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    Optical fiber preform and manufacturing method therefor
    92.
    发明授权
    Optical fiber preform and manufacturing method therefor 有权
    光纤预制棒及其制造方法

    公开(公告)号：US08567217B2

    公开(公告)日：2013-10-29

    申请号：US10838375

    申请日：2004-05-05

    Applicant: Takakazu Gotoh ,  Naritoshi Yamada

    Inventor： Takakazu Gotoh ,  Naritoshi Yamada

    IPC: C03B37/07

    CPC classification number: C03B37/014 ,  C03B37/01237 ,  C03B2201/04 ,  Y02P40/57

    Abstract: A method for manufacturing an optical fiber preform includes a process A of applying flame polishing to a center glass rod, a process B of determining a ratio ra/rb, which is a ratio of a radius ra of the center glass rod expressed in millimeters with respect to a radius rb of a target optical fiber preform expressed in millimeters, based on a refractive index profile of a target optical fiber preform, and a process C of determining an amount of fine glass particles to be deposited on the center glass rod so that a ratio ra/rb/c falls within a range from 0.002 to 0.01, where “c” is a maximum value of hydroxyl group concentration expressed in ppm in the vicinity of a boundary between the center glass rod and an outer layer, which is formed by depositing fine glass particles on the center rod and by being vitrified.

    Abstract translation: 制造光纤预制棒的方法包括对中心玻璃棒施加火焰抛光的方法A，确定比率ra / rb的方法B，其为以毫米表示的中心玻璃棒的半径ra与以毫米为单位的比率 相对于目标光纤预制件的半径rb，以目标光纤预制棒的折射率分布为单位，以毫米为单位表示，以及确定要沉积在中心玻璃棒上的细微玻璃颗粒的量的方法C，使得 比率ra / rb / c落在0.002至0.01的范围内，其中“c”是在形成的中心玻璃棒和外层之间的边界附近以ppm表示的羟基浓度的最大值 通过在中心棒上沉积玻璃微粒并被玻璃化。

    Method for producing a hollow cylinder of synthetic quartz glass, and thickwalled hollow cylinder obtained according to the method
    94.
    发明授权
    Method for producing a hollow cylinder of synthetic quartz glass, and thickwalled hollow cylinder obtained according to the method 有权
    制造合成石英玻璃中空圆柱体的方法和根据该方法获得的厚壁中空圆柱体

    公开(公告)号：US08316671B2

    公开(公告)日：2012-11-27

    申请号：US12448294

    申请日：2007-12-13

    Applicant: Michael Huenermann

    Inventor： Michael Huenermann

    IPC: C03B37/018 ,  C03B37/00 ,  C03B25/00 ,  C03C3/06

    CPC classification number: C03B19/1469 ,  C03B19/1423 ,  C03B19/1492 ,  C03B37/01205 ,  C03B37/01208 ,  C03B37/01211 ,  C03B37/0122 ,  C03B37/0142 ,  C03B37/01466 ,  C03B37/01493 ,  C03B2201/04 ,  C03B2201/075 ,  C03B2203/42 ,  C03B2207/46

    Abstract: A known method for producing a hollow cylinder of synthetic quartz glass comprises the steps of: (a) providing an inner tube of synthetic quartz glass having an inner bore defined by an inner wall, (b) cladding the inner tube (3′) with an SiO2 soot layer (4′), and (c) sintering the SiO2 soot layer with formation of the hollow cylinder. Starting therefrom, to indicate a method in which on the one hand the sintering process is completed before the hollow cylinder is further processed together with the core rod, and in which on the other hand a complicated machining of the inner bore of the hollow cylinder of quartz glass is not required, the invention suggests that during sintering the surface temperature of the inner wall of the inner tube should be kept below the softening temperature.

    Abstract translation: 用于生产合成石英玻璃的中空圆筒的已知方法包括以下步骤：（a）提供合成石英玻璃的内管，其具有由内壁限定的内孔，（b）用内壁（3'）包覆内管 SiO 2烟灰层（4'），和（c）在形成中空圆筒的情况下烧结SiO 2烟灰层。 从此开始，指示一方面在中空圆筒与芯棒一起进一步加工之前烧结过程完成的方法，另一方面，中空圆柱体的内孔的复杂加工 石英玻璃不需要，本发明提出在烧结过程中，内管内壁的表面温度应保持在软化温度以下。

    Low loss optical fiber designs for confining optical power to low-doped regions
    95.
    发明授权
    Low loss optical fiber designs for confining optical power to low-doped regions 有权
    低损耗光纤设计用于将光功率限制在低掺杂区域

    公开(公告)号：US08315493B2

    公开(公告)日：2012-11-20

    申请号：US13317476

    申请日：2011-10-19

    Applicant: Lance Gibson ,  David Peckham ,  Robert Lingle, Jr.

    Inventor： Lance Gibson ,  David Peckham ,  Robert Lingle, Jr.

