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    SUBSTRATE, SUBSTRATE INSPECTING METHOD AND METHODS OF MANUFACTURING AN ELEMENT AND A SUBSTRATE
    101.
    发明申请
    SUBSTRATE, SUBSTRATE INSPECTING METHOD AND METHODS OF MANUFACTURING AN ELEMENT AND A SUBSTRATE 审中-公开
    基板，基板检查方法及制造元件和基板的方法

    公开(公告)号：US20100047933A1

    公开(公告)日：2010-02-25

    申请号：US12608413

    申请日：2009-10-29

    申请人： Takao NAKAMURA ,  Toshio Ueda ,  Takashi Kyono

    发明人： Takao NAKAMURA ,  Toshio Ueda ,  Takashi Kyono

    IPC分类号： H01L21/66

    CPC分类号： H01L22/10 ,  H01L22/20

    摘要： A substrate inspection method allowing inspection of all a plurality of substrates each provided at its surface with a plurality of layers by determining quality of the plurality of layers as well as methods of manufacturing the substrate and an element using the substrate inspection method are provided. The substrate inspection method includes a step of preparing the substrate provided at its main surface with the plurality of layers, a film forming step, a local etching step, and an inspection step or a composition analysis step. In the step, a concavity is formed in a region provided with an epitaxial layer of the main surface of the substrate by removing at least partially the epitaxial layer. In the inspection step, the inspection is performed on the layer exposed in the concavity.

    摘要翻译： 提供了一种基板检查方法，其允许通过确定多个层的质量以及制造基板的方法和使用基板检查方法的元件来检查在其表面处设置多个层的多个基板。 基板检查方法包括准备在其主表面上设置有多个层的基板，成膜步骤，局部蚀刻步骤以及检查步骤或组成分析步骤的步骤。 在该步骤中，通过至少部分去除外延层，在设置有衬底的主表面的外延层的区域中形成凹陷。 在检查步骤中，在暴露于凹部的层上进行检查。

    Method and apparatus for controlling the gray scale of plasma display device
    102.
    再颁专利
    Method and apparatus for controlling the gray scale of plasma display device 有权
    用于控制等离子体显示装置的灰度级的方法和装置

    公开(公告)号：USRE40769E1

    公开(公告)日：2009-06-23

    申请号：US09938303

    申请日：2001-08-24

    申请人： Keishin Nagaoka ,  Masaya Tajima ,  Yoshimasa Awata ,  Yoshikazu Kanazawa ,  Toshio Ueda

    发明人： Keishin Nagaoka ,  Masaya Tajima ,  Yoshimasa Awata ,  Yoshikazu Kanazawa ,  Toshio Ueda

    IPC分类号： G09G3/28 ,  G09G5/10

    CPC分类号： G09G3/2946 ,  G09G3/2022 ,  G09G2320/0271 ,  G09G2320/0626 ,  G09G2330/021 ,  G09G2360/145 ,  G09G2360/16

    摘要： A method of controlling the gray scale of a plasma display device has a forming step of forming a frame for an image by a plurality of subframes each having a different brightness, a setting step of setting the number of sustain emissions of each subframe in an anti-geometrical progression corresponding to the brightness of each subframe, and a displaying step of displaying the image on the plasma display device by a gray scale display having a specific brightness. The number of sustain emissions in each subframe is set individually by the each subframe, and this establishes a linear relation between the gray level and the corresponding brightness Therefore, an enhancement of display quality of the plasma display device can be realized. A method of controlling the gray scale of a plasma display device has a forming step of forming a frame for an image by a plurality of subframes each having a different brightness, a setting step of setting the number of sustain emissions of each subframe in an anti-geometrical progression corresponding to the brightness of each subframe, and a displaying step of displaying the image on the plasma display device by a gray scale display having a specific brightness. The number of sustain emission in each subframe is set individually by the each subframe, and this establishes a linear relation between the gray level and the corresponding brightness. Therefore, an enhancement of display quality of the plasma display device can be realized.

    摘要翻译： <？delete-start id =“DEL-S-00001”date =“20090623”？一种控制等离子体显示装置的灰度级的方法具有通过多个子帧形成图像帧的形成步骤 具有不同亮度的设置步骤，将每个子帧的维持发射次数设置为与每个子帧的亮度对应的反几何级数的设置步骤，以及通过灰度显示在等离子体显示装置上显示图像的显示步骤 具有特定的亮度。 每个子帧中的维持发射次数由每个子帧分别设定，这就建立了灰度级与对应的亮度之间的线性关系。因此，可以实现等离子体显示装置的显示质量的提高。 end id =“DEL-S-00001”？> <？insert-start id =“INS-S-00001”date =“20090623”？>等离子体显示装置的灰度级的控制方法具有： 通过具有不同亮度的多个子帧形成用于图像的帧;设置步骤，将每个子帧的维持发射次数设置为与每个子帧的亮度相对应的反几何级数;以及显示步骤，显示步骤 通过具有特定亮度的灰度显示器在等离子体显示装置上的图像。 每个子帧中的每个子帧的维持发射次数由每个子帧分别设置，这就建立了灰度级与对应的亮度之间的线性关系。 因此，可以实现等离子体显示装置的显示质量的提高。<？insert-end id =“INS-S-00001”→>

