化的金属材料。