    IPC: G02B6/036

    CPC classification number: G02B6/03683 ,  C03B37/01211 ,  C03B37/01228 ,  C03B37/014 ,  C03B37/018 ,  C03B2201/04 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/31 ,  C03B2203/22

    Abstract: The specification describes an improved optical fiber produced by a hybrid VAD/MCVD process. The core of the fiber is produced using VAD and the inner cladding layer has a depressed index and is produced using MCVD. In preferred embodiments, the optical power envelope is essentially entirely contained in VAD produced core material and the MCVD produced depressed index cladding material. Optical loss is minimized by confining most of the optical power to the VAD core where OH presence is low, as well as by maximizing the optical power in the un-doped silica region. The MCVD substrate tube material is essentially devoid of optical power.

    Abstract translation: 本说明书描述了通过混合VAD / MCVD工艺生产的改进的光纤。 使用VAD制造纤维的芯，并且内包层具有凹陷指数，并且使用MCVD制造。 在优选实施例中，光功率包层基本上完全包含在VAD生产的芯材料中，并且MCVD产生凹陷的折射率包层材料。 通过将大部分光功率限制在其中OH存在低的VAD核心以及通过使未掺杂二氧化硅区域中的光功率最大化来将光损耗最小化。 MCVD衬底管材料基本上没有光学功率。

    Modification process of synthetic silica powder and its quartz glass product
    96.
    发明授权
    Modification process of synthetic silica powder and its quartz glass product 有权
    合成二氧化硅粉及其石英玻璃制品的改性工艺

    公开(公告)号：US08053080B2

    公开(公告)日：2011-11-08

    申请号：US12768904

    申请日：2010-04-28

    Applicant: Masanori Fukui ,  Takahiro Satoh

    Inventor： Masanori Fukui ,  Takahiro Satoh

    IPC: B32B13/04 ,  B32B17/06 ,  A47G19/22

    CPC classification number: C30B35/002 ,  C03B19/1065 ,  C03B2201/04 ,  C03B2201/20 ,  C03C1/026 ,  C30B15/10 ,  Y10T117/10 ,  Y10T428/13 ,  Y10T428/131 ,  Y10T428/1317

    Abstract: A modification process of the synthetic quartz powder, which can make a quartz glass product hardly having bubbles at the time of fusing, is provided, along with a modification process of the synthetic quartz powder and a glass product using said modified quartz powder are provided, wherein the synthetic quartz powder is kept in helium atmosphere at least in the temperature falling process, when the amorphous synthetic quartz powder produced by the sol-gel method is carried out by heat treatment in a vacuum furnace at more than the degas temperature and less than the baking temperature, wherein the highest temperature in the helium atmosphere is preferably set to from more than 700° C. to less than 1400° C., and the helium atmosphere is kept to less than 400° C.

    Abstract translation: 本发明提供可以使石英玻璃制品在熔融时几乎不具有气泡的合成石英粉末的改性方法，以及使用所述改性石英粉末的合成石英粉末和玻璃制品的改性方法， 至少在降温过程中，将合成石英粉保存在氦气氛中，当通过溶胶 - 凝胶法制造的无定形合成石英粉末在真空炉中通过在脱气温度下进行热处理并且小于 烘烤温度，其中氦气氛中的最高温度优选设定为大于700℃至小于1400℃，氦气保持在小于400℃。

    MODIFICATION PROCESS OF SYNTHETIC SILICA POWDER AND ITS QUARTZ GLASS PRODUCT
    98.
    发明申请
    MODIFICATION PROCESS OF SYNTHETIC SILICA POWDER AND ITS QUARTZ GLASS PRODUCT 有权
    合成二氧化硅粉及其QUARTZ玻璃产品的改性方法

    公开(公告)号：US20100212582A1

    公开(公告)日：2010-08-26

    申请号：US12768904

    申请日：2010-04-28

    Applicant: Masanori FUKUI ,  Takahiro SATOH

    Inventor： Masanori FUKUI ,  Takahiro SATOH

    IPC: C30B35/00

    CPC classification number: C30B35/002 ,  C03B19/1065 ,  C03B2201/04 ,  C03B2201/20 ,  C03C1/026 ,  C30B15/10 ,  Y10T117/10 ,  Y10T428/13 ,  Y10T428/131 ,  Y10T428/1317

    Abstract: A modification process of the synthetic quartz powder, which can make a quartz glass product hardly having bubbles at the time of fusing, is provided, along with a modification process of the synthetic quartz powder and a glass product using said modified quartz powder are provided, wherein the synthetic quartz powder is kept in helium atmosphere at least in the temperature falling process, when the amorphous synthetic quartz powder produced by the sol-gel method is carried out by heat treatment in a vacuum furnace at more than the degas temperature and less than the baking temperature, wherein the highest temperature in the helium atmosphere is preferably set to from more than 700° C. to less than 1400° C., and the helium atmosphere is kept to less than 400° C.