    Substrate, substrate inspecting method and methods of manufacturing an element and a substrate
    104.
    发明申请
    Substrate, substrate inspecting method and methods of manufacturing an element and a substrate 审中-公开
    基板，基板检查方法以及元件和基板的制造方法

    公开(公告)号：US20070278485A1

    公开(公告)日：2007-12-06

    申请号：US11806561

    申请日：2007-06-01

    申请人： Takao Nakamura ,  Toshio Ueda ,  Takashi Kyono

    发明人： Takao Nakamura ,  Toshio Ueda ,  Takashi Kyono

    IPC分类号： H01L23/58

    CPC分类号： H01L22/10 ,  H01L22/20

    摘要： A substrate inspection method allowing inspection of all a plurality of substrates each provided at its surface with a plurality of layers by determining quality of the plurality of layers as well as methods of manufacturing the substrate and an element using the substrate inspection method are provided. The substrate inspection method includes a step of preparing the substrate provided at its main surface with the plurality of layers, a film forming step, a local etching step, and an inspection step or a composition analysis step. In the step, a concavity is formed in a region provided with an epitaxial layer of the main surface of the substrate by removing at least partially the epitaxial layer. In the inspection step, the inspection is performed on the layer exposed in the concavity.

    摘要翻译： 提供了一种基板检查方法，其允许通过确定多个层的质量以及制造基板的方法和使用基板检查方法的元件来检查在其表面处设置多个层的多个基板。 基板检查方法包括准备在其主表面上设置有多个层的基板，成膜步骤，局部蚀刻步骤以及检查步骤或组成分析步骤的步骤。 在该步骤中，通过至少部分去除外延层，在设置有衬底的主表面的外延层的区域中形成凹陷。 在检查步骤中，在暴露于凹部的层上进行检查。

    Lathe, and Machining System Equipped with the Lathe
    105.
    发明申请
    Lathe, and Machining System Equipped with the Lathe 审中-公开
    车床和车床加工系统

    公开(公告)号：US20060207397A1

    公开(公告)日：2006-09-21

    申请号：US11306216

    申请日：2005-12-20

    申请人： Kazuyuki Hiramoto ,  Toshio Ueda

    发明人： Kazuyuki Hiramoto ,  Toshio Ueda

    IPC分类号： B23B3/00

    CPC分类号： B23Q11/0053 ,  B23B3/06 ,  B23B3/167 ,  B23B3/36 ,  B23Q7/04 ,  Y10T82/25

    摘要： A lathe includes a bed, a main spindle, a headstock fixedly disposed on the bed that supports the main spindle such that its axis is horizontal and it can rotate about its axis, a tailstock disposed on the bed in opposition to the headstock, a tailstock spindle, supported by the tailstock such that it is coaxial with the main spindle, and tool posts for holding tools. The bed is formed in a shape that is rectangular when viewed from above, and the outer shape in the bed width direction is formed with left and right symmetry with respect to a predetermined vertical plane of symmetry, and the headstock and the tailstock are disposed on the bed upper face such that the axes of the main spindle and the tailstock spindle are included in the plane of symmetry.

    摘要翻译： 车床包括床，主轴，固定地设置在床上的头架，其支撑主轴，使得其轴线是水平的并且其可以围绕其轴线旋转，与床架相对设置在床上的尾架，尾架 主轴，由尾座支撑，使其与主轴同轴，以及用于保持工具的工具柱。 该床形成为从上方观察为矩形的形状，并且床宽度方向上的外部形状相对于预定的垂直对称平面形成左右对称，并且将头架和尾架设置在 床上表面使得主轴和尾座主轴的轴线包括在对称平面中。

    C-axis driving system for machine tools
    107.
    发明授权
    C-axis driving system for machine tools 有权

    公开(公告)号：US06626058B2

    公开(公告)日：2003-09-30

    申请号：US09866561

    申请日：2001-05-29

    申请人： Toshio Ueda ,  Yoshitane Uemura ,  Nobuaki Sasabe

    发明人： Toshio Ueda ,  Yoshitane Uemura ,  Nobuaki Sasabe

    IPC分类号： B23Q1602

    CPC分类号： B23Q16/025 ,  B23B3/10 ,  Y10T29/5165 ,  Y10T74/19565 ,  Y10T74/19614 ,  Y10T74/19828 ,  Y10T82/2511 ,  Y10T82/2552

    摘要： A C-axis driving system for machine tools is disclosed that comprises a worm wheel mounted on a spindle that is rotatably supported by a headstock. The C-axis driving system also includes a worm shaft with a worm formed therein directed perpendicular to an axis of the spindle and placed so as to be pivotable about a pivotal shaft between an engagement position, and a disengagement position. The C-axis driving system also includes a C-axis driving motor connected to the worm shaft and serving to rotationally index the spindle to a specified rotational angle. The pivotal shaft is provided on the worm shaft base so as to be directed perpendicular to an axis of the worm shaft. Thus, the C-axis driving system for machine tools is capable of reducing the size of the C-axis unit as well as the cost while allowing a smooth engagement with the worm wheel.

    Scanning type exposure apparatus
    108.
    发明授权
    Scanning type exposure apparatus 有权
    扫描型曝光装置

    公开(公告)号：US06259511B1

    公开(公告)日：2001-07-10

    申请号：US09450566

    申请日：1999-11-30

    申请人： Susumu Makinouchi ,  Toshio Ueda

    发明人： Susumu Makinouchi ,  Toshio Ueda

    IPC分类号： G03B2742

    CPC分类号： G03F7/70358 ,  G03F7/70725 ,  G03F7/70775

    摘要： A scanning type exposure apparatus includes a mask stage which can move a mask along a predetermined scanning direction; a substrate stage which can move a substrate, onto which a pattern on the mask is to be transferred, along the scanning direction; a fine movement stage which is arranged on one of the mask stage and the substrate stage, and is movable along the scanning direction relative to the one stage; a first measuring device for detecting the position, along the scanning direction, of the fine movement stage; a second measuring device for detecting the position, along the scanning direction, of the other one of the mask stage and the substrate stage; a speed controller for controlling the ratio between the speeds of the mask stage and the substrate stage to a predetermined value while the pattern on the mask is scanning-exposed on the substrate; and a control device for controlling the position of the fine movement stage in accordance with the difference between the position measured by the first measuring device and the position measured by the second measuring device during the scanning exposure.

    摘要翻译： 扫描型曝光装置包括可沿着预定扫描方向移动掩模的掩模台; 可以沿扫描方向移动掩模上的图案要被转印的基板的基板台; 配置在掩模载台和基板台之一上的细移动台，能够相对于一个台沿着扫描方向移动; 第一测量装置，用于沿着扫描方向检测微动台的位置; 第二测量装置，用于检测掩模台和衬底台中另一个沿着扫描方向的位置; 速度控制器，用于在掩模上的图案在基板上扫描曝光时，将掩模载物台和基板载物台的速度之比控制为预定值; 以及控制装置，用于根据在扫描曝光期间由第一测量装置测量的位置与由第二测量装置测量的位置之间的差异来控制微动载台的位置。

    Scanning exposure apparatus in which light exposure is a function of the speed of the mask or substrate stage
    109.
    发明授权
    Scanning exposure apparatus in which light exposure is a function of the speed of the mask or substrate stage 失效
    曝光是掩模或基板台的速度的函数的扫描曝光装置

    公开(公告)号：US06191844B1

    公开(公告)日：2001-02-20

    申请号：US09362686

    申请日：1999-07-29

    申请人： Toshio Ueda

    发明人： Toshio Ueda

    IPC分类号： G03B2742

    CPC分类号： G03F7/70558 ,  G03F7/70358 ,  G03F7/70716 ,  G03F7/70725 ,  G03F9/70

    摘要： When the scanning of a mask stage and a substrate stage is started, an interferometer measures the position of the substrate stage, while an interferometer unit differentiates the output of the interferometer to give a speed signal on the substrate stage, and delivers this speed signal. A main control unit produces a target value for the amount of exposure light adapted to this speed signal. A light amount adjustment system adjusts the amount of exposure light from an exposure light source in response to the target value calculated by the main control unit. Thus, exposure with appropriate amount of light adapted to the speed of the substrate stage is performed over all of the time zones from the start of drive of the substrate stage in the scan direction until its standstill. Hence, the exposure time can be shortened, and the throughput can be increased, in comparison with exposure being performed only in the constant speed zone of the stage.

    摘要翻译： 当掩模阶段和基片台的扫描开始时，干涉仪测量衬底台的位置，而干涉仪单元将干涉仪的输出区分开以在衬底台上给出速度信号，并传送该速度信号。 主控制单元产生适合该速度信号的曝光量的目标值。 光量调节系统响应于由主控制单元计算的目标值来调节来自曝光光源的曝光光量。 因此，在从扫描方向的驱动开始到停止的扫描方向的所有时间区域都进行适合于衬底台的速度的适当量的光的曝光。 因此，与仅在阶段的恒定速度区域进行曝光相比，可以缩短曝光时间，并且可以提高吞吐量。