    Abstract translation: 本发明提供可以使石英玻璃制品在熔融时几乎不具有气泡的合成石英粉末的改性方法，以及使用所述改性石英粉末的合成石英粉末和玻璃制品的改性方法， 至少在降温过程中，将合成石英粉保存在氦气氛中，当通过溶胶 - 凝胶法制造的无定形合成石英粉末在真空炉中通过在脱气温度下进行热处理并且小于 烘烤温度，其中氦气氛中的最高温度优选设定为大于700℃至小于1400℃，氦气保持在小于400℃。

    FUSED SILICA GLASS AND PROCESS FOR PRODUCING THE SAME
    99.
    发明申请
    FUSED SILICA GLASS AND PROCESS FOR PRODUCING THE SAME 有权
    熔融二氧化硅玻璃及其制造方法

    公开(公告)号：US20100041538A1

    公开(公告)日：2010-02-18

    申请号：US12440683

    申请日：2007-09-11

    Applicant: Kazuyoshi Arai ,  Tsutomu Takahata ,  Shinkichi Hasimoto ,  Masahito Uchida ,  Nobusuke Yamada ,  Yoshinori Harada ,  Hideharu Horikoshi

    Inventor： Kazuyoshi Arai ,  Tsutomu Takahata ,  Shinkichi Hasimoto ,  Masahito Uchida ,  Nobusuke Yamada ,  Yoshinori Harada ,  Hideharu Horikoshi

    IPC: C03C3/04 ,  C03C10/00

    CPC classification number: C03C4/0085 ,  C03B19/066 ,  C03B20/00 ,  C03B2201/03 ,  C03B2201/04 ,  C03C3/06 ,  C03C4/10 ,  C03C2201/23 ,  C03C2201/50 ,  C03C2201/54 ,  Y02P40/57

    Abstract: Fused silica glass having an internal transmittance of UV with 245 nm wavelength, being at least 95% at 10 mm thickness, a OH content of not larger than 5 ppm, and a content of Li, Na, K, Mg, Ca and Cu each being smaller than 0.1 ppm. Preferably the glass has a viscosity coefficient at 1215° C. of at least 1011.5 Pa·s; and a Cu ion diffusion coefficient of not larger than 1×10−10 cm2/sec in a depth range of greater than 20 μm up to 100 μm, from the surface, when leaving to stand at 1050° C. in air for 24 hours. The glass is made by crystobalitizing powdery silica raw material; then, fusing the crystobalitized silica material in a non-reducing atmosphere. The glass exhibits a high transmittance of ultraviolet, visible and infrared rays, has high purity and heat resistance, and exhibits a reduced diffusion rate of metal impurities, therefore, it is suitable for various optical goods, semiconductor-production apparatus members, and liquid crystal display production apparatus members.

    Abstract translation: 具有245nm波长的UV的内部透射率，10mm厚度至少95％，OH含量不大于5ppm，Li，Na，K，Mg，Ca和Cu的含量的熔融石英玻璃 小于0.1ppm。 优选地，玻璃的1215℃下的粘度系数至少为1011.5Pa·s; 在大于20μm至100μm的深度范围内的Cu离子扩散系数不大于1×10 -10 cm 2 / sec，在1050℃在空气中放置24小时时， 。 玻璃由硅胶粉末二氧化硅原料精制而成; 然后，在非还原气氛中将经晶化的二氧化硅材料熔融。 该玻璃的紫外线，可见光和红外线的透射率高，纯度高，耐热性高，金属杂质的扩散速度降低，因此适用于各种光学制品，半导体制造装置部件和液晶 展示生产设备成员。

    Synthetic quartz glass for optical member and its production method
    100.
    发明授权
    Synthetic quartz glass for optical member and its production method 有权
    光学构件合成石英玻璃及其制作方法

    公开(公告)号：US07514382B2

    公开(公告)日：2009-04-07

    申请号：US11398669

    申请日：2006-04-06

    Applicant: Yoshiaki Ikuta ,  Noriyuki Agata

    Inventor： Yoshiaki Ikuta ,  Noriyuki Agata

    IPC: C03C3/06 ,  C03B20/00

    CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/36 ,  Y02P40/57

    Abstract: A synthetic quartz glass for an optical member which is free from compaction and rarefaction is obtained. A synthetic quartz glass for an optical member to be used for an optical device employing a light having a wavelength of at most 400 nm and at least 170 nm as a light source, which contains substantially no oxygen excess defects, dissolved oxygen molecules nor reduction type defects, which has a chlorine concentration of at most 50 ppm and a OH group concentration of at most 100 ppm, and which contains oxygen deficient defects within a concentration range of at most 5×1014 defects/cm3 and at least 1×1013 defects/cm3. The fluorine concentration is preferably at most 100 ppm.

    Abstract translation: 得到不含压实和稀释的用于光学构件的合成石英玻璃。 用于光学元件的合成石英玻璃，其用于使用波长最多为400nm且至少170nm的光作为光源的光学元件，其基本上不含氧过剩缺陷，溶解氧分子或还原型 其浓度最多为50ppm，OH基浓度为100ppm以下，含有缺氧缺陷量为5×1014个/ cm 3以下且至少1×10 13个缺陷/ cm 3以下的缺陷缺陷。 氟浓度优选为100ppm以下。